Ka波段分布式MEMS移相器低驱动电平容性开关的机电设计

为降低Ka波段分布式MEMS移相器容性开关的驱动电压,提出不同形状新型低弹性系数铰链梁结构MEMS电容开关的机电设计概念.采用Intelli SuiteTM和ADS软件分析了三种梁结构MEMS电容开关的位移分布、驱动电压、机械振动模式和射频性能等参数,结果表明:所设计新型beam2结构MEMS电容开关具有优越的机电特性和射频特性,即开关的驱动电压为3V,机械振动模式固有频率都大于31kHz,在35GHz处插入损耗和回波损耗分别为0.082dB和18.6dB,而相移量可达到105.9o.     

基于UV-LIGA技术的新型RF MEMS开关

介绍了一种基于UV-LIGA加工技术的双稳态电磁型RF MEMS开关,该结构由于使用了永磁体单元而使得开关在维持“开”或“关”态时不需要功耗,利用牺牲层UV-LIGA技术实现了开关的微制作。非接触式Wyko NT1100光学轮廓仪的测试表明,制备的开关实现了双稳态驱动功能,驱动脉冲电流50 mA,驱动行程17μm,响应时间20μs;开关完成一次驱动姿态转换所需要的功耗不到3μJ。AGILENT 8722ES型S参数网络分析仪的测试表明,开关在12 GHz时的插入损耗为-0.25 dB,隔离度为-30 dB。     

RFMEMS电容式并联开关的研制

通过分析MEMS电容式并联开关的工作原理,设计并制作出一款适合Ka波段分布式MEMS移相器的电容式开关。通过理论计算和经验选取,初步得到了MEMS电容式并联开关的结构尺寸。采用HFSS软件建立了开关的三维电磁场模型并优化了关键结构参数。仿真表明开关在Ka波段插入损耗小于0．15dB,回波损耗大于15dB。采用CoventorWare软件进行了开关的机电耦合仿真,得出其驱动电压为2．1V。为了满足流片单位的实际工艺约束条件,对开关的设计版图和微加工工艺进行了多轮改进,研制成功MEMS电容式并联开关工艺样品。开关动态特性测试表明,在驱动电压36V时,桥下拉的高度约为2μm。     

DC-20GHz射频MEMS开关

描述了DC-20GHz射频MEMS开关的设计和制造工艺.开关为一薄金属膜桥组成的桥式结构,形成一个单刀单掷(SPST)并联设置的金属-绝缘体-金属接触.开关通过上下电极之间的静电力进行控制,其插入损耗及隔离性能取决于开态和关态的电容.测试结果如下:射频MEMS开关驱动电压约为20V,在"开”态下DC-20GHz带宽的插入损耗小于0.69dB;在"关”态下在14-18GHz时隔离大于13dB,在18-20GHz时隔离大于16dB.本器件为国内首只研制成功的宽带射频MEMS开关.     

基于UV-LIGA技术的电磁型射频MEMS开关的集成制作

电磁型MEMS开关比静电式的结构复杂,一体化集成加工困难.对于新型电磁驱动双稳态RF MEMS开关进行了材料的选择,并对一些主要材料的电镀和悬空结构的制备与释放进行了工艺优化研究.经过工艺整合,实现了电磁型RF MEMS开关的多种非硅材料和多元结构形式的一体化集成加工.     

低激励电压微波MEMS开关的理论分析和仿真

通过对独特的MEMS微波开关模型的理论分析,并用ConventorWare和ADS软件对其微机械结构和射频性能进行仿真,得出该开关工作在DC-4GHz时,插入损耗<1dB,在2GHz的隔离度>40dB,激励电压<5V。可知这种独特的MEMS微波开关模型利用扭转臂和杠杆的原理来达到比较低的激励电压,并且获得较高的隔离度。     

DC-20GHz射频MEMS开关

描述了DC－200GHz射频MEMS开关的设计和制造工艺。开关为一薄金属膜桥组成的桥式结构,形成一个单刀单掷（SPST）并联设置的金属－绝缘体－金属接触。开关通过上下电极之间的静电力进行控制,其插入损耗及隔离性能取决于开态和关态的电容。测试结果如下：射频MEMS开关驱动电压约为20V,在“开”态下DC－20GHz带宽的插入损耗小于0．69dB;在“关”态下在14－18GHz时离小于13dB,在18－20GHz时隔离大于16dB。本器作为国内首只研制成功的宽带射频MEMS开关。     

用于X波段移相器的RF MEMS开关设计

针对某片上集成开关线式MEMS移相器设计了一款串联接触式悬臂梁开关。该移相器要求结构紧凑,工作频段为X波段,工作电压低于27V。利用Ansoft HFSS软件仿真分析了开关关键结构参数对电磁性能的影响,包括传输线断开间距d,接触金属与传输线之间的垂直间距h,接触金属的宽度B,总结了各参数对开关电磁性能的影响趋势,确定了本设计中各结构参数的最优取值;利用MEMS CAD软件CoventorWare对初始设计的开关进行机电耦合仿真,确定了开关的详细结构参数。仿真结果表明,设计的串联接触式悬臂梁开关驱动电压约为18V;中心频率为10GHz时,开关闭合态回波损耗为0.02dB,隔离度为36dB,导通态下,插入损耗为0.028dB。     

一种K~D波段宽带射频MEMS开关设计

针对卫星通信、电子对抗及微波测试系统对开关提出的宽带宽、低插损、低功耗的应用需求,设计了一种K~D波段宽带射频MEMS开关。通过优化衬底材料和十字型上电极结构提高开关的带宽,降低开关的损耗。利用HFSS电磁波仿真软件对开关的几何参数进行优化计算。结果表明,所设计的射频MEMS开关可工作在18~188 GHz的频带内,且插入损耗小于1.47 dB,隔离度大于20.12 dB,其整体体积约为0.75 mm³。此开关可与移相器、延时器、谐振器等结构集成,实现宽带且低损耗的射频可重构MEMS器件及系统,可用于新一代通信及微波测试等领域。     

电磁驱动推拉式射频MEMS开关的设计与制作

提出了一种新型电磁驱动推拉式射频MEMS开关。针对传统静电驱动单臂梁开关所需驱动电压大、恢复力不足等问题,设计了一种推拉式开关结构,降低了驱动电压(电流),提高了开关的隔离度,同时实现了单刀双掷的功能。单晶Si梁由于自身无应力,解决了悬臂梁残余应力引起的梁变形问题。通过理论计算和有限元分析,优化了开关设计尺寸,在外围永磁铁磁感应梯度dB/dz=100T/m,在线圈通入100mA电流的驱动下,单晶Si扭转梁末端可以获得约10μm的弯曲量,满足开关驱动要求。给出了开关的详细微细加工流程,对开关的传输参数进行了测试,在10GHz时隔离度为-40dB.     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.