工艺条件对化学镀Ni-Co-P合金的影响

采用硼酸为缓冲剂 ,柠檬酸钠为络合剂化学镀Ni Co P合金。考察了镀液pH值、钴离子浓度和温度对化学镀Ni Co P沉积速度的影响 ;研究了钴离子浓度对镀层组成的影响 ,获得了化学镀Ni Co P合金的最佳工艺条件为 :镀液pH值为 7.0 ,操作温度 90℃ ,CoSO4 ·7H2 O浓度为 11g/L。此工艺下镀液稳定性好 ,镀层沉积速度快 ;所得镀层为非晶结构。     

化学镀Ni-Fe-P合金镀液组分及pH值对镀层性能的影响

目前,对化学镀Ni-Fe-P合金镀液影响镀层形成及其阴极极化曲线的研究较少。在纯铜片表面化学镀Ni-Fe-P合金;采用扫描电镜观察了镀层的形貌,采用能谱仪测试了镀层成分,采用X射线衍射仪分析镀层的结构,采用电化学工作站测试镀层在镀液中的阴极极化曲线;通过单因素法考察了镀液组分含量及pH值对化学镀Ni-Fe-P合金沉积速率、镀层成分、形貌、结构及阴极极化曲线的影响。结果表明:镀液各组分含量及pH值对镀层性能有较大影响;最佳工艺条件为20 g/L硫酸镍,12 g/L硫酸亚铁,30 g/L次磷酸钠,40 g/L柠檬酸三钠,20 g/L硫酸铵,20 mL/L乳酸,pH值9.0,镀液温度80℃,时间1 h;此条件下所得Ni-Fe-P合金镀层以非晶态形式存在,其耐蚀性能明显优于相同工艺条件制备的Ni-P镀层。     

玻璃纤维化学镀Co-P合金工艺研究

为了提高导电玻璃纤维的电、磁性能,拓宽其应用领域,采用化学镀的方法,研究了在玻璃纤维表面镀Co-P合金的工艺,探讨了化学镀液的主盐、温度、pH值及施镀时间等工艺参数对化学镀Co-P合金成分及镀速的影响.本工艺的最佳配方为:18 g/L CoSO4,18 g/L NaH2PO2*H2O,45 g/L柠檬酸钠,29 g/L (NH4)2SO4;最佳参数:温度为90 ℃,pH值为9,施镀时间为50 min.在此工艺条件下镀液的稳定性较好,镀层沉积速度快、光亮、致密,所得镀层为非晶结构.     

化学镀可焊性Sn-Pb合金的工艺研究

Sn-Pb合金镀层防腐蚀性好,熔点低,钎焊性好,在工业上应用很广。含Sn10％～40％的Sn-Pb合金镀层多用于电子元器件引线以提高其可焊性。工业生产常采用电镀工艺,对化学镀工艺研究较少。为此,介绍了一种烷基磺酸盐体系化学镀可焊性Sn-Pb合金(Sn：Pb为9：1左右)新工艺,系统研究了络合剂、还原剂、添加剂、时间、温度等因素对化学镀Sn-Pb合金沉积速率及镀层合金成分的影响。该化学镀液稳定性好、沉积速率可达到4．2μm／10min,镀层为银白色无光合金镀层,可焊性优良;当镀液中不添加Pb^2 时,该工艺也可用于化学镀Sn.     

Fe-Ni-B合金的化学镀和磁性能

以硼氢化钾为还原剂,柠檬酸钠和酒石酸钾钠为络合剂的镀液中化学镀制备Fe-Ni-B合金.研究了沉积条件对沉积速率、镀层组成和磁性能的影响.结果表明,镀层的磁性能随着镀层中铁含量的增加而升高,并获得了具有良好稳定性的镀液体系和相对含铁量高的镀层.     

稳定剂对线路板化学镀钯的影响

为提高线路板上化学镀钯的稳定性,通过镀液稳定性测试、膜厚测试以及扫描电镜(SEM)、能谱(EDS)分析和X射线光电子能谱(XPS)分析等手段研究了稳定剂对镀液稳定性、镀速、镀层形貌以及镀金后镍腐蚀的影响.结果 表明:丙烯酸浓度在0.050～0.300 mol/L范围内,随着浓度的增加,化学镀钯沉积速率总体上呈下降趋势;无机盐C浓度在1.000～7.000 mg/L能够大幅提高镀液稳定性,随含量的提高沉积速率呈现下降趋势.以丙烯酸浓度0.300 mg/L和无机盐浓度1.000 mg/L进行复配时,镀液稳定性强,沉积速率稳定,得到的钯镀层均匀细致,能够有效抑制镀金时产生镍腐蚀.     

