High power supercontinuum generation by dual-color femtosecond laser pulses in fused silica

High power supercontinuum (SC) is generated by focusing 800 nm and 400 nm femtosecond laser pulses in fused silica with a microlens array. It is found that the spectrum of the SC is getting broader compared with the case of a single laser pulse, and the spectral energy density between the two fundamental laser wavelengths is getting significantly higher by optimizing the phase matching angle of the BBO. It exceeds μJ/nm over 490 nm range which is from 380 nm to 870 nm, overcoming the disadvantage of relative lower power in the ranges far from the fundamental wavelength.     

平顶飞秒激光经圆锥透镜在熔融石英中成丝及超连续辐射

实验研究了平顶飞秒激光经圆锥透镜后在熔融石英中的成丝及超连续辐射.与高斯飞秒激光的成丝对比发现,平顶飞秒激光可以获得在圆锥透镜焦深区域内强度分布更为均匀的等离子体细丝,这一特征更有利于飞秒激光在固体介质中进行微纳加工等领域的应用.并且,在不损伤熔融石英的条件下,平顶飞秒激光成丝可以获得更高能量、更高转换效率的超连续辐射,这是因为若产生光强相近的细丝,平顶飞秒激光所需的初始激光能量更高,此激光能量下产生的细丝长度更长、均匀性更好.     

Frequency conversion of subnanojoule femtosecond pulses in microstructure fibers

We experimentally demonstrate highly efficient multiplex frequency conversion of unamplified subnanojoule femtosecond pulses of Ti:sapphire laser radiation in fused silica microstructure fibers. Nonlinear optical spectral transformation of femtosecond pulses in an array of fused silica threadlike channels in these microstructure fibers results in the generation of isolated anti-Stokes spectral components within the wavelength range of 400–500 nm. An efficiency of frequency conversion of about 20% is achieved for 800-nm pump pulses with an energy of 0.7 nJ and a pulse duration of 70 fs.     

整形飞秒激光脉冲的成丝超连续辐射控制

飞秒激光成丝超连续辐射具有高强度和高时空相干性等优点,作为一种超宽带光源在很多领域都具有广泛的应用前景.本文提出一种结合微透镜阵列的空间调制和基于液晶空间光调制器的时域整形的飞秒激光脉冲整形方式,利用基于遗传算法的反馈优化控制,实现了飞秒激光在熔融石英中成丝产生的超连续辐射强度的调制,得到了在一定范围内光谱强度可控的超连续辐射光谱;光谱的能量密度可以从0.03μJ/nm调制到0.09μJ/nm,其能量密度变化达到了初始值的3倍.计算了典型迭代代数对应的整形脉冲时域包络,分析了超连续光谱随迭代代数的演化趋势,结果表明,脉冲包络的峰值强度和波形分布是影响超连续光谱展宽和强度的主要物理原因.     

Ultraviolet conical emission produced by high-power femtosecond laser pulse in transparent media

In this work, supercontinuum conical emission (SC CE) accompanying the filamentation of powerful ultrashort laser pulse in BK₇ glass and fused silica is studied. The SC CE is controlled by the laser power density and the sample thickness, and the minimum SC CE cut-off wavelength is about 309?nm in the BK₇ glass and 237?nm in the fused silica. The angular distributions of the SC CE in the wavelength range less than 510?nm are measured by using a new method, and it cannot be explained by the Cerenkov emission theory but the unabridged X-Waves solution theory. Meanwhile numerical simulations of the propagation of femtosecond laser pulse in sample are performed to provide theoretical support to our results.     

Absorption and luminescence spectroscopy of fused silica by multiple pulses irradiation at 355 nm

In this work, the effects of laser irradiation on fused silica at 355 nm are investigated by using transient absorption spectroscopy and luminescence spectroscopy. Our result shows that no transient absorption or luminescence in the spectra range from 400 nm to 600 nm is observed when laser energy density is below the damage threshold. When the laser energy density reaches the threshold, an initial damage site will be created. After subsequent laser pulses irradiation, the damage size grows. At the same time, the intensity of the transient absorption and luminescence spectra at the damage site also raises remarkably with the laser pulse number increasing. The absorption band from 420 nm to 520 nm is probably related to the absorption of impurity such as metal ion of iron, cerium and copper. Laser modified fused silica exhibits intense broad luminescence bands due to oxygen-deficiency centers at 444 nm and 580 nm.     

