GaN压电半导体杆的非线性动态响应研究

利用有限元分析方法,研究了p型GaN压电半导体杆在简谐力作用下的拉伸振动问题,得到了位移、电势和空穴浓度非线性动态响应的数值解,并分析了简谐力对p型GaN压电半导体杆力电耦合性能的调控作用。研究结果表明,简谐力显著地影响压电半导体杆内力电场的分布情况:由于电流密度中的电非线性项,电场和空穴浓度的分布失去对称性或反对称性;力电场在简谐力驱动下表现为周期性变化,但空穴浓度的动态响应表现为明显的非对称波动。     

温度梯度对GaN热压电pn结电学性能的影响

热感应产生的极化电势可以改变压电半导体结构内的力电物理量,这在人工智能、微机电系统(MEMS)中极具应用价值.文章针对温度梯度作用下的氮化镓(GaN)压电pn结,采用二维压电半导体多场耦合方程和精确的热电物理边界条件,数值分析了温度梯度改变对GaN热压电pn结内极化强度、电势、电场、载流子分布及电流等物理场的影响.结果表明:由于温度梯度场和极化电荷之间存在耦合,热压电pn结电学性能对温度梯度高度敏感,由温度改变产生的热感应极化电荷可以有效调节该结构的开启电压和载流子传输特性,这为操控与温度相关的智能异质结器件电流传输提供了新的方法和理论指导.     

温度对一维压电半导体梁弯曲特性的影响

采用微分算子法,理论研究了一维热压电半导体梁在横向力作用下的静态弯曲问题,得到了位移、电势、载流子、温度以及剪力、弯矩、电位移和电流密度等物理场的解析解,并分析了温度对n型ZnO压电半导体悬臂梁力电热耦合性能的调控作用.研究结果表明:温度能显著影响压电半导体梁的力电场分布,造成电势、载流子、电场和电位移在高温区域发生显著变化,而对于位移、剪力和弯矩影响较小.该温度调控效果主要是由热释电效应产生的极化电荷引起的.     

图形化氧化锌纳米线的合成和场发射性能研究

通过简单的热蒸发在ITO电极上合成图形化氧化锌纳米线,利用SEM,XRD,EDX和PL光谱分析氧化锌纳米线的表面形貌、微观结构和光学特性,并测试其场发射性能。SEM表明,ZnO纳米线的直径约为100-200nm,长度大于5um,且均匀长在ITO电极表面。场发射测试表明,图形化ZnO纳米线的开启电场和阈值电场分别为1.6 V/m和4.92 V/m,在电场强度为5.38 V/m时发射电流高达 2.26 mA/cm2,经4.5h场发射测试后发射电流的浮动低于5%。低的开启电场、高的发射电流和好的稳定性表明图形化氧化锌纳米线是一种应用前景广阔的场发射材料。     

硅纳米线的电学特性

总结了硅纳米线在电学特性方面的研究进展,重点分析了本征及掺杂硅纳米线的载流子浓度与迁移率、场发射及电子输运特性。研究表明通过对硅纳米线进行掺杂可提高载流子浓度及迁移率、场发射和电子输运性能,随硅纳米线直径的减小其电学性能增强。因此,硅纳米线在场效应晶体管及存储元件等纳米器件方面具有极大的应用前景。     

叉指形电极压电执行器的热弹性比拟分析方法

通过对比分析逆压电效应本构方程和热弹性体本构方程,将压电执行器的驱动电压比拟为温度载荷,压电应变系数比拟为正交各向异性的热膨胀系数,则叉指形电极压电执行器的静态位移可采用热弹性有限元法分析。由于叉指形电极的电场导致局部的非均匀和非线性,在热弹性比拟法中,需引入修正系数对热膨胀系数进行修正。数值算例和实验结果表明,热弹性比拟法在叉指形电极压电执行器的静态仿真中是简单有效的。     

Zn2SiO4掺杂对氧化锌压敏电阻性能的影响

采用普通陶瓷工艺制备了Zn2SiO4掺杂的氧化锌压敏电阻,研究了Zn2SiO4掺杂量对氧化锌压敏电阻的致密度,晶粒微观结构,小电流性能和通流能力的影响.结果表明:当Zn2SiO4掺杂量达到0.75％(摩尔分数)时,氧化锌压敏电阻晶粒致密均匀;电学性能得到改善,压敏电压梯度和非线性系数分别高达438 V/mm和85,漏电...     

