基底晶态对HfO_2薄膜晶向结构和力学特性的影响

用电子束蒸发技术在晶体及激光陶瓷两种基底上沉积了氧化铪(HfO_2)单层膜,采用掠角X射线衍射(GIXRD)技术和纳米划痕仪对薄膜的晶向结构和力学特性进行了研究。实验结果表明,HfO_2薄膜在单晶晶体和多晶陶瓷基底上均呈现多晶态结构,均呈(020)面择优生长,陶瓷基底上薄膜的择优取向更明显。膜基结合较差的晶体-HfO_2体系上薄膜的衍射峰较多,膜基结合较好的陶瓷-HfO_2体系上薄膜的衍射峰较少。对比两个基底和其上薄膜的X射线衍射(XRD)结果发现,晶体基底的单晶结构与其上薄膜的多晶结构晶态差异较大,导致其膜基间有较大的残余应力,所以其膜基结合力也较差,这种弱结合力导致基底对薄膜的束缚作用较小,其上薄膜具有更多的衍射峰;陶瓷基底的多晶结构与其上薄膜的多晶结构差异较小,导致其上薄膜的择优生长更强,更有效地消除了残余应力,所以陶瓷-HfO_2体系的膜基结合力较晶体-HfO_2体系好,这种较强的结合力限制了薄膜向更多HfO_2晶向的发展,其上薄膜衍射峰较少。     

MOCVD生长的GaN:Mg外延膜的光电性质

用MOCVD技术生长GaN:Mg外延膜,在550～950℃温度范围内,对样品进行热退火,并进行室温Hall、光致发光谱(PL)测试.Hall测试结果表明,850℃退火后空穴浓度达到8×1017 cm-3以上,电阻率降到0.8Ω·cm以下.室温PL谱有两个缺陷相关发光峰,位于2.8eV的蓝光峰(BL)以及3.27eV附近的紫外峰(UVL).蓝光峰对紫外峰的相对强度(BL/UVL)在550℃退火后升高,之后随着退火温度的升高(650～850℃)而下降,继续提高退火温度至950℃,BL/UVL急剧上升.空穴浓度先随着Mg掺杂浓度的增加而升高;但继续增加Mg掺杂浓度,空穴浓度反而下降.这些结果表明要实现空穴浓度达1018 cm-3,不仅要考虑H的钝化作用,还要考虑Mg受主的自补偿效应.     

MOCVD生长的GaN:Mg外延膜的光电性质

用MOCVD技术生长GaN:Mg外延膜,在550～950℃温度范围内,对样品进行热退火,并进行室温Hall、光致发光谱(PL)测试.Hall测试结果表明,850℃退火后空穴浓度达到8×1017 cm-3以上,电阻率降到0.8Ω·cm以下.室温PL谱有两个缺陷相关发光峰,位于2.8eV的蓝光峰(BL)以及3.27eV附近的紫外峰(UVL).蓝光峰对紫外峰的相对强度(BL/UVL)在550℃退火后升高,之后随着退火温度的升高(650～850℃)而下降,继续提高退火温度至950℃,BL/UVL急剧上升.空穴浓度先随着Mg掺杂浓度的增加而升高;但继续增加Mg掺杂浓度,空穴浓度反而下降.这些结果表明要实现空穴浓度达1018 cm-3,不仅要考虑H的钝化作用,还要考虑Mg受主的自补偿效应.     

磁控溅射不同厚度铝薄膜的微结构及其表面形貌

用直流磁控溅射法在室温的Si(100)基底上制备了21～55 nm范围内不同厚度的铝膜,并用X射线衍射和扫描电镜对薄膜的结构和表面形貌进行了表征.分析结果表明:制备的铝薄膜呈多晶状态,晶粒择优取向为(111),随着膜厚的增加,Al(100)衍射峰宽变窄,薄膜的平均晶粒尺寸逐渐增大,晶面间距逐渐减小,薄膜中的残余应力减小.膜厚为55 nm时,Al膜均匀致密.     

