一个采用0.18μm CMOS工艺的3－5GHz超宽带平坦增益低噪声放大器

本论文设计并实现了一个用于UWB脉冲体制的3-5GHz超宽带平坦增益的全差分低噪声放大器。在电路设计上,采用了一种增益平坦化技术,并且利用了串连建峰与并联建峰技术,分别实现了宽带的输入匹配与整个电路大的增益带宽积。同时,利用反馈技术,进一步拓展带宽和削减带内增益波动。此LNA才用SMIC 0.18um CMOS射频工艺流片验证。测试结果表面电路3dB带宽为2.4~5.5GHz,最高增益可达13.2dB,在3－5GHz的带内增益波动仅为＋/- 0.45dB,最低噪声系数为3.2dB．输入匹配性能良好,在2.9~5.4GHz范围内S11<-13dB,电路的输入P1dB为－11.7dBm@5GHz,电路采样1.8v供电,整个差分电路消耗电流9.6mA.     

一种可切换的双频段CMOS低噪声放大器

基于0.18μm RF CMOS工艺,设计了一种可切换的双频段CMOS低噪声放大器,其输入输出均匹配到50Ω。加入封装、ESD电路和PAD模型,采用Cadence Spectre RF进行仿真。结果显示,在1.8 V工作电压下,1.575 GHz输入时,LNA的噪声系数、功率增益和偏置电流分别为0.9 dB、18.2 dB和5.7 mA;1.2 GHz输入时,LNA的噪声系数、功率增益和偏置电流分别为0.8dB、16.8 dB和5.3 mA。     

一种宽带CMOS低噪声放大器

基于130 nm CMOS工艺设计了一款宽带低噪声放大器(LNA),适用于Ka波段的5G应用。通过降低输入阻抗与最佳源阻抗的偏差以抑制噪声,该LNA实现了宽带的最佳噪声系数匹配。一方面,该LNA采用由LC串联组合和LC并联组合构成的宽带前端网络,在取得低噪声系数的同时,实现了宽带输入匹配;另一方面,通过体隔离技术和级间电感匹配技术提高了电路增益。同时,通过并联峰值负载技术,提高了LNA的带内增益平坦度。测试结果表明,该LNA的峰值增益为11.2 dB,-3 dB带宽为7.5 GHz(29.1～36.6 GHz)。噪声系数为5.9～6.6 dB,与仿真的最小噪声系数非常接近。输入反射系数(<-10 dB)带宽为6.7 GHz(28.3～35 GHz)。该LNA在1.2 V电源电压下功耗为9 mW,芯片面积为0.54 mm²。     

一种用于超宽带接收机的CMOS可变增益低噪声放大器

本文介绍一种符合中国超宽带应用标准的工作频率范围为4.2-4.8 GHz的CMOS可变增益低噪声放大器(LNA)。文章主要描述了LNA宽带输入匹配的设计方法和低噪声性能的实现方式,提出一种3位可编程增益控制电路实现可变增益控制。该设计采用0.13-μm RF CMOS工艺流片,带有ESD引脚的芯片总面积为0.9平方毫米。使用1.2 V直流供电,芯片共消耗18 mA电流。测试结果表明,LNA最小噪声系数为2.3 dB,S(1,1)小于-9 dB,S(2,2)小于-10 dB。最大和最小功率增益分别为28.5 dB和16 dB,共设有4档可变增益,每档幅度为4 dB。同时,输入1 dB压缩点是-10 dBm,输入三阶交调为-2 dBm。     

一种应用于脉冲超宽带接收机的高增益LNA

基于SMIC 0.13 μm CMOS工艺,设计了一种应用于脉冲超宽带无线通信系统接收机的高增益低噪声放大器(LNA)。该LNA工作在6~9 GHz频段,单端输入,差分输出,采用电容交叉耦合与电流复用技术提高了增益,实现了低功耗性能。仿真结果表明,LNA电路工作在7.5 GHz中心频率时,增益高达46 dB,噪声系数为3.05 dB,输入端回波损耗为－12.5 dB,输出端回波损耗为－16.7 dB,在1.2 V电源供电下的核心消耗功耗为16 mW,核心电路面积仅为0.5 mm²。     

采用多级噪声抵消技术的CMOS全差分LNA设计

设计了一种用于2.4GHz RFID单芯片阅读器的CMOS低噪声放大器(LNA)。该设计采用全差分共源共栅结构和新颖的多级噪声抵消技术,不仅减小了电路的噪声而且增加了系统的线性度。芯片采用标准UMC 0.18um CMOS工艺,工作电压为1.2V时,消耗电流小于8mA,后仿真结果表明2.4GHz时,芯片达到1.69dB噪声系数,大于14.25dB功率增益以及-1.1dBm的输入三阶截点(IIP3)。设计满足单芯片阅读器低噪声,低功耗和高线性度的要求。     