图案化氧化钨纳米线阵列的低温制备工艺及其场发射特性研究

氧化钨纳米线由于具有长径比较大、导电性好、阈值电场较低、可承受的电流较高等优点,因此在场致电子发射器件中受到人们的广泛关注。但是在氧化钨纳米结构研究发展的过程中,出现了一些技术难题,比如制备温度高(>800℃),制备的氧化钨通常混合多种化学相而导致物性不均匀等,所以束缚了氧化钨纳米线在场发射领域的快速发展。本文采用磁控溅射技术结合化学气相沉积技术在500℃下分别实现了高纯相的WO2和WO3纳米线阵列的定域生长。场发射特性研究结果表明:所制备的WO3纳米线阵列的开启电场低至0.65MV/m,阈值电场约为2.9MV/m,最大电流密度达到18.3A/cm2;WO2纳米线阵列的开启电场低至0.8MV/m,阈值电场为2.46MV/m,最大电流密度达到12.1mA/cm2。这表明在低温下制备的氧化钨纳米线阵列在场致电子发射领域具有非常广阔的应用前景。     

衬底温度对ZnO:Al薄膜结构和性能的影响

利用射频磁控溅射法采用氧化锌铝(98%ZnO+2%Al2O3)为靶材在普通载玻片上制备了ZAO(ZnO:al)薄膜,研究了衬底温度对薄膜晶体结构,电学和光学性能的影响.利用X射线衍射仪、场扫描电镜对薄膜的结构及表面形貌进行了分析,利用分光光度计和电阻测试仪分别测试了薄膜的光电学性能.结果表明,衬底温度对薄膜结构及光电学性能影响最大.溅射功率120 W、衬底温度300℃、工作气压0.6 Pa制得的薄膜具有良好的光电学性能(可见光平均透过率为79.49%(考虑衬底的影响,电阻率为4.99×10-2 Ω·cm).     

氧化锌纳米线晶体管的电学特性研究

成功制作了氧化锌纳米线沟道场效应晶体管器件,所制作器件的电学性能通过I-V测试进行了分析。使用了水浴法生长了单晶性完整的氧化锌纳米线,该纳米线被用作背栅场效应晶体管的沟道,采用光刻方式制备的器件具有良好的直流特性,进行退火后进一步改善器件的源漏接触,提高器件性能,最终制备成功的场效应晶体管显示出p型MOS的特性,其开关态电流比达到105。在Vds=2.5 V时,跨导峰值为0.4μS,栅氧电容约为0.9 fF,器件夹断电压Vth为0.6 V,沟道迁移率约为87.1 cm2/V.s,计算得到氧化锌纳米线载流子浓度ne=6.8×108 cm-3。在Vgs=0 V时,器件沟道电阻率为100Ω.cm。     

Study of the Piezoelectric Power Generation of ZnO Nanowire Arrays Grown by Different Methods

The piezoelectric power generation from ZnO nanowire arrays grown on different substrates using different methods is investigated. ZnO nanowires were grown on n‐SiC and n‐Si substrates using both the high‐temperature vapor liquid solid (VLS) and the low‐temperature aqueous chemical growth (ACG) methods. A conductive atomic force microscope (AFM) is used in contact mode to deflect the ZnO nanowire arrays. No substrate effect was observed but the growth method, crystal quality, density, length, and diameter (aspect ratio) of the nanowires are found to affect the piezoelectric behavior. During the AFM scanning in contact mode without biasing voltage, the ZnO nanowire arrays grown by the VLS method produced higher and larger output voltage signal of 35 mV compared to those grown by the ACG method, which produce smaller output voltage signal of only 5 mV. The finite element (FE) method was used to investigate the output voltage for different aspect ratio of the ZnO nanowires. From the FE results it was found that the output voltage increases as the aspect ratio increases and starts to decreases above an aspect ratio of 80 for ZnO nanowires.     

一种背栅极冷阴极器件中纳米线表面电场的分析

利用静电场理论计算了背栅极冷阴极器件的纳米线附近电场,给出电场分布的表示式及J-V曲线,并分析了几何参数对纳米线顶端表面电场的影响.结果表明,纳米线顶端表面产生巨大的电场,随着离纳米线顶端表面距离的增大,电场迅速下降;纳米线突出栅孔的长度(L-d1)越大,纳米线半径r0、栅孔半径R以及栅极与阳极间距d2越小,则纳米线顶端表面电场越强,而d2较大时d2对表面电场的影响很弱;纳米线顶端边缘电流密度J随着阳极与栅极电压的增加而指数增大.     

Current-voltage characteristics of a silicon nanowire transistor

The nanowires and nanotubes are being considered as the best candidates for high-speed applications. It is shown that the high mobility does not always lead to higher carrier velocity. The ultimate drift velocity due to the high-electric-field streaming are based on the asymmetrical distribution function that converts randomness in zero-field to streamlined one in a very high electric field. The limited drift velocity is found to be appropriate thermal velocity for a nondegenerately doped sample of silicon, increasing with the temperature, but independent of carrier concentration. However, the limited drift velocity is the Fermi velocity for a degenerately doped silicon nanowire, increasing with carrier concentration but independent of temperature. The results obtained are applied to the modeling of the current-voltage characteristics of a nanowire transistor.     

