面向高性能的红外折射式镜头装调技术

针对红外光学材料折射率不均匀导致系统波前产生异常像差,从而引起镜头像质严重下降的问题,提出了一种光学件位置迭代调整和面形修配相结合的系统波前补偿方法,实现面向高性能的红外折射式镜头装调。在光学件精密定心的基础上,设计了在线装调检测装置,依据镜头实测波前并结合计算机辅助装调技术,通过迭代调整光学件位置矫正系统波前初阶像差。对系统残留的中高阶像差,根据各视场测得的系统波前综合分析计算,采用修配光瞳处光学件面形,引入反残留波像差的方式补偿。实验上,通过对某红外折射式镜头装调,将镜头三个视场系统波前RMS (λ=3.39μm)分别由精密定心后的0.162λ、0.118λ、0.166λ降低至0.064λ、0.040λ、0.067λ,平均MTF (@25 lp/mm)由0.31提升至0.67。结果表明,这种装调技术对红外折射式镜头系统波前补偿效果明显,可大幅提升镜头成像性能,具有重要的工程应用价值。     

自由曲面离轴四反全铝光机红外探测系统(特邀)EI北大核心CSCD

为满足红外探测系统对大视场、轻量化、低成本的需求,设计并研制了一款用于制冷型红外探测器的自由曲面离轴四反全铝光机系统。光学设计采用具有实出瞳的离轴无遮拦全反射式光路形式,并利用7次XY多项式表征各反射镜面型。在紧凑包络约束下,实现了6.25°×5°的视场角,全视场RMS几何弥散斑半径<6.0μm。各反射镜和支撑结构材料均选用6061-T651铝合金,各反射镜进行了柔性支撑设计,以降低装调时的刚性连接应力。采用激光干涉仪对光机系统波像差进行了测试,典型视场波像差相似文献   

基于自准直原理的小视场镜头波像差测试系统

为实现对小视场光学镜头波像差的快速、高精度检测,将自准直原理与斐索型激光球面干涉仪检测波像差原理结合起来,提出一种基于自准直原理的光学镜头波像差检测系统。介绍了斐索型激光球面干涉仪检测波像差的工作原理,并详细论述了基于自准直原理的波像差检测系统的装调及检测方法。结合自准直光路的特点,实现对干涉仪光轴、被测光学镜头光轴以及高精度平面反射镜光轴的精确定轴,从而实现了系统光路的快速装调。实验证明,此系统可有效解决小视场光学镜头在波像差检测过程中的光轴偏斜问题,实现小视场光学镜头波像差快速、准确的检测。     

方形孔径自由曲面反射式系统装调技术研究

针对方形孔径自由曲面反射系统,构造方形域上正交多项式用于波前解析,得到方形孔径系统波像差系数。在计算机辅助装调阶段,为确保装调结果准确,用方形域上正交多项式和光学设计软件来建立系统的灵敏度矩阵,结合自准直干涉法得到的多个视场得波像差来求解系统失调量;在多次迭代后得到系统平均RMS为0.164 1(632.8 nm)实测系统平均传递函数达到0.453 4的理想结果;证明该装调方法正确性,并适用于其他形状孔径自由曲面离轴反射系统式系统装调。     

R-C光学系统的计算机辅助装调

R-C光学系统是现代光学工程中常用的光学系统,以某一R-C光学系统为例,对其计算机辅助装调技术进行了研究。分析了R-C系统装调理论,确定以主镜为装调基准,调整次镜五个自由度的装调方法,建立起次镜失调量与系统Zernike系数的关系,以此指导装调工作,达到明确装调方向、缩短装调周期的目的。整机光学系统的波像差RMS值优于1/10波长,达到了成像质量的要求。对相机进行实验室和地面外场成像,获得的图像图像清晰,层次丰富,验证了装调工作的正确性。     

