光孤子振幅压缩态的产生及检测

利用非对称Sagnac干涉仪得到光孤子振幅压缩态,并利用平衡零差探测系统对其进行测量.本文重点讨论了测量孤子压缩态的光电探测器,给出了设计方案以及测试指标.其中3dB带宽约为10 MHz,饱和功率约为19 mW.利用该探测器测得孤子压缩值约为1.1 dB,考虑系统整体探测效率(75%),可达约1.5 dB.     

应用于IEEE 802.11b无线局域网系统的2.4GHzCMOS单片收发机射频前端

实现了一个应用于IEEE 802.11b无线局域网系统的2.4GHz CMOS单片收发机射频前端,它的接收机和发射机都采用了性能优良的超外差结构.该射频前端由五个模块组成:低噪声放大器、下变频器、上变频器、末前级和LO缓冲器.除了下变频器的输出采用了开漏级输出外,各模块的输入、输出端都在片匹配到50Ω.该射频前端已经采用0.18μm CMOS工艺实现.当低噪声放大器和下变频器直接级联时,测量到的噪声系数约为5.2dB,功率增益为12.5dB,输入1dB压缩点约为-18dBm,输入三阶交调点约为-7dBm.当上变频器和末前级直接级联时,测量到的噪声系数约为12.4dB,功率增益约为23.8dB,输出1dB压缩点约为1.5dBm,输出三阶交调点约为16dBm.接收机射频前端和发射机射频前端都采用1.8V电源,消耗的电流分别为13.6和27.6mA.     

S-Band 1mm SiC MESFET with 2W Output on Semi-Insulated SiC Substrate

介绍了用热壁反应炉在50mm SiC半绝缘衬底上制备的SiC MESFET外延材料.其沟道层厚度约为0.35μm,掺杂浓度约为1.7×1017cm-3.沟道和衬底之间的缓冲层为非有意掺杂的弱n型.欧姆接触用的帽层掺杂浓度约1019cm-3.器件制备采用了ICP刻蚀等技术.微波测试结果表明,1mm栅宽功率器件封装后在2GHz下输出功率达到了2W.     

在半绝缘SiC衬底上制备的S波段2W碳化硅MESFET

介绍了用热壁反应炉在50mm SiC半绝缘衬底上制备的SiC MESFET外延材料.其沟道层厚度约为0.35μm,掺杂浓度约为1.7×1017cm-3.沟道和衬底之间的缓冲层为非有意掺杂的弱n型.欧姆接触用的帽层掺杂浓度约1019cm-3.器件制备采用了ICP刻蚀等技术.微波测试结果表明,1mm栅宽功率器件封装后在2GHz下输出功率达到了2W.     

LBlock 码的不可能差分密码性能分析

该文分析研究了LBlock分组密码算法的不可能差分性质.基于LBlock算法的轮函数结构和部分密钥分别猜测技术,给出了21轮和22轮的LBlock算法的不可能差分分析方法.攻击21轮LBlock算法所需的数据量约为262,计算量约为262次21轮加密;攻击22轮LBlock算法所需的数据量约为262.5,计算量约为263.5次22轮加密.与已有的结果相比较,分析所需的计算量均有明显的降低,是目前不可能差分分析攻击LBlock的最好结果.     

2014年Vacon交流变频器帮助节省24小时的全球发电量

http://www.vacon.com/2015年3月9日,全球交流传动制造商Vacon估算其产品在2014年帮助节约了约62TWh的电能。另外,去年来自配备有Vacon交流变频器的可再生能源的发电量约为25TWh。去年在Vacon变频器的帮助下节省了约62TWh(2013年为55TWh)。这相当于约11座700兆瓦的核电反应堆一年的发电量,或者约1380万个欧洲家庭的年用电量。也相当于约24小时     

Bi_2Cu_(0.1)V_(0.9)O_(5.35-δ)固态电解质化学溶液法的合成与性能

用化学溶液法合成了Bi2Cu0.1V0.9O5.35-δ(BICUVOX.10)材料,研究了材料的物相、表面形貌和电学特性.BICUVOX.10薄膜具有室温稳定的高电导γ相.在LaNiO3/Si衬底上,BICUVOX.10薄膜具有(001)择优取向,平均晶粒大小约为200nm.低频范围的介电损耗来源于氧空位的短程扩散,BICUVOX.10薄膜主要表现为晶粒电导特性.BICUVOX.10薄膜中氧离子电导激活能约为0.3 eV,氧离子电导率约为5×10-2S.cm-1.     

Passive Orbit Measurement of Geosynchronous Satellite Based on Four-station's Time Difference of Arrival

基于卫星通信信号的多站时差测轨是一种重要的新型无源测轨方法,分析其定轨精度对系统应用具有重要意义.介绍了四站时差测轨原理与系统组成,提出了基于四站时差测量数据的自校准统计定轨策略,采用计算机仿真了同步轨道卫星的统计定轨精度.仿真结果表明:当无系统误差时,24h观测数据统计定轨位置误差约为11m,预报1周位置误差约100 m;当存在系统误差时,可用自校准方法同步估计系统误差,系统误差估计精度约为4m,位置误差约为120 m,预报1周的位置误差约为200 m.     

High-Power Distributed Feedback Laser Diodes Emitting at 820nm

通过将二级光栅直接刻在脊形波导AlGaInAs/AlGaAs DFB激光器的无铝光波导层上,实现了波长约为820nm,单面功率为30mW的单纵模激光器.由于采用无铝光栅,保证了二次外延质量,从而得到较好的器件性能.激光器的阈值电流为57mA,斜率效率约为0.32mW/mA.     

北京奥运期间的碳黑气溶胶观测研究

2008年7～8月在北京市奥体中心的遥感所站点连续实时监测碳黑气溶胶(BC),研究其在北京奥运期间的变化特征和来源.奥运会前BC平均质量浓度约为4.58μg/m3,而奥运会期间其平均浓度约为3.07μg/m3,下降比约为33.0%,这说明减排措施有效降低了BC的排放总量.同步监测的可吸入颗粒物(PM10)与BC一致性较好,相关系数为0.86,BC约占PM10的1.9%.比对2007年同期BC浓度数据,也证实了北京地区在实行各项减排措施后,BC的污染情况有较大好转.     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.