Low Friction-Coefficient TiBCN Nanocomposite Coatings Prepared by Cathode Arc Plasma Deposition

TiBCN nanocomposite coatings were deposited on cemented carbide and Si（100）by a cathode arc plasma system,in which TiB₂ cathodes were used in mixture gases of N₂ and C₂H₂.X-ray diffraction shows that TiB₂ and Ti₂B₅ peaks enhance at low flow rates of C₂H₂,but they shrink when the flow rate is over 200 seem.An increase of deposition rate was obtained from different TiBCN thicknesses for the same deposition time measured by scanning electron microscopy.Atomic force microscopy shows that the surface roughnesses are ¹0 nm and ²0 nm at C₂H₂ flow rates of 0-100 sccm and of 150-300 sccm,respectively.High resolution transmission electron microscopy and X-ray photoelectron spectroscopy show that the coatings consist of nanocrystal phases Ti₂B₅,TiB₂ and TiN,and amorphous phase carbon and BN.The average crystal sizes embedded in the amorphous matrices are 200 nm and 10 nm at C₂H₂ flow rates of200 sccm and 300 sccm,respectively.In Raman spectra,the D- and G-bands increase with C₂H₂flows at low flow rates,but weaken at high flow rates.The microhardness of the coatings decreases from 28.6 GPa to 20 GPa as the C₂H₂ increases from 0 sccm to 300 sccm,and the ball-on-disk measurement shows a dramatic decrease of the friction coefficient from 0.84 to 0.13.The reason for the reduced hardness and friction coefficient with the change of C₂H₂ flow rates is discussed.     

多弧离子镀制备TiN/TiBN纳米复合涂层的结构和性能

为了满足复合材料高速切削加工的需要,用金属Ti靶和纯TiB2靶作为靶材料,在N2气氛下用多弧离子镀方法制备了TiN/TiBN纳米复合涂层。利用X射线衍射仪(XRD)、X射线光电子能谱仪(XPS)、扫描电子显微镜(SEM)和原子力显微镜(AFM)分析涂层的组织结构、成分和表面形貌;利用显微硬度计、划痕仪和球盘摩擦仪分析调制周期对涂层力学性能的影响。结果表明:TiN/TiBN纳米复合涂层的调制周期范围为5.5~21nm,主要成分为晶相TiN、非晶BN和TiB2;调制周期对涂层的力学性能有较大的影响,随着调制周期的减小,硬度增加,调制周期最小时最大硬度达到29GPa;最大膜基结合力为88N,且所有样品均表现出较高的膜基结合力。随着转速的增大,摩擦因数与表面粗糙度两者表现出相同的变化趋势,摩擦因数最大值为0.31,其低摩擦因数与自润滑的BN相的存在有关。调制周期减少,界面积增加,TiN/TiBN纳米复合涂层的力学性能增强。     

多弧离子镀制备的CrTiAlN涂层的结构和摩擦学性能

用自行设计的多靶阴极电弧离子镀系统在单晶硅和硬质合金衬底上沉积CrTiAlN硬质涂层,用X射线衍射、X射线光电子能谱和扫描电镜系统研究衬底偏压和N2气分压对CrTiAlN涂层结构、形貌和摩擦学性能的影响。结果表明CrTiAlN涂层为面心立方CrN和TiAlN的复合涂层。衬底偏压、N2气分压对涂层的表面形貌、显微硬度和抗磨损性能有较大影响,在氮气分压为5.0 Pa、衬底偏压为-200 V的优化条件下,得到表面光滑的CrTiAlN涂层,涂层硬度为29 GPa,涂层对氮化硅摩擦副的摩擦因数为0.37,沉积速率3.8μm/h。     

离子源辅助中频磁控溅射法在活塞环表面沉积CrN涂层

用热丝弧光放电离子源辅助的中频磁控溅射装置在单晶硅和渗氮钢质活塞环上沉积CrN涂层,并用X射线衍射、原子力显微镜和电子显微镜测量涂层的微结构,用显微硬度计和球盘式摩擦磨损仪测量涂层的硬度和摩擦性能。与常规的中频磁控溅射法相比,采用离子源辅助磁控溅射法制备CrN涂层的沉积速率提高30%以上,达到4.0μm/h。在靶基距为90 mm,氮气分压比为0.14的优化条件下,沉积在活塞环上的CrN涂层结构为CrN(200)取向,涂层厚度达到25μm,硬度高达17.85 GPa,平均摩擦因数为0.48。     

CrAlTiN及CrAlTiSiN纳米多层复合涂层的制备及力学性能

以金属Cr和AlTi合金为靶材料,在沉积过程中引入SiH4气体,用自行设计的多靶阴极电弧离子镀系统在单晶硅和硬质合金衬底上沉积了CrAlTiN和CrAlTiSiN硬质涂层.通过X射线衍射(XRD)和透射电镜(TEM)分析涂层的组织和形貌,结果表明:衬底偏压和反应气体流量对膜层的力学性能有较大影响,在优化条件下得到CrAlTiN涂层的硬度为29 GPa.且CrAlTiSiN涂层为CrSiN和AlTiSiN组成的纳米多层复合涂层,随着SiH4流量的增加,薄膜中的硅含量明显增加,在优化条件下,涂层的显微硬度达到37 GPa,摩擦因数为0.58.刀具涂层检测试验表明,涂覆CrAlTiN涂层的铣刀使用寿命可提高3倍,而CrAlTiSiN涂层较CrAlTiN涂层还会进一步提高刀具使用寿命.     

Structure and Mechanical Properties of CrTiAlN/TiAlN Composite Coatings Deposited by Multi-Arc Ion Plating

CrTiAlN/TiAlN composite coatings were deposited on cemented carbide by using a home-made industrial scale multi-arc ion plating system. The samples were studied by X-ray diffraction, scanning electron microscopy （SEM）, microhardness and ball-on-disk testing. The properties of the CrTiAlN/TiAlN coatings were significantly influenced by the microstructure and the deposition time ratio of TiAlN over CrTiAlN layers. With the increase of deposition time ratio, the microhardness of CrTiAlN/TiAlN increased from 28.6 GPa to 37.5 GPa, much higher than that of CrTiAlN coatings. The friction coefficients of the CrTiAlN/TiAlN coatings were higher than those of CrTiAlN coatings against a cemented carbide ball. The microhardness of the CrTiAlN/TiAlN coatings was changed after annealing at 800 ℃, and the friction coefficients of the annealed coatings were increased against the cemented carbide ball.