一种增益提升和摆率增强的电流镜放大器

针对低压低功耗条件下传统电流镜运算放大器电压增益和摆率严重降低的问题,提出了一种新型增益提升和摆率增强的CMOS电流镜放大器,并对其小信号增益和摆率进行了详细分析。理论分析表明,在不影响单位增益频率和相位裕度等小信号特性的同时,极大地提高了增益和摆率。仿真结果表明,与传统的CMOS电流镜放大器相比,该新型CMOS电流镜放大器的增益提高了15 dB,正、负摆率分别提高到传统放大器的146倍和187倍。     

一种恒跨导高增益轨到轨运算放大器

基于TSMC 0.18 μm CMOS工艺,设计了一种新颖的恒跨导高增益轨到轨运算放大器。输入级仅由NMOS管差分对构成,采用电平移位及两路复用选择器控制技术,在轨到轨共模输入范围内实现了输入级恒跨导。中间级采用折叠式共源共栅放大器结构,运算放大器能获得高增益。输出级采用前馈型AB类推挽放大器,实现轨到轨全摆幅输出。利用密勒补偿技术进行频率补偿,运算放大器工作稳定。仿真结果表明,在1.8 V电源电压下,该运算放大器的直流开环增益为129.3 dB,单位增益带宽为7.22 MHz,相位裕度为60.1°,整个轨到轨共模输入范围内跨导的变化率为1.44%。     

恒跨导轨对轨CMOS运算放大器的设计

为了提高运算放大器对电源电压的利用率,基于GSMC 0.18 μm CMOS工艺模型,设计了一种高增益恒跨导轨对轨CMOS运算放大器。该运算放大器的输入级采用了互补差分对,并通过3倍电流镜法保证输入级总跨导在整个共模输入范围内恒定;为了获得较大的增益和输出摆幅,中间级采用了折叠式共源共栅结构;输出级采用了AB类输出控制电路,使输出摆幅基本实现了轨对轨。在3.3 V供电电压以及1.6 V输入电压下,该放大器的直流增益为126 dB,单位增益带宽为50 MHz,相位裕度为65°。电路结构简单,易于调试,可大大缩减设计周期和成本。     

一种增益和摆率提升的电流镜运算放大器

提出了一种应用于低压低功耗电路的新型电流镜运算放大器。该运算放大器在传统电流镜运算放大器结构的基础上,在输入级增加电流复用模块,在输出级增加动态调控单元,提升了电路的增益和摆率,且不产生额外的静态功耗,不影响电路的稳定性。在UMC 28 nm CMOS工艺下进行设计和验证。仿真结果表明,在1.05 V电源电压下,与传统电流镜运算放大器相比,该运算放大器的摆率提高了11倍,增益提升了20 dB。     

一种高共模抑制比轨到轨全差分运算放大器

针对传统全差分运算放大器电路存在输入输出摆幅小和共模抑制比低的问题,提出了一种高共模抑制比轨到轨全差分运算放大器电路。电路的输入级采用基于电流补偿技术的互补差分输入对,实现较大的输入信号摆幅;中间级采用折叠式共源共栅结构,获得较大的增益和输出摆幅;输出级采用共模反馈环路控制的A类输出结构,同时对共模反馈环路进行密勒补偿,提高电路的共模抑制比和环路稳定性。提出的全差分运算放大器电路基于中芯国际(SMIC) 0.13μm CMOS工艺设计,结果表明,该电路在3.3 V供电电压下,负载电容为5 pF时,可实现轨到轨的输入输出信号摆幅;当输入共模电平为1.65 V时,直流增益为108.9 dB,相位裕度为77.5°,单位增益带宽为12.71 MHz;共模反馈环路增益为97.7 dB,相位裕度为71.3°;共模抑制比为237.7 dB,电源抑制比为209.6 dB,等效输入参考噪声为37.9 nV/Hz^1/2@100 kHz。     

