Effect of H_2 dilution on the structure and properties of nc-CrC/a-C:H coatings deposited by a hybrid beams system

Nanocomposite Cr C/hydrogenated amorphous carbon(nc-CrC/a-C:H) coatings were deposited by a hybrid beams system comprised of a hollow cathode ion source and a cathodic arc ion-plating unit with varying H_2 flow rates. The influences of H_2 flow rates on the morphologies, microstructures, and properties of the coatings were systematically studied. The morphologies and microstructures of the coatings were characterized by SEM, AFM, XPS, Raman spectroscopy, GIXRD, and HRTEM. The mechanical and tribological properties were measured by a nano-indenter, scratch tester, and ball-ondisk tribometer. The wear tracks were evaluated using 3D profilometer, optical microscope, and EDS analysis. It has been found that a moderate H_2 flow rate can effectively smooth the surface, enlarge the fraction of a sp~3 bond, and improve the properties. The coating exhibits the highest hardness and elastic modulus at the H_2 flow rate of 40 sccm. A superior combination of adhesion strength,friction coefficient, and wear resistance can be achieved at the H_2 flow rate of 80 sccm.     

Investigation of structure and mechanical properties of plasma vapor deposited nanocomposite TiBN films

TiBN coatings have huge potential applications as they have excellent properties with increasing modern industrial requirements.Nanocomposite TiBN coatings were synthesized on cemented carbide,high speed steel and Si substrates by using cathodic arc plasma ion plating from pure TiB_2 ceramic targets.The structure and mechanical properties of the TiBN coatings were significantly influenced by the nitrogen partial pressure.Rutherford backscattering spectrometry demonstrates that the nitrogen content of the coating varied from 2.8%to 34.5%and highresolution electron microscopy images reveal that all coatings have the characteristic of nanocrystals embedded in an amorphous matrix.The root-mean-square roughness of the coatings increases from 3.73 to 14.64 nm and the coefficients of friction of the coatings at room temperature vary from 0.54 to 0.73 with increasing nitrogen partial pressure.The microhardness of the coating increases up to 35.7 GPa at 10 seem N_2 flow rate.The smallest wear rate is2.65×10~(-15)m~3 N~(-1)m~(-1)which indicates that TiBN coatings have excellent wear resistance.The adhesion test revealed that the TiBN coatings have good adhesion at low nitrogen partial pressure.     

Influence of N2 flow rate on structure and properties of TiBCN films prepared by multi-cathodic arc ion plating and studied with ion beam scattering spectroscopy

TiBCN films were deposited on Si(100) and cemented carbide substrates by using multi-cathodic arc ion plating in C_2H_2 and N_2atmosp~here. Their structure and mechanical properties were studied systematically under different N_2 flow rates. The results showed that the Ti BCN films were adhered well to the substrates. Rutherford backscattering sp~ectroscopy was employed to determine the relative concentration of Ti, B, C and N in the films.The chemical bonding states of the films were explored by X-ray photoelectron sp~ectroscopy, revealing the presence of bonds of Ti N, Ti(C,N), BN, pure B, sp~2C–C and sp~3C–C, which changed with the N_2 flow rate. Ti BCN films contain nanocrystals of Ti N/Ti CN and Ti B_2/Ti(B,C)embedded in an amorphous matrix consisting of amorphous BN and carbon at N_2 flow rate of up to 250 sccm.     

Structure and tribological properties of Ti-containing amorphous carbon coatings prepared by cathode arc-enhanced middle-frequency magnetron sputtering

Ti-containing amorphous carbon （Ti-aC） coatings were deposited on cemented carbide and Si substratcs by cathode-arc-enhanced closed field middle-frequency unbalanced magnetron sputtering. The coatings were studied by using atomic force microscopy, Raman scattering, nanoindentation, and pin-on-disk testing. The measurements showed that the hardness of the coatings increased from 12 GPa at a Ti content of 1 at.% to 27 GPa at 31 at.%. The coatings exhibited different friction behaviors when facing different mating materials and changed with increasing Ti content, The coating with 4 at.% Ti exhibited excellent tribological performance with a low friction coefficient of 0.07 when facing the cemented carbide.     