Broadband four-wave optical parametric amplification in bulk isotropic media in the ultraviolet

We report on four-wave optical parametric amplification of the ultrashort ultraviolet light pulses in bulk fused silica and CaF₂. Exact phase-matching in these isotropic media is achieved by means of non-collinear interaction with cylindrical beam focusing. Four-wave optical parametric amplifier efficiently operates in the UV spectral range with 1-ps laser pulses, delivering amplified signal energy exceeding 50 μJ using millijoule pump pulses in the visible (527 nm). Results of scanning of the parametric gain profile suggest that broad amplification bandwidth as wide as ∼20 nm (at FWHM) under these experimental settings is achieved, which might support amplification of sub-10-fs ultraviolet pulses with central wavelength around 330 nm. It is also shown experimentally and verified theoretically that the parametric gain profile exposes a distinct inhomogeneity and its bandwidth notably broadens due to effects of self- and cross-phase modulation imposed by the intense pump beam.     

1064 nm和532 nm纳秒激光同时辐照熔石英损伤规律的研究

利用Nd: YAG激光器研究基频(1064 nm)与倍频(532 nm)单独辐照和同时辐照下熔石英的损伤规律,对损伤几率进行了测试,获得损伤几率曲线与典型损伤形貌。研究结果表明:双波长同时辐照下的初始损伤阈值总是小于单波长辐照下的初始损伤阈值;基频光中加入定量倍频光后,熔石英对基频光的吸收效率提高;并且双波长同时辐照下,熔石英损伤密度增大;原因主要是熔石英表面缺陷对不同波长吸收机制的差异。     

高功率全固态绿光激光技术研究进展

 报道了高功率全固态腔内和腔外倍频两种绿光激光器研究进展。腔内倍频绿光激光器采用L型腔双棒串接结构,在重复频率10 kHz时,用三硼酸锂晶体倍频获得绿光功率186 W,光-光效率达15.8%。腔外倍频绿光激光器采用主振荡和功率放大器,在重复频率400 Hz时,获得基频激光单脉冲能量1.2 J,采用Ⅱ类相位匹配KTP晶体腔外倍频,获得525 mJ的绿光输出,倍频效率为43.7%。采用偏振合成技术获得了单脉冲能量大于1 J的绿光输出。在该激光放大器实验装置上,进行了双模块热效应补偿技术和受激布里渊散射相位共轭技术实验研究,改善了激光光束质量。     

飞秒平顶光束经微透镜阵列在熔融石英中的成丝及其超连续辐射

实验研究了平顶激光光束经微透镜阵列在熔融石英中成丝的演化以及超连续辐射的产生,并进一步与高斯光束的成丝和超连续辐射进行了对比研究.分别对这两种光束的多丝传输进行了横向和纵向成像.结果表明,使用平顶光束可以获得更为均匀的多丝分布,成丝的起点也更为一致;尤其重要的是,相对于高斯光束,平顶光束可以使用更高的入射激光脉冲能量而不会造成介质的损伤,从而可以获得更高脉冲能量和更高转换效率的超连续辐射.     

飞秒激光离焦抽运熔融石英产生超连续白光的实验研究

利用飞秒激光在熔融石英介质中传输产生能量达数毫焦、波长范围覆盖400-900 nm 且光谱分布较为均匀的超连续白光,实验过程中将熔融石英介质离焦放置以避免被击穿. 研究了入射激光能量以及介质离焦距离对超连续白光特性的影响. 结果表明采用高能量的入射激光脉冲离焦抽运介质的方法能够有效避免介质 击穿损伤并提高超连续白光脉冲的能量输出.     

