一种新型RF MEMS 单刀双掷开关的设计与仿真

本文介绍了一种利用单驱动电压控制通路选择的新型RF MEMS单刀双掷开关,利用三维仿真软件Ansoft HFSS和ANSYS进行仿真和优化设计该开关的性能。仿真结果表明：驱动电压为22V,开关时间为22μs,在中心频率30GHz处,开关处于down状态下的插入损耗为0.42dB,回波损耗为43dB,隔离度为29dB;而当开关处于up状态的插入损耗为0.53dB,回波损耗为19dB,隔离度为28dB,该开关的性能仿真和优化设计达到理想情况。     

光纤电光开关实验研究

本文介绍一种以液晶为旋光材料的光纤电光开关。开关是与偏振不相关的,插入损耗L≤2.8dB,串音D≥22dB,驱动电压为3V。     

一种100 MHz~12 GHz高功率SPDT射频开关

基于0.13 μm CMOS SOI工艺,设计并实现了一种100 MHz~12 GHz高功率SPDT射频开关。该射频开关为吸收式射频开关,开关支路为串并联的拓扑结构。采用负压偏置设计,减小了插入损耗,提高了隔离度。采用多级开关管堆叠设计,提高了开关的输入1 dB 压缩点。测试结果表明,在100 MHz~12 GHz频率范围内,该射频开关插入损耗小于1.5 dB,隔离度大于31 dB,输入1 dB 压缩点大于40 dBm。芯片尺寸为1.1 mm ×1.1 mm。     

X-波段MEMS单刀双掷开关的研究

利用X-波段MEMS单刀单掷膜开关和成熟的微带线技术设计了一种X-波段MEMS单刀双掷膜开关,其模拟结果为;阈值电压为19V左右,工作频率为8～12GHz,在中心频率（10GHz）处,导通开关的插入损耗为-0．2dB,截止开关的隔离度为-21dB,开关的回波损耗为-43dB。     

高隔离度宽频带MEMS双膜桥开关

利用一种新型双边加直流驱动电极的电容耦合式MEMS并联膜开关与直接接触式并联膜开关进行级联,形成MEMS双膜开关.通过对其尺寸和结构的优化,降低开关阈值电压,Coventor软件模拟表明,开关的阈值电压小于20V;通过对其匹配设计改善开关的高频性能,HFSS软件模拟的结果表明,在DC～20GHz整个频带内,开关的插入损耗优于-0.1dB,反射损耗低于-30dB,隔离度低于-20dB,在 谐振点处隔离度能达到-40dB.     

X波段交直流分离的MEMS开关的设计与研究

介绍了一种带直流驱动电极交直流分离的MEMS开关,研究了影响开关阈值电压的因素,运用缩腰设计、尺寸优化等方法降低开关的阈值电压;运用阻抗匹配方法降低开关的反射损耗;利用等效电感的设计提高所需频段的隔离度。使用Coventor和HFSS软件模拟,设计的开关阈值电压小于20V,在X波段插入损耗低于0.1dB,反射损耗低于-25dB,谐振点处隔离度高于40dB。     

驱动与信号隔离的单刀双掷RF MEMS开关

设计了一种基于横向金属接触的DC-5 GHz单刀双掷RF MEMS开关,该开关包括一套有限地共面波导(FGCPW)传输线和左右摆动的悬臂梁。利用绝缘的介质层实现了驱动信号与射频信号的隔离,提高了开关的性能。根据开关的拓扑结构,提出相应的等效电路,并据此实现开关射频性能的优化设计。开关利用MetalMUMPs工艺实现,测试结果显示,该开关在5GHz的插入损耗为0.8dB,回波损耗大于20dB,隔离度为40dB。测得开关的开启电压为59V。     

C波段GaAs PIN二极管单片单刀单掷开关

基于中国科学院微电子研究所的GaAs PIN二极管工艺,研究了一种单片单刀单掷开关.为了仿真该单片单刀单掷开关,研制开发了GaAs PIN二极管的小信号模型.在5.5～7.5GHz的频段内,开关正向导通时的插入损耗低于1.6dB,回波损耗大于10dB,开关关断状态的隔离度大于23dB.     

C波段GaAs PIN二极管单片单刀单掷开关

基于中国科学院微电子研究所的GaAs PIN二极管工艺,研究了一种单片单刀单掷开关.为了仿真该单片单刀单掷开关,研制开发了GaAs PIN二极管的小信号模型.在5.5～7.5GHz的频段内,开关正向导通时的插入损耗低于1.6dB,回波损耗大于10dB,开关关断状态的隔离度大于23dB.     

基于Switched-RC技术的0.8V带通滤波器

开关电容滤波器是信号处理系统的重要组成模块,设计了一种用于心率检测设备的六阶带通开关电容滤波器。该设计基于开关电阻电容技术,利用开关电阻代替传统的采样开关,实现了更高的采样线性度,是低压下开关电容滤波器正常工作的一种全新实现方案。仿真结果表明,该滤波器在0.8 V工作电压下,功耗为0.9 mW,输出摆幅可达1.2Vp-p,通带增益为10 dB,-3 dB带宽为25~80 Hz。     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.     