The properties of N-doped diamond-like carbon films prepared by helicon wave plasma chemical vapor deposition

In this paper, N-doped diamond-like carbon(DLC) films were deposited on silicon substrates by using helicon wave plasma chemical vapor deposition(HWP-CVD) with the Ar/CH_4/N_2 mixed gas. The surface morphology, structural and mechanical properties of the N-doped DLC films were investigated in detail by scanning electron microscopy(SEM), x-ray photoelectron spectroscopy(XPS), Raman spectra, and atomic force microscopy(AFM). It can be observed from SEM images that surface morphology of the films become compact and uniform due to the incorporation of N. The maximum of the deposition rate of the films is 143 nm min~(-1), which is related to the high plasma density. The results of XPS show that the N incorporates in the films and the C-C sp~3 bond content increases firstly up to the maximum(20%) at 10 sccm of N_2 flow rate, and then decreases with further increase in the N_2 flow rate. The maximum Young's modulus of the films is obtained by the doping of N and reaches 80 GPa at 10 sccm of N_2 flow rate, which is measured by AFM in the scanning probe microscope mode. Meanwhile, friction characteristic of the N-doped DLC films reaches a minimum value of 0.010.     

Tarnish Testing of Copper-Based Alloys Coated with SiO_2-Like Films by PECVD

The tarnishing test in the presence of hydrogen sulfide（H2S） vapors has been used to investigate the tarnish resistance capability of copper-based alloys coated with Si02-like films by means of plasma-enhanced chemical vapor deposition（PECVD） fed with a tetraethoxysilane/oxygen mixture.The chemical and morphological properties of the films have been characterized by using infrared absorption spectroscopy（IR） and scanning electron microscopy（SEM）with energy disperse spectroscopy（EDS）.The corrosion products of the samples after the tarnishing test have been identified by X-ray diffraction analysis（XRD）.It has been found that SiO2-like films formed via PECVD with a high O2 flow rate could protect copper-based alloys from H2S vapor tarnishing.The alloys coated at the O2 flow rate of 20 sccm remain uncorroded after 54days of H2S vapor tarnish testing.The corrosion products for the alloys deposited at a low O2flow rate after 54 days of tarnish testing are mainly composed of brochantite.     

CrN films deposited by ion source-assisted magnetron sputtering

CrN coatings were deposited on Si(100) and piston rings by ion source assisted 40 kHz magnetron sputtering.Structure and composition of the coatings were characterized by X-ray diffraction,atomic force microscopy,scanning electron microscopy and transmission electron microscopy.Mechanical and tribological properties were assessed by microhardness and pin-on-disc testing.The ion source-assisted system has a deposition rate of 3.88 μm/h,against 2.2 μm/h without ion-source assistance.The CrN coatings prepared with ion source assistance exhibited an increase in microhardness(up to 16.3 GPa) and decrease in friction coefficient(down to 0.48) at the optimized cathode source-to-substrate distance.Under optimized conditions,CrN coatings were deposited on piston rings,with a thickness of 25 μm and hardness of 17.85 GPa.     

Conversion of coalbed methane surrogate into hydrogen and graphene sheets using rotating gliding arc plasma