一种应用于6-9GHz UWB系统的低噪声CMOS射频前端设计

本文介绍了一种应用于6-9 GHz超宽带系统的全集成差分CMOS射频前端电路设计。在该前端电路中应用了一种电阻负反馈形式的低噪声放大器和IQ两路合并结构的增益可变的折叠式正交混频器。芯片通过TSMC 0.13µm RF CMOS工艺流片,含ESD保护电路。经测试得该前端电路大电压增益为23~26dB,小电压增益为16~19dB;大增益下前端电路平均噪声系数为3.3-4.6dB,小增益下的带内输入三阶交调量(IIP3)为-12.6dBm。在1.2V电压下,消耗的总电流约为17mA。     

一个基于65 nm CMOS工艺具有17.3 dB增益的47-67 GHz宽带低噪声放大器

报道了一个基于65 nm CMOS工艺具有17.3 dB增益的47-67 GHz宽带低噪声放大器（LNA）。文中首先阐述了毫米波电路的特征,并讨论了其设计方法。LNA的宽带输入匹配通过源极电感退化获得,这种结构在低GHz频段为窄带匹配,但由于栅漏电容Cgd的存在,在毫米波频段其进化为宽带匹配。为了使噪声系数（NF）最小化,LNA在第一级使用了共源（CS）结构而不是cascode结构,同时文中也探讨了噪声匹配的原理。LNA的后两级使用cascode结构以提高功率增益。对共栅（CG）晶体管中栅极电感的增益提升效应进行了分析。级间T形匹配网络用来提升电路带宽。所有片上电感和传输线都在3维电磁仿真工具中建模和仿真以确保成功的设计。测试结果显示LNA在60 GHz处取得最高的 17.3 dB增益,同时3-dB带宽为20 GHz（47-67 GHz）,涵盖所需要的59-64 GHz频段,并在62 GHz取得最低的4.9 dB噪声系数。整个LNA从1.2 V电源处吸收19 mA电流,芯片包括焊盘占用面积为900×550 μm2。     

基于移动数字电视应用的宽带可变增益LNA设计

提出了0.13 μm CMOS工艺下可兼容多标准DVB-H/DAB/CMMB的移动数字电视调谐器射频前端双通道LNA设计。在UHF频段和L波段下,设计分别采用片上balun电路、双交叉耦合技术、开关转换电路、伪差分电路等技术以达到LNA宽带匹配、可变增益、低NF及高线性度的指标要求。版图后仿真结果显示:在UHF频段,仿真频率范围为470~860MHz,LNA增益范围为14.7~38.8dB,NF<2.4dB,IIP3=1.979dBm;在L波段,仿真频率范围为1.4~1.8 GHz,LNA增益范围为13~38.5 dB,NF<2.7 dB,IIP3=3.605 dBm。该设计较好地实现了多标准下LNA宽带可变增益性能。     

基于0.18μm CMOS工艺的3.1~10.6GHz超宽带LNA设计

本文基于特许0.18μm CMOS工艺,提出了一种新型的低复杂3.1~10.6GHz超宽带LNA电路,它由两级简单的放大器通过级间电感连接构成。第一级放大器使用电阻电流复用结构和双电感退化技术来达到宽带输入匹配和低噪声性能,第二级放大器使用带电感峰值技术的共源级放大器来同时达到高平坦增益和好的宽带性能。测试结果表明,在3.1~10.6GHz频段内,提出的超宽带LNA的最大功率增益为15.6dB,S12为-45dB,输入输出隔离度小于-10dB,噪声系数NF为2.8~4.7dB,在6GHz时的输入三阶交调点IIP3为-7.1dBm。芯片在1.5V电源电压下,消耗的功率为14.1mW,芯片总面积为0.8mm0.9mm。     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.     

Curved crystal spectrometer for the measurement of X-ray lines from laser-produced plasmas

