White Light‐Emitting Diode From Sb‐Doped p‐ZnO Nanowire Arrays/n‐GaN Film

A whole interfacial transition of electrons from conduction bands of n‐type material to the acceptor levels of p‐type material makes the energy band engineering successful. It tunes intrinsic ZnO UV emission to UV‐free and warm white light‐emitting diode (W‐LED) emission with color coordinates around (0.418, 0.429) at the bias of 8–15.5 V. The W‐LED is fabricated based on antimony (Sb) doped p‐ZnO nanowire arrays/Si doped n‐GaN film heterojunction structure through one‐step chemical vapor deposition with quenching process. Element analysis shows that the doping concentration of Sb is ≈1.0%. The I–V test exhibits the formation of p‐type ZnO nanowires, and the temperature‐dependent photoluminescence measurement down to 4.65 K confirms the formation of deep levels and shallow acceptor levels after Sb‐doping. The intrinsic UV emission of ZnO at room temperature is cut off in electroluminescence emission at a bias of 4–15.5 V. The UV‐free and warm W‐LED have great potential application in green lights program, especially in eye‐protected lamp and display since television, computer, smart phone, and mobile digital equipment are widely and heavily used in modern human life, as more than 3000 h per year.     

石墨烯/NiAu复合透明导电层在GaN LED的应用

通过溅射方法制备Ni/Au层,用作石墨烯和p型GaN之间的插入层来减小接触电势。研究了Ni和Au的厚度比与GaN LED性能的关系。结果表明,在1.5 nm总厚度的条件下,Ni与Au厚度比为1 nm/0.5 nm时为最佳,可同时兼顾透光性能和良好欧姆接触,此时,石墨烯/NiAu复合透明导电层可以明显地降低GaN LED的工作电压,同时在蓝光波段具有很高的透光率,因而提高了GaN LED的发光性能。     

Pulse‐Mode Dynamic Ron Measurement of Large‐Scale High‐Power AlGaN/GaN HFET

We propose pulse‐mode dynamic R_on measurement as a method for analyzing the effect of stress on large‐scale high‐power AlGaN/GaN HFETs. The measurements were carried out under the soft‐switching condition (zero‐voltage switching) and aimed to minimize the self‐heating problem that exists with the conventional hard‐switching measurement. The dynamic R_on of the fabricated AlGaN/GaN MIS‐HFETs was measured under different stabilization time conditions. To do so, the drain‐gate bias is set to zero after applying the off‐state stress. As the stabilization time increased from 0.1 μs to 100 ms, the dynamic R_on decreased from 160 Ω to 2 Ω. This method will be useful in developing high‐performance GaN power FETs suitable for use in high‐efficiency converter/inverter topology design.     

In situ growth monitoring of AlGaN/GaN distributed Bragg reflectors at 530 nm using a 633 nm laser

The metal-organic chemical vapor deposition(MOCVD) growth of AlGaN/GaN distributed Bragg reflectors (DBR) with a reflection peak at 530 nm was in situ monitored using 633 nm laser reflectometry.Evolutions of in situ reflected reflectivity for different kinds of AlGaN/GaN DBR were simulated by the classical transfer matrix method.Two DBR samples,which have the same parameters as the simulated structures,were grown by MOCVD.The simulated and experimental results show that it is possible to evaluate the DBR...     

Investigation of Optical and Structural Stability of Localized Surface Plasmon Mediated Light‐Emitting Diodes by Ag and Ag/SiO2 Nanoparticles

Localized surface plasmon (LSP) effects due to Ag and Ag/SiO₂ nanoparticles (NPs) deposited on GaN/InGaN multiquantum well (MQW) light‐emitting diode (LED) structures are studied. The colloidal NPs are synthesized by a sol‐gel method and drop‐cased on the LED structures. The surface density of NPs its controlled by the concentration of the NP solution. Theoretical modeling is performed for the emission spectrum and the electric field distribution of LSP resonance for Ag/SiO₂ NPs. Enhanced photoluminescence (PL) efficiency is observed in the LED structures and the amount of PL enhancement increases with increasing the surface density of Ag and Ag/SiO₂ NPs. These effects are attributed to resonance coupling between the MQW and LSP in the NPs. It is also shown that the PL enhancement attainable with Ag NPs and Ag/SiO₂ NPs is comparable, but the latter displays a much higher stability with respect to long‐term storage and annealing due to a barrier for NP agglomeration, Ag oxidation, and impurity diffusion provided by the SiO₂ shell.     

