读出电路数字模块设计

文章介绍了一个读出电路的数字控制模块.该模块集成了众多的控制功能,包括积分时间的调控,对面阵中指定窗口的读出,并能够支持快照读出模式和滚动读出模式之间的选择.文章中详细介绍了实现窗口功能和滚动功能的算法;电路的整体结构及端口时序,并给出了整个系统的仿真结果;最后采用上海集成电路设计中心提供的0.6μm双硅双铝标准单元库对本设计进行了电路综合,并对本设计的版图规划和实现进行了简略的说明,验证了将该设计向大规模读出电路上集成的可行性.     

一种大面阵红外焦平面阵列读出电路的设计方法

论文提出了一种可用于大面阵红外焦平面阵列的智能化读出电路的设计方法,所设计的读出电路具有放大、读出、片上模数转换以及智能控制等功能。论文主要介绍该面阵电路的组成结构、核心电路的工作原理、电路的仿真方法和结果。通过对该面阵读出电路进行版图设计、流片和性能测试,得到了符合设计要求的面阵规模为128X128的大面阵红外焦平面阵列智能读出电路。     

2×8低噪声InGaAs/InP APD读出电路设计

对In0.53Ga0.47As/InP雪崩光电二极管(APD)探测器进行了特性分析.以大阵列研究为基础,结合器件特性设计了一个2×8低噪声读出电路(ROIC),电路主要由电容反馈互阻放大器(CTIA)和相关双采样(CDS)电路单元构成,并对读出电路的时序、积分电容等进行了设计.电路采用0.6 μm CMOS工艺流片,芯片面积为2 mm×2 mm,电荷存储能力为5×107个,功耗小,噪声低,设计达到预期要求.     

一种新型红外焦平面片上模数转换电路

基于串行单斜率积分的原理,提出了一种新型的像素级红外焦平面片上8位模数转换电路.设计了一个8×8像素阵列组成的完整读出电路芯片,并进行了版图设计和电路仿真.每个单元像素电路采用直接注入方式输入,输出与输入电流成正比的数字脉冲信号,经每列单元共享的计数器计数输出.采用独特的数字电路列共享结构,电荷注入补偿等技术,具有结构简单、面积小等特点.仿真及测试结果表明,该芯片能较好地完成红外焦平面信号读出及模数转换功能,单元面积80 μm×80 μm,单元功耗50 μW,量化等级达到8位,芯片实测量化误差小于4 LSB,帧速可达460 f/s.     

具有时间延迟积分(TDI)功能的288×4红外焦平面读出电路

提出了一种具有TDI功能的288×4扫描型红外焦平面读出电路.分析了TDI的工作原理及电路实现,给出了本类电路TDI功能的测试方法.实现了支持积分同时读出(IWR)的相关双采样(CDS)及其可测性设计.提出了一种大规模扫描型焦平面读出电路的低功耗设计方案.本文的设计结果经过了流片验证.     

一个128×128CMOS快照模式焦平面读出电路设计

本文介绍了一个工作于快照模式的CMOS焦平面读出电路新结构——DCA(Direct-injection Charge Amplifier)结构.该结构像素电路仅用4个MOS管,采用特殊的版图设计并用PMOS管做复位管,既可保证像素内存储电容足够大,又可避免复位电压的阈值损失,从而提高了读出电路的电荷处理能力.由于像素电路非常简单,且该结构能有效消除列线寄生电容C_bus的影响,因此该结构非常适用于小像素、大规模的焦平面读出电路.采用DCA结构和1.2μm双硅双铝(DPDM-Double-Poly Double-Metal)标准CMOS工艺设计了一个128×128规模焦平面读出电路试验芯片,其像素尺寸为50×50μm²,电荷处理能力达11.2pC.本文详细介绍了该读出电路的体系结构、像素电路、探测器模型和工作时序,并给出了精确的HSPICE仿真结果和试验芯片测试结果.     

读出电路数字模块设计

文章介绍了一个读出电路的数字控制模块。该模块集成了众多的控制功能，包括积分时间的调控，对面阵中指定窗口的读出，并能够支持快照读出模式和滚动读出模式之间的选择。文章中详细介绍了实现窗口功能和滚动功能的算法；电路的整体结构及端口时序，并给出了整个系统的仿真结果；最后采用上海集成电路设计中心提供的0．6μm双硅双铝标准单元库对本设计进行了电路综合，并对本设计的版图规划和实现进行了简略的说明，验证了将该设计向大规模读出电路上集成的可行性。     

640×512焦平面读出电路设计

介绍了640×512电容反馈跨阻放大器(CTIA)型焦平面读出电路的设计,包含模拟电路与数字模块设计。分析了CTIA采样单元的设计,折中优化了采样单元的面积、噪声、增益等因素,同时优化了采样单元控制电路,最大限度地提高了对采样单元阵列的驱动能力;数字控制部分着重分析了对行选、列选、翻转读出、随机开窗、隔行扫描、多路选择输出等功能的实现方式。设计基于0.5μm DPTM工艺进行仿真验证,采样单元面积为25μm×25μm,工作频率为5MHz,芯片面积为18.1mm×17.4mm,输出摆幅大于2.5V,动态范围大于70dB。     

读出电路数字模块设计

文章介绍了一个读出电路的数字控制模块。该模块集成了众多的控制功能，包括积分时间的调控，对面阵中指定窗口的读出，并能够支持快照读出模式和滚动读出模式之间的选择。文章中详细介绍了实现窗口功能和滚动功能的算法；电路的整体结构及端口时序，并给出了整个系统的仿真结果；最后采用上海集成电路设计中心提供的0．6μm双硅双铝标准单元库对本设计进行了电路综合，并对本设计的版图规划和实现进行了简略的说明，验证了将该设计向大规模读出电路上集成的可行性。     

一种红外焦平面的数字化输出设计方案

为了实现红外焦平面数字化输出,设计了一种带片上模数转换的焦平面读出电路,包括一个8×1的读出电路单元阵列和一个基于逐次逼近算法的10位模数转换器.单元读出电路采用了电容反馈负阻抗放大器结构作为输入级,输出的信号经采样保持后通过多路传输送到模数转换器.设计的逐次逼近型的模数转换器中的比较器采用的是两级开环结构,数模转换器采用的是高位电荷缩放低位电压缩放型的结构.在Cadence全定制设计平台下,采用0.6μm双多晶硅、双金属层的CMOS工艺模型对电路进行了仿真和版图设计.整个读出电路采用5V电压供电,20kHz的采样输出时仿真平均功耗约为5mW.     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.