The use of atmospheric rotating gliding arc(RGA) plasma is proposed as a facile, scalable and catalyst-free approach to synthesizing hydrogen(H_2) and graphene sheets from coalbed methane(CBM). CH_4 is used as a CBM surrogate. Based on a previous investigation of discharge properties, product distribution and energy efficiency, the operating parameters such as CH_4 concentration, applied voltage and gas flow rate can effectively affect the CH_4 conversion rate,the selectivity of H_2 and the properties of solid generated carbon. Nevertheless, the basic properties of RGA plasma and its role in CH_4 conversion are scarcely mentioned. In the present work, a 3D RGA model, with a detailed nonequilibrium CH_4/Ar plasma chemistry, is developed to validate the previous experiments on CBM conversion, aiming in particular at the distribution of H_2 and other gas products. Our results demonstrate that the dynamics of RGA is derived from the joint effects of electron convection, electron migration and electron diffusion, and is prominently determined by the variation of the gas flow rate and applied voltage. Subsequently,a combined experimental and chemical kinetical simulation is performed to analyze the selectivity of gas products in an RGA reaction, taking into consideration the formation and loss pathways of crucial targeted substances(such as CH_4, C_2H_2, H_2 and H radicals) and corresponding contribution rates. Additionally, the effects of operating conditions on the properties of solid products are investigated by scanning electron microscopy(SEM) and Raman spectroscopy. The results show that increasing the applied voltage and decreasing CH_4 concentration will change the solid carbon from its initial spherical structure into folded multilayer graphene sheets, while the size of the graphene sheets is slightly affected by the change in gas flow rate.     

OES diagnostic of radicals in 33MHz radio-frequency Ar/C_2H_5OH atmospheric pressure plasma jet

Ar/C_2H_5OH plasma jet is generated at atmospheric pressure by 33 MHz radio-frequency power source. This RF excitation frequencies which are higher than 13.56 MHz had rarely been used in atmospheric pressure plasma. The plasma characteristics of ethanol are investigated. The introduction of ethanol leads to the generation of four excited carbonaceous species C, CN, CH and C_2 in plasma, respectively. Optical emission intensities of four carbonaceous species were strengthened with ethanol content increasing in the range of 0-4600 ppm. The ethanol content increase results in all the Ar spectra lines decrease. The reason is that the electron temperature decreases when ethanol content is high. The emission intensity ratios of C/C_2, CN/C_2 and CH/C_2 decrease with the increase of ethanol content, showing that the relative amount of C_2 is increasing by increasing the ethanol flow. The emission intensity ratios of excited species did not change much with the increase of RF power in stable discharge mode.     

Study on the Hydrogenated Diamond-Like Carbon Films Synthesized by RF-PECVD from n-decane

Using a mixture of n-decane and hydrogen, diamond-like carbon thin films (DLCTFs) with high growth rate of 35?nm/min are deposited by radio frequency plasma enhanced chemical vapor deposition. We show that n-decane can be considered as a promising carbon source in DLCTF deposition. The properties of the deposited films such as structure, hydrogen content, deposition rate and refractive index are studied for 20, 50 and 100?sccm hydrogen flow rates (HFRs). It is shown that the deposition rate has a maximum of 35?nm/min for HFR?=?20?sccm and by increasing hydrogen concentration, deposition rate drops to 19?nm/min for HFR?=?100?sccm. The Raman spectra reveal that the films represent hydrogenated diamond-like carbon features. The photoluminescence background of the Raman spectra is used as a measure for hydrogen content of the films. The hydrogen content varies from 29 to 46% which yields a various amount of sp³ fraction. The results of the spectroscopic ellipsometry indicate that by increasing HFR, refractive index decreases from 2.1 to 1.9 at 632?nm. The aforementioned trends are attributed to the increase of hydrogen content in DLCTFs which is in very good agreement with enhancing of the photoluminescence background of the Raman spectra.     

低质量氦基混合气及其在小单元漂移室中应用的模拟研究

用Garfield、Magboltz和Heed程序包对4种氦基混合气：He／CH4(60／40)、He／C2H6(50／50)、He／C3H8(60／40)和He／iC4H10(80／20)的主要性能(包括电子漂移速度、电子扩散和洛伦兹角)以及小单元漂移室在上述4种混合气中的漂移性能进行了模拟研究。同时比较了两种不同尺寸小单元结构在He／C3H8(60／40)下的性能。     

低能14N+1离子微剂量学研究

叙述了用圆柱型流气式组织等效正比计数器测定用Ｋ－２００ＫＶ低能重离子加速器加速的能量为６６－１１９ｋｅＶ的＾１４Ｎ＋１离子穿过４μｍ厚的ＰＥＴ薄膜后的微剂量谱、径向剂量分布等微剂量学参数。     