热处理温度对掺钕钇铝石榴石陶瓷析晶的影响

采用氧化钕、氧化钇、硝酸铝、氨水以及柠檬酸作为原材料,以低温燃烧法(LCS)制备出纳米粉末材料。该方法解决了固相反应的高温合成及化学沉淀法的粉体团聚问题。通过热重-差热(TG-DTA)、X-射线粉末衍射(XRD)、傅里叶红外透射(FT-IR)和透射电镜(TEM)测试手段研究粉末的特性,采用谢莱方程(Scherrer)根据YAG(420)晶面的衍射曲线半峰宽数据计算出晶粒尺寸,详细研究陶瓷材料在不同热处理条件下的析晶情况。研究结果表明：YAG相的形成温度为850℃,在热处理过程中出现YAP中间相,于1050℃转变成纯YAG相,颗粒在不同的热处理条件下呈现不同的尺寸,在20～50nm范围变化。随着热处理温度的升高,平均晶粒尺寸增加,晶粒尺寸的标准偏差保持在2．0左右,晶格参数逐渐减小。晶粒主要以晶界扩散形式进行生长,晶格参数膨胀是由晶粒表面的排斥偶极距所造成的。     

射频磁控溅射法低温沉积MnZn铁氧体薄膜

采用磁控溅射法在Si(100)、Si(111)和玻璃基片上原位沉积MnZn铁氧体薄膜,用X线衍射(XRD)仪、场发射扫描电子显微镜(FESEM)表征薄膜的物相结构与微观形貌,用振动样品磁强计(VSM)测试薄膜的磁性能.结果表明,在Si(100)基片上原位沉积的MnZn铁氧体薄膜,在较低的基片加热温度(Ts=50℃)下即可晶化;Ts升高,MnZn铁氧体薄膜的XRD衍射峰强度逐渐增强;当Ts≤150℃时,MnZn铁氧体薄膜X线衍射主峰为(311),但当Ts≥200℃后,MnZn铁氧体薄膜沿{111}晶面生长.在Si(111)和玻璃基片上沉积的MnZn铁氧体薄膜,其XRD衍射主峰分别为(111)和(311).     

功率参数对光电薄膜Mg2Si择优取向的影响

采用射频磁控溅射设备,在硅(111)衬底上制备了光电半导体薄膜Mg2Si。通过X线衍射仪(XRD)和场致发射扫描电子显微镜(FESEM)对Mg2Si的晶体结构和微观形貌进行了表征,研究了功率参数对光电半导体薄膜Mg2Si外延择优取向的影响。结果表明,在60~90 W的溅射功率范围内,硅基外延Mg2Si具有Mg2Si(220)的外延择优生长特性,且随着溅射功率的增加Mg2Si(220)晶面的衍射峰强度先增大后减小,在70 W溅射功率下Mg2Si(220)晶面的衍射峰强度最强。     

Al2O3陶瓷上金刚石膜生长工艺优化及α粒子响应

采用微波等离子体化学气相沉积(MPCVD)法在氧化铝陶瓷衬底上沉积金刚石膜,并制作梳状电极的α粒子探测器.通过优化薄膜生长条件,发现酒精浓度为0.8%、沉积温度为850℃时,金刚石薄膜的介电常数最接近单晶金刚石膜,X射线衍射、喇曼光谱及扫描电子显微镜测试表明金刚石膜的质量较好.探测器的FV测试结果表明暗电流在10-8～10-7A之间,α粒子(241Am 5.5MeV)辐照下电流为10-5～10-4A.     

