基于log-polar变换的全景展开算法

提出一种基于log-polar变换的全景展开算法,将带有畸变的全景图像展开为柱面图像,包含预估全景图像的中心点,全景图像中像素点转换至对级数坐标系,将所有像素点转换至笛卡尔直角坐标系并进行双线性插值等三个步骤。实验结果表明此算法不仅计算量小,处理速度快,而且具有较理想的校正效果。     

双曲面折反射全景成像柱面展开图像质量分析

为提高双曲面折反射全景成像系统柱面展开图像的质量,根据双曲面反射镜的性质,给出了全景图像柱面展开方法的数学模型。提出以图像分辨率和像素有效率作为图像展开质量的衡量指标,分析了2个指标随起始入射角和入射角跨度变化的规律,得出了柱面展开时起始入射角和入射角跨度的选择范围,仿真结果和实测数据实验验证了结论的正确性。     

柱面全景图像视图合成中的关键问题研究

图像校正和插值是基于柱面全景图像视图合成中的关键问题。首先分析了极线采样方法在柱面图像校正像素保持率和像素有效率上的优势,通过计算极线的数量、范围及起止位置,有效保留了源图像的信息,减少了以往算法中由于使用单应性映射而导致的弱采样和过采样效应;其次,在新视点插值上,根据柱面全景图像的成像模型,推导了合成视图上像素点的位置和颜色计算公式。最后给出了基于仿真图像和实际图像的视图合成结果。      

基于双曲面折反射相机的柱面全景立体成像

为满足机器人导航、视频监视和场景建模等领域实时获取全景深度信息的需要,提出了一种利用2个双曲面折反射相机同轴放置实现全景立体成像的方法,并推导了这种全景立体视觉系统的深度计算公式。为了简化全景立体图像对的匹配和深度计算,建立了满足针孔成像模型的虚拟柱面相机,使通常的双目视觉算法适用于柱面全景图像对的深度信息提取。建立了全景立体成像实验装置,提取出了反映场景深度信息的360°柱面全景浓密视差图。     

一种多路全景图像拼接融合算法研究

针对外场大场景视频监控需求,分析研究了单台全景摄像机全景图像缺点,多台全景摄像机多路全景图像拼接融合难点和拼接融合算法原理,设计了一种多路全景图像拼接融合算法.研究结果认为,该算法设计合理,可有效拼接融合多路全景图像,具有良好的视觉观感和图像质量,可对提升外场全景监控能力提供借鉴.     

一种多路全景图像拼接融合算法研究

针对外场大场景视频监控需求,分析研究了单台全景摄像机全景图像缺点,多台全景摄像机多路全景图像拼接融合难点和拼接融合算法原理,设计了一种多路全景图像拼接融合算法.研究结果认为,该算法设计合理,可有效拼接融合多路全景图像,具有良好的视觉观感和图像质量,可对提升外场全景监控能力提供借鉴.     

基于SURF算法的现场概貌图像拼接技术分析

阐述SURF算法提取图像中的特征点进行粗匹配,通过RANSAC算法提高匹配准确率,利用加权平均的方法对拼接图像进行图像融合,并进行柱面投影,生成全景图像,从而获得完整的现场概貌图像。     

微型无人机载实时全景成像设备研究

针对目前基于图像拼接法和鱼眼镜头法无人机载全景成像实时性低、成本高的问题,设计了一种微型无人机载实时全景成像设备。采用基于抛物面反射镜的折反射全景成像方式,通过无线通信实时获取机载全景图像视频,并利用投影变换展开成柱面全景图像,从而实时获得水平方向360°、垂直方向286°范围内的大视场图像,提高了无人机载大视场成像的实时性,降低了系统成本,为进一步释读图像奠定了重要基础。     

基于小波域特征提取的360度全景图像质量评价

随着虚拟现实(VR)技术的发展,其中代表性的360度全景图像越来越受到关注.本文针对360度全景图像在传输、压缩、储存过程中容易产生失真的特点,结合研究当下流行的编码技术对其质量影响的客观需求,研究了360 度全景图像的质量评价.设计了使用小波域提取能量波动等特征信息的半参考质量评价方法,用来对经过压缩的360 度全景图像进行质量评价.通过与其他图像质量评价算法结果的比较,验证了此方法具有较高的性能.     

视频编码标准HEVC中的环路滤波技术分析

新一代视频编码标准HEVC中增加了环路滤波技术来提高编码图像质量。研究了滤波过程中的两种算法:去块滤波和自适应采样点滤波。去块滤波可以消除块效应,自适应采样点滤波可以减小图像失真。通过实验仿真,分析了滤波技术的有效性。结果表明该滤波技术提高了编码性能,改善了图像质量。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.