基于OPNET的地域通信网网络仿真研究

针对无线通信情况下地域通信网中心交换机节点间的通信质量,采用模块化的方法描述节点对象的行为并对节点进行建模,通过OPNET网络仿真工具对地域通信网各网络节点的仿真模型以及组成各节点的进程模块进行设计实现,结合地域通信网的一个实例,得出了节点受不同干扰情况下的全局数据业务丢包率和话音业务呼损率。     

地域通信网干扰效果评估指标研究

目前地域通信网是战术通信网的主体和主要发展方向。介绍了地域通信网的特点,分析了对地域通信网的干扰方法。针对地域通信网的工作特性,提出了采用误码率和网络阻塞概率作为对地域网干线节点干扰的效果评估指标,最后以四个节点组成的栅格状地域通信网作为研究对象,采用数学仿真方法对多种情况下的误码率、网络阻塞概率进行了仿真评估。     

对MSK信号最佳干扰效果的仿真研究

MSK是一种性能优越的新型数字调制方式,在外军的地域通信网中广泛采用。本文在对MSK信号特点进行分析的基础上,利用SystemView动态分析仿真平台建立用于地域通信网微波干线的MSK通信系统,对其进行干扰效果研究,并给出仿真结果。     

对MSK信号最佳干扰效果的仿真研究

MSK是一种性能优越的新型数字调制方式，在外军的地域通信网中广泛采用。本文在对MSK信号特点进行分析的基础上，利用System View动态分析仿真平台建立用于地域通信网微波干线的MSK通信系统，对其进行干扰效果研究，并给出仿真结果。     

地域通信网单链路干扰研究

地域通信网是现代军事通信中一种重要手段,链路是通信网络的重要组成部分。不同通信体制下对链路干扰的效果是不同的,误码率是衡量通信质量的重要参数,干信比是对干扰效能的衡量指标,而链路阻塞率则是对网络服务质量进行描述的具体参数,研究不同通信体制下3种变量之间的关系对地域通信网干扰研究具有十分重要的意义。文章正是在地域通信网单链路的基础上,从链路模型和通信干扰效果两个方面出发,研究了链路阻塞率、干信比和误码率之间的关系,并进行了计算机仿真。     

地域通信网的干扰技术研究

本文在分析地域通信网结构及组成的基础上,研究了对地域通信网实施的节点破坏、末端信息封锁、局部阻塞瘫痪等对抗方法,并使用干扰地域通信网的程度、节点干扰率、末端节点封锁率和传递信息误差率等指标对干扰效果进行评估。     

地域通信网的干扰技术研究

本文在分析地域通信网结构及组成的基础上，研究了对地域通信网实施的节点破坏、末端信息封锁、局部阻塞瘫痪等对抗方法，并使用干扰地域通信网的程度、节点干扰率、末端节点封锁率和传递信息误差率等指标对干扰效果进行评估。     

基于地域通信网流量攻击方法的仿真研究

地域通信网中各节点之间的正常通信是保障作战胜利的关键,由于地域通信网中各节点间的连接多采用无线链路,可以使用流量攻击的方法对链路进行攻击,使各节点通信中断。在分析流量控制和拥塞控制的基础上,结合OPNET仿真软件建立网络模型,通过仿真研究验证了流量攻击法可以有效地使地域通信网通信中断,达到攻击的目的。     

一种基于误码率分析的无线通信网干扰效能评估方法

随着现代通信技术的发展,通信干扰的对象已由单一信号源转向通信网。为了有效评估对无线通信网的干扰效能,在构建通信网干扰模型的基础上,提出了一种基于传统误码率理论的无线通信网干扰效能评估方法,并进行了干扰效能评估仿真。仿真结果验证了该方法的科学性和可行性,表明了对干扰组资源采用适度倾向性分配方式能够提高对通信网的干扰效能,在实际对抗中对通信网实施有效干扰具有重要的指导意义。     

基于仿真的地域通信网规划与管理

针对地域通信网在开设和维护中的需求，提出了一种基于仿真的实时规划与管理方式，将仿真系统与地域通信网中的一些节点构成半实物仿真环境。根据网络的当前状态．快速仿真网络运行，预测网络未来的性能，并持续地对网络进行优化，以此来提高地域通信网性能，改善服务质量。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.