首页 | 官方网站   微博 | 高级检索  
相似文献
 共查询到20条相似文献,搜索用时 62 毫秒
1.
通常多晶铜中会含有一定数量的生长孪晶或退火孪晶。但是,由于一般生长孪晶的尺寸和分布很不均匀,数量也较少,很难研究它们在材料力学行为中的作用,因此孪晶对铜的力学行为的影响还不清楚。最新研究发现,可以利用电解沉积法,通过引入大量的生长孪晶和降低孪晶尺寸来制备纳米结构铜。纳米量级的孪晶结构对力学行为的影响十分明显,但对其作用机理的研究十分有限。本工作对一种由电解沉积法制备的含有独特的高密度纳米孪晶片层结构的多晶纯铜进行室温轧制,通过观察其微观结构,探讨了孪晶结构特别是纳米量级的孪晶片层结构的形变行为以及孪晶片层尺寸对其形变行为的影响。  相似文献   

2.
纳米晶体材料与传统的多晶材料相比,具有较高的强度和硬度,其优越的力学性能归因于它们独特的变形机制。在纳米材料中,随着晶粒尺寸的不同,其形变方式主要有晶界转动、晶界扩散、不全位错发射形成层错、孪晶等,这些形变机制已被分子动力学模拟计算所预测。  相似文献   

3.
铝为层错能高的面心立方结构金属材料,在通常的塑性变形情况下,不易形成形变孪晶。最近分子动力学的模拟计算表明,在高应力应变速率条件下纳米晶铝可以出现形变孪晶。随后在物理气相沉积方法制备的纳米铝膜中和低温球磨制备的纳米铝中分别观察到了铝的形变孪晶。但迄今为止,在粗  相似文献   

4.
采用固溶+激光冲击强化(LSP)+时效方法,研究了AZ80镁合金轧板和铸态组织参数(形变孪晶和析出相)和残余应力演变,以及时效处理对其影响。结果表明,固溶+LSP处理后轧板强化层内形成高密度孪晶的形变带,铸态合金高密度形变孪晶产生于晶界附近,均产生于应力集中和高能区域,产生一次或多次孪晶,呈平行或交叉孪晶。时效后连续析出大量的颗粒状β相,其优先于形变带内、孪晶界面或片状孪晶内析出,与晶粒尺寸相关。时效后轧板和铸态冲击表面残余压应力分别为由-100.8 MPa和-68.9 MPa转变为-67.8 MPa和-35.9 MPa,即应力松弛为32.7%和48.7%。LSP次表层硬化效果明显,其时效强化效果较弱。残余压应力及其热稳定性是影响高密度形变孪晶的形成主要因素之一。  相似文献   

5.
本文采用化学气相沉积法制得大量ZnO纳米棒,利用会聚束电子衍射(CBED)研究了纳米棒的生长方向,验证了纳米棒在生长过程中产生碰撞.通过TEM研究发现,纳米棒沿c轴生长,碰撞形成的晶界并不是一个随机取向的大角晶界,为了降低能量,晶界具有孪晶关系.晶界的存在导致晶体产生缺陷生长,使纳米棒的结的附近区域长粗.  相似文献   

6.
在形变的半导体外延薄膜中经常观察到微孪晶。这种微孪晶的HREM像中往往出现一种三倍于晶格周期性的条纹。本文利用HREM和图像模拟计算技术研究这种条纹的本领。材料有两种:①激光再结晶多晶Si/Si层和②MB EGaAs/Si层。图(1)是Si中的微孪晶的HREM像。图中a和b处是具有敏锐边界的晶界,a处的大白点呈明显的三倍周期性。C处是一个模糊的边界区域。三倍周期条纹的图样特征随着离晶界C的距离而逐渐改变。我们认为这种三倍周期的条纹是两个成孪晶关系的区域重叠而形成的。这种微孪晶片的主晶界是[111]面,而其侧面的晶界应为[112]面。晶界的原子模型如图(2)。按晶界与膜面的取向关系可分成两类,如图(3)。  相似文献   