Curved crystal spectrometer for the measurement of X-ray lines from laser-produced plasmas

In order to diagnose the laser-produced plasmas, a focusing curved crystal spectrometer has been developed for measuring the X-ray lines radiated from a laser-produced plasmas. The design is based on the fact that the ray emitted from a source located at one focus of an ellipse will converge on the other focus by the reflection of the elliptical surface. The focal length and the eccentricity of the ellipse are 1350 mm and 0.9586, respectively. The spectrometer can be used to measure the X- ray lines in the wavelength range of 0.2-0.37 nm, and a LiF crystal （200） （2d = 0.4027 nm） is used as dispersive element covering Bragg angle from 30° to 67.5°. The spectrometer was tested on Shengnang- Ⅱ which can deliver laser energy of 60-80 J/pulse and the laser wavelength is 0.35 μm. Photographs of spectra including the 1 s2p ^1P1-1s^2 ^1S0 resonance line（w）, the 1s2p ^3P2-1s^2 1S0 magnetic quadrupole line（x）, the 1s2p ^3P1-1 s^2 ^1S0 intercombination lines（y）, the 1 s2p ^3S~1-1 s^2 ^1S0 forbidden line（z） in helium-like Ti Ⅹ Ⅺ and the 1 s2s2p ^2P3/2-1 s622s ^2S1/2 line（q） in lithium-like Ti Ⅹ Ⅹhave been recorded with a X-ray CCD camera. The experimental result shows that the wavelength resolution（λ/△ 2） is above 1000 and the elliptical crystal spectrometer is suitable for X-ray spectroscopy.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.     

An improved parallel thinning algorithm with two subiterations

The parallel thinning algorithm with two subiterations is improved in this paper. By analyzing the notions of connected components and passes, a conclusion is drawn that the number of passes and the number of eight-connected components are equal. Then the expression of the number of eight-connected components is obtained which replaces the old one in the algorithm. And a reserving condition is proposed by experiments, which alleviates the excess deletion where a diagonal line and a beeline intersect. The experimental results demonstrate that the thinned curve is almost located in the middle of the original curve connectivelv with single pixel width and the processing speed is high.     

Theoretical analysis of the relationship between the Brillouin gain coefficient and the strain in the optical-fiber sensors

The relation between the power of the Brillouin signal and the strain is one of the bases of the distributed fiber sensors of temperature and strain. The coefficient of the Bfillouin gain can be changed by the temperature and the strain that will affect the power of the Brillouin scattering. The relation between the change of the Brillouin gain coefficient and the strain is thought to be linear by many researchers. However, it is not always linear based on the theoretical analysis and numerical simulation. Therefore, errors will be caused if the relation between the change of the Brillouin gain coefficient and the strain is regarded as to be linear approximately for measuring the temperature and the strain. For this reason, the influence of the parameters on the Brillouin gain coefficient is proposed through theoretical analysis and numerical simulation.     

Novel fiber-optical interferometer with miniaturized probe for in-hole measurements

Today, micro-system technology and the development of new MEMS （Micro-Electro-Mechanical Systems） are emerging rapidly. In order for this development to become a success in the long run, measurement systems have to ensure product quality. Most often, MEMS have to be tested by means of functionality or destructive tests. One reason for this is that there are no suitable systems or sensing probes available which can be used for the measurement of quasi inaccessible features like small holes or cavities. We present a measurement system that could be used for these kinds of measurements. The system combines a fiber optical, miniaturized sensing probe with low-coherence interferometry, so that absolute distance measurements with nanometer accuracy are possible.     

Study of waveguide coupling efficiency in hybrid silicon lasers

This paper presents a new method to increase the waveguide coupling efficiency in hybrid silicon lasers. We find that the propagation constant of the InGaAsP emitting layer can be equal to that of the Si resonant layer through improving the design size of the InP waveguide. The coupling power achieves 42% of the total power in the hybrid lasers when the thickness of the bonding layer is 100 nm. Our result is very close to 50% of the total power reported by Intel when the thickness of the thin bonding layer is less than 5 nm. Therefore, our invariable coupling power technique is simpler than Intel＇s.     

Electronic Structure of Semiconductor Nanocrystals

This paper reviews our recent development of the use of the large-scale pseudopotential method to calculate the electronic structure of semiconductor nanocrystals, such as quantum dots and wires, which often contain tens of thousands of atoms. The calculated size-dependent exciton energies and absorption spectra of quantum dots and wires are in good agreement with experiments. We show that the electronic structure of a nanocrystal can be tuned not only by its size,but also by its shape. Finally,we show that defect properties in quantum dots can be significantly different from those in bulk semiconductors.     

Critical Stage Rule-Based Real Time Dispatch（RTD）System in Highly-Mixed-Products （HMP） FAB

An improving utilization and efficiency of critical equipments in semiconductor wafer fabrication facilities are concerned. Semiconductor manufacturing FAB is one of the most complicated and cost sensitive environments. A good dispatching tool will make big difference in equipment utilization and FAB output as a whole. The equipment in this paper is In-Line DUV Scanner. There are many factors impacting utilization and output on this equipment group. In HMP environment one of the issues is changing of reticule in this area and idle counts due to load unbalance between equipments. Here we'll introduce a rule-based RTD system which aiming at decreasing the number of recipe change and idle counts among a group of scanner equipment in a high-mixed-products FAB.