嵌入式开关电容DC-DC变换器的新颖控制技术

提出了一种针对单片集成开关电容DC-DC变换器进行优化的设计方案.阐述了开关电容DC-DC变换器电路的拓扑结构及其基本工作原理,给出了单片集成开关电容DC-DC变换器的等效电阻控制方法.考虑到集成工艺的兼容性问题,在电路设计时,用n沟MOSFET替代二极管;为了改善变换器的输出特性,在标准2μm p阱双层多晶硅单层金属CMOS工艺中增加了一次MOSFET阈值电压的调整步骤,实现了升压开关电容DC-DC变换器的单片集成.芯片面积为0.4mm2,测试结果显示,在变换器输入电压为3V,输出电压为5V,电路开关频率为9.8MHz时,输出功率为0.63mW,效率达到68%.     

多输出谐振型开关电容变换器的设计与仿真

开关电容变换器是一种典型的无感变换器,电路中主要由开关管和电容器来实现电压变换和能量转换。由于电路中不含电感和变压器,可以大大缩小电源体积、减轻重量,并且易于在芯片上集成。随着电子设备的小型化,开关电容DC-DC变换器将具有广阔的应用前景。基于开关电容DC-DC变换器的研究现状,文中系统地阐述了多输出开关电容DC-DC变换器的工作原理和设计方法,并通过系统仿真和实验验证了该类谐振型变换器的高效性。     

用CMOS工艺改善集成开关电容DC-DC变换器的特性

介绍了一种具有改进电路结构和改进工艺的单片集成3.3V/1.2V开关电容DC-DC变换器,其控制脉冲频率和固定导通比分别为10MHz和0.5.为了提高变换器的输出电流,采用CMOS工艺来制造电路中的开关器件和改进的互补型电路结构.使用Hspice电路仿真软件得到的仿真结果表明改进变换器的单个单元电路和互补型电路可使输出电流分别达到12.5mA和26mA,且后者的功率转换效率为73%,输出电压纹波小于1.5%.变换器在日本东京大学的标准Rohm 0.35μm CMOS工艺线上投片试制,测试结果显示,使用CMOS开关的变换器单元电路的输出电流为9.8mA.     

采用有源电容倍增器改善开关电容DC-DC变换器的性能

研究了开关电容DC-DC变换器输出电压与电容的关系,分析了变换器输出电压波纹产生的原因.针对变换器中大电容难集成的问题,提出了一种基于跨导放大器和第二代电流传输器的有源电容倍增器的新型拓扑结构.该电路只用较少的元件就可以实现开关电容变换器中的浮地和接地电容.以二阶开关电容DC-DC变换器为例,用PSPICE软件分别对采用了有源电容倍增器的新型结构和传统结构进行了仿真.结果显示,基于有源电容倍增器的开关电容变换器仅用100pF电容就等效了200nF电容的输出性能,而且具有更低的输出电压波纹.     

用CMOS工艺改善集成开关电容DC-DC变换器的特性

介绍了一种具有改进电路结构和改进工艺的单片集成3.3V/ 1.2 V开关电容DC- DC变换器,其控制脉冲频率和固定导通比分别为10 MHz和0 .5 .为了提高变换器的输出电流,采用CMOS工艺来制造电路中的开关器件和改进的互补型电路结构.使用Hspice电路仿真软件得到的仿真结果表明改进变换器的单个单元电路和互补型电路可使输出电流分别达到12 .5 m A和2 6 m A,且后者的功率转换效率为73% ,输出电压纹波小于1.5 % .变换器在日本东京大学的标准Rohm 0 .35 μm CMOS工艺线上投片试制,测试结果显示,使用CMOS开关的变换器单元电路的输出电流为9.8m A.     

一种新的应用于降压式DC-DC变换器电流采样电路的设计

在分析了传统的应用于大负载电流降压式DC-DC变换器电流采样电路主要缺点的基础上,提出一种新的应用于降压式DC-DC变换器的电流采样电路。该方法通过一个电阻电容网络来消除电感寄生电阻的影响,并利用开关电容积分器来实现降压式DC-DC变换器的电流采样,在Chartered 0.35μm CMOS工艺下实现该电路并流片验证。最终的测试结果显示,提出的电流采样电路实现了对降压式DC-DC变换器精确的电流采样。     

一类零电流谐振开关电容变换器的特性分析

具有零电流开关特性的谐振开关电容变换器是开关电容变换器的一种新拓扑形式.本文着重分析电路寄生参数和变换器运行条件对该类谐振开关电容变换器稳态特性的影响,推出变换器输出电压和效率的数学表达式,为研究负载或输入电压变化时变换器的输出性能提供了分析和设计依据.基于输出电压表达式,还提出谐振开关电容变换器的频率控制方案.全文以一个降压式谐振开关电容变换器为例详细说明公式的推导过程,并将此稳态特性分析推广到其它类型的谐振开关电容变换器.最后,文中设计了一台12V/5V/2.5A降压式谐振开关电容变换器样机,实验结果验证了本文的理论分析结果.     

集成于电流模降压型DC-DC变换器的电流采样电路

针对电流模降压型DC-DC变换器,提出了一种新颖的CMOS片上电流采样电路.该电路结构简单,易于集成,功率损耗小,且通过MOSFET的匹配使采样比例几乎不受温度、模型以及电源电压变化影响.并通过进一步的优化设计,使得响应速度更快,工作电压进一步降低.提出的采样电路在一款基于0.5μm CMOS工艺没计的单片电流模降压型DC-DC变换器中进行了验证.在2.5～5.5V的电压范围,0～2A的负载范围内芯片工作稳定,瞬态响应良好,且效率高达96%.     

集成于电流模降压型DC-DC变换器的电流采样电路

针对电流模降压型DC-DC变换器,提出了一种新颖的CMOS片上电流采样电路.该电路结构简单,易于集成,功率损耗小,且通过MOSFET的匹配使采样比例几乎不受温度、模型以及电源电压变化影响.并通过进一步的优化设计,使得响应速度更快,工作电压进一步降低.提出的采样电路在一款基于0.5μm CMOS工艺没计的单片电流模降压型DC-DC变换器中进行了验证.在2.5～5.5V的电压范围,0～2A的负载范围内芯片工作稳定,瞬态响应良好,且效率高达96%.     

一种片内集成飞电容的自适应开关电容DC-DC

提出一种电容片内集成、高效率升压模式的DC-DC电源管理芯片,较普通结构相比,文中提出的电路结构具有6组2×,3组3×,2组4×升压模型共11种工作模式,并具有低纹波等优点。通过MIM电容与积累型NMOS电容串联的方式,提高单位面积容值,使得总电容面积大幅减小。采用SMIC 0.18μm CMOS工艺,利用Cadence工具对电路进行仿真验证,所提出自适应开关电容升压电路,在输出电压为3 V时,其效率最高可达到83.6%。在开关频率为20 MHz时,输入电压范围为1~1.8 V,所需总片内集成电容总面积为900 μm×900 μm,输出电压纹波＜40 mV     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.