计算机无线遥控玩具模型实验方案

系统采用无线电遥控与计算机相结合的传输方式,用户在计算机操作界面上对玩具模型实现实时控制和编程控制,在计算机机器操作界面上显示模型类型和运动轨迹方向。系统通过单片机编程和专用编解码器实现被控对象的动作编排.通过单片机与计算机的串口通讯实现在机器界面上的操作,操作界面软件采用BORLAND Delphi 7.0编写。     

基于myDAQ的远程多对象控制系统设计

针对目前远程控制扩展性弱的现状,设计了一种基于myDAQ的远程多对象控制系统,该系统将NI便携式数据采集设备（myDAQ）上的各种信号源通过模拟开关技术拓展成六路信号,并通过单片机IAP技术实现六路信号之间的切换控制。上位机通过LabVIEW编写制作便于人机交互的图形操作界面,并通过LabVIEW的Web发布技术将前面板发布到网络上。该系统在网络环境下成功实现了利用任意一台PC机对现场六种被控对象随时随地的交互式远程控制,并且通过摄像头实时观看控制现象。该系统已成功应用于iLab实验室的远程网络实验教学中,并且运行可靠稳定。     

GET COMMUNICATED THROUGH RADIOWAVE

拍摄!接下来的事情就用不到数据线帮忙了,无线拍摄体验正式开始!开机,在正常拍摄状态下按一下数据传输键,蓝光亮起的同时液晶屏上便会出现无线连接界面。选定目标 PC 机后点击“连接”,相机就会自动搜索已注册计算机的无线网络,可不要忘了开启 PC 端的 Wi-Fi 哟!短暂的网络搜索后,相机就处于无线连接状态,并在液晶屏上显示出当前信号强度。此时用户可以在拍摄前进入相机的连接菜单界面设置“自动传输”功能,如果选择开启,那么相机会在每拍摄完一张后将照片传输至 PC 端,如果是关闭状态,则不会有任何动作,用家可以在拍摄工作完全结束后将照片一次性上传——既保证了     

基于IP传输的空地遥控系统设计

现代新航空产品的科研试飞、定型试飞不仅任务量大,且试飞难度大,试飞风险高.为降低试飞风险和试飞成本,实现机载电子系统试飞地空无线遥控操作是有效途径之一.基于IP传输的地空遥控系统通过无线的TCP/IP网络将远程(机载)被控计算机上的软件界面传输到(地面)遥控计算机,将地面遥控计算机的键盘、鼠标等操作指令传递到机载被控计算机上,实现机载电子系统试飞地面无线遥控操作.试验结果验证了设计方案的正确性和可行性.     

人工神经网络控制的实时仿真系统

为了观测使用人工神经网络作为控制器的实际的自动控制系统的控制效果,我们开发了一种实时闭环仿真系统.该仿真系统具有两个独立的部分:一部分是被控对象部分,由PC计算机计算被控对象的数学模型来模拟;另一部分为控制器部分,由真正的神经网络硬件实现.两部分由硬件接口电路连接在一起.此仿真系统工作于真正的时间轴中,即数学模型中的时间常数不再仅仅是计算中的参数而是反映真正的时间长度,它满足检验用于实际系统的神经网络控制器性能的需要.实验结果表明,此实时仿真系统对于设计基于人工神经网络的控制系统是一种有用的工具.     

MES—1微电脑值机系统中采样电路的设计

在实现微计算机广播与电视发射机等设备的自动控制中,计算机接口的采样电路的设计好坏,直接关系到微计算机能否正确地反映被控设备的工作状态及系统能否可靠地运行。采样电路设计应考虑到:信号取出部位最能反映被控设备该部分的性能;对采样信号进行处理的电路要尽可能的简单和可靠;     

基于GPRS远程家电控制系统的设计与实现

介绍以各种家用电器作为被控对象,结合近距离及远程无线通信技术,构成远程家电控制系统。居室内是一个小型无线网络,家电控制器作为网络中的节点,通过与无线遥控器进行命令/状态信息的交换,实现室内家电状态的无线控制;选择一家电控制器连接GPRS模块,使其作为客户端,以便访问远程PC机,实现信息与命令的交互。此系统可帮助人们有效的安排时间,节约各种能源,使家居生活更加简便舒适。     

基于FPGA数据采集系统的设计

随着当今现代化水平的提高,应用现代电子技术对湿度、压强、频率、速度、加速度、流量、液位等一些物理量的测量和采集时,普遍的做法是将上述物理量经过某种传感器转换为电信号,再由模数转换电路将电信号变为数字量,然后通过计算机对数字量进行处理。本文根据工业生产的需要,设计了一种高速度和高准确度的数据采集系统,该系统采用具有高速处理数据的FPGA技术,通过控制模数转换芯片的工作状态和USB的通信模块,在计算机上使用LABVIEW软件开发显示,并在PC机上显示控制界面。     

自抗扰控制器的分析及设计

自抗扰控制器是利用非线性控制理论而设计的新型控制器。这种控制器不依赖被控对象的精确数学模型,采用跟踪微分器处理参考输入,扩张状态观测器估计系统状态、模型和外扰,非线性状态误差反馈组合,能够实现对被控对象的良好控制。本文总结了自抗扰控制器的调节规律,解决了自抗扰控制器参数难以整定的问题。仿真证明,这种控制器对被控系统具有较强的快速性、适应性和鲁棒性,具有很高的工程实用价值。     

自抗扰控制器的分析及设计

自抗扰控制器是利用非线性控制理论而设计的新型控制器.这种控制器不依赖被控对象的精确数学模型,采用跟踪微分器处理参考输入,扩张状态观测器估计系统状态、模型和外扰,非线性状态误差反馈组合,能够实现对被控对象的良好控制.本文总结了自抗扰控制器的调节规律,解决了自抗扰控制器参数难以整定的问题.仿真证明,这种控制器对被控系统具有较强的快速性、适应性和鲁棒性,具有很高的工程实用价值.     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.