LP-MOVPE生长宽波导有源区无铝单量子阱激光器

介绍了无铝激光器的优点,利用LP-MOVPE生长出宽波导有源区无铝SCH-SQW结构激光器.该结构采用宽带隙InGaAlP作限制层,加宽的InGaP作波导层,增加对载流子和光子的限制作用,以克服有铝激光器易氧化和全无铝激光器载流子易泄漏的缺点.制作的条宽100μm、腔长1mm的激光器(腔面未镀膜),激射波长为831nm,室温连续输出光功率达1W.     

大功率InGaAsP/InGaP/GaAs激光器特性研究

介绍了无铝激光器的优点 ;利用 LP-MOVPE生长了 In Ga As P/In Ga P/Ga As分别限制异质结构单量子阱 (SCH-SQW)结构 ,讨论了激光器的腔长对特征温度的影响。对于条宽 1 0 0 μm、腔长 1 mm腔面未镀膜的激光器 ,连续输出光功率为 1 .2 W,阈值电流密度为 41 0 A/cm2 ,外微分量子效率为 62 % ,并进行了可靠性实验。     

非对称异质波导半导体激光器结构

提出了一种非对称异质波导半导体激光器外延结构,即通过优化选择材料体系和结构厚度,对器件外延层的P侧限制结构和N侧限制结构分别设计,从而降低器件的电压损耗,使其满足高输出功率以及高的电光转换效率的要求.从载流子的输运和限制等微观机制出发,对器件的主要输出特性进行了理论分析和数值模拟,并以此为根据设计和制作了一种1060 nm In Ga As/Ga As单量子阱非对称异质波导结构半导体激光器,并对器件的主要输出特性进行了测试.实验结果表明,非对称异质结构是降低器件的电压降、增大限制结构对注入载流子的限制,提高半导体激光器电光转换效率的有效措施.     

高铝Al_xGa_(1-x)As氧化层对垂直腔面发射激光器的影响

针对可见光垂直腔面发射激光器的制备 ,通过湿氮氧化实验和测量微区光致发光谱分别研究了高铝组分Alx Ga1 - x As的氧化特性及氧化产物的收缩应力对有源区的影响 ,结合器件结构设计确定了氧化限制层 Alx Ga1 - x-As的铝组分和最佳位置 ,并制备出了低阈值电流的 Al Ga In P系垂直腔面发射激光器     

InGaAsP/GaAs单量子阱半导体激光器光学特性的研究

用改进的液相外延方法 L PE 生长了无铝的 In Ga As P/Ga As分别限制单量子阱半导体激光器 ,测量其远场分布近似为高斯分布 .用缓变波导理论分析了产生这种分布所对应的光波导结构的折射率分布模型 ,并简单解释了其生成原因 ,为改善光束质量提供了参考     

AlGaN/GaN/InGaN对称分别限制多量子阱激光器的优化设计

采用一维传递矩阵法模拟计算了AlGaN/GaN/InGaN对称分别限制多量子阱激光器(发射波长为396.6nm)的波导特性.以光限制因子、阈值电流密度和功率效率作为优化参量,获得激光器的优化结构参数为:3周期量子阱In0.02Ga0.98N/In0.15Ga0.85N(10.5nm/3.5nm)作为有源层,90nm In0.1Ga0.9N为波导层,120周期Al0.25Ga0.75N/GaN(2.5nm/2.5nm)为限制层.     

AlGaN/GaN/InGaN对称分别限制多量子阱激光器的优化设计

采用一维传递矩阵法模拟计算了AlGaN/GaN/InGaN对称分别限制多量子阱激光器(发射波长为396.6nm)的波导特性.以光限制因子、阈值电流密度和功率效率作为优化参量,获得激光器的优化结构参数为:3周期量子阱In0.02Ga0.98N/In0.15Ga0.85N(10.5nm/3.5nm)作为有源层,90nm In0.1Ga0.9N为波导层,120周期Al0.25Ga0.75N/GaN(2.5nm/2.5nm)为限制层.     

大功率宽面808nm GaAsP/AlGaAs量子阱激光器分别限制结构设计

本文对有源区条宽100μm的GaAsP/AlGaAs 808nm量子阱激光器分别限制结构进行了理论分析和设计.选取了三种情况的波导层和限制层的铝组分,分别计算和分析了波导层厚度与激光器光限制因子、最大出光功率、垂直发散角和阈值电流密度的函数关系.根据计算结果可知:当波导层和限制层铝组分为0.4和0.5时,采用窄波导结构可以获得器件的最大输出功率为11.2W,发散角为19°,阈值电流密度为266A/cm2;采用宽波导结构可以得到器件的最大输出功率为9.4W,发散角为32°,阈值电流密度为239A/cm2.     

大功率宽面808nm GaAsP/AlGaAs量子阱激光器分别限制结构设计

本文对有源区条宽100μm的GaAsP/AlGaAs 808nm量子阱激光器分别限制结构进行了理论分析和设计.选取了三种情况的波导层和限制层的铝组分,分别计算和分析了波导层厚度与激光器光限制因子、最大出光功率、垂直发散角和阈值电流密度的函数关系.根据计算结果可知:当波导层和限制层铝组分为0.4和0.5时,采用窄波导结构可以获得器件的最大输出功率为11.2W,发散角为19°,阈值电流密度为266A/cm2;采用宽波导结构可以得到器件的最大输出功率为9.4W,发散角为32°,阈值电流密度为239A/cm2.     

808 nm大功率无铝有源区非对称波导结构激光器

采用分别限制非对称波导结构,将光场从对称分布变为非对称分布,降低了载流子光吸收损耗,并允许p型区具有更高的掺杂水平,从而使器件电阻降低.对GaAsP/GaInP张应变单量子阱(SQW)非对称波导结构激光器的光场特性进行了理论分析,设计了波导层厚度,并制作了波长为808 nm的无铝有源区大功率半导体激光器.器件综合特性测试结果为:腔长900μm器件的阈值电流密度典型值为400 A/cm2,内损耗低至1.0 cm-1;连续工作条件下,150μm条宽器件输出功率达到6 W,最大斜率效率为1.25 W/A.器件激射波长为807.5 nm,平行和垂直结的发散角分别为3.0°和34.8°.20~70℃范围内特征温度达到133 K.结果表明,分别限制非对称波导结构是降低内损耗,提高大功率半导体激光器特性的有效措施.     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.