Replication of a thin polydimethylsiloxane stamp and its application to dual-nanoimprint lithography for 3D hybrid nano/micropatterns

This paper presents the fabrication of a thin and flexible polydimethylsiloxane (PDMS) stamp with a thickness of a few tens of um and its application to nanoimprint lithography (NIL). The PDMS material generally has a low elastic modulus and high adhesive characteristics. Therefore, after being treated, the thin PDMS stamp is easily deformed and torn, adhering to itself and other materials. This paper introduces the use of a metal ring around the flange of a thin PDMS stamp to assist with the handling of this material. A PDMS stamp with a motheye pattern in nanometer scale was inserted between a substrate and a microstamp with concave patterns in micrometer scale. Subsequently, three-dimensional (3D) hybrid nano/micropatterns were fabricated by pressing these two stamps and curing the resist. The fabricated hybrid patterns were measured and verified in both the microscale and nanoscale. The process, termed "dual NIL," can be applied to the fabrication of optical components or bio-sensors that require repetitive nanopatterns on micropatterns.     

Combined laser interference and photolithography patterning of a hybrid mask mold for nanoimprint lithography

A lithography technique that combines laser interference lithography (LIL) and photolithography, which can be a valuable technique for the low cost production of microscale and nanoscale hybrid mask molds, is proposed. LIL is a maskless process which allows the production of periodic nanoscale structures quickly, uniformly, and over large areas. A 257 nm wavelength Ar-Ion laser is utilized for the LIL process incorporating a Lloyd's mirror one beam inteferometer. By combining LIL with photolithography, the non-selective patterning limitation of LIL are explored and the design and development of a hybrid mask mold for nanoimprint lithography process, with uniform two-dimensional nanoscale patterns are presented. Polydimethylsiloxane is applied on the mold to fabricate a replica of the stamp. Through nanoimprint lithography using the manufactured replica, successful transfer of the patterns is achieved, and selective nanoscale patterning is confirmed with pattern sizes of around 180 nm and pattern aspect ratio of around 1.44:1.     

A Simplified Method to Produce a Functional Test Stamp for Nanoimprint Lithography (NIL)

Nanoimprint lithography (NIL) is a novel technique that allows fabrication of submicron features into substrates using a modified embossing method into a polymer resist. In most cases, a stamp is produced by direct e-beam writing into a resist and then the pattern is etched into the substrate. Other stamp fabrication methods exist but, in general, they are expensive to produce. When performing NIL, damage may occur to the stamp unless the process steps are optimized. In this letter, we illustrate a simple and inexpensive method to produce a test stamp to use for NIL process optimization. This may have wide applications in both industrial and academic settings.      

Pattern-definable and low cost fabrication of nanopatterned conducting polymer film on flexible substrates

This study reports the pattern definable and low cost fabrication of nanopatterned conducting polymer film on flexible substrates. Noble nanopatterned polymer hard template was fabricated by using nanoimprint lithography (NIL) and used for electropolymerization of conducting polymer. Conducting polymer was electrochemically deposited on the template and transferred over to flexible substrates. Eventually conducting polymer films with various nanopatterns were fabricated on flexible substrates. High pattern definability was achieved by nanoimprinted polymer template, which was molded from lithographically fabricated stamp. Low cost fabrication was accomplished due to low cost NIL, reusable polymer templates, and low material consumption of electrodeposition. The electrodeposited films were transferred using double sided tape. Because the templates are made of flexible polymer, the transfer bonding method applied in this study is adaptable to both wafers and flexible polymer substrates. The fabricated nanopatterned conducting polymer film can be applied to gas sensors, super capacitors, super wetting films, and neuron interfaces due to its characteristic of high surface to volume. For an illustrative application, the gas sensing properties of films were tested. The result showed enhanced sensing characteristic with nanopatterned film, which are attributed to the high surface to volume ratio of nanopatterned films.     

Nanoimprint lithography patterns with a vertically aligned nanoscale tubular carbon structure

A nanoscale tubular carbon structure array was demonstrated as a mold for nanoimprint lithography (NIL), in which a vertically formed and hexagonally aligned nanoscale tubular carbon array was fabricated through carbon growth inside an anodic aluminum oxide (AAO) nanotemplate, followed by controlled chemical etching of the AAO layer. High density (over 10(10)?cm(-2)) of the nanoscale carbon pillars with their controlled diameters and protruded lengths was inversely replicated onto a UV-curable resist for the first time using the imprinting lithography technique.     