一种高增益三级运算放大器

提出了一种高增益三级运算放大器。采用五管全差分、套筒式共源共栅、典型共源级结构作为运算放大器的放大级,采用共模抑制电路、频率补偿电路、高摆幅偏置电路,提高了运算放大器的性能。结果表明,在3 V电源电压、4 pF负载电容的条件下,该运算放大器的开环直流增益为155 dB,单位增益带宽为112 MHz,相位裕度为84.1°,电源抑制比为151 dB,共模抑制比为-168 dB。该运算放大器的补偿电容较小,节省了面积。     

适用于高阶Sigma Delta调制器的全差分运算放大器的设计

比较了套筒式共源共栅、折叠式共源共栅和两级AB类输出的三种运算放大器结构,提出了一种可用于前馈型高阶Sigma Delta调制器的全差分跨导运算放大器.采用SIMC 0.18 μmCMOS工艺,完成了含共模反馈电路的两级AB类输出的跨导运算放大器的设计.利用Cadence/Spectre仿真器进行仿真,结果表明放大器的直流增益为62.19dB,单位增益带宽为205.56 MHz,相位裕度为70.81°,功耗仅为0.42 mW,适合于低压低功耗Sigma Delta调制器的应用.     

一种高增益多级运算放大器的设计

为了保证运算放大器在深亚微米量级也能提供足够的增益,三级运算放大器的研究成为近年的热点内容。基于SMIC 0.18 μm工艺设计了一种三级运算放大器,前两级采用折叠共源共栅结构,在提供足够直流增益的同时增加了输入输出摆幅,并且采用DFCFC补偿方案使整体性能得到优化。在3.3 V电源电压下,负载为5 pF电容时,直流开环增益为155 dB,单位增益带宽达到了32 MHz,相位裕度为56.09°。仿真结果表明,设计的三级运算放大器具有较理想的频率响应和瞬态响应,并且所需的补偿电容值较小,芯片面积得到优化,较容易在CMOS工艺下实现。     

一种低电压恒定跨导轨到轨运算放大器的设计

设计了一种低电压恒定跨导的轨到轨运算放大器,作为误差放大器用在BUCK型DC-DC上实现对输出电压的调节。该运算放大器采用两级结构,输入级采用互补差分对的结构,实现了轨到轨电压的输入,并且利用2倍电流镜技术实现了跨导的恒定;输出级采用AB类放大器的结构,提高了输出电压摆幅和效率,实现了轨到轨电压的输出。该电路基于CSMC 0.25μm EN BCDMOS工艺进行设计,仿真结果表明:电源电压为2.8 V时,在输出端负载电容为160 pF、负载电阻为10 kΩ的情况下,增益为124 dB,单位增益带宽积为5.76 MHz,相位裕度为59.9℃,输入跨导为5.2 mΩ~(-1),共模抑制比为123 dB,输入共模信号范围为0～2.8V,输出电压摆幅为0～2.8 V。     

恒跨导高摆率轨对轨运算放大器的设计

本文在分析MOS管恒跨导输入级和AB类输出级运算放大器的基础上设计了一个高摆率、恒跨导的轨对轨运算放大器。在输入级中采用了齐纳二极管的稳压原理,保证Rail-to-Rail运算放大器的输入跨导恒定。为了实现高转换率,本文采用了一种新型的压摆率提高电路。另外,为了提高系统的稳定性,采用了控制零点的米勒补偿进行频率补偿。采...     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.     

An improved parallel thinning algorithm with two subiterations

The parallel thinning algorithm with two subiterations is improved in this paper. By analyzing the notions of connected components and passes, a conclusion is drawn that the number of passes and the number of eight-connected components are equal. Then the expression of the number of eight-connected components is obtained which replaces the old one in the algorithm. And a reserving condition is proposed by experiments, which alleviates the excess deletion where a diagonal line and a beeline intersect. The experimental results demonstrate that the thinned curve is almost located in the middle of the original curve connectivelv with single pixel width and the processing speed is high.