Microstructure and Nano-Hardness of 10 MeV Cl-Ion Irradiated T91 Steel

Hardening and elemental segregation of T91 martenstic steel irradiated by 10 MeV Cl ions to doses from 0.06 dpa to 0.83 dpa were investigated with the nanoindentation technique and transmission electron microscopy(TEM).The results demonstrated that the irradiation hardening was closely related with irradiation dose.By increasing the dose,the hardness increased rapidly at first from the initial value of 3.15 GPa before irradiation,and then tended to saturate at a value of 3.58 GPa at the highest dose of 0.83 dpa.Combined with TEM observation,the mechanism of hardening was preliminary attributed to the formation of M(Fe,Cr)_(23)C_6 carbides induced by the high energy Cl-ion irradiation.     

硅中注入BF^＋2辐射损伤的反常行为

借助离子束背散射和沟道技术结合透射电子显微镜分析，研究了在３００Ｋ和７７Ｋ下硅中注入ＢＦ＾＋２辐射损的反常行国。结果发现ＢＦ＾＋２注入在硅中产生的损伤层或无定形层情况区别于其它较重离子注入。在３００Ｋ下注入时，硅中引入的两个损伤峰，其中一个位于离子入射的平均投影射程附近，另一个则在近表面，在７７Ｋ下注入时，硅中引入的损伤层或无定形层首先出现在表面，随注入剂量的增加，地锭形层向硅体内延伸。     

氢气流量对类金刚石薄膜结构与性能的影响

采用直流/射频耦合反应磁控溅射法在Si（100）衬底上成功制备出类金刚石（DLC）薄膜。利用表面轮廓仪、Raman光谱仪、X射线光电子能谱仪表征所制备薄膜在不同氢气流量下的沉积速率和化学结构,讨论了氢气流量对薄膜沉积速率和化学结构的影响;利用纳米压痕技术及曲率弯曲法表征薄膜的力学性能;利用扫描电镜和原子力显微镜表征薄膜的表面形貌与粗糙度。研究表明：随着氢气流量的增加,所制备薄膜的沉积速率逐渐减小,而薄膜中sp³键的含量逐渐增大。当氢气流量为25 mL/min时,薄膜中sp³键的含量为36.3%,薄膜的硬度和体弹性模量分别达到最大值17.5 GPa和137 GPa。同时,所制备薄膜的内应力均低于0.5 GPa,有望成功制备出低内应力的高质量DLC厚膜。随着氢气流量的增加,DLC薄膜的表面变得更致密光滑,且表面均方根粗糙度由5.40 nm降为1.46 nm。     

C离子辐照对核级石墨硬度和杨氏模量影响研究

为了探明离子辐照剂量和辐照温度对核级石墨硬度、杨氏模量及微观组织的影响,采用0.02 dpa、0.2 dpa和2 dpa剂量的C4+分别在室温和180℃下辐照核级石墨,利用纳米压痕仪和透射电镜对不同离子辐照条件下核级石墨的性能和微观组织进行研究。结果表明：室温辐照时,硬度和杨氏模量均随着辐照剂量的增加而增加,辐照剂量为2 dpa时,硬度与杨氏模量的峰值分别由未辐照时的0.51 GPa与15.52 GPa急剧增加到2.51 GPa与37.73 GPa。180℃辐照剂量为0、0.02、0.2 dpa时,硬度和杨氏模量也随着辐照剂量的增加而增加,均高于室温辐照相同辐照剂量下硬度和杨氏模量的峰值。当辐照剂量达到2 dpa时,硬度与杨氏模量的峰值从0.2 dpa的1.72 GPa和31.53 GPa迅速降为1.32 GPa和25.91 GPa。石墨硬度和杨氏模量的增加是由于辐照导致石墨内部的微裂纹闭合和基体缺陷增加造成的,180℃辐照2 dpa后硬度和杨氏模量的急剧降低是由于辐照导致石墨发生了非晶化导致的。     