7.
通过热蒸发的方法在镀金的硅衬底上得到了硒化锌(ZnSe)复合孪晶纳米带.利用透射电镜选区电子衍射(SAED)方法并结合明场像确定了ZnSe复合孪晶纳米带的结构及生长方向,发现ZnSe复合孪晶纳米带由取向互为{113}镜面孪晶的两个纳米子带组成,单个纳米子带又由纳米量级的<111>旋转孪晶片层构成.采用会聚束电子衍射(CBED)技术确定了ZnSe复合孪晶纳米带沿<111>方向的极性.根据CBED结果并结合实验过程的设定,对ZnSe复合孪晶纳米带的形成机制进行了讨论.  相似文献   

8.
Oppolpzer曾用TEM这观察到BaTiO_3半导体陶瓷的孪晶,认为它会伴生异常晶粒长大。但是有关孪晶和孪晶界的结构细节以及形成机制尚不清楚。本文用高分辩电镜(HREM)和透射电镜(TEM)进一步研究了它们的孪晶,得到如下四点结果。1.BaTiO_3的大部分孪晶均为{111)孪晶,其晶界为共格倾斜(70°)孪晶界。图1是[110]方向孪晶的晶格像,图中用粗黑线示意镜面对称的(001)晶格(3.9A),与之垂直的为(110)晶格(2.8A),它相应于左右(指标化示意)上角的衍射结  相似文献   

9.
利用电子显微镜对不同材料组合和焊接条件下,奥氏体不锈钢焊缝中形变孪晶的形态进行了现察。实验发现焊缝中形变孪晶的数量和形态与接头的拘束条件有关。在全拘束接头中,孪晶的数量最多,还会出现多次孪晶。随拘束程度的下降,孪晶数量减少。在无拘束接头中,几乎看不到孪晶。这些形变孪晶是由于在奥氏体钢焊缝冷却过程中,结晶凝固和δ-铁素体向奥氏体的相转变,导致焊缝体积缩小而快速引入的拉伸切应力产生的。  相似文献   

10.
本文利用EBSD技术对亚稳β型Ti?25Nb?25Ta合金室温拉伸变形过程中{332}〈113〉变形孪晶的演变趋势及交叉现象进行了研究。结果表明:随着变形量的增大,孪晶宽度不断增加,孪晶形态由变形初期的平直细条带状逐渐变为宽窄不一的条带状,至变形末期部分孪晶呈破碎状,孪晶界严重扭曲变形。多数晶粒内产生两种以上{332}〈113〉孪晶变体,部分孪晶能穿越晶界继续生长,某些初次孪晶内部有二次{332}〈113〉孪晶产生。不同变体孪晶间易发生交叉现象。不同{332}〈113〉孪晶变体的交叉作用导致交叉区域出现较大的局部晶格畸变,晶格畸变主要集中于孪晶内部,且交叉界面处的晶格畸变程度最为严重。交叉作用的结果是交叉区域的晶体相对于不同孪晶变体和基体的取向都发生一定程度的改变。  相似文献   

11.
DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.  相似文献   

12.
High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET > PDMAT > TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.  相似文献   

13.
In order to diagnose the laser-produced plasmas, a focusing curved crystal spectrometer has been developed for measuring the X-ray lines radiated from a laser-produced plasmas. The design is based on the fact that the ray emitted from a source located at one focus of an ellipse will converge on the other focus by the reflection of the elliptical surface. The focal length and the eccentricity of the ellipse are 1350 mm and 0.9586, respectively. The spectrometer can be used to measure the X- ray lines in the wavelength range of 0.2-0.37 nm, and a LiF crystal (200) (2d = 0.4027 nm) is used as dispersive element covering Bragg angle from 30° to 67.5°. The spectrometer was tested on Shengnang- Ⅱ which can deliver laser energy of 60-80 J/pulse and the laser wavelength is 0.35 μm. Photographs of spectra including the 1 s2p ^1P1-1s^2 ^1S0 resonance line(w), the 1s2p ^3P2-1s^2 1S0 magnetic quadrupole line(x), the 1s2p ^3P1-1 s^2 ^1S0 intercombination lines(y), the 1 s2p ^3S~1-1 s^2 ^1S0 forbidden line(z) in helium-like Ti Ⅹ Ⅺ and the 1 s2s2p ^2P3/2-1 s622s ^2S1/2 line(q) in lithium-like Ti Ⅹ Ⅹhave been recorded with a X-ray CCD camera. The experimental result shows that the wavelength resolution(λ/△ 2) is above 1000 and the elliptical crystal spectrometer is suitable for X-ray spectroscopy.  相似文献   