GaN基LED与Si键合技术的研究

采用金属键合技术结合激光剥离技术将GaN基LED从蓝宝石衬底成功转移到Si衬底上。利用X射线光电子谱(XPS)研究不同阻挡层对Au向GaN扩散所起的阻挡作用,确定键合所需的金属过渡层。利用多层金属过渡层,在真空、温度400℃和加压300 N下实现GaN基LED和Si的键合,通过激光剥离技术将蓝宝石衬底从键合结构上剥离下来,形成GaN基LED/金属层/Si结构。用金相显微镜及原子力显微镜(AFM)观察结构的表面形貌,测得表面粗糙度(RMS)为12.1 nm。X射线衍射(XRD)和Raman测试结果表明,衬底转移后,GaN基LED的结构及其晶体质量没有发生明显变化,而且GaN与蓝宝石衬底间的压应力得到了释放,使得Si衬底上GaN基LED的电致发光(EL)波长发生红移现象。     

Epitaxy of Single‐Crystalline GaN Film on CMOS‐Compatible Si(100) Substrate Buffered by Graphene

Fabricating single‐crystalline gallium nitride (GaN)‐based devices on a Si(100) substrate, which is compatible with the mainstream complementary metal‐oxide‐semiconductor circuits, is a prerequisite for next‐generation high‐performance electronics and optoelectronics. However, the direct epitaxy of single‐crystalline GaN on a Si(100) substrate remains challenging due to the asymmetric surface domains of Si(100), which can lead to polycrystalline GaN with a two‐domain structure. Here, by utilizing single‐crystalline graphene as a buffer layer, the epitaxy of a single‐crystalline GaN film on a Si(100) substrate is demonstrated. The in situ treatment of graphene with NH₃ can generate sp³ C? N bonds, which then triggers the nucleation of nitrides. The one‐atom‐thick single‐crystalline graphene provides an in‐plane driving force to align all GaN domains to form a single crystal. The nucleation mechanisms and domain evolutions are further clarified by surface science exploration and first‐principle calculations. This work lays the foundation for the integration of GaN‐based devices into Si‐based integrated circuits and also broadens the choice for the epitaxy of nitrides on unconventional amorphous or flexible substrates.     

用633nm的激光器监控峰值波长为 530nm的AlGaN/GaN DBR的生长

本文从理论和实验上研究了用633nm激光器干涉仪监控峰值反射波长为530nm的1/4光学厚度的AlGaN/GaN 分布布拉格反射器（DBR）的生长。首先采用传输矩阵法从理论上研究了不同周期厚度的AlGaN/GaN DBR的实时反射率随DBR生长厚度的变化。接着采用金属有机化合物气相外延法生长了两个与模拟结构相同的DBR样品。仿真结果和实验结果表明能够从DBR实时反射率随生长厚度变化的曲线形状判断DBR的结构参数。最后通过激光干涉仪实时监控生长了DBR发光二极管,光致发光实验证明DBR对发光二极管出射光的加强作用在期望波长范围内。     

Graphene‐Assisted Epitaxy of Nitrogen Lattice Polarity GaN Films on Non‐Polar Sapphire Substrates for Green Light Emitting Diodes

Lattice polarity is a key point for hexagonal semiconductors such as GaN. Unfortunately, only Ga‐polarity GaN have been achieved on graphene till now. Here, the epitaxy of high quality nitrogen‐polarity GaN films on transferred graphene on non‐polar sapphire substrates by molecular beam epitaxy is reported. This success is achieved through atomic nitrogen irradiation, where C? N bonds are formed in graphene and provide nucleation sites for GaN and leading to N‐polarity GaN epitaxy. The N‐polarity characteristics are confirmed by chemical etching and transmission electron microscopy measurement. Due to the higher growth temperature of InGaN at N‐polarity than that at Ga‐polarity, green light emitting diodes are fabricated on the graphene‐assisted substrate, where a large redshift of emission wavelength is observed. These results open a new avenue for the polarity modulation of III‐nitride films based on 2D materials, and also pave the way for potential application in longer wavelength light emitting devices.     

Top‐Emission Organic Light‐Emitting Diode with a Novel Copper/Graphene Composite Anode

The relatively high sheet resistance of graphene compared with indium tin oxide (ITO) blocks the applications of graphene as transparent electrodes in organic light‐emitting diodes. A novel copper (Cu)/graphene composite electrode is presented and employed as the anode of a top‐emission organic light‐emitting diode with the structure of Cu/graphene/V₂O₅/NPB/Alq₃/Alq₃: C545T/Bphen: Cs₂CO₃/Sm/Au. The Cu/graphene composite electrodes are fabricated by growing graphene directly on Cu substrates via the chemical vapor deposition method without any transfer process. The maxima of current efficiency and power efficiency of a typical Cu/graphene composite anode device reach 6.1 cd/A and 7.6 lm/W, respectively, which are markedly higher than those of the control devices with a graphene anode, a Cu anode or an ITO anode. The low sheet resistance of the composite electrode, the high quality of graphene without any transfer process and the avoidance of wave guiding loss in glass or polyethylene terephthalate substrates result in the improvements of light emission efficiencies.     