ZnS薄膜生长温度对ZnS/PS体系结构和发光的影响

用电化学阳极氧化法制备了一定孔隙率的多孔硅(PS,Porous Silicon)样品,然后以PS为衬底用脉冲激光沉积(PLD)的方法在100℃、200℃和300℃下生长ZnS薄膜.X射线衍射(XRD)结果表明,样品都在28.5°附近有一个较强的衍射峰,对应于β-ZnS(111)晶向,说明薄膜沿该方向择优取向生长,但由于衬底PS粗糙的表面结构,衍射峰的半高全宽(FWHM)较大.随着ZnS薄膜生长温度的升高,薄膜的衍射峰强度逐渐增强.扫描电子显微镜(SEM)像显示,随着薄膜生长温度的升高,构成薄膜的纳米晶粒生长变大.室温下的光致发光(PL)谱表明,随着薄膜生长温度的升高,ZnS的发光强度增强而PS的发光强度减弱,把ZnS的蓝绿光与PS的红光叠加,在可见光区450～700 nm形成了一个较宽的光致发光谱带,呈现较强的白光发射.     

定向金刚石膜的合成及机理探索

采用热丝化学汽相淀积 (CVD) ,未用别的辅助措施 ,合成了 (10 0 )晶面的金刚石膜。结合CVD金刚石成核的微观过程 ,探讨了定向金刚石膜的形成机理。发现和研究了表面扩散对CVD金刚石成核的重要影响。     

PLD方法在CVD金刚石膜上生长ZnO薄膜及其特性研究

采用脉冲激光沉积(PLD)技术,在(110)和(100)织构金刚石膜上成功制备出高度c-轴取向的ZnO薄膜,然后在纯氮气氛条件下对ZnO薄膜进行退火处理.作为比较,也在(100)Si上生长的ZnO薄膜进行了相同的处理.通过测量X射线衍射(XRD)谱和光致发光(PL)谱,研究了不同衬底性质和退火对薄膜结构和发光特性的影响.实验结果表明,在(100)织构金刚石上的ZnO膜具有最好的结晶质量,其半高宽只有0.2°.退火之后近紫外发光峰明显减弱的同时,绿色发光峰得到增强.这里归结为氮气退火后氧空位的增加,这点从退火后的XPS谱中可以得到进一步的确认.     

Growth of diamond films on si(100) with and without boron nitride buffer layer

Diamond films were grown on Si(100) and boron nitride deposited Si(100) substrates using hot filament chemical vapor deposition (HFCVD) technique. Microstructure and morphology of diamond films have been investigated systematically as a function of CH₄ and H₂ ratio and the ambient pressure. The deposited films were characterized by employing techniques such as scanning electron microscopy (SEM) and laser Raman spectroscopy. The average size and growth rate of diamond particles were found to increase with the CH₄ to H₂ ratio and decrease with the ambient pressure. Maximum growth rate of synthetic diamond deposited on Si(100) was found to be ∼3.5 µm/hr for the film deposited at 20 Torr with CH₄:H₂ ∼ 1.5:100 (substrate temperature ∼850°C). In most of these depositions, the morphology of the diamond crystals was cubic with significant secondary nucleation at higher methane concentrations and ambient pressure. The diamond film deposited on Si(100) with BN buffer layer shows an improvement in growth rate and the coverage, and the secondary nucleation was found to be substantially reduced, resulting in relatively smooth morphology. MicroRaman investigations show less amorphous graphite formation and better structural quality of diamond film than the one deposited without the BN buffer layer. On leave from Department of Physics University of Poona, Pune-411007 INDIA     

电泳法制备ZnO/SiO_2复合薄膜

用电泳法在硅衬底上沉积了ZnO/SiO2复合薄膜,然后在650℃和950℃退火热处理30 min。测试结果表明,样品经650℃退火后,复合薄膜ZnO和SiO2微晶颗粒集结成块状,结晶程度较高,颗粒尺寸较大,不连续的散落在硅衬底上。经950℃退火后,其中ZnO和SiO2发生反应生成少量的ZnSiO4微晶颗粒,使复合薄膜在室温下的绿色发光强度有所增加。     

衬底对V_2O_5薄膜微观结构的影响

在常温下,用sol-gel法在普通玻璃和单晶Si衬底上制备了V2O5薄膜,并将样品在空气中于500℃进行热处理。通过XRD和SEM对比分析了不同衬底上样品的微观结构,用分光光度计测试了玻璃衬底上样品在350~850nm的光学特性。结果表明:在玻璃和Si衬底上分别得到了β-V2O5和α-V2O5薄膜,两种样品的纯度高、相结构单一和结晶度好。β-V2O5薄膜的光学带隙Eg为2.33eV。     