Ni-Cu-P化学镀工艺及组织结构的研究

研究了Ni-Cu-P化学镀液主要成分、PH值、温度以及时间等工艺参数对化学沉积Ni-Cu-P合金镀层成分及镀速的影响。通过选择适当的镀液成分及工艺参数,得到了Cu含量从0到56．18wt%的Ni-Cu-P合金镀层。利用EDS和XRD研究了镀液中硫酸铜浓度对Ni-Cu-P合金镀层组织结构的影响。在硫酸铜浓度低于3g/L时,Ni-Cu-P合金镀层中P含量高于7．05wt%,合金镀层是非晶态结构。     

工艺条件对聚苯胺粉体Ni-Co-P合金镀层的影响

利用化学镀工艺对聚苯胺粉体表面进行金属化改性,使其在雷达波吸收方面具有电损耗的同时兼具磁损耗性能.通过实验获得一组较好的化学镀Ni-Co-P配方,在此基础上讨论主盐浓度、主盐浓度比、镀覆时间等控制对镀层沉积速度的影响因素,研究了镀覆时间对镀层组分的影响.获得了化学镀Ni-Co-P合金的最佳工艺条件为:pH=9、温度85℃、硫酸镍质量浓度18g/L、硫酸钴质量浓度9g/L,此时镀液稳定,沉积速度快.     

多壁碳纳米管表面的钴-铁化学镀(英文)

采用化学镀法在多壁碳纳米管表面沉积钴-铁涂层。主要研究了镀液中钴盐和铁盐的摩尔比、络合剂浓度和镀液温度对镀层的影响。在钴-铁的摩尔比为9∶1,络合剂浓度为0.32mol/L,镀液温度为60℃时,可得到的较为平整的镀层,且镀层中钴-铁摩尔之和达90%以上。其他条件下,则会在镀层中出现金属颗粒或钴-铁含量过少的情况。     

化学镀Ni-Co-W-P合金镀层性能研究

为改善化学镀Ni-Co-W-P合金工艺镀速慢、镀层耐腐蚀性能差、析氢过电位高等问题,研究了镀液组分、pH值、温度、转速、表面.活性剂对45钢上化学镀Ni-Co-W-P合金镀层沉积速度、耐腐蚀性能、镀层厚度、孔蚀率、表面形貌和硬度的影响,得出最佳镀液配方:6 g/L CoSO4,24g/L NiSO4,20 g/L NaH2PO2,20g/L Na2WO4·2H2O,20 g/L(NH4)2S04,24 g/L Na3C6H5O7,11g/L苹果酸,pH值7.0～7.5,温度80℃,搅拌速度30 r/min.结果表明,当pH为7.0～7.5时,沉积速度最大,孔蚀率最少;温度为80℃时,镀层综合性能好,超过80℃时,镀液的稳定性开始下降;转速为30 r/min时,合金镀层的沉积速度达到最大值;加入50 mg/L表面活性荆十二烷基磺酸钠的Ni-Co-W-P合金镀层试样的腐蚀电位(0.191 V)大于未加入十二烷基磺酸钠表面活性荆(0.040 8V)的.     

Influence of Sb ions on photoconductive properties of chemically deposited PbS films

PbS films were obtained on glass substrates using the chemical bath deposition (CBD) method. The infra red (IR) photosensitivity increases of about 1000 times when a reducing agent (hydroxylamine hydrochloride NH₂OHHCl) is added in the deposition bath. A further enhancement was tried by adding small amounts of antimony chloride (SbCl₃) solution in the deposition bath. The result was just opposite. It was found that the photosensitivity decreases with increasing the Sb salt content. The changes in PbS photoconductive properties are correlated with the changes in film morphology due to the two compounds added in the bath — the reducing agent and the Sb salt.     