Double-layer imprint lithography on wafers and foils from the submicrometer to the millimeter scale

In this paper, a thermal imprint technique, double-layer nanoimprint lithography (dlNIL), is introduced, allowing complete filling of features in the dimensional range of submicrometer to millimeter. The imprinting and filling quality of dlNIL was studied on Si substrates as a model system and compared to results obtained with regular NIL (NIL) and reverse NIL (rNIL). Wavy foils were imprinted with NIL, rNIL and dlNIL and the patterning results compared and discussed. With dlNIL, a new application possibility was introduced in which two different resists having, for example, a different etch resistance to a certain plasma were combined within one imprint step. dlNIL allows extension to many resist combinations for tailored nanostructure fabrication.     

Fabrication of discrete nanoscaled force sensors based on single-walled carbon nanotubes

We present a fabrication technique for discrete, released carbon-nanotube-based nanomechanical force sensors. The fabrication technique uses prepatterned coordinate markers to align the device design to predeposited single-walled carbon nanotubes (SWNTs): Atomic force microscope (AFM) images are recorded to determine spatial orientation and location of each discrete nanotube to be integrated in a nanoscaled force sensor. Electron beam lithography is subsequently used to pattern the metallic electrodes for the nanoscale structures. Diluted hydrofluoric acid etching followed by critical point drying completes the nanosized device fabrication. We use discrete, highly purified, and chemically stable carbon nanotubes as active elements. We show AFM and scanning electron microscope images of the successfully realized SWNTs embedded nanoelectromechanical systems (NEMS). Finally, we present electromechanical measurements of the suspended SWNT NEMS structures.     

Inherently reproducible fabrication of plasmonic nanoparticle arrays for SERS by combining nanoimprint and copolymer lithography

We present an inherently reproducible route to realizing high-performance SERS substrates by exploiting a high-throughput top-down/bottom-up fabrication scheme. The fabrication route employs self-assembly of amphiphilic copolymers to create high-resolution molds for nanoimprint lithography (NIL) spanning entire 100 mm Si wafers. The nanoporous polymer templates obtained upon NIL are subjected to galvanic displacement reactions to create gold nanorod arrays. Nanorods are subsequently converted to nanodiscs by thermal annealing. The nanodiscs were found to perform as robust SERS substrates as compared with the nanorods. The SERS performance of these substrates and its generality for catering to diverse molecules is demonstrated through the excellent Raman peak resolution and intensity for three different molecules, exhibiting different interaction modes on surface. Numerical simulations using FDTD shows plasmonic coupling between the particles and also brings out the influence due to size distribution. The approach combines distinct advantages of high-precision and repeatability offered by NIL with low-cost fabrication of high-resolution NIL molds by copolymer self-assembly.     

Nanoimprint Lithography: A Processing Technique for Nanofabrication Advancement

Nano-Micro Letters - Nanoimprint lithography (NIL) is an emerging micro/nano-patterning technique, which is a high-resolution, high-throughput and yet simple fabrication process. According to...     

纳米光子结构软膜紫外光固化纳米压印

紫外光固化纳米压印是实现纳米结构批量复制的一种新技术．其特点是低成本和高分辨，而且可以达到极高的套刻精度．为了得到大面积图案的均匀复制，可用聚二甲基硅氧烷（PDMS）制备透光的压印软模板．其母版图案可由高分辨率电子柬曝光和反应离子刻蚀的方法在硅片基底上获得，然后用浇注的方法将图案转移到PDMS上．本实验特别发展了紫外光固化纳米压印适用于软膜压印的双层膜图型转移技术．该双层膜由廉价的光胶和聚甲基丙烯酸甲脂（PMMA）构成．对光胶层的压印可用普通的光学曝光仪实现．然后再将图案用反应离子刻蚀的方法转移到PMMA层中．为了证明方案的可行性，在两种不同材料的半导体基片上压印了三角晶格的光子晶体和准晶结构的图案，并用剥离的方法将它们转移到金属薄膜上，最后成功地进行了硅片刻蚀实验．相信这一纳米制做方法对大面积纳米光子结构和光学集成芯片的制造是普遍适用的．     

Neon Ion Beam Lithography (NIBL)

Existing techniques for electron- and ion-beam lithography, routinely employed for nanoscale device fabrication and mask/mold prototyping, do not simultaneously achieve efficient (low fluence) exposure and high resolution. We report lithography using neon ions with fluence <1 ion/nm(2), ～1000× more efficient than using 30 keV electrons, and resolution down to 7 nm half-pitch. This combination of resolution and exposure efficiency is expected to impact a wide array of fields that are dependent on beam-based lithography.     

