基于初始种群优化粒子群算法的通信抗干扰决策引擎

针对抗干扰决策引擎对实时性能要求较高的问题,借鉴了一种基于初始种群优化的粒子群算法(IPO-PSO)。该算法通过把上一次决策的部分解作为当前初始解集的一部分,以此来优化粒子群算法的初始种群。仿真结果表明,该算法能够在不增加复杂度的情况下显著提高粒子群算法在缓变干扰环境下的收敛速度,具有较好的实时性能,更加符合通信抗干扰的应用场景。     

基于PPSO-GRADS算法的盲信号分离

该文将联姻策略应用在粒子群算法中,提出一种并行分阶段的基于粒子群优化算法的盲信号分离方法(PPSO-GRADS)。该算法具有收敛速度快,分离精度高的特点。通过仿真证明该算法比未使用联姻策略的粒子群算法有更好的性能,在收敛速度和分离效果上比传统的梯度算法,遗传算法都有较明显的改善。     

基于直觉模糊熵的混合粒子群优化算法

为了提升粒子群算法的全局寻优与局部精细搜索能力并加快收敛速度,提出了基于直觉模糊熵的混合粒子群优化算法.该算法采用粒子的历史最优解信息构造直觉模糊熵的自适应函数,并将熵值作为扰动因子动态调节惯性权重,同时建立自适应全局最优粒子学习策略对扰动后的粒子进行训练,在保持多样性传播的基础上选择学习对象,使粒子探索更多新区域,实现种群间的协作与并行进化.通过仿真实验,将本文算法与两种衍生算法以及其他改进粒子群算法在11个测试函数上进行比较,结果表明,本算法在求解精度、收敛速度和寻优效率上均有更好表现.     

基于改进离散粒子群算法的认知无线电频谱分配

原始的二进制粒子算法在认知无线电频谱分配过程中存在收敛速度慢、最优值不理想的问题,并且对二进制粒子群算法在频谱分配过程中的惯性权重参数设置缺乏理论研究。针对这一问题,在分析二进制粒子群算法的基本原理和计算步骤的基础上,探讨了二进制粒子群算法ω最适宜的取值。对原始二进制粒子群算法进行了改进,提出了采用混沌Logistic映射的方式进行初始种群的构造,保证了初始种群在解空间的均匀分布。引入了基于种群聚集度的粒子变异思想,使得新算法与原算法相比,不易陷入局部最优解。仿真结果表明,利用该算法进行认知无线电频谱分配时,收敛速度较快,得到的系统总效益值也较好。     

基于PSO-GA算法的多用户OFDM系统资源分配

为了最小化多用户OFDM系统的总发射功率,提出利用改进的粒子群算法与遗传算法相结合的联合算法(PSO-GA)来搜索最优的子载波和比特分配。该算法首先利用改进粒子群算法对系统的子载波和比特分配进行优化。算法运行过程中,当更新后的粒子速度大于最大粒子速度或小于最小粒子速度时,取最大粒子速度与最小粒子速度区间中的一个随机值作为更新的粒子速度。待PSO-GA算法的改进粒子群算法收敛后,将收敛后的种群作为遗传算法的初始种群,再利用遗传算法进行系统的子载波和比特优化分配,进而得出最优解。仿真结果表明,利用该算法比利用遗传算法、粒子群算法与Zhang算法的分配方案使系统需要的总发射功率降低2~10 dB。     

基于环形结构带缓存器模型的并行微粒群算法

受并行遗传算法的启发，文章设计和实现了一种基于环形结构带缓存器模型的并行微粒群算法。它基于一种单向环结构的拓扑连接，可以保证优良粒子在子种群问的扩散，丰富种群的多样性。仿真实验的结果表明．该并行算法不仅有效地提高了求解效率，而且在一定程度上改善了早熟现象，算法的各项性能与微粒群算法相比有了很大提高。     

改进的免疫粒子群算法在TDOA定位中的应用

针对无线传感器网络中的TDOA节点无源定位估计中的非线性优化问题,提出了一种改进的免疫粒子群优化(Immune Particle Swarm Optimization, IPSO)的TDOA定位算法。该算法在自适应粒子群算法的基础上,引入免疫过程,增加了粒子种群的多样性,平衡局部搜索能力和全局搜索能力,有效地解决粒子易陷入局部最优问题,更快收敛到全局最优解。仿真结果表明,提出的算法相比于标准粒子群算法、自适应粒子群算法、Chan算法,当基站数量仅为4～5个、半径达到100 m时定位精度仍然较高,当加入随机噪声时,性能更加稳定,鲁棒性较好。     

基于量子粒子群优化算法的光纤光栅参数重构

提出了一种基于量子粒子群优化算法的光纤光栅参数重构方法。该方法通过传输矩阵法得到优化目标函数,并将待优化的光纤光栅参数以粒子表示,再让粒子在解空间模拟量子行为进行搜索。以均匀布拉格光栅和线性啁啾光纤光栅为例,分别采用遗传算法(GA)、经典粒子群优化(PSO)算法以及量子粒子群优化(QPSO)算法对其进行参数重构。与传统粒子群算法及遗传算法相比,该方法借鉴了量子行为,具有更好的收敛性能和稳态性能。数值结果表明,种群规模为40时,针对均匀和非均匀光栅分别进化100代和200代得到的重构参数误差均小于0.5%。     

一种动态分群的自适应粒子群优化算法

粒子群优化算法是模拟鸟类觅食行为思想的随机搜索算法,主要是通过迭代寻找最优解。将粒子随机初始化改进为固定初始化,并将动态分群思想引入粒子群优化算法将整个种群划分为三个子群,根据不同群中粒子的情况自适应地选择惯性权重,以此提高粒子的搜索能力。仿真实验结果表明,该方法大大提高了搜索过程中粒子的多样性,避免粒子陷入局部最优,提高了求解的速度和精度。     

交叉前置式粒子群优化算法及其在催化裂化C3含量软测量中的应用

 针对粒子群优化算法易陷入局部极小点,出现早熟收敛的问题,本文提出了一种交叉前置式粒子群优化算法(PSOPC).该算法引入了一个辅助种群,将其中的个体与粒子群中的粒子在粒子更新之前进行预先的交叉操作.辅助种群所包含的是每次迭代后所生成的适应值较差但多样性较高的粒子.前置式交叉操作能够增加粒子群的多样性,有效改善算法的全局收敛能力.标准函数测试结果表明,PSOPC比基本PSO具有更好的优化性能.最后,将PSOPC应用于催化裂化装置干气中C₃含量软测量建模,通过与实际的工业数据的对比,结果表明基于PSOPC的神经网络C₃含量软测量模型具有较高的精度和较强的泛化能力.     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.