抗辐射数字电路加固技术研究

文章对电路抗辐射的机理进行了研究,提出了几种提高数字电路抗辐射能力的方法:通过工艺控制减小辐射后的背栅阈值电压漂移,通过版图增加体接触、采用环型栅等结构提高单元的抗辐射能力,通过对电路关键节点的加固提高整体电路的抗辐射能力。为了验证加固方法的可靠性,设计了一款电路进行抗总剂量、抗瞬态剂量率、抗中子辐射、抗单粒子辐射等多种试验。通过辐照试验结果可以看到,采用抗辐照方法设计的电路具有较强的抗辐照能力,为今后抗辐照电路的研制和开发奠定了坚实的基础。     

0.13μm抗辐射SOI CMOS标准单元库建库流程研究与实现

基于0.13μm部分耗尽绝缘体上硅(SOI)互补金属氧化物半导体(CMOS)工艺线,开发了全套0.13μm抗辐射SOI CMOS工艺的标准单元库。针对深亚微米SOI器件的辐射效应,在电路设计和版图设计上进行了加固,达到了比较好的抗辐射效果。对SOI标准单元库的建库流程的各方面做了比较深入的介绍,通过Hspice仿真验证单元库中加固D触发器(DFF)抗单粒子效应的能力并对不同加固方式的性能开销进行了对比。利用已建立的0.13μm抗辐射SOI CMOS标准单元库设计了测试芯片以验证库的可靠性。     

总剂量辐照效应模型在TDI-CCD器件中的应用

介绍了抗辐射加固设计使用的总剂量辐照效应模型,研究了它在时间延迟积分电荷耦合器件(TDI-CCD)电荷转移效率参数衰减中的应用,并通过不同剂量60Coγ辐照试验,验证了该模型在TDI-CCD器件抗辐射加固设计中的应用价值。     

设计和表征一个65nm抗辐射标准单元库

提出了一个基于商用65nm工艺在晶体管级设计抗辐射数字标准单元库的方法。因为当C单元的两个输入是不同的逻辑值时输出会进入高阻模式,并保持输出逻辑电平不变,而当输入端有相同的逻辑值时,C单元的功能就像一个反相器的特性。因此它有把因为辐射粒子引起的单粒子翻转（SEU）效应或单粒子传输（SET）效应所产生的毛刺滤除掉的能力。在这个标准单元库中包含了在晶体管级使用C单元设计了抗辐射的触发器,以便于芯片设计者可以使用这个库来设计具有更高抗辐射能力和减小面积、功耗和延迟的芯片。在最后为了能表征标准单元在硅片上的延迟特性,一个基于环形振荡器的芯片结构用来测量每个单元的延迟,以及验证抗辐射能力。延迟测量结果跟版图后仿真结果偏差在10％以内。     

GaAs 10 bit DAC的抗辐射设计和实验

通过分析砷化镓(GaAs)器件的电离辐射剂量率辐照机理和效应,结合电路结构,描述了砷化镓10 bit数模转换器(DAC)的电离辐射剂量率辐射效应、抗辐射设计和辐照实验。在电路设计上,10 bit DAC由两个5 bit DAC组成,通过芯片内部合成10 bit DAC,有效降低了芯片面积和制造工艺难度;通过分析电路的电离辐射剂量率辐射效应,针对敏感电路进行局部电路的抗辐射设计,提高电路抗辐射能力;结合实验条件和器件引线分布,设计合理的辐照实验方案,开发辐照实验电路板,进行辐照实验,获得科学的实验结果,验证电路的抗辐射能力。实验结果表明该数模转换器能够抗3×1011rad(Si)/s剂量率的瞬时辐照。     

砷化镓8Bit ADC电路的抗辐射设计和辐照试验研究

砷化镓模数转换器(ADC)具有良好的电性能和耐辐照能力,广泛应用于各种领域,尤其是航空航天领域.电路的抗辐射能力与设计和工艺密切相关,在前期对电路进行辐照试验基础上,针对电路设计和工艺制造进行大规模集成电路的抗辐射研究,改进电路的设计和工艺制造技术,提高电路的抗辐射能力.本文主要对该电路的设计、工艺研究和γ总剂量辐照试...     

基于130nm PD-SOI工艺存储单元电路的抗辐射加固设计

基于130 nm部分耗尽绝缘体上硅(SOI) CMOS工艺,设计并开发了一款标准单元库.研究了单粒子效应并对标准单元库中存储单元电路进行了抗单粒子辐射的加固设计.提出了一种基于三模冗余(TMR)的改进的抗辐射加固技术,可以同时验证非加固与加固单元的翻转情况并定位翻转单元位置.对双互锁存储单元(DICE)加固、非加固存储单元电路进行了性能及抗辐射能力的测试对比.测试结果显示,应用DICE加固的存储单元电路在99.8 MeV ·cm2 ·mg_1的线性能量转移(LET)阈值下未发生翻转,非加固存储单元电路在37.6 MeV·cm2·mg_1和99.8 MeV·cm2·mg_1两个LET阈值下测试均发生了翻转,试验中两个版本的基本单元均未发生闩锁.结果证明,基于SOI CMOS工艺的抗辐射加固设计(RHBD)可以显著提升存储单元电路的抗单粒子翻转能力.     

日盲紫外焦平面探测器的抗辐射加固设计

设计了一款320×256元抗辐射日盲紫外焦平面阵列探测器,重点针对探测器的读出电路版图、积分开关偏置点、探测器芯片外延结构及器件工艺开展了抗辐射加固设计。对加固样品开展了γ总剂量和中子辐照试验和测试,试验结果表明样品的抗电离辐照总剂量达到150krad(Si),抗中子辐照注量达到1×10¹³n/cm²(等效1MeV中子),验证了抗辐射加固措施的有效性。     

一种标准单元库的自动仿真验证方法

提出了一种针对标准单元库中单元逻辑功能进行自动仿真验证的方法,验证了55 nm标准单元库中单元逻辑功能的正确性。该方法能自动提取设计文档中的单元逻辑,根据提取结果中输入端的数量自动生成测试向量,并以此测试向量生成参考逻辑值,整个过程只需0.708 μs。采用仿真工具对标准单元库文件进行仿真,将得到的仿真值自动与参考值对比,验证了库单元逻辑的正确性,提高了标准单元库功能验证的效率。     

一种抗辐射前置稳压高压电源

以一种高压电源的前置稳压电路作为研究对象,重点分析稳压控制电路的抗中子抗辐射能力。对导致中子辐照前后输出电压变化量的因素进行分析,并对关键元器件晶体管进行辐照效应分析和试验验证,提出了晶体管优化和采用达林顿晶体管结构2种加固措施。通过电路仿真和制作样机,得到在1 MeV等效中子2×1013 n/cm2中子注量后的仿真和实测结果与理论分析值相吻合,验证了抗辐射加固措施的有效性。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.