High-efficiency ordered silicon nano-conical-frustum array solar cells by self-powered parallel electron lithography

Nanostructured silicon thin film solar cells are promising, due to the strongly enhanced light trapping, high carrier collection efficiency, and potential low cost. Ordered nanostructure arrays, with large-area controllable spacing, orientation, and size, are critical for reliable light-trapping and high-efficiency solar cells. Available top-down lithography approaches to fabricate large-area ordered nanostructure arrays are challenging due to the requirement of both high lithography resolution and high throughput. Here, a novel ordered silicon nano-conical-frustum array structure, exhibiting an impressive absorbance of 99% (upper bound) over wavelengths 400-1100 nm by a thickness of only 5 μm, is realized by our recently reported technique self-powered parallel electron lithography that has high-throughput and sub-35-nm high resolution. Moreover, high-efficiency (up to 10.8%) solar cells are demonstrated, using these ordered ultrathin silicon nano-conical-frustum arrays. These related fabrication techniques can also be transferred to low-cost substrate solar energy harvesting device applications.     

Nanoembossed polymer substrates for biomedical surface interaction studies

Biomedical devices are moving towards the incorporation of nanostructures to investigate the interactions of biological species with such topological surfaces found in nature. Good optical transparency and sealing properties, low fabrication cost, fast design realization times, and biocompatibility make polymers excellent candidates for the production of surfaces containing such nanometric structures. In this work, a method for the production of nanostructures in free-standing sheets of different thermoplastic polymers is presented, with a view to using these substrates in biomedical cell-surface applications where optical microscopy techniques are required. The process conditions for the production of these structures in poly(methyl methacrylate), poly(ethylene naphthalate), poly(lactic acid), poly(styrene), and poly(ethyl ether ketone) are given. The fabrication method used is based on a modified nanoimprint lithography (NIL) technique using silicon based moulds, fabricated via reactive ion etching or focused ion beam lithography, to emboss nanostructures into the surface of the biologically compatible thermoplastic polymers. The method presented here is designed to faithfully replicate the nanostructures in the mould while maximising the mould lifetime. Examples of polymer replicas with nanostructures of different topographies are presented in poly(methyl methacrylate), including nanostructures for use in cell-surface interactions and nanostructure-containing microfluidic devices.     

Current Trends in Shrinking the Channel Length of Organic Transistors Down to the Nanoscale

In this Review article, we highlighted current trends in shrinking the channel length of organic field effect transistors (OFETs) down to the nanoscale in three systems where sophisticated device fabrication has been integrated into the development of different electrodes with nanoscale gaps. The design principle is the combination of molecular design freedom and flexible molecular self‐assembly with state‐of‐the‐art device fabrication to realize organic field effect nano‐transistors where molecular materials themselves behave as pivotal elements. Three different types of nanoscale electrodes are used for OFETs: metals, single‐walled carbon nanotubes (SWCNTs), and graphenes. These electrodes are made by e‐beam lithography as well as other complementary methods (shadow deposition, underetching, nanoimprinting, rubber stamping, and microcontact printing).     

Nanopatterning on nonplanar and fragile substrates with ice resists

Electron beam (e-beam) lithography using polymer resists is an important technology that provides the spatial resolution needed for nanodevice fabrication. But it is often desirable to pattern nonplanar structures on which polymeric resists cannot be reliably applied. Furthermore, fragile substrates, such as free-standing nanotubes or thin films, cannot tolerate the vigorous mechanical scrubbing procedures required to remove all residual traces of the polymer resist. Here we demonstrate several examples where e-beam lithography using an amorphous ice resist eliminates both of these difficulties and enables the fabrication of unique nanoscale device structures in a process we call ice lithography. (1, 2) We demonstrate the fabrication of micro- and nanostructures on the tip of atomic force microscope probes, microcantilevers, transmission electron microscopy grids, and suspended single-walled carbon nanotubes. Our results show that by using amorphous water ice as an e-beam resist, a new generation of nanodevice structures can be fabricated on nonplanar or fragile substrates.     

