采用残差变化控制的自适应稀疏信道估计

针对传统压缩感知信道估计对稀疏度信息依赖和稀疏度自适应信道估计在低信噪比时抗噪能力较差的问题,提出了一种采用残差变化控制的稀疏度自适应的压缩感知信道估计算法。该算法在传统的压缩感知信道估计的基础上引入残差变化控制,通过比较每次迭代下的残差变化的幅度来控制信道估计的迭代次数,提高信道估计的自适应性和鲁棒性。同时,为解决传统稀疏度自适应压缩感知信道估计抗噪能力较差的问题,利用正交匹配追踪提高算法的抗噪声性能。相比于传统的稀疏度自适应匹配追踪(Sparsity Adaptive Matching Pursuit,SAMP)算法,所提算法约有4 dB的性能优势,且算法复杂度更低。     

基于簇的块稀疏压缩感知的60GHz信道估计

基于压缩感知设计适用于60 GHz毫米波通信系统的信道估计方案,深入研究了正交匹配追踪(OMP)算法和正则正交匹配追踪(Regularized OMP)算法的60 GHz信道估计性能;在此基础上,充分发掘60 GHz无线多径信道所呈现出的分簇特性,提出一种新颖的基于簇分级的稀疏压缩感知重构算法。新算法在有效减少重构迭代次数的前提下,亦能显著降低信道估计误差。综合对比分析了基于簇分块稀疏压缩感知重构算法和现有压缩感知算法在60 GHz信道估计应用中的重构性能,仿真结果表明,压缩感知算法可有效应用于60 GHz系统信道估计,而新设计的基于簇分级的稀疏压缩感知算法则在估计精度和实现复杂度方面具更优越性能。     

RIS辅助无线系统中基于压缩感知的稀疏度自适应级联信道估计方法研究

为了解决可重构智能超表面（Reconfigurable Intelligent Surface, RIS）辅助无线通信系统中级联信道的估计问题,本文提出了一种基于压缩感知（Compressive Sensing, CS）的自适应双结构稀疏正交匹配追踪算法（Adaptive Double-Structured Orthogonal Matching Pursuit, ADS-OMP）。已有的双结构稀疏正交匹配追踪算法（Double-Structured Orthogonal Matching Pursuit, DS-OMP）利用级联信道的双结构稀疏特性即行稀疏特性和列稀疏特性来提高算法估计性能,但需要已知相关信道稀疏度信息。本文提出的ADS-OMP算法在现有的DS-OMP算法基础上设计合理的判决准则和迭代阈值来估计相关稀疏度,从而能在角域级联信道的行稀疏度和列稀疏度均未知的情况下完成级联信道估计,有效克服了现有DS-OMP算法对相关信道稀疏度的依赖,算法实用性更强。仿真结果表明,本文提出的ADS-OMP算法和已有DS-OMP算法估计性能一致,算法复杂度在同一数量级上,前者复杂度略微提升。      

基于IOC-CSMP的OFDM系统稀疏信道快速重构算法

针对信道路径数量未知时正交频分复用（OFDM）系统信道估计问题,提出了一种基于内积运算优化与稀疏度更新约束的压缩采样匹配追踪快速重构算法。通过构建与更新选择向量,利用与选择向量中非零值索引对应的原子向量参与内积运算来降低运算量;基于压缩采样与回溯策略来优化原子,利用匹配追踪完成信道估计,通过相邻两次信道估计值的能量差来更新稀疏度并约束算法停止,保证算法快速收敛。仿真结果表明,所提算法具有比最小二乘、最小均方差、稀疏度自适应匹配追踪和自适应正则化压缩采样匹配追踪算法更好的信道估计性能,且比2种自适应方法消耗更少的信道估计时间。     

基于压缩感知的MIMO NC-OFDM系统信道估计算法北大核心

多输入多输出不连续正交频分复用(MIMO NC-OFDM)系统是认知无线电(CR)系统的常用体制,由于授权用户占用而导致的载波不连续情况下的信道估计是影响该系统性能的关键技术问题。提出一种基于压缩感知(CS)的MIMO NC-OFDM系统的信道估计方法——稀疏自适应匹配追踪(SAMP)算法。SAMP算法在重构过程中先对信号稀疏度进行初始估计,然后自适应调整步长逐步逼近信号,相较于其他贪婪算法,能够在稀疏度未知的情况下准确重建稀疏信号。仿真结果表明,SAMP算法提高了重构精度,在实际应用中易于实现。     