In order to diagnose the laser-produced plasmas, a focusing curved crystal spectrometer has been developed for measuring the X-ray lines radiated from a laser-produced plasmas. The design is based on the fact that the ray emitted from a source located at one focus of an ellipse will converge on the other focus by the reflection of the elliptical surface. The focal length and the eccentricity of the ellipse are 1350 mm and 0.9586, respectively. The spectrometer can be used to measure the X- ray lines in the wavelength range of 0.2-0.37 nm, and a LiF crystal （200） （2d = 0.4027 nm） is used as dispersive element covering Bragg angle from 30° to 67.5°. The spectrometer was tested on Shengnang- Ⅱ which can deliver laser energy of 60-80 J/pulse and the laser wavelength is 0.35 μm. Photographs of spectra including the 1 s2p ^1P1-1s^2 ^1S0 resonance line（w）, the 1s2p ^3P2-1s^2 1S0 magnetic quadrupole line（x）, the 1s2p ^3P1-1 s^2 ^1S0 intercombination lines（y）, the 1 s2p ^3S~1-1 s^2 ^1S0 forbidden line（z） in helium-like Ti Ⅹ Ⅺ and the 1 s2s2p ^2P3/2-1 s622s ^2S1/2 line（q） in lithium-like Ti Ⅹ Ⅹhave been recorded with a X-ray CCD camera. The experimental result shows that the wavelength resolution（λ/△ 2） is above 1000 and the elliptical crystal spectrometer is suitable for X-ray spectroscopy.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.     

An improved parallel thinning algorithm with two subiterations

The parallel thinning algorithm with two subiterations is improved in this paper. By analyzing the notions of connected components and passes, a conclusion is drawn that the number of passes and the number of eight-connected components are equal. Then the expression of the number of eight-connected components is obtained which replaces the old one in the algorithm. And a reserving condition is proposed by experiments, which alleviates the excess deletion where a diagonal line and a beeline intersect. The experimental results demonstrate that the thinned curve is almost located in the middle of the original curve connectivelv with single pixel width and the processing speed is high.     

Theoretical analysis of the relationship between the Brillouin gain coefficient and the strain in the optical-fiber sensors

The relation between the power of the Brillouin signal and the strain is one of the bases of the distributed fiber sensors of temperature and strain. The coefficient of the Bfillouin gain can be changed by the temperature and the strain that will affect the power of the Brillouin scattering. The relation between the change of the Brillouin gain coefficient and the strain is thought to be linear by many researchers. However, it is not always linear based on the theoretical analysis and numerical simulation. Therefore, errors will be caused if the relation between the change of the Brillouin gain coefficient and the strain is regarded as to be linear approximately for measuring the temperature and the strain. For this reason, the influence of the parameters on the Brillouin gain coefficient is proposed through theoretical analysis and numerical simulation.     

Novel fiber-optical interferometer with miniaturized probe for in-hole measurements

Today, micro-system technology and the development of new MEMS （Micro-Electro-Mechanical Systems） are emerging rapidly. In order for this development to become a success in the long run, measurement systems have to ensure product quality. Most often, MEMS have to be tested by means of functionality or destructive tests. One reason for this is that there are no suitable systems or sensing probes available which can be used for the measurement of quasi inaccessible features like small holes or cavities. We present a measurement system that could be used for these kinds of measurements. The system combines a fiber optical, miniaturized sensing probe with low-coherence interferometry, so that absolute distance measurements with nanometer accuracy are possible.     

Study of waveguide coupling efficiency in hybrid silicon lasers

This paper presents a new method to increase the waveguide coupling efficiency in hybrid silicon lasers. We find that the propagation constant of the InGaAsP emitting layer can be equal to that of the Si resonant layer through improving the design size of the InP waveguide. The coupling power achieves 42% of the total power in the hybrid lasers when the thickness of the bonding layer is 100 nm. Our result is very close to 50% of the total power reported by Intel when the thickness of the thin bonding layer is less than 5 nm. Therefore, our invariable coupling power technique is simpler than Intel＇s.     

Electronic Structure of Semiconductor Nanocrystals

This paper reviews our recent development of the use of the large-scale pseudopotential method to calculate the electronic structure of semiconductor nanocrystals, such as quantum dots and wires, which often contain tens of thousands of atoms. The calculated size-dependent exciton energies and absorption spectra of quantum dots and wires are in good agreement with experiments. We show that the electronic structure of a nanocrystal can be tuned not only by its size,but also by its shape. Finally,we show that defect properties in quantum dots can be significantly different from those in bulk semiconductors.     

Critical Stage Rule-Based Real Time Dispatch（RTD）System in Highly-Mixed-Products （HMP） FAB

An improving utilization and efficiency of critical equipments in semiconductor wafer fabrication facilities are concerned. Semiconductor manufacturing FAB is one of the most complicated and cost sensitive environments. A good dispatching tool will make big difference in equipment utilization and FAB output as a whole. The equipment in this paper is In-Line DUV Scanner. There are many factors impacting utilization and output on this equipment group. In HMP environment one of the issues is changing of reticule in this area and idle counts due to load unbalance between equipments. Here we'll introduce a rule-based RTD system which aiming at decreasing the number of recipe change and idle counts among a group of scanner equipment in a high-mixed-products FAB.