光折变晶体的光电导及陷阱密度

通过分析体全息光栅的读取过程,得到光折变晶体CuKNSBN的光电导在入射光强为5×104W/m2时的典型值为σph=3.01×10-10 A·m-2.实验得到光电导与入射光强是指数约为b=0.8的亚线性关系,从而得到满陷阱与空陷阱之密度比的定量表示式为(CCu+/CCu2+)=αIb-1.在观测的波长范围内,b随着波长缩短而增大.     

非故意掺杂n型GaN的负持续光电导现象

研究了MOCVD方法制备的非故意掺杂n型GaN薄膜的持续光电导现象.实验发现样品的光电导与入射光强有密切的关系,当入射光强由弱到强变化时,样品会依次出现正常持续光电导(PPC)、负光电导(NPC)和负持续光电导(NPPC)现象.据知,这是首次在一个样品中仅仅通过改变入射光强就可以依次产生以上现象的实验报道.通过系统的实验分析和理论研究认为,该现象形成的主要原因是材料中深能级电子陷阱和空穴陷阱共同作用的结果.     

非故意掺杂n型GaN的负持续光电导现象

研究了MOCVD方法制备的非故意掺杂n型GaN薄膜的持续光电导现象.实验发现样品的光电导与入射光强有密切的关系,当入射光强由弱到强变化时,样品会依次出现正常持续光电导(PPC)、负光电导(NPC)和负持续光电导(NPPC)现象.据知,这是首次在一个样品中仅仅通过改变入射光强就可以依次产生以上现象的实验报道.通过系统的实验分析和理论研究认为,该现象形成的主要原因是材料中深能级电子陷阱和空穴陷阱共同作用的结果.     

超瑞利散射法研究7—羟基喹啉的一阶超级化率

本文报道了利用超瑞利散射 (HRS)技术研究 7-羟基喹啉 (7HQ)的二阶非线性光学性质。采用波长为 10 6 4 nm、脉冲宽度为 35 ps的激光作激发光 ,观测其超散射光强与入射光强的关系 ,得到 7HQ的一阶超极化率为 3.2× 10 - 2 9esu。     

叶绿素d染料分子的实验研究

本文介绍了测量叶绿素d染料的各种参数的实验方法和实验结果。进行了下述四方面的研究。 1.叶绿素d可饱和吸收特性的测定。用叶绿素d Q调制的红宝石激光束,脉宽～10ns,光强范围5×10~5～1×10~8W/cm~2,测量激光束进入染料池前后的衰减与入射光强的关系。即染料透过率与入射光强的关系,通过作图求得叶绿素d在浓度为T=40％(透过率)时的饱和光强I_s≈1×10~7W/cm~2。 2.叶绿素d基态粒子恢复时间的测定。用叶绿素d可饱和吸收体锁模的红宝石激光脉冲系列和一个可变光学延迟装置对叶绿素d和隐花青染料的基态粒子恢复时间进行了     

用Z扫描技术研究Pd(mpo)2的非线性光学特性

为了研究一种新型功能配合物材料Pd(mpo)2的非线性光学特性,把二甲基甲酰苯胺(DMF)溶剂稀释的Pd(mpo)2溶液(浓度为0.75×10-4mol/L)作为待测样品,采用脉冲宽度为7ns,波长为532nm的激光束,对该样品进行了Z-扫描实验,测量了Pd(mpo)2材料的非线性吸收和非线性折射系数。实验发现,当入射光强很小时,其非线性吸收系数β=(1.916±0.016)cm/Gw,非线性折射系数γ0=-(3.153±0.048)×10-5cm2/Gw,且β和|γ|随入射光强的增大而线性减少。合理地解释了Pd(mpo)2的非线性光学特性产生机理:非线性吸收来自于近共振双光子吸收,而非线性折射是由于近共振双光子吸收造成的折射加强。非线性吸收和非线性折射系数随光强的增大而线性减少是近共振双光子吸收引起粒子数重新布居的结果。     

8～14微米碲镉汞材料电参数与光电导探测器性能的关系

本文阐述不同退火温度下获得的材料电学参数。选择合适的退火温度,可以得到性能优良的电学参数材料。同时较详细地列出了退火后的材料在低温(77K)和室温电阻率变化及光电导样品在低温(77K)和室温电阻值的变化对光电导探测器探测率的影响。电阻率相对变化在10倍左右的材料可以制得性能较好的光电导探测器样品,最高黑体探测率D_(bb)~＊=2×10~(10)厘米·赫~(1/2)瓦~(-1)。     

利用BSO晶体实现光强的非线性调制

利用BSO晶体的电光效应和光电导效应实现了光强的非线性调制,在0～25mW Ar~+激光入射情况下得到了类似于饱和吸收体的非线性透过率。     

光控调频效应的实验研究

将双基区晶体管与一光电探测器件相结合首次实现了三端负阻器件的光控调频效应。得到每ｌｕｘ光强发迹频率２．０×１０＾５Ｈｚ和每ｌｕｘ光强改变频率２．８×１０＾５Ｈｚ的实验结果。     

高性能石墨烯/硅纳米线阵列异质结光探测器

设计了基于石墨烯/硅纳米线阵列异质结的高灵敏度自驱动光探测器。该探测器中的纳米线阵列为直径约为100nm的周期性结构,表面纳米结构的光捕获效应可以有效地抑制入射光的反射,增加了有效光照面积,增强了异质结的吸收,从而提高了器件的光电检测性能。实验制备出的异质结在±3 V偏压下表现出明显的电流整流特性,整流比为693×105。此外,由于纳米线阵列的光捕获效应增强了探测器在紫外到近红外的吸收,所以该探测器的探测范围可以从紫外到近红外光。在入射波长810nm、光强为90 μW/cm2的光照下,光探测器的光电流响应度可以达到056 A·W-1,光电压响应度达124×106 V·W-1,探测率为118×1012Jones。更重要的是,该器件具有30/32 μs的快速升/降响应速度。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.