激光熔覆Zr/FeCSiB涂层的组织和性能

采用激光预置熔覆法,通过在FeCSiB合金粉末中添加一定比率的强碳化物形成元素Zr,在中碳钢基体上制备原位析出的颗粒增强铁基复合材料表层。利用光学显微镜、场发射电子扫描显微镜(能谱仪)和金相组织分析系统,对熔覆层显微组织、硬质颗粒的成分及其分布规律进行了观察与分析。其显微组织特征是树枝状的先共晶奥氏体分布在共晶基体上的亚共晶介稳组织;奥氏体在随后的冷却过程中转变为马氏体;熔覆层与基体成良好的冶金结合。熔覆层内析出的硬质颗粒是以ZrC为主的复合碳化物,主要分布在枝晶内与枝晶间;单道搭接熔覆层颗粒的体积分数分别为1.96%、2.2%～3.84%;显微硬度值在800HV0.2～1100HV0.2之间。     

Stellite和NiCrSiB合金激光送粉熔覆裂纹倾向的比较研究

高功率CO_2激光送粉熔覆Stellite和NiCrSiB合金对比实验表明:NiCrSiB合金激光熔覆具有很大的裂纹倾向,NiCrSiB+50％Ni不出现裂纹,前者微观组织特征为少量的韧性相和大量不规则杂乱分布的粗大硬质相,后者为典型枝晶结构。Stellite 6合金激光熔覆不出现裂纹,Stellite 6+18％以上WC出现裂纹,前者微观组织特征为先共晶枝晶和枝晶间共晶,后者枝晶间共晶增多、共晶内碳化物析出物增多并出现多种复杂形状的碳化物无规沉淀析出。激光熔覆层裂纹形成的根本原因是由于熔覆过程产生的很大拉应力,裂纹形成的主导原因是由于激光熔覆层本身的韧性太低而脆性太大,难以承受大的拉应力。降低裂纹倾向的思路是改变熔覆层内强化相的形态,使其以颗粒形式均匀弥散地析出,同时使强化相颗粒由底部至表面呈梯度分布。     

Ti对Fe-C合金表面激光熔覆复合材料层组织和性能的影响

往Fe-C-Si-B激光熔覆专用合金粉末中加入Ti粉,结果表明,加Ti粉后熔覆层与基体润湿性非常好,并且裂纹倾向大大减少.控制Ti的加入量,可以获得组织均匀的细化的过共晶、共晶和亚共晶熔覆层,整个熔覆层弥散、均匀分布着大量硬颗粒,而硬颗粒的数量、尺寸及形状随Ti元素加入量的不同而有所改变,熔覆层显微硬度分布也非常均匀.     

激光熔覆原位生成B4C颗粒增强镍基复合涂层的研究

采用自动送粉工艺,在A3钢表面制备出原位生成B4C颗粒增强的镍基激光熔覆层.使用扫描电镜(SEM),电子能谱(EDS)和X射线衍射仪(XRD)对熔覆层的组织和物相构成进行了分析,并对熔覆层进行了硬度、摩擦性能测试.结果表明,原位生长B4C颗粒增强的Ni基复合涂层与基材呈现良好的冶金结合.熔覆层的底部组织为先共晶析出的Cr,Fe的碳化物树枝相分布在γ(Ni Fe)基体中,而中上部组织为先共晶析出的树枝晶和包含原位生成B4C的白色颗粒相分布在共晶基体中.熔覆层具有极高的硬度(平均HV0.31400),耐磨性是纯Ni60涂层的2倍.硬度和耐磨性的提高归因于涂层中大量的包含原位生长B4C颗粒相的生成,并均匀分布于涂层的共晶基体中.     

激光熔覆原位自生复相陶瓷颗粒增强涂层

借助光学显微镜、X射线衍射仪、电子探针及显微硬度计等手段对熔覆层的组织、物相、元素分布和显微硬度分布特征进行了研究。熔覆层不同位置的凝固特征参数不同,形成的组织亦不同。陶瓷相的引入使得熔覆层晶粒细小,枝晶生长方向发生紊乱。原位反应生成的TiB2,Al2O3为亚微米颗粒,主要分布在晶粒内部,形成晶内复合,而未反应的TiO2,B2O3陶瓷颗粒分布在晶间。熔覆层物相主要为基体的γ相和基体上弥散分布的γ'相以及Al2O3,TiB2等陶瓷相等。研究了激光加工参数对显微硬度分布的影响。磨损试验表明,陶瓷增强颗粒的加入在很大程度上提高了覆层的抗磨损性能。     