枪黑色Ni-Sn合金镀液的稳定性及金属杂质的影响

测定了以羟基羧酸盐作配体的电镀枪黑色Ni-Sn合金的碱性溶液各组分的自然消耗和生产性消耗,确定了镀液中能够抑制Sn^2 氧化的稳定剂,制定了清除镀液中Zn^2 、Fe^2 和Cu^2 等金属杂质的电解方法。结果表明,亚锡盐的自然消耗是引起镀液自然静置时不稳定的唯一因素,镀液生产性消耗,亚锡盐下降率最大,镍盐最小;以小电流电解可除Zn^2 、Fe^2 和Cu^2 杂质。     

羧酸盐-尿素体系脉冲电沉积纳米晶铬镀层的工艺优化

六价铬电沉积工艺毒性高、污染大,三价铬电沉积工艺低毒、低污染,应用前景广阔.运用正交设计法优化了镀铬液配方,确定了其工艺参数,研究了影响脉冲电沉积纳米铬镀层质量的主要工艺因素,分析了镀液组成对铬镀层厚度和电流效率的影响,得到了羧酸盐-尿素体系脉冲电沉积纳米晶铬镀层的最佳工艺.结果表明:影响镀层厚度的主次因素分别是配位剂A(柠檬酸钠)、配位剂B(碳原子数不少于8的一元羧酸盐)和CrCl3˙6H2O的浓度;影响电流效率的主次因素分别是配位剂A、CO(NH2)2和配位剂B的浓度.扫描电镜观察和电子能谱分析结果表明,铬镀层晶粒尺寸小于100nm,厚度均匀,表面光滑,结晶细致.该工艺能制备厚度为11.2um的铬镀层,其电流效率高达25.32%.     

Anisotropic strain on phonons in a-plane GaN layers studied by Raman scattering

The requirement for integration into silicon IC circuitry working at GHz frequencies drives the research into new development of both materials and processes. The formation of electroless Co–Fe–B coatings was investigated on pure copper and 304 stainless steel substrates which were pretreated in a bath containing EDTA (20 g l⁻¹), ethylene diamine (30 g l⁻¹), PdCl₂ (10 g l⁻¹) and NaHPO₂ (4 g l⁻¹). Electroless deposition was performed at 348 K, for 2 h, in a bath that contained sodium tartrate (0.2 M) and sodium citrate (0.05 M) as complexing agents and the bath pH was adjusted between 6.5 and 9.5 using a concentrated solution of sodium hydroxide. The main components of the bath were a source of cobalt (II) ions, a source of iron (II) ions, DMAB as reducing agent and boron source, ammonium sulfate as buffering agent, phosphorous acid as a slow-rate reducing agent, a stabilizer, and an accelerator. Co–Fe–B films having a variety of composition with respect to cobalt, iron, and boron contents were produced by varying the experimental parameters such as pH and the concentration of bath components. The coatings were characterized in terms of composition, structure and corrosion resistance by ICP and EDS, XRD and SEM, and by electrochemical instrumentation, respectively. The magnetic properties of the electroless Co–Fe–B ternary alloy deposits were measured by a DC extraction method. The results indicate that tight control of process parameters enables the tailoring of coercivity and magnetic permeability of the films, and may lead to the microfabrication of innovative and efficient devices having nanofeatures such as nanowires.     

纳米螺旋碳纤维表面化学镀Ni-Co-B涂层研究

利用铁片试样研究以二甲基胺硼烷为还原剂的化学镀Ni-Co-B合金涂层的工艺,考察了还原剂、金属盐浓度之比、pH值对化学镀反应沉积速率的影响.利用优化的工艺配方在经过敏化、活化处理后的纳米螺旋碳纤维表面沉积Ni-Co-B合金涂层.采用等离子发射光谱仪(ICP)分析涂层成分,利用扫描电子显微镜(SEM)观察涂层形貌,利用振动样品磁强计测试涂层磁学性能(VSM).结果表明:在纳米螺旋碳纤维表面获得了连续、均匀的Ni-Co-B合金涂层,材料磁性明显改善.     