Dynamic Extracellular Imaging of Biochemical Cell Activity Using InGaN/GaN Nanowire Arrays as Nanophotonic Probes

The application of InGaN/GaN nanowire heterostructure arrays as photonic probes for dynamic imaging of biochemical and cellular processes in an incident light fluorescence microscope is demonstrated. The photoluminescence intensity of InGaN/GaN nanowires sensitively depends on the pH value of the surrounding solution, making them suitable probes for the optical detection of biochemical processes accompanied by local pH variations. Grown on a conductive substrate, the nanowire arrays can be operated in a well‐defined electrochemical working point with high sensitivity and stability. The achievable pH and bias resolution as well as signal‐to‐noise ratio are assessed as a function of the working point and for different integration times. A bias resolution of 1 mV and a pH resolution of 0.03 are achieved at a time resolution below 25 ms. The application for dynamic imaging of the activity of isolated intestinal crypts from Wistar rats is demonstrated. Here, the pH change in the vicinity of the crypt is quantified and attributed to the activity of the sodium‐proton exchanger (NHE). Imaging of the effect of amiloride and NH₄Cl on its activity is demonstrated with a spatial resolution of <0.63 µm and reveals that NH₄Cl‐induced NHE activation preferentially occurs in the upper part of the crypt.     

Single‐Crystal Hybrid Perovskite Platelets on Graphene: A Mixed‐Dimensional Van Der Waals Heterostructure with Strong Interface Coupling

Van der Waals (vdW) heterostructures open up excellent prospects in electronic and optoelectronic applications. In this work, mixed‐dimensional metal‐halide perovskite/graphene heterostructures are prepared through selective growth of CH₃NH₃PbBr₃ platelets on patterned single‐layer graphene using chemical vapor deposition. Preferred growth of single‐crystal CH₃NH₃PbBr₃ platelets on graphene surfaces is achieved, which is accompanied by significant photoluminescence quenching. Raman spectra reveal that perovskite platelets cause p‐type doping in the graphene layer. A significant Fermi level decrease of 272 meV in graphene is estimated, which corresponds to a high doping density of 7.5 × 10¹² cm^?2. Surface potentials measured by Kelvin probe force microscopy indicate a negatively charged perovskite surface under illumination, which is consistent with the upward band bending deduced from conducting atomic force microscopy measurements. Moreover, a field‐effect phototransistor is fabricated using the perovskite/graphene heterostructure channel, and the increased Dirac voltage under illumination confirms an enhanced p‐type character in graphene. These findings enrich the understanding of strong interface coupling in such mixed‐dimensional vdW heterostructures and pave the way toward novel perovskite‐based optoelectronic devices.     

Enhancement of Green Emission from InGaN/GaN Multiple Quantum Wells via Coupling to Surface Plasmons in a Two‐Dimensional Silver Array

A novel approach to enhancing the emission efficiency of InGaN/GaN multiple quantum wells via coupling to surface plasmons (SPs) in a periodic two‐dimensional silver array is demonstrated. A higher internal quantum efficiency and a higher light extraction efficiency are simultaneously achieved by engraving an array of nanoholes into the p‐GaN cladding layer, followed by partial filling with silver. By top excitation and collection from the top of the Ag‐incorporated light emitting diodes (LEDs), a 2.8‐fold enhancement in peak photoluminescence intensity is demonstrated. The proposed nanoengraving technique offers a practical approach to overcoming the limitation of the exponentially decayed SP field without sacrificing the thickness of the p‐GaN layer and to controlling the effective coupling energy. The approach is feasible for high‐power lighting applications.     

Colloidal quantum dot active layers for light emitting diodes

In this paper the preliminary results of incorporating a novel active layer into a GaN light emitting diode (LED) are discussed. Integration of colloidal CdSe quantum dots into a GaN LED active layer is demonstrated. Properties of p-type Mg doped overgrowth GaN are examined via circular transmission line method (CTLM). Effects on surface roughness due to the active layer incorporation are examined using atomic force microscopy (AFM). Electroluminescence of LED test structures is reported, and an ideality factor of n = 1.6 is demonstrated.     