14.
From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.  相似文献   

15.
The parallel thinning algorithm with two subiterations is improved in this paper. By analyzing the notions of connected components and passes, a conclusion is drawn that the number of passes and the number of eight-connected components are equal. Then the expression of the number of eight-connected components is obtained which replaces the old one in the algorithm. And a reserving condition is proposed by experiments, which alleviates the excess deletion where a diagonal line and a beeline intersect. The experimental results demonstrate that the thinned curve is almost located in the middle of the original curve connectivelv with single pixel width and the processing speed is high.  相似文献   

16.
The relation between the power of the Brillouin signal and the strain is one of the bases of the distributed fiber sensors of temperature and strain. The coefficient of the Bfillouin gain can be changed by the temperature and the strain that will affect the power of the Brillouin scattering. The relation between the change of the Brillouin gain coefficient and the strain is thought to be linear by many researchers. However, it is not always linear based on the theoretical analysis and numerical simulation. Therefore, errors will be caused if the relation between the change of the Brillouin gain coefficient and the strain is regarded as to be linear approximately for measuring the temperature and the strain. For this reason, the influence of the parameters on the Brillouin gain coefficient is proposed through theoretical analysis and numerical simulation.  相似文献   

17.
Today, micro-system technology and the development of new MEMS (Micro-Electro-Mechanical Systems) are emerging rapidly. In order for this development to become a success in the long run, measurement systems have to ensure product quality. Most often, MEMS have to be tested by means of functionality or destructive tests. One reason for this is that there are no suitable systems or sensing probes available which can be used for the measurement of quasi inaccessible features like small holes or cavities. We present a measurement system that could be used for these kinds of measurements. The system combines a fiber optical, miniaturized sensing probe with low-coherence interferometry, so that absolute distance measurements with nanometer accuracy are possible.  相似文献   

18.
This paper presents a new method to increase the waveguide coupling efficiency in hybrid silicon lasers. We find that the propagation constant of the InGaAsP emitting layer can be equal to that of the Si resonant layer through improving the design size of the InP waveguide. The coupling power achieves 42% of the total power in the hybrid lasers when the thickness of the bonding layer is 100 nm. Our result is very close to 50% of the total power reported by Intel when the thickness of the thin bonding layer is less than 5 nm. Therefore, our invariable coupling power technique is simpler than Intel's.  相似文献   

19.
This paper reviews our recent development of the use of the large-scale pseudopotential method to calculate the electronic structure of semiconductor nanocrystals, such as quantum dots and wires, which often contain tens of thousands of atoms. The calculated size-dependent exciton energies and absorption spectra of quantum dots and wires are in good agreement with experiments. We show that the electronic structure of a nanocrystal can be tuned not only by its size,but also by its shape. Finally,we show that defect properties in quantum dots can be significantly different from those in bulk semiconductors.  相似文献   

20.
An improving utilization and efficiency of critical equipments in semiconductor wafer fabrication facilities are concerned. Semiconductor manufacturing FAB is one of the most complicated and cost sensitive environments. A good dispatching tool will make big difference in equipment utilization and FAB output as a whole. The equipment in this paper is In-Line DUV Scanner. There are many factors impacting utilization and output on this equipment group. In HMP environment one of the issues is changing of reticule in this area and idle counts due to load unbalance between equipments. Here we'll introduce a rule-based RTD system which aiming at decreasing the number of recipe change and idle counts among a group of scanner equipment in a high-mixed-products FAB.  相似文献   

设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司    京ICP备09084417号-23

京公网安备 11010802026262号