银纳米线中五次孪晶结构的透射电镜研究

五次孪晶结构是一个典型的结构问题。过去人们深入研究了纳米团簇(颗粒)中的多重孪晶现象。但关于金属纳米线中的五次孪晶结构，特别是孪晶晶界和孪晶关系的问题尚有待深入研究。本文对Ag纳米线中的五次孪晶结构进行了透射电镜研究。     

低维纳米材料中五次孪晶结构的透射电镜研究

本文对Ag纳米线中的五次孪晶结构进行了深入系统的透射电镜研究。首次获得了Ag纳米线截面的五次孪晶结构的高分辨图像和电子衍射花样;研究了单根孪晶Ag纳米线中五次孪晶的结构特性。结果表明:Ag纳米线沿着[110]方向生长,具有显著的五次孪晶结构特点,其中五次孪晶是由五个{111}晶体旋转组成。并针对五重旋转孪晶产生7°20′本征间隙的这一典型结构问题,进行了统计实验分析,提出了纳米线中五次孪晶的新的结构模型。电子能量损失谱(EELS)研究表明:五次孪晶的中心部位相对于Ag单晶,其Ag M4,5峰向低能量方向有轻微漂移。单根纳米线的选区电子衍射或者是由[112]和[110]方向,或者是由[110]和[111]方向叠加产生的。对五次孪晶纳米线高温动态行为的透射电镜原位观察将有利于了解纳米线的生长机理。     

碳化硼五次孪晶纳米线的结构弛豫现象研究

通过透射电子显微学方法研究纳米材料内部结构有助于理解界面与缺陷对纳米材料性能的影响。在碳化硼五次孪晶纳米线体系中,为了缓解5°角度过剩引起的五次孪晶轴心区域的弹性应变能,在纳米线内部会产生一些结构缺陷。本文通过系列电子衍射分析结合暗场成像技术揭示了碳化硼五次循环孪晶纳米线中的一种结构弛豫模式。孪晶轴向纳米线边缘偏移从而导致其中2片单晶结构单元的缺失,形成仅具有3个单晶结构单元的非完整循环孪晶结构。统计分析发现此类结构弛豫现象少量存在于1100℃固相烧结合成的碳化硼五次孪晶纳米线中,从能量角度定性分析表明这可能与该结构弛豫发生过程中会产生具有较高能量的界面及表面有关。     

KxWO3有序孪晶纳米线的合成和TEM表征

通过简单的实验方法在玻璃衬底上得到了钾钨青铜(KxWO3)纳米线。利用透射电镜选区电子衍射方法结合明场像及高分辨电子显微像分析确定了KxWO3纳米线的结构及生长方向,发现KxWO3纳米线具有有序的单斜超结构,该单斜KxWO3相以[001]m为孪晶轴的120°三次旋转孪晶的形式存在,纳米线的生长方向为[001]m。通过暗场像分析,确定了纳米线是由更小尺度的纳米单元构成的。根据透射电子显微分析结果并结合实验过程,对KxWO3纳米线可能的形成机制进行了讨论。     

碳化硼五次孪晶纳米线的结构弛豫现象研究

通过透射电子显微学方法研究纳米材料内部结构有助于理解界面与缺陷对纳米材料性能的影响.在碳化硼五次孪晶纳米线体系中,为了缓解5°角度过剩引起的五次孪晶轴心区域的弹性应变能,在纳米线内部会产生一些结构缺陷.本文通过系列电子衍射分析结合暗场成像技术揭示了碳化硼五次循环孪晶纳米线中的一种结构弛豫模式.孪晶轴向纳米线边缘偏移从而...     