原位生长Cr3C2-CrB复合增强镍基激光熔覆层研究

采用预涂激光熔覆技术,在A3钢表面制备原位生长Cr3C2-CrB复合增强镍基激光熔覆层.使用金相显微镜、扫描电镜(SEM)、能谱仪(EDS)和X射线衍射(XRD)仪对熔覆层进行了显微组织和物相分析,并测试了熔覆层显微硬度及摩擦性能.结果表明,在适当工艺条件下,熔覆层成形良好、表面光滑,涂层与基体呈现良好的冶金结合.熔覆层底部组织为包含Cr,Fe的碳、硼化物的γ(NiFe)树枝晶结构.熔覆层中上部组织为先共晶析出、规则排列的Cr3C2杆状相和CrB颗粒相分布在Fe2C/γ(NiFe)共晶基体中.由于Cr3C2-CrB复合强化相的原位生成且均匀弥散分布在基体中,使得熔覆层具有高的硬度(平均硬度HV     

TC4激光熔覆Ti/7YSZ复合热障涂层实验研究

为提升YSZ隔热涂层的力学性能,阐明其组织形成过程及机理,优化激光加工工艺参数。方法采用YLS-3000型光纤激光系统利用激光熔覆技术在TC4表面制备了Ti/7YSZ复合涂层体系;通过光学显微镜、扫描电镜、能谱仪、X射线衍射仪和硬度仪分别表征激光熔覆Ti/7YSZ复合热障涂层的宏观形貌、显微组织、元素分布、物相组成及硬度分布。结果在不同激光扫描速度下,熔覆层表面呈不同程度黄色,微观组织均具有“上下细密、中间粗大”特征,其主要由针状α′马氏体、马氏体核心、α相集束、残余β相以及以TiC为代表的MC碳化物构成,Zr元素富集在基体与熔覆区的结合区;随着扫描速度的增加,Zr元素分布愈发不均匀,熔覆区内马氏体混乱、破碎程度加剧,显微硬度先增后减,7mm/s时熔覆层与基体结合良好,硬度水平达到峰值600 HV,达TC4基体的2.5倍,熔覆质量最佳。结论:优化激光扫描速度,可以显著提升熔覆层的质量与综合性能;熔材中Zr元素以ZrO2、ZrC以及固溶形式存在于熔覆区;马氏体间错位滑移阻力、TiC等增强相以及Zr元素固溶强化作用使显微硬度得以提升。     

激光熔覆汽轮机转子表面涂层的显微组织研究

针对激光熔覆再制造汽轮机转子轴颈,采用2 kW半导体激光器进行同轴送粉的激光熔覆Fe基合金试验,并在激光熔覆过程中对加工点附近的温度进行监控。利用扫描电镜(SEM)、X射线衍射仪(XRD)、X射线能量色散谱仪(EDS)研究了熔覆层的显微组织形貌、相结构与成分。结果表明,激光熔覆加热集中,检测部位的最高温度未超过70 ℃,整个修复过程平稳。Fe基合金熔覆层组织均匀、致密,与基体冶金结合,没有微观裂纹与气孔等缺陷。熔覆层组织主要为(Fe、Cr、C)合金与CrC两相。熔覆层的组织主要为典型的过饱和固溶体枝晶与枝晶间多元碳化物共晶组成,激光熔覆层与基体熔合过程中产生了元素互渗。     

钛锆对激光熔覆原位合成颗粒增强铁基复合涂层组织的影响

运用激光熔覆的方法在中碳钢表面原位合成制备了颗粒增强铁基复合涂层.通过调整两种强碳化物形成元素Ti和Zr的相对含量,研究了不同配比下原位自生碳化物颗粒相的分布特征.结果表明,在总量一定的情况下,复合添加Ti和Zr可以提高颗粒分布密度和颗粒相面积比.其中,以Ti和Zr的质量比为1∶1时得到的颗粒密度最大、颗粒尺寸分布最均匀.同时对不同的颗粒分布状态下涂层的显微硬度进行了研究.     

激光熔覆原位生成TiC-ZrC颗粒增强镍基复合涂层

采用预涂粉末激光熔覆技术,在45#钢表面制备出原位牛成TiC-ZrC颗粒增强的镍基复合涂层.使用扫描电镜(SEM),EDS能谱和X射线衍射(XRD)对熔覆层的显微组织和物相构成进行了分析,并对熔覆层进行了硬度、摩擦性能测试.结果表明,在适当的工艺条件下,原位生成TiC-ZrC颗粒增强镍基复合涂层形貌良好,涂层与基材呈冶金结合.熔覆层底部组织为定向生长的γ(NiFe)树枝晶,熔覆层中上部组织为先共晶析出的TiC-ZrC颗粒相和Cr3C2条状相均匀分布于γ(NiFe)树枝晶基体中.熔覆层具有高的硬度(平均硬度HV0.31300)和良好的耐磨性,与纯Ni60熔覆层相比,其磨损失重仅为纯Ni60熔覆层的1/4.熔覆层硬度和耐磨性的提高归因于大量TiC-ZrC复合颗粒的形成及其在涂层中的均匀弥散分布.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.     