离轴三反系统计算机辅助装调

为实现对离轴三反系统快速、有效的装调,提出了一种离轴三反系统计算机辅助装调（CAA）方法。该方法在理论分析失调后离轴三反系统像差特性的基础上,结合CAA技术及光学装调的实际情况,选择出最少且最合理的调整量;根据检测数据及CAA数学模型直接计算出调整量的大小及方向。采用该方法对一离轴三反系统进行实际装调,将调整量从11个减少到7个,利用波前传感器被动式检测方法对离轴三反系统0及1视场像质进行检测,通过一次计算调整快速使该系统全视场波像差从RMS0.32减少至RMS0.067（=632.8 nm）,结果表明该装调方法简单、有效。     

主三镜一体化离轴三反光学系统设计

离轴三反光学系统具有成像质量高、可实现大视场、无遮拦等优点,但其装调难度大,镜面支撑结构质量大。为解决这些问题,基于三级像差理论,研究一种主镜、三镜可集成一体化的大视场离轴三反光学系统,并以焦距为1 200 mm,F数为12,视场为101的光学系统为例进行了验证设计。结果表明:调制传递函数接近衍射极限,视场内平均波像差RMS值为/55,最大波像差RMS值为/22。设计结果显示,光学系统装调自由度由12个减少到6个,可使光机系统可得到简化,实现了主三镜一体化设计。     

空间碎片探测与测距复合系统光学望远镜

针对空间碎片探测与测距复合系统地面验证演示实验中,工作环境10~30 ℃、光学基台的尺寸限制（不超过450 mm×400 mm）以及光学望远镜尾部安装导致重心远离安装面的问题,提出了空间碎片探测与测距复合系统光学望远镜的设计。使用ANSYS有限元分析软件对光学望远镜建立了有限元模型,针对环境温度10~30 ℃、尾部安装状态下、光轴方向和垂直光轴方向1 g （g=9.8 m/s2）重力加速度工况下进行了分析。分析结果表明:光学望远镜整机一阶模态为133 Hz动态刚度较好,重力为光轴方向时主次镜间距最大变化量0.01 mm,重力为垂直光轴方向时主次镜间距最大为0.007 mm,光学望远镜系统波像差RMS值为λ/15,次镜最大倾角1.93″,具有较好的力、热稳定性,可以满足光学天线装校、检测以及外场实验验证过程中的指标要求。在光学望远镜装校完成后,使用ZYGO干涉仪对其像质进行检测,在重力垂直于光轴方向、环境温度10、20、30 ℃条件下进行检测,结果显示:系统波像差RMS值分别为0.097λ、0.075λ及0.1λ,整机光学望远镜系统波像差RMS值在最低温与最高温度时均优于λ/10均满足系统使用要求。     

空间碎片多光谱探测相机光学系统设计

为了实现对空间碎片探测,提出了一种空间碎片多光谱探测相机光学系统,由可见光相机、长波红外相机、中波红外相机光学系统组成,三个相机共用主、次镜,在三路相机光学系统中同时加入校正组件平衡校正像差,可见光相机焦距为1000mm,视场为1.2,长波红外相机焦距为-250mm,视场为2.75,中波红外相机焦距为-500mm,视场为1.38,考虑了温度对相机像质的影响,采用热膨胀性系数小的材料作为反射镜基底,分析了三个相机光学系统在空间环境下（205℃）温度环境下的像质变化,设计结果能满足使用要求。     

面型误差和失调量对同轴三反系统像质的影响

应用于对地观测的高分辨同轴三反式系统对光学装调有着严格的要求,光学元件的失调量和由装配应力导致的面型误差都会严重影响系统成像质量。该方法通过镜面受力分析和光学系统仿真指导系统装调,以某商业遥感卫星搭载的同轴三反式镜头装调过程为例,分析失调量和面型误差的像差特性。通过分析光学元件失调量和面型误差与系统像散、彗差以及球差的关系,并利用系统波像差的均方根（RMS）作为系统像质的评价标准,得出各个光学元件失调量和面型误差对系统成像质量的影响权重。根据计算结果进行针对性调校,使系统各视场的平均RMS值收敛为0.06以下。经过多台同类镜头装调结果验证,证明该方法切实有效,可缩短装调周期,提升装调精度。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.