Growth and surface morphology of ion-beam sputtered Ti-Ni thin films

Titanium-nickel thin films have been deposited on float glass substrates by ion beam sputtering in 100% pure argon atmosphere. Sputtering is predominant at energy region of incident ions, 1000 eV to 100 keV. The as-deposited films were investigated by X-ray photoelectron spectroscopy (XPS) and atomic force microscope (AFM). In this paper we attempted to study the surface morphology and elemental composition through AFM and XPS, respectively. Core level as well as valence band spectra of ion-beam sputtered Ti-Ni thin films at various Ar gas rates (5, 7 and 12 sccm) show that the thin film deposited at 3 sccm possess two distinct peaks at binding energies 458.55 eV and 464.36 eV mainly due to TiO₂. Upon increasing Ar rate oxidation of Ti-Ni is reduced and the Ti-2p peaks begin approaching those of pure elemental Ti. Here Ti-2p peaks are observed at binding energy positions of 454.7 eV and 460.5 eV. AFM results show that the average grain size and roughness decrease, upon increasing Ar gas rate, from 2.90 μm to 0.096 μm and from 16.285 nm to 1.169 nm, respectively.     

Characteristics of Single Cathode Cascaded Bias Voltage Arc Plasma

A single cathode with a cascaded bias voltage arc plasma source has been developed with a new quartz cathode chamber,instead of the previous copper chambers,to provide better diagnostic observation and access to the plasma optical emission.The cathode chamber cooling scheme is also modified to be naturally cooled only by light emission without cooling water to improve the optical thin performance in the optical path.A single-parameter physical model has been developed to describe the power dissipated in the cascaded bias voltage arc discharge argon plasmas,which have been investigated by utilizing optical emission spectroscopy(OES) and Langmuir probe.In the experiments,discharge currents from 50 A to 100 A,argon flow rates from 800 sccm to 2000 sccm and magnetic fields of 0.1 T and 0.2 T were chosen.The results show:(a) the relationship between the averaged resistivity and the averaged current density exhibits an empirical scaling law as η∝ j~(-0.63369) and the power dissipated in the arc has a strong relation with the filling factor;(b) through the quartz,the argon ions optical emission lines have been easily observed and are dominating with wavelengths between 340 nm and 520 nm,which are the emissions of Ar~+-434.81 nm and Ar~+-442.60 nm line,and theintensities are increasing with the arc current and decreasing with the inlet argon flow rate;and(c) the electron density and temperature can reach 2.0 × 10~(19) m~(-3) and 0.48 eV,respectively,under the conditions of an arc current of 90 A and a magnetic field of 0.2 T.The half-width of the n_e radial profile is approximatively equal to a few Larmor radii of electrons and can be regarded as the diameter of the plasma jet in the experiments.     

正子素形成几率与云团反应机理

本文对e~+云团中反应的机制及其对正子素形成几率的影响作了进一步的研究。提出了激发分子也有可能对Ps形成作出贡献的观点,并提供了描述三重态正子素(O-Ps)形成几率(I_3)并能反映激发能转移方向的理论近似式。通过对含弱电子清除剂的二元分子介质中I_3值的分析,提出了“共振复合反应”机理。在此基础上解释了弱电子清除作为添加剂对分子介质中I_3值的影响。     

紫外光氧化法制备水溶性富勒醇

富勒烯因其特殊的结构在生物学中具有潜在的重要应用价值,而其不溶于水阻碍了其在相关领域的进一步应用。制备水溶性的富勒烯衍生物的方法被证实是一种可行的途径。本文采用波长为254nm的紫外光作为照射源,通过照射水溶液中的H2O2使其分解产生·OH自由基,并与富勒烯分子发生加成反应,成功制备了富勒醇。对制备的富勒醇进行了纯化、分析和表征。实验结果表明,合成的富勒醇分子结构式为C60(OH)26。紫外光氧化法制备水溶性富勒醇是一种简单可行的新方法,为由富勒烯制备富勒醇提供了新的借鉴。