Micro patterning of fused silica by laser ablation mediated by solid coating absorption

Precise patterning by laser ablation requires sufficient absorption. For weak absorbers like fused silica indirect methods using external absorbers have been developed. A novel approach using a solid SiO absorber coating is described. Irradiation by an ArF excimer laser (wavelength 193 nm) is leading to ablation of the coating and, at sufficiently high fluence, of the fused silica substrate. The remaining coating in the unexposed areas is removed afterwards by large area irradiation. The fluence threshold for substrate ablation using a 28 nm thick absorber layer is about 1.1 J/cm². Single pulse ablation rates of up to 800 nm and a surface roughness of R _a<5 nm are obtained. High resolution grating patterns with 400 nm period and a modulation depth of 80 nm are possible. The process can be described as controlled plasma mediated ablation.     

High-energy broadband four-wave optical parametric amplification in bulk fused silica

Efficient broadband four-wave optical parametric amplification in bulk Kerr medium (fused silica) is demonstrated by means of noncollinear phase matching and cylindrical focusing geometry without the onset of beam breakup and filamentation. Amplified signal energy as high as 180 microJ with 1 ps, 1.8 mJ pumping at 1,055 nm is achieved with pump-to-signal energy conversion close to 10%. More than 70 nm FWHM parametric gain bandwidth around 740 nm is demonstrated without imposing angular dispersion on the frequency components of the broadband seed signal.     

飞秒BBO光参量放大中闲频光二次谐波的产生

由于相位匹配条件和非线性晶体透光范围的限制，400nm蓝光抽运的飞秒β-BaB₂O₄（BBO）光参量放大（OPA）输出的参量光调谐范围有限，很难得到波长小于460nm的蓝光和近紫外光.实验采用1kHz钛宝石九通啁啾脉冲放大器的倍频蓝光作抽运光，超连续白光 作种子光，在Ⅰ类非共线相位匹配条件下，利用宽带的飞秒BBO OPA，在一定的实验参数下 获得了530—810nm放大的信号光，以及810nm—17μm波段范围的闲频光.与此同时 ，还获得了410—700nm连续可调的闲频光的二次谐波，其与闲频光层叠分布，单脉冲能量 为26μJ，转换效率大于5%.仅利用单块晶体的飞秒BBO OPA就可以获得410—810nm连 续可调的飞秒脉冲输出，从而为更多研究和应用的需要提供了重要的光源.对飞秒光参量放 大中闲频光二次谐波产生的条件也进行了理论分析. 关键词： 二次谐波 闲频光 非共线相位匹配 飞秒光参量放大     

Generation of a compact high-power high-efficiency normal-dispersion pumping supercontinuum in silica photonic crystal fiber pumped with a 1064-nm picosecond pulse

Broadband normal dispersion pumping supercontinuum （SC） generation in silica photonic crystal fiber （PCF） is investigated in this paper. A 1064-nm picosecond fiber laser is used to pump silica PCF for the SC generation. The length of PCF is optimized for the most efficient stimulated Raman scattering process in the picosecond pump pulse region. The first stimulated Raman Stokes peak is located in the anomalous dispersion regime of the PCF and near the zero dispersion wavelength; thus the SC generation process can benefit from both a normal dispersion pumping scheme and an anomalous dispersion pumping scheme. The 51.7-W SC spanning from about 700 nm to beyond 1700 nm is generated with an all-fiber configuration, and the pump-to-SC conversion efficiency is up to 90%. In order to avoid the output fiber end face damage and increase the stability of the system, an improved output solution for the high power SC is proposed in our experiment. This high-efficiency near-infrared SC source is very suitable for applications in which average output power and spectral power density are firstly desirable.     