Curved crystal spectrometer for the measurement of X-ray lines from laser-produced plasmas

In order to diagnose the laser-produced plasmas, a focusing curved crystal spectrometer has been developed for measuring the X-ray lines radiated from a laser-produced plasmas. The design is based on the fact that the ray emitted from a source located at one focus of an ellipse will converge on the other focus by the reflection of the elliptical surface. The focal length and the eccentricity of the ellipse are 1350 mm and 0.9586, respectively. The spectrometer can be used to measure the X- ray lines in the wavelength range of 0.2-0.37 nm, and a LiF crystal （200） （2d = 0.4027 nm） is used as dispersive element covering Bragg angle from 30° to 67.5°. The spectrometer was tested on Shengnang- Ⅱ which can deliver laser energy of 60-80 J/pulse and the laser wavelength is 0.35 μm. Photographs of spectra including the 1 s2p ^1P1-1s^2 ^1S0 resonance line（w）, the 1s2p ^3P2-1s^2 1S0 magnetic quadrupole line（x）, the 1s2p ^3P1-1 s^2 ^1S0 intercombination lines（y）, the 1 s2p ^3S~1-1 s^2 ^1S0 forbidden line（z） in helium-like Ti Ⅹ Ⅺ and the 1 s2s2p ^2P3/2-1 s622s ^2S1/2 line（q） in lithium-like Ti Ⅹ Ⅹhave been recorded with a X-ray CCD camera. The experimental result shows that the wavelength resolution（λ/△ 2） is above 1000 and the elliptical crystal spectrometer is suitable for X-ray spectroscopy.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.     

An improved parallel thinning algorithm with two subiterations

The parallel thinning algorithm with two subiterations is improved in this paper. By analyzing the notions of connected components and passes, a conclusion is drawn that the number of passes and the number of eight-connected components are equal. Then the expression of the number of eight-connected components is obtained which replaces the old one in the algorithm. And a reserving condition is proposed by experiments, which alleviates the excess deletion where a diagonal line and a beeline intersect. The experimental results demonstrate that the thinned curve is almost located in the middle of the original curve connectivelv with single pixel width and the processing speed is high.     

Theoretical analysis of the relationship between the Brillouin gain coefficient and the strain in the optical-fiber sensors

The relation between the power of the Brillouin signal and the strain is one of the bases of the distributed fiber sensors of temperature and strain. The coefficient of the Bfillouin gain can be changed by the temperature and the strain that will affect the power of the Brillouin scattering. The relation between the change of the Brillouin gain coefficient and the strain is thought to be linear by many researchers. However, it is not always linear based on the theoretical analysis and numerical simulation. Therefore, errors will be caused if the relation between the change of the Brillouin gain coefficient and the strain is regarded as to be linear approximately for measuring the temperature and the strain. For this reason, the influence of the parameters on the Brillouin gain coefficient is proposed through theoretical analysis and numerical simulation.     

Novel fiber-optical interferometer with miniaturized probe for in-hole measurements

Today, micro-system technology and the development of new MEMS （Micro-Electro-Mechanical Systems） are emerging rapidly. In order for this development to become a success in the long run, measurement systems have to ensure product quality. Most often, MEMS have to be tested by means of functionality or destructive tests. One reason for this is that there are no suitable systems or sensing probes available which can be used for the measurement of quasi inaccessible features like small holes or cavities. We present a measurement system that could be used for these kinds of measurements. The system combines a fiber optical, miniaturized sensing probe with low-coherence interferometry, so that absolute distance measurements with nanometer accuracy are possible.     

Study of waveguide coupling efficiency in hybrid silicon lasers

This paper presents a new method to increase the waveguide coupling efficiency in hybrid silicon lasers. We find that the propagation constant of the InGaAsP emitting layer can be equal to that of the Si resonant layer through improving the design size of the InP waveguide. The coupling power achieves 42% of the total power in the hybrid lasers when the thickness of the bonding layer is 100 nm. Our result is very close to 50% of the total power reported by Intel when the thickness of the thin bonding layer is less than 5 nm. Therefore, our invariable coupling power technique is simpler than Intel＇s.     

Electronic Structure of Semiconductor Nanocrystals

This paper reviews our recent development of the use of the large-scale pseudopotential method to calculate the electronic structure of semiconductor nanocrystals, such as quantum dots and wires, which often contain tens of thousands of atoms. The calculated size-dependent exciton energies and absorption spectra of quantum dots and wires are in good agreement with experiments. We show that the electronic structure of a nanocrystal can be tuned not only by its size,but also by its shape. Finally,we show that defect properties in quantum dots can be significantly different from those in bulk semiconductors.     

Critical Stage Rule-Based Real Time Dispatch（RTD）System in Highly-Mixed-Products （HMP） FAB

An improving utilization and efficiency of critical equipments in semiconductor wafer fabrication facilities are concerned. Semiconductor manufacturing FAB is one of the most complicated and cost sensitive environments. A good dispatching tool will make big difference in equipment utilization and FAB output as a whole. The equipment in this paper is In-Line DUV Scanner. There are many factors impacting utilization and output on this equipment group. In HMP environment one of the issues is changing of reticule in this area and idle counts due to load unbalance between equipments. Here we'll introduce a rule-based RTD system which aiming at decreasing the number of recipe change and idle counts among a group of scanner equipment in a high-mixed-products FAB.