CNT改性水泥基压电复合材料制备与压电性能

采用Fenton试剂结合超声分散和紫外线照射对CNT进行表面修饰,采用溶胶-凝胶法制备纳米级压电陶瓷(PZT),以CNT作为增强相,结合手动压片与直流极化工艺,制备出CNT改性水泥基压电复合材料。通过红外光谱和分光光度测试,当超声温度60℃、紫外线照射1h时,CNT分散液分散均匀,分散性最好。通过显微测试,CNT和PZT在水泥基压电复合材料中分散均匀,但结构致密度下降。压电常数和相对介电常数分别达到50.6pC/N、412.0,与相同条件下制备的PZT水泥基压电材料相比,分别提高18.5%、4.1%。同时,分散的CNT能发挥宏观量子隧穿效应,使复合材料在几乎不降低材料介电性能情况下更易极化。     

PZT压电陶瓷的总剂量辐照效应实验研究

采用传统固相反应法制备PZT压电陶瓷材料,并制作成平行平板无源电容器结构。在ELV-8电子直线加速器上对其进行总剂量辐照效应实验,对辐照前后PZT材料的介电和压电性能参数进行了测试和比较。实验结果表明,PZT材料平行平板电容器的压电性能抗总剂量水平可达2×108rad(Si),领先国际水平。     

低温烧结PZT压电陶瓷材料

本文介绍了低温烧结PZT压电陶瓷材料的发展概况,给出了不同方法制备的低温烧结PZT压电陶瓷材料的性能,并对降低PZT陶瓷烧结温度的各种方法进行了评价。     

基于PZT压电薄膜的压力传感器工艺研究

选用敏感材料锆钛酸铅(PZT),优化微机电系统(MEMS)微加工工艺,制作了硅基PZT压电薄膜叉指式电极结构的MEMS压力传感器。在基体Au/Ti/LNO/SiO_2/Si<100>上,采用溶胶-凝胶(Sol-Gel)法,在650℃高温下采用分层退火的方式进行退火,得到厚1.2μm的PZT压电薄膜。薄膜表面均匀,无裂纹。利用光刻工艺和低压溅射工艺得到平行叉指电极。制作完成PZT压电薄膜结构的微压力传感器,在弹性薄膜上施加压力,其电压输出性能较好,说明基于压电薄膜的叉指电极结构可行,为基于纳米纤维结构的微压力传感器的制作奠定了理论基础。     

基于压电效应的MEMS振动式微能源器件

设计了一种硅基压电功能材料的四悬臂梁-中心质量块结构MEMS振动式微能源器件,可将环境振动能量有效转化为电能。采用溶胶-凝胶法制备硅基锆钛酸铅(PbZr0.53Ti0.47O3,PZT)压电功能薄膜,经干/湿法刻蚀和溅射沉积等MEMS工艺实现器件功能结构的制备。研制的器件整体结构尺寸为7 000μm×7 000μm×300μm,单个PZT压电单元面积为0.149 6 mm2。将悬臂梁上4个压电单元串联以实现输出最大化,测试结果表明,器件的谐振频率为300 Hz,适于低频振动环境;输出电压在一定范围内随加速度增加而增大;在加速度为10 g时压电单元单位面积输出电压达1.19 mV/mm2。     

溶胶-凝胶法制备PZT薄膜研究进展

随着微机电系统(MEMS)产业的快速发展,铁电薄膜材料作为微机电器件的重要组成部分而愈受重视。锆钛酸铅(PZT)薄膜具有优越的压电性、热释电性及光电性等性能,在微电子、压电、光学及半导体等领域展现了巨大的应用潜力。因此,高性能PZT薄膜的制备技术及制备工艺一直备受关注。其中,溶胶凝胶法因具有易于控制成分,所需设备成本低及制备薄膜的均匀性好等优点而被广泛用于PZT薄膜制作中。该文在溶胶凝胶法基本原理及制作工艺的基础上,着重分析了溶胶凝胶法制备PZT薄膜的研究现状,总结了当前溶胶凝胶法的技术特点,并指出了研究中存在的不足及未来的潜在改进方向。     

纳米PZT粉体制备及PZT/水泥基复合材料压电性能

采用溶胶-凝胶法,结合正交试验设计,研究了不同反应条件((CH3COO)2Pb浓度、pH值、反应时间和煅烧温度)对PZT粉体结晶程度和晶粒大小的影响。用压制成型法制备出PZT压电陶瓷和PZT/硫铝酸盐水泥基复合材料。用正交极差与方差法分析了反应条件对PZT粉体物相与粒度及陶瓷片和复合材料的压电与介电性能的影响,得出粉体最佳制备工艺。结果显示:最佳反应条件为(CH3COO)2Pb浓度为15%,pH=5.0,反应时间2h,煅烧温度600℃;煅烧温度对陶瓷片及复合材料的压电与介电性能影响最显著;相应陶瓷片压电常数d33、相对介电常数εr分别为38.5pC/N、1.3;而复合材料的d33、εr分别为4.4pC/N、29.4,数值偏低可能是水泥水化不充分,结构不致密所致。     

溶胶-凝胶工艺对纳米级富锆PZT粉末制备的影响

采用溶胶-凝胶工艺制备了纳米级富锆PZT粉末,分析比较了不同溶胶-凝胶过程对制备工艺和合成粉末性能的影响.研究表明合适的反应前驱物、溶液pH值、胶凝剂和热处理条件,对于提高制备粉体结晶度和活性,简化制备工艺、降低反应成本是极其重要的;以硝酸铅为铅源合成粉末具有较好的活性.     

铅锰锑系压电陶瓷介电性研究

采用预合成及掺杂适量MnO2等工艺制备了钙钛矿结构为主的压电陶瓷材料Pb（Mn1/3Sb2/3)x(Zn1/3Nb2/3)y(Zr0.535Ti0.465)1-x-yO3,此材料具有机电耦合系数高、介质损耗小、介电常数与机械品质因数适中的特点。引入MnO3使其成为单一的钙态矿结构,并且提高了材料的介电与压电性能。     

PT种子层对PZT薄膜结晶及压电性能的影响

采用溶胶-凝胶法(Sol-Gel)在Pt/Si衬底上制备了PbTiO3 (PT)薄膜和Pb (Zrx,Ti1-x)O3(PZT)薄膜,研究了退火温度以及PT种子层对PZT薄膜结晶及压电性能的影响。X射线衍射(XRD)结果表明,制备的PZT薄膜为纯钙钛矿结构的多晶薄膜,有PT种子层的PZT薄膜晶粒尺寸更大,(110)面取向度更高,结晶性能更好;原子力显微镜(AFM)结果表明,制备的薄膜表面形貌比较平整、均匀、无裂纹;压电力显微镜(PFM)结果表明,压电力显微镜(PFM)结果表明,有PT种子层时,PZT薄膜的平均压电系数d33为128～237 pm/V,无PT种子层时平均压电系数d33为21～29 pm/V。在升温速率为10 ℃/s的退火条件下保温10 min时,随着退火温度的升高,PZT薄膜晶粒尺寸增大,粗糙度增大,(110)面取向度升高,平均压电系数d33增大。PT种子层能够有效的改善PZT薄膜的结晶性能和压电性能。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.