Supercontinuum generation using Raman fiber laser

Using a phosphosilicate-doped continuous-wave Raman fiber laser, a 350-m single-mode fiber, and a 50% feedback fiber Bragg grating at 1483.4 nm, we obtained a high-efficiency ultra-broadband (1434–1527 nm) supercontinuum (SC) centered at 1483.4 nm with an average output power of 2.1 W, a spectral intensity of 22.3 mWnm^-1, and a nonlinear conversion efficiency of 94%. Increasing the fiber length in the Raman cavity to 1840 m gave simultaneous SC centered at 1483.4 nm and 1239 nm. An average power of 2.3 W in the bandwidth of 1434–1544 nm and 0.2 W in the bandwidth of 1224–1257 nm is obtained. The temperature dependence of the SC was also investigated.PACS 42.55.Wd; 42.81.-i; 42.65.-k; 42.65.ReThis revised version was published in August 2003 with corrections to the affiliation of Mr. Taniguchi.     

真空环境中紫外脉冲激光对熔石英抗损伤能力的影响

在10-3Pa的高真空环境下,利用355nm的紫外脉冲激光以低于石英基片零概率损伤阈值的能量密度对其进行重复多次的全口径扫描,目的是为了研究石英基片在接受不同剂量的紫外激光辐照后其抗损伤能力的变化和原因.通过辐照过程中损伤点的扩展程度以及辐照后的抗损伤测量表明,高真空环境下紫外脉冲激光辐照后的石英基片抗损伤能力明显降低,降低的幅度更多的与其接受激光辐照的次数有关,辐照能量密度的影响相对较小;通过荧光及X射线光电子能谱(XPS)检测发现,紫外脉冲激光辐照后石英基片表面氧缺位的增加是导致其抗损伤能力下降的主要原因,其程度也直接与接受辐照的紫外脉冲激光剂量相关.     

近红外KTP单共振光参量振荡器

本文报道了角度调谐KTP单共振参量振荡器(SRO)的实验结果,并对结果进行了分析讨论.采用调QNd:YAG激光的二次谐波作为泵浦源.受腔镜涂膜带宽的限制,调谐范围为785～1010nm.最大的参量光脉冲能量为2.4mJ.最大的能量转换效率为26.3%.     

基于激光近场和图像分割技术的复合波长诱导熔石英损伤实验研究

在复合波长(波长分别为1053、527、351nm)情况下,利用激光近场对熔石英样品进行损伤实验。设计了一种基于激光近场辐照的损伤阈值定义方法,并利用带有灰度抑制的分水岭标记算法对损伤图像进行损伤区域提取,通过对比损伤图像与相应光束近场能量分布,计算出损伤区域与非损伤区域临界处的光能量密度,即为熔石英样品的损伤阈值。实验结果表明,复合波长激光诱导熔石英损伤是3种波长激光共同作用的结果,但351nm激光对损伤起主要作用,初始损伤阈值为8.22J/cm2;在复合波长激光多次辐照样品的情况下,熔石英样品后表面的损伤成指数形式增长,损伤增长系数为0.59。     

Using IR laser radiation for backside etching of fused silica

Laser-induced backside etching of fused silica with gallium as highly absorbing liquid is demonstrated using pulsed infrared laser radiation. The influences of the laser fluence, the pulse number, and the pulse length on the etch rate and the etched surface topography were studied and the results are compared with these of excimer laser etching. The high reflectivity of the fused silica-gallium interface at IR wavelengths results in the measured high threshold fluences for etching of about 3 J/cm² and 7 J/cm² for 18 ns and 73 ns pulses, respectively. For both pulse lengths the etch rate rises almost linearly with laser fluence and reaches a value of 350 and 300 nm/pulse at a laser fluence of about 12 and 28 J/cm², respectively. The etching process is almost free from incubation processes because etching with the first laser pulse and a constant etch rate were observed. The etched surfaces are well-defined with clear edges and a Gaussian-curved, smooth bottom. A roughness of about 1.5 nm rms was measured by AFM at an etch depth of 0.95 μm. The normalization of the etch rates with respect to the reflectivity and the pulse length results in similar etch rates and threshold fluence for the different pulse widths and wavelengths. It is concluded that etching is a thermal process including the laser heating, the materials melting, and the materials etching by mechanical forces. The backside etching of fused silica with IR-Nd:YAG laser can be a promising approach for the industrial usage of the backside etching of a wide range of materials. PACS 81.65.C; 81.05.J; 79.20.D; 61.80.B; 42.55.L