Bath temperature impact on morphological evolution of Ni(OH)2 thin films and their supercapacitive behaviour

Nanostructured Ni(OH)₂ thin films were deposited over stainless steel (SS) and glass substrate via simple chemical bath deposition (CBD) method. NiCl₂:6H₂O were used as source of nickel and aqueous ammonia as a complexing agent. The coating process of Ni(OH)₂ material over substrate is based on the decomposition of ammonia complexed nickel ions at two different bath temperatures. The changes in structural, morphological and electrochemical properties are examined as an impact of bath temperature. XRD studies reveal formation of mixed phase of α and β at lower bath temperature (313 K) while, pure β phase of Ni(OH)₂ thin films deposited was observed at higher bath temperature (353 K). The morphological evolution from honeycomb structure to vertically aligned flakes over the substrate is observed as the influence of bath temperature. The supercapacitive performance based on the morphology examined by using cyclic voltammetric measurements in 1 M KOH. The maximum specific capacitances of 610 and 460 F/g were observed for the vertical flake and honeycomb structured Ni(OH)₂ thin films, respectively.     

Sb-Fe合金的电沉积及其结构与磁性能

以柠檬酸为络合剂、硼酸为缓冲剂的酸性镀液中电沉积Sb-Fe合金,循环伏安实验显示在镀液pH值为3.2时合金的起始共沉积电位约-0.855V(vs·SCE)。借助扫描电镜(SEM)、能谱分析(EDS)、X射线衍射(XRD)和振动样品磁强计(VSM)研究了沉积条件对Sb-Fe镀层结构和磁性能的影响。结果表明,在镀液pH值为3.2时,随着阴极电流密度从20mA·cm-2增加到40mA·cm-2,镀层中铁含量从2at%增加到24at%;当阴极电流密度大于40mA·cm-2,镀层中铁含量又下降。Sb-Fe镀层含有Sb-Fe固溶体(R-3m)相以及少量的铁(Im3m)相。随着Sb-Fe镀层中铁含量的增加,镀膜的矫顽力减少而饱和磁化强度则增加。镀膜的矫顽力在1.2～1.7kA·m-1范围,属软磁材料。     

用光度法测定镀铬溶液中的镍杂质

镀铬溶液中的镍杂质影响镀液的性能,作者制定了镍杂质的分析方法.在碱性和过硫酸铵存在的条件下,镍离子与丁二酮肟生成水红色配合物,利用这一特性,以丁二酮肟光度法测定镀铬溶液中镍杂质的含量,以不加显色剂的试样作参比液,用3 cm比色皿,在波长510 nm处测定.结果表明,镀液中其他各种离子对测定无干扰.本方法对8个试样测定值的平均偏差为1.4 mg/L,对3个试样测定值的回收率分别为98.3%,98.7%和100.2%.本方法简单、快速而准确,能够满足对镀铬溶液中镍杂质监控的要求.     

铍基体快速化学镀Ni-P合金工艺研究

针对铍的特点,选用了化学镀镍技术对其进行处理.介绍了一种以稀土金属Ce和有机酸钠盐作为复合添加剂,沉积速度较快的化学镀Ni-P合金的工艺.研究了复合添加剂浓度、配位剂浓度等因素对镀速和镀层的性能的影响,检测了镀层的耐磨性、耐蚀性、结合力等性能.结果表明,所确定的镀液性能稳定,沉积速度较快,在该工艺条件下能在铍表面获得细致、均匀、结合力和耐蚀性能良好的镍-磷合金镀层.     

Tribological characteristics of electroless Ni–B coating and optimization of coating parameters using Taguchi based grey relational analysis

Electroless nickel coating is an autocatalytic coating whose characteristics are very much dependent on the composition of electroless bath. The present study is an attempt to minimize the friction and wear characteristics of electroless Ni–B coatings simultaneously by optimizing the three coating parameters viz. bath temperature, concentration of reducing agent and concentration of nickel source together with the annealing temperature. Taguchi based grey relational analysis is employed for the optimization of this multiple response problem using an L₂₇ orthogonal array. Analysis of variance reveals that concentration of reducing agent has the maximum contribution in controlling the friction and wear behaviour of Ni–B coating. The interaction between bath temperature and nickel source concentration is also found to possess significant contribution in controlling the friction and wear characteristics. The surface morphology, composition and phase structure analysis are done with the help of scanning electron microscopy (SEM), energy dispersive X-ray analysis (EDX) and X-ray diffraction analysis (XRD), respectively. Moreover the wear mechanism is studied and found to be in general abrasive in nature.