Al-7Si合金在热处理过程中的显微结构演变

本文利用扫描电子显微镜(SEM)和高分辨透射电子显微镜(HRTEM)研究了固溶处理和时效处理过程中铝硅二元合金中硅颗粒、析出相及硅颗粒与铝基体界面处的微观结构变化特征。研究结果表明:随着固溶时间的延长,硅颗粒的形态由树枝状逐渐变成椭球状和球状;时效过程中,溶入α-Al基体中的硅原子会在铝基体中聚集,形核并形成沿铝基体{111}面生长的硅析出相,同时还会在硅颗粒上析出一层硅的纳米孪晶,这些纳米孪晶会随着时效时间的延长不断长大。硅的孪晶壳层中存在大量孪晶和其他缺陷,除了常见的SiΣ3(111)孪晶外,观察到的孪晶类型还包括多重孪晶,如五重孪晶。     

纳米Ir薄膜中缺陷结构的原子尺度研究

金属铱(Ir)因具有高密度,高熔点,高硬度等特点而被广泛应用于航空航天、军工等高新科技领域。但Ir的塑性差,严重影响其进一步广泛应用。金属自身的结构及缺陷对其力学性能具有重要影响,研究Ir的原子尺度微观结构可为其力学性能优化提供重要参考。本文主要利用透射电子显微镜(TEM)对纳米Ir薄膜中的缺陷类型和缺陷密度进行了研究。发现薄膜中存在高密度的孪晶以及位错。其中,薄膜中的孪晶密度为1.6×10³(1/μm²)。此外,研究还发现薄膜中有两大类缺陷的相互作用:位错与孪晶相互作用以及孪晶与孪晶相互作用。前者包括层错与孪晶相互作用以及全位错对孪晶的钉扎作用;孪晶之间的相互作用形态包括头对头对接式,三重孪晶和五重孪晶等多种形态。     

低碳位错马氏体中的局部孪晶

在位错型低碳马氏体中观察到孪晶亚结构已有一些报导,但是低碳位错马氏体中孪晶的形成原因、形貌特征与影响因素尚未深入研究。本文研究了Ms温度260—430℃五种低碳马氏体中李晶的形态、数量与形成原因。试验取用的最高淬火速率为11280℃/秒,五种材料均存在含有孪晶的马氏体数量(简称孪晶数量)随淬火速率增加递增的变化规律,其中M_s温度最高的20钢低于一定淬火速率时孪晶消失。淬火速率相同时,孪晶数量随Ms温度降低而增加。李晶的形态随Ms温度及化学成分变化,Ms温度高于300℃低碳马氏体(20,15MnB、18CrMnTi,18Cr_2Ni4W)中存在的少量孪晶一般是位错马氏体中的局部孪晶,孪晶往往沿板条界分布,孪晶短而厚呈笋状或透镜状(见图)。Ms温度低于300℃的25SiMn_2CrNiMoV的弯晶细长平直呈典型的孪晶形态,而且往往     

SiC纳米线的孪晶机制的透射电子显微学研究

本文对溶胶-凝胶法制得的SiC微孪晶纳米线进行了微结构与孪晶机制的详细研究,利用会聚束电子衍射(CBED)及其动力学模拟技术间接证明了它是一种关于(111)面的60°旋转孪晶.并在此基础上对SiC微孪晶纳米线的生长机理进行了讨论.     

孪晶片层尺寸对孪晶形变行为的影响

通常多晶铜中会含有一定数量的生长孪晶或退火孪晶。但是，由于一般生长孪晶的尺寸和分布很不均匀，数量也较少，很难研究它们在材料力学行为中的作用，因此孪晶对铜的力学行为的影响还不清楚。最新研究发现，可以利用电解沉积法，通过引入大量的生长孪晶和降低孪晶尺寸来制备纳米结构铜。纳米量级的孪晶结构对力学行为的影响十分明显，但对其作用机理的研究十分有限。本工作对一种由电解沉积法制备的含有独特的高密度纳米孪晶片层结构的多晶纯铜进行室温轧制，通过观察其微观结构，探讨了孪晶结构特别是纳米量级的孪晶片层结构的形变行为以及孪晶片层尺寸对其形变行为的影响。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.