Template Deformation‐Tailored ZnO Nanorod/Nanowire Arrays: Full Growth Control and Optimization of Field‐Emission

Here, a facile and effective route toward full control of vertical ZnO nanorod (NR)/nanowire (NW) arrays in centimeter‐scale areas and considerable improvement of field‐emission (FE) performance is reported. Controlled deformation of colloidal crystal monolayer templates is introduced by heating near glass‐transition temperature. The NR/NW density, uniformity, and tapering were all adjusted through selection of template size and deformation, and electrolyte composition. In line with the adjustments, the field‐emission performance of the arrays is significantly improved. A low turn‐on electric field of 1.8 V µm^?1, a field‐enhancement factor of up to 5 750, and an emitting current density of up to 2.5 mA cm^?2 were obtained. These improved parameters would benefit their potential application in cold‐cathode‐based electronics.     

Ultrahigh Tunability of Room Temperature Electronic Transport and Ferromagnetism in Dilute Magnetic Semiconductor and PMN‐PT Single‐Crystal‐Based Field Effect Transistors via Electric Charge Mediation

Multiferroic heterostructures composed of complex oxide thin films and ferroelectric single crystals have aroused considerable interest due to the electrically switchable strain and charge elements of oxide films by the polarization reversal of ferroelectrics. Previous studies have demonstrated that the electric‐field‐control of physical properties of such heterostructures is exclusively due to the ferroelectric domain switching‐induced lattice strain effects. Here, the first successful integration of the hexagonal ZnO:Mn dilute magnetic semiconductor thin films with high performance (111)‐oriented perovskite Pb(Mg_1/3Nb_2/3)O₃‐PbTiO₃ (PMN‐PT) single crystals is reported, and unprecedented charge‐mediated electric‐field control of both electronic transport and ferromagnetism at room temperature for PMN‐PT single crystal‐based oxide heterostructures is realized. A significant carrier concentration‐tunability of resistance and magnetization by ≈400% and ≈257% is achieved at room temperature. The electric‐field controlled bistable resistance and ferromagnetism switching at room temperature via interfacial electric charge presents a potential strategy for designing prototype devices for information storage. The results also disclose that the relative importance of the strain effect and interfacial charge effect in oxide film/ferroelectric crystal heterostructures can be tuned by appropriately adjusting the charge carrier density of oxide films.     

表面形貌对定向氧化锌阵列场致发射性能的影响

采用热蒸发的方法生长不同形貌的ZnO纳米材料。通过调节反应温度和氧气流量,生长了梳状ZnO ,ZnO纳米针和ZnO纳米柱状。场致发射测试结果表明一维纳米ZnO材料的表明形貌对其开启电场和发射电流有很大的影响。ZnO纳米柱阵列的开启电场最低,电流密度最大。这是由于它与衬底的良好接触以及较弱的场屏蔽效应。实验结果表明ZnO纳米柱阵列是一种优良的场致发射器件的冷阴极材料。     

Characterization and Field‐Emission Properties of Needle‐like Zinc Oxide Nanowires Grown Vertically on Conductive Zinc Oxide Films

Needle‐like ZnO nanowires with high density are grown uniformly and vertically over an entire Ga‐doped conductive ZnO film at 550 °C. The nanowires are grown preferentially in the c‐axis direction. The X‐ray diffraction (XRD) θ‐scan curve shows a full width at half maximum (FWHM) value of 2°. This indicates that the c‐axes of the nanorods are along the normal direction of the substrate surface. The investigation using high‐resolution transmission electron microscopy (HRTEM) confirmed that each nanowire is a single crystal. A room‐temperature photoluminescence (PL) spectrum of the wires consists of a strong and sharp UV emission band at 380 nm and a weak and broad green–yellow band. It reveals a low concentration of oxygen vacancies in the ZnO nanowires and their high optical quality. Field electron emission from the wires was also investigated. The turn‐on field for the ZnO nanowires was found to be about 18 V μm^–1 at a current density of 0.01 μA cm^–2. The emission current density from the ZnO nanowires reached 0.1 mA cm^–2 at a bias field of 24 V μm^–1.     

一维ZnO纳米结构的电子场发射研究

在大量制备一维ZnO纳米结构的基础上,研究了这些纳米结构的场发射性能。对于四角状ZnO纳米结构,获得1.0m Ac/m2的电流密度只需要4.5V/μm的电场;对于线状Z nO纳米结构,获得1.0mAc/m 2的电流密度需要6.5V/μm的电场。由于其特殊的结构,四角状ZnO一维纳米结构在真空电子器件方面有很好的应用前景。