基于压缩感知的MIMO-OFDM系统自适应信道估计

针对超密集组网中导频复用将产生导频干扰,严重影响移动用户下行链路信道估计准确性的问题,提出了一种使用短导频的幂函数稀疏度自适应匹配追踪(Power Sparsity Adaptive Matching Pursuit,PSAMP)算法.该算法由稀疏度预估计和追踪重构两部分构成.首先通过幂函数试探得到一个略小于真实稀疏度的预估值,再通过压缩采样匹配追踪重构信号,改善估计结果;若不能成功重构,则逐渐增加信号原子数量.仿真结果表明,相较于传统自适应压缩感知重建算法,所提的P SAMP算法在高信噪比区域具有更好的信道估计性能.     

一种基于改进ROMP的MIMO-OFDM信道估计方法

本文根据信道响应的时域稀疏性,引入压缩感知理论,针对正则化正交匹配追踪（ROMP）需已知稀疏度和原子一旦选入无法删除两大缺点,提出一种基于改进ROMP的信道估计方法.该方法结合压缩采样匹配追踪（CoSaMP）、稀疏度自适应匹配追踪（SAMP）和变步长的优点,实现稀疏信号快速准确的重建.仿真结果表明,与基于OMP、ROMP、CoSaMP、SAMP的信道估计方法相比,所提方法有效提高了MIMO-OFDM系统的归一化均方误差（NMSE）和误码率（BER）性能.     

G3-PLC系统压缩感知信道估计的LS-SAMP算法

为了提高G3-PLC系统可靠性,引入压缩感知(Compressed Sensing,CS)的信道估计方法,提出了一种基于最小二乘(Least Squares,LS)的稀疏度预测自适应匹配追踪(LS Based Prediction-Sparsity Adaptive Matching Pursuit,LS-SAMP)算法。该算法在稀疏度自适应匹配追踪(Sparsity Adaptive Matching Pursuit,SAMP)算法的基础上,采用了基于LS的稀疏度预测方法对信道稀疏度进行预估计,使算法可以快速逼近信道的真实稀疏度,提高算法运行效率;其次利用主成分分析方法对观测矩阵进行线性优化,降低观测矩阵相干度,提高算法的重构性能。实验结果表明,在误码率为10-3时,所提算法相对于LS算法的信道估计性能有1 dB的提升,且其运行效率比SAMP算法提升了31.23%,以更有效的方式提高了G3-PLC系统的可靠性。     

基于CS的Kalman滤波OFDM信道估计

在OFDM系统信道估计中,准确的时域卡尔曼滤波（TDKF）估计需要信道多径时延作为先验条件,而且具有较低的频谱效率.考虑到大多数无线信道具有稀疏和时变的特性,提出一种改进的卡尔曼滤波与压缩感知联合信道估计方法,采用稀疏度自适应匹配追踪（SAMP）算法,并对信道响应变化量进行重建.仿真结果表明,相较于已有算法,提出的算法不需要知道信道的稀疏度,而且信道估计结果更加准确.     

一种改进的变步长SAMP压缩感知浅海水声信道估计算法

针对稀疏度自适应匹配追踪（Sparsity Adaptive Matching Pursuit,SAMP）算法估计性能过度依赖初始步长的问题,提出了改进的变步长稀疏度自适应匹配追踪（Improved Variable Step-size Sparsity Adaptive Matching Pursuit,IVSSAMP）算法,并将IVSSAMP算法应用于水声正交频分复用（Orthogonal Frequency Division Multiplexing,OFDM）系统的压缩感知信道估计框架中。IVSSAMP算法通过残差条件对步长选取进行分类,在不同条件下分别引入微调因子设置残差与测量向量、残差与噪声之间的阈值来调整步长,实现变步长和稀疏度的自适应,同时规避了过度估计情况的发生。实验结果表明,IVSSAMP算法利用步长的灵活选取实现了估计精度与运行速度之间的平衡,降低了初始步长对算法性能的影响,具有较好的稳健性和应用性。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.