Dependence of surface morphology of CVD diamond films on deposition conditions

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Solid-phase Crystallization of Amorphous Silicon Films by Rapid Thermal Annealing

The morphous silicon films prepared by PECVD at substrate temperatures of 30℃ have been crystallized by rapid thermal annealing method, the budget of time-temperature in the annealing process is 600℃ for 120s, 850℃ for 120s, and 950℃ for 120s. The results indicate the crystallization at 850℃ and 950℃ are better as shown in micro-Raman scattering and scanning electronic microscope.     

PLD法制备ZnO薄膜的退火特性和蓝光机制研究

通过脉冲激光沉积(PLD)方法,在O2中和100～500℃衬底温度下,用粉末靶在Si(111)衬底上制备了ZnO薄膜,在300℃温度下生长的薄膜在400～800℃温度和N2氛围中进行了退火处理,用X射线衍射(XRD)谱、原子力显微镜(AFM)和光致发光(PL)谱表征薄膜的结构和光学特性。XRD谱显示,在生长温度300℃时获得较好的复晶薄膜,在退火温度700℃时获得最好的六方结构的结晶薄膜;AFM显示,在此退火条件下,薄膜表面平整、晶粒均匀;PL谱结果显示,在700℃退火时有最好的光学特性。     

Complementary metal-oxide-semiconductor thin-film transistor circuits from a high-temperature polycrystalline silicon process on steel foil substrates

We fabricated CMOS circuits from polycrystalline silicon films on steel foil substrates at process temperatures up to 950/spl deg/C. The substrates were 0.2-mm thick steel foil coated with 0.5-/spl mu/m thick SiO/sub 2/. We employed silicon crystallization times ranging from 6 h (600/spl deg/C) to 20 s (950/spl deg/C). Thin-film transistors (TFTs) were made in either self-aligned or nonself-aligned geometries. The gate dielectric was SiO/sub 2/ made by thermal oxidation or from deposited SiO/sub 2/. The field-effect mobilities reach 64 cm/sup 2//Vs for electrons and 22 cm/sup 2//Vs for holes. Complementary metal-oxide-silicon (CMOS) circuits were fabricated with self-aligned TFT geometries, and exhibit ring oscillator frequencies of 1 MHz. These results lay the groundwork for polycrystalline silicon circuitry on flexible substrates for large-area electronic backplanes.     

Properties of CdTe nanocrystalline thin films grown on different substrates by low temperature sputtering

CdTe nanocrystalline thin films have been prepared on glass, Si and Al2O3 substrates by radio-frequency magnetron sputtering at liquid nitrogen temperature. The crystal structure and morphology of the films were characterized by X-ray diffraction (XRD) and field-emission scanning electron microscopy (FESEM). The XRD examinations revealed that CdTe films on glass and Si had a better crystal quality and higher preferential orientation along the (111) plane than the Al2O3. FESEM observations revealed a continuous and dense morphology of CdTe films on glass and Si substrates. Optical properties of nanocrystalline CdTe films deposited on glass substrates for different deposited times were studied.     

不同衬底上纳米晶CdTe薄膜的低温制备及光性能研究

CdTe nanocrystalline thin films have been prepared on glass, Si and Al2O3 substrates by radio-frequency magnetron sputtering at liquid nitrogen temperature. The crystal structure and morphology of the films were charac-terized by X-ray diffraction （XRD） and field-emission scanning electron microscopy （FESEM）. The XRD examinations revealed that CdTe films on glass and Si had a better crystal quality and higher preferential orientation along the （111） plane than the Al2O3. FESEM observations revealed a continuous and dense morphology of CdTe films on glass and Si substrates. Optical properties of nanocrystalline CdTe films deposited on glass substrates for different deposited times were studied.