薄板模具钢脉冲Nd:YAG激光熔凝区显微硬度特征的影响因素

本文在厚度为 0 .5— 2 .0mm的 5Cr4Mo3SiMnVAl(0 12Al)模具钢和Cr12MoV模具钢薄板上 ,采用脉冲Nd :YAG激光进行了激光熔凝实验 ,研究了工艺参数 (脉冲宽度和脉冲频率 )、材质和材料厚度对激光熔凝后熔凝层显微硬度特征的影响。结果表明 :随着脉冲宽度的增加或脉冲频率的减少 ,激光熔凝区的显微硬度有减少的趋势 ;Cr12MoV模具钢的激光熔凝区的显微硬度比 0 12Al模具钢的低 ;随着材料厚度的增加 ,激光熔凝区的显微硬度表现为先增加后减少的趋势。激光熔凝工艺参数、材料的热扩散情况和材料的热物性参数的不同是造成上述现象的主要原因。     

激光熔凝不锈钢的组织和综合性能

为探究激光熔凝工艺对不锈钢表面综合性能的影响,本课题组选用LDF 4000-40型激光器对0Cr17Ni12Mo2不锈钢表面进行处理,并采用光学显微镜、电子显微镜、能谱扫描仪、显微硬度计、电化学分析仪及磨损试验机等对其微观组织与性能进行表征.结果 表明:由于不同区域的传热、散热差异,激光熔凝组织与基体的界面呈波浪形,强化区的表层为等轴晶,中部为等轴晶和柱状晶,边缘区域为平面晶,且强化区的碳元素、铁元素及铬元素存在扩散现象;由于激光熔凝细化了微观组织,强化层的最高硬度约为基体最高硬度的1.5倍;与基体相比,强化层的耐蚀性更好,但强化层一旦发生腐蚀,其腐蚀速率比基体高;由于晶粒细化及硬度增加等原因,强化层的摩擦因数(0.29)低于基体的摩擦因数(0.35),且磨损机理为磨粒磨损.     

激光快速熔疑40Cr钢表面硬度与残余应力研究

研究40Cr在激光单道熔凝和叠道熔凝下材料表面显微组织分布特征,表面硬度分布规律和残余应力状态,结果显示单道激光熔凝的强化层组织由表层熔化区、亚表层相变硬化区及与基体相连的高温回火区组成,最大残余应力为拉应力,出现在熔凝带中心,在熔化带边缘为压应力,在热影响区为拉应力:叠道激光熔凝试件表面显微组织和硬度分布的差异在回火软化区和二次淬硬区。。叠道扫描的残余应力要比单道激光熔凝的小,新的熔凝带对前道熔凝带施加了应力并产生了韧化作用。     

渗碳淬火零件表面激光熔凝后的组织特性研究

采用3000W CO2激光器对12Cr2Ni4A钢渗碳淬火表面进行了激光熔凝处理.设计了激光熔凝处理的工艺参数,获得了表面光洁、成形良好的硬化层.研究了渗碳淬火层经激光熔凝处理后的组织特性与显微硬度分布.结果表明,预置TH-1型增强激光吸收涂料的激光熔凝处理能够显著的改善组织,显微硬度可达HV0.21100.研究还发现,激光熔凝处理后的零件表层与内部没有任何裂纹出现.研究结果为激光表面处理修复或强化渗碳淬火零件提供了基础资料.     

高铬钢轧辊激光熔凝层组织及性能

利用扫描电镜(SEM)、透射电镜(TEM)和X射线衍射(XRD)等手段对高铬钢轧辊激光熔凝层的显微组织、相结构、回火稳定性及高温耐磨性能进行了分析.结果表明,高铬钢激光熔凝处理后剖面区由熔凝区、热影响