2.45 GHz ECR离子源的微波阻抗匹配

ECR离子源的等离子体阻抗对其微波传输与阻抗匹配设计至关重要。在中国科学院近代物理研究所现有的2.45 GHz ECR 质子源上,对等离子体阻抗进行了测量。首先用水吸收负载代替等离子体负载测量得到了所用微波窗阻抗,然后根据质子源测量数据,推算得到了等离子体阻抗。实验结果表明,脊波导输出端阻抗与后续负载不完全匹配,等离子体阻抗随微波功率变化呈非线性。这些结果为ECR离子源过渡匹配和微波窗的设计提供了参考依据。Plasma impedance of an ECR ion source is important for microwave transmission and impedance matching design. Plasma impedance was measured indirectly with the 2.45 GHz ECR proton source at the Institute of Modern Physics, Chinese Academy of Sciences. In the test, we got microwave window mpedance by using water absorption load instead of plasma load, and the source plasma impedance was derived from the test data with the 2.45 GHz ECR proton source and microwave window impedance. The experimental results show that ridge waveguide output impedance and the subsequent load does not exactly match, plasma impedance variation is nonlinear with microwave power. The achievedresult is useful in the design of ridged waveguide and microwave window.     

强流ECR离子源引出系统研究

为了提高强流ECR 离子源的引出束流品质,分别设计了1# 和2# 引出系统,利用束流引出模拟软件PBGUNS 对1# 和2# 引出系统进行了质子束流引出与传输的模拟计算,结合实际测得的发射度数据分析引出系统,发现2# 引出系统比1# 引出系统引出束流品质高。对ECR 离子源引出系统的电势等位线分布等参数引起的球差进行了简单数学推导及MATLAB 绘图,并结合1# 和2# 引出系统束流相图模拟结果证明了球差会使引出束流品质有效发射度增长,通过适当加大电极孔径可改善束流聚焦情况,得到了束流光学聚焦较好的束流引出系统设计。To improve the quality of extracted ion beam from a high current ECR ion source, 1# and 2# extraction systems were designed and tested. The PBGUNS code was used to simulate the 1# and 2# extraction systems of proton ion beam. The emittance measurement results with the two different extraction systems were compared and analyzed with the simulation, the conclusion that more high quality beam extracted from 2# system than 1# system was got. The formula derivation of ECR ion source extraction system spherical aberration and MATLAB drawing was done by the analyzing on the distribution of extraction field equipotentials, effective emittance increasing caused by spherical berration was proved by 1# and 2# extraction systems beam phase space simulation result, beam focusing would be improved if electrode hole size increasing appropriately and a general concept on good optics focusing of ion beam extraction system was proposed finally.     

ADS强流质子加速器低能传输段发射度匹配研究北大核心CSCD

研制了一套强流质子源及低能传输线(LEBT)注入器用于ADS质子直线加速器。质子源产生35 ke V强流束经过低能传输段聚焦进入射频四极(RFQ)入口。低能传输段不匹配是强流RFQ中引起束流丢失的主要原因。不同加速段的束流匹配是减少束流损失与抑制发射度增长的重要手段。束流损失导致RFQ电极表面受热变形进而引起高频打火,降低RFQ长期运行的稳定性。针对以上问题,研究LEBT发射度在不同的实验条件下如何实现加速器更好的匹配。研究结果表明,LEBT出口束流在35 ke V,10 m A下,束流发射度小于0.2πmm·mrad,当LEBT螺线管电流为210和270 A时,束流在RFQ入口满足匹配条件。     

加速器驱动次临界系统注入器离子源控制系统

强流质子源及低能传输线是加速器驱动次临界系统(ADS)项目注入器的重要组成部分,为了保证其工作效率设计了一种基于实验物理及工业控制系统(EPICS)架构的远程控制系统。根据被控设备硬件接口的特点及控制需求分别采用可编程控制器(PLC)和串口服务器等作为控制部件,在主控机中使用LabVIEW编程实现了对系统内所有设备的监控,并借助于DSC模块把设备状态和参数等以过程变量的形式进行网络发布。设计的控制系统具有结构简单、工作可靠的特点,已经在系统调试中发挥了重要作用。