Transition of MEMS technology to nanofabrication

The transition of MEMS technology to nano fabrication is a solution to the growing demand for smaller and high-density feature sizes in the nanometer scale. Nanoimprint lithography (NIL) techniques for fabricating micro- and nano-features are discussed including hot embossing lithography (HEL), UV Molding (UVM) and micro contact printing (microCP). Recent results in micro and nano-pattern transfer are presented where features ranged from < 100 nm to several centimeters. We also present a comparative study between standard glass microfluidic chips and their HEL counterparts by metrology. Hot-embossed microfluidic chips are shown to be faithful replicates of their parent stamps. NIL is presented as a promising avenue for low-cost, high throughput micro and nano-device fabrication.     

Discrete mode lasers for communication applications

The authors present a novel, low cost laser transmitter for telecommunication systems. This device, called discrete mode (DM) laser, is basically a ridge waveguide Fabry?Pe′ rot (FP) laser, whose wavelength spectra has been modified to obtain a single mode operation. This is achieved by perturbing the effective refractive index of the guided mode along very small sections of the laser cavity, by etching features into the ridge waveguide. Suitable positioning of these interfaces allows the mirror loss spectrum of an FP laser to be manipulated in order to achieve single longitudinal mode emission. The waveguide structure requires only a single growth stage and uses optical lithography to realise the ridge. In addition, the fabrication process is re-growth free. Despite this simple and low cost fabrication process, the DM lasers portray many advantages over the distributed feedback and distributed Bragg reflector lasers, such as very high side mode suppression ratio, stable operation over a large temperature range, narrow linewidth and low sensitivity to optical feedback.     

Sculpting Asymmetric,Hollow‐Core,Three‐Dimensional Nanostructures Using Colloidal Particles

Colloidal elements have historically played a key role in “bottom‐up” self‐assembly processes for nanofabrication. However, these elementary components can also interact with light to generate complex intensity distributions and facilitate “top‐down” lithography. Here, a nanolithography technique is demonstrated based on oblique illuminations of colloidal particles to fabricate hollow‐core 3D nanostructures with complex symmetry. The light–particle interaction generates an angular light distribution as governed by Mie scattering, which can be compounded by multiple illuminations to sculpt novel 3D structures in the underlying photoresist. The fabricated geometry can be controlled by the particle parameters and illumination configurations, enabling the fabrication of a large variety of asymmetric hollow nanostructures. The proposed technique has high pattern versatility, is low cost and high throughput, and can find potential application in nanoneedles, nanonozzles, and materials with anisotropic properties.     

Nanoimprint Lithography: Methods and Material Requirements

Nanoimprint lithography (NIL) is a nonconventional lithographic technique for high‐throughput patterning of polymer nanostructures at great precision and at low costs. Unlike traditional lithographic approaches, which achieve pattern definition through the use of photons or electrons to modify the chemical and physical properties of the resist, NIL relies on direct mechanical deformation of the resist material and can therefore achieve resolutions beyond the limitations set by light diffraction or beam scattering that are encountered in conventional techniques. This Review covers the basic principles of nanoimprinting, with an emphasis on the requirements on materials for the imprinting mold, surface properties, and resist materials for successful and reliable nanostructure replication.     

Nanoimprint Lithography for Functional Three‐Dimensional Patterns

Nanoimprint lithography (NIL) is viewed as an alternative nanopatterning technique to traditional photolithography, allowing micrometer‐scale and sub‐hundred‐nanometer resolution as well as three‐dimensional structure fabrication. In this Research News article we highlight current activities towards the use of NIL in patterning active or functional materials, and the application of NIL in patterning materials that present both chemistry and structure/topo­graphy in the patterned structures, which provide scaffolds for subsequent manipulation. We discuss and give examples of the various materials and chemistries that have been used to create functional patterns and their implication in various fields as electronic and magnetic devices, optically relevant structures, biologically important surfaces, and 3D particles.