共查询到18条相似文献,搜索用时 93 毫秒
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双光束双曝光与四光束单曝光干涉光刻方法的比较 总被引:2,自引:0,他引:2
双光束双曝光和四光束单曝光是无掩模激光干涉光刻的两种典型方法,都容易利用现有光刻工艺,在不需掩模和高精度光刻物镜的情况下,用简单廉价光学系统在大视场和深曝光场内形成孔阵、点阵或锥阵等周期性图形。双光束双曝光法得到的阵列图形周期极限为λ/2;四光束单曝光的周期略大,为前者的2倍。模拟和实验结果表明,通过控制曝光和显影工艺,双光束双曝光较四光束单曝光能更灵活地得到孔阵或点阵,而四光束单曝光得到的图形孔与孔之间没有鞍点,较双光束双曝光形成的孔侧壁更陡。这两种方法在需要在大面积范围内形成孔或点这类周期阵列图形的微电子和光电子器件的制造领域有很好的应用前景。 相似文献
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用于大面积周期性图形制造的激光干涉光刻 总被引:13,自引:5,他引:8
用两束或多束相干激光束以不同的组合形式对光致抗蚀剂曝光,可在大面积范围内产生精细的二维周期性图形,这个方法特别适合于产生光电子器件和生电子器件的周期性结构。介绍激光干涉光刻的基本原理,对几种光束组合干涉方法给出了理论推导结果,并进行了计算机模拟。初步的实验结果表明,用激光干扰光刻技术产生大面积的亚微米级周期性孔、柱、锥图形是可行的。该方法不需要掩模、昂贵的光刻成像透镜、新的短波长光源和新型的抗蚀剂,提供了得到高分辨、无限焦深、大面积光刻的可能性。 相似文献
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讨论了相移掩模提高光刻分辨力的基本原理,提出了一种抗蚀剂相移器制作衰减相移掩模的新方法,利用自行设计、建立的KrF准分子激光投影光刻实验曝光系统进行了实验研究,给出了实验结果,并与传统光刻方法作了比较。 相似文献
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Ahn S Choi J Kim E Dong KY Jeon H Ju BK Lee KB 《Journal of nanoscience and nanotechnology》2011,11(7):6039-6043
A lithography technique that combines laser interference lithography (LIL) and photolithography, which can be a valuable technique for the low cost production of microscale and nanoscale hybrid mask molds, is proposed. LIL is a maskless process which allows the production of periodic nanoscale structures quickly, uniformly, and over large areas. A 257 nm wavelength Ar-Ion laser is utilized for the LIL process incorporating a Lloyd's mirror one beam inteferometer. By combining LIL with photolithography, the non-selective patterning limitation of LIL are explored and the design and development of a hybrid mask mold for nanoimprint lithography process, with uniform two-dimensional nanoscale patterns are presented. Polydimethylsiloxane is applied on the mold to fabricate a replica of the stamp. Through nanoimprint lithography using the manufactured replica, successful transfer of the patterns is achieved, and selective nanoscale patterning is confirmed with pattern sizes of around 180 nm and pattern aspect ratio of around 1.44:1. 相似文献
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Fabrication of Micropatterned Self‐Oscillating Polymer Brush for Direction Control of Chemical Waves 下载免费PDF全文
Kenta Homma Tsukuru Masuda Aya Mizutani Akimoto Kenichi Nagase Kazuyoshi Itoga Teruo Okano Ryo Yoshida 《Small (Weinheim an der Bergstrasse, Germany)》2017,13(21)
The propagation control of chemical waves via a pentagonal patterned structure in a self‐oscillating polymer brush composed of N‐isopropylacrylamide and a metal catalyst for the Belousov–Zhabotinsky (BZ) reaction is reported. The patterned self‐oscillating polymer brush is prepared by combining surface‐initiated atom transfer radical polymerization and maskless photolithography. Surface modification is confirmed by X‐ray photoelectron spectroscopy, Fourier transform infrared spectroscopy, 3D measuring laser microscopy, and fluorescence microscopy. The polymer brush patterns are fabricated with gaps between the pentagonal regions, and investigations on the effect of the gap distance on the BZ reaction reveal that at the appropriate distance, chemical waves propagate across the array from the plane to the corner between the patterns. Unidirectional control is achieved not only in the 1D array, but also in a 2D curved array. This patterned self‐oscillating polymer brush is a novel and advantageous approach for creating an autonomous dynamic soft interface. 相似文献
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We have previously reported on a maskless photolithography device for surface micropatterning and microfabrication by modifying a commercially available liquid crystal display projector. For the prototype, 10-microm resolution was achieved by downsizing the image on a 0.7-in. liquid crystal display panel to an area of 8 x 6 mm and projecting it on a fixed stage. Here, we report on a second-generation maskless photolithography device having two novel features. First, the sliding lens system with variable focal distances and exchangeable objective lenses achieves a variable resolution of 2-8 mum. Second, the synchronous control of displayed images generated by a personal computer and the movement of a XY-positioning stage allows for the fabrication of micropatterns over a larger area (over 50 x 50 mm). Here, we show examples fabricated with the two novel features. 相似文献
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A Bernassau L Garcia-Gancedo D Hutson C Demore J McAneny T Button S Cochran 《IEEE transactions on ultrasonics, ferroelectrics, and frequency control》2012,59(8):1820-1829
High-frequency ultrasound is needed for medical imaging with high spatial resolution. A key issue in the development of ultrasound imaging arrays to operate at high frequencies (?30 MHz) is the need for photolithographic patterning of array electrodes. To achieve this directly on 1-3 piezocomposite, the material requires not only planar, parallel, and smooth surfaces, but also an epoxy composite filler that is resistant to chemicals, heat, and vacuum. This paper reports, first, on the surface finishing of 1-3 piezocomposite materials by lapping and polishing. Excellent surface flatness has been obtained, with an average surface roughness of materials as low as 3 nm and step heights between ceramic/polymer of ~80 nm. Subsequently, high-frequency array elements were patterned directly on top of these surfaces using a photolithography process. A 30-MHz linear array electrode pattern with 50-μm element pitch has been patterned on the lapped and polished surface of a high-frequency 1-3 piezocomposite. Excellent electrode edge definition and electrical contact to the composite were obtained. The composite has been lapped to a final thickness of ~55 μm. Good adhesion of electrodes on the piezocomposite has been achieved and electrical impedance measurements have demonstrated their basic functionality. The array was then packaged, and acoustic pulse-echo measurements were performed. These results demonstrate that direct patterning of electrodes by photolithography on 1-3 piezocomposite is feasible for fabrication of high-frequency ultrasound arrays. Furthermore, this method is more conducive to mass production than other reported array fabrication techniques. 相似文献