InGaN/GaN light emitting diodes activated in O2 ambient

Mg-doped GaN epitaxial layers were annealed in pure O₂ and pure N₂. It was found that we could achieve a low-resistive p-type GaN by pure O₂ annealing at a temperature as low as 400°C. With a 500°C annealing temperature, it was found that the forward voltage and dynamic resistance of the InGaN/GaN light emitting diode (LED) annealed in pure O₂ were both smaller than those values observed from InGaN/GaN LED annealed in pure N₂. It was also found that an incomplete activation of Mg will result in a shorter LED lifetime     

Efficiency enhancement of InGaN/GaN light-emitting diodes with a back-surface distributed bragg reflector

The design, fabrication, and performance characteristics of a back-surface distributed Bragg reflector (DBR) enhanced InGaN/GaN light-emitting diode (LED) are described. A wide reflectance bandwidth in the blue and green wavelength regions is obtained using a double quarter-wave stack design composed of TiO₂ and SiO₂ layers. More than 65% enhancement in extracted light intensity is demonstrated for a blue LED measured at the chip level. Similar improvement in green LED performance is discussed and achieved through simulation. Possible applications of back-surface DBR-enhanced LEDs include surface-mount packages with significantly reduced vertical profiles, resonant cavity LEDs, and superluminescent diodes.     

Fabrication of vertical thin-GaN light-emitting diode by low-temperature Cu/Sn/Ag wafer bonding

Vertical thin-GaN LED was successfully fabricated on the GaN LED epi-layers grown on the patterned-sapphire substrate with the pyramidal pattern by low-temperature Cu/Sn/Ag wafer bonding at 150 °C. An inverted pyramidal pattern formed on the n-GaN surface after the GaN epi-layer was transferred onto Si wafer, which resulted from the pyramidal pattern on the patterned-sapphire substrate. The inverted pyramidal pattern has an equivalent function with roughening the n-GaN surface. With higher inverted pyramidal pattern coverage, the light extraction efficiency can be greatly enhanced. In addition, we found that the 4-fold increase (from 13.6% to 53.8%) in the pyramidal pattern coverage on patterned-sapphire substrate only gives the GaN LED epi-layer about 5.7% enhancement in the internal quantum efficiency.     

Schottky‐Barrier‐Controllable Graphene Electrode to Boost Rectification in Organic Vertical P–N Junction Photodiodes

Monolayer graphene is used as an electrode to develop novel electronic device architectures that exploit the unique, atomically thin structure of the material with a low density of states at its charge neutrality point. For example, a single semiconductor layer stacked onto graphene can provide a semiconductor–electrode junction with a tunable injection barrier, which is the basis for a primitive transistor architecture known as the Schottky barrier field‐effect transistor. This work demonstrates the next level of complexity in a vertical graphene–semiconductor architecture. Specifically, an organic vertical p‐n junction (p‐type pentacene/n‐type N,N′‐dioctyl‐3,4,9,10‐perylenedicarboximide (PTCDI‐C₈)) on top of a graphene electrode constituting a novel gate‐tunable photodiode device structure is fabricated. The model device confirms that controlling the Schottky barrier height at the pentacene–graphene junction can (i) suppress the dark current density and (ii) enhance the photocurrent of the device, both of which are critical to improve the performance of a photodiode.     

Direct Growth of Nanopatterned Graphene on Sapphire and Its Application in Light Emitting Diodes

Direct growth of graphene films on functional substrates is immensely beneficial for the large‐scale applications of graphene by avoiding the transfer‐induced issues. Notably, the selective growth of patterned graphene will further boost the development of graphene‐based devices. Here, the direct growth of patterned graphene on the c‐plane of nanopatterned sapphire substrate (NPSS) is realized and the superiority of the patterned graphene for high‐performance ultraviolet light‐emitting diodes (UV‐LED) is demonstrated. As confirmed by density functional theory calculations and analog simulations, compared to the concave r‐plane the flat c‐plane of NPSS is characterized by a lower active barrier for methane decomposition and carbon species diffusion, as well as a greater supply of carbon precursor for graphene growth. The synthesized patterned graphene on the c‐plane of NPSS is verified to be monolayer and high quality. The patterned graphene enables the selective and well‐aligned nucleation of aluminium nitride (AlN) to promote rapid epitaxial lateral overgrowth of single‐crystal AlN films with low dislocation density. Consequently, the fabricated UV‐LED demonstrates high luminescence intensity and stability. The method is suitable for obtaining various patterned graphene by substrate design, which will allow for greater progress in the cutting‐edge applications of graphene.     

Improvement of visible light photocatalytic activity over graphene oxide/CuInS2/ZnO nanocomposite synthesized by hydrothermal method

In this study, graphene oxide/CuInS₂/ZnO as a new photocatalyst with light absorption properties in the visible region were successfully synthesized via hydrothermal route. The UV–vis absorption spectra of the catalyst suggested that the graphene oxide/CuInS₂/ZnO is active under visible light. It was evaluated the photocatalytic activities of graphene oxide/CuInS₂/ZnO on the degradation of Rhodamine B under visible light irradiation and was found that the graphene oxide/CuInS₂/ZnO obtained exhibit photocatalytic activity higher than single ZnO and CuInS₂/ZnO. Presence of graphene oxide with high specific surface area and great conductivity make it as a good support for CuInS₂/ZnO and improves removal efficiency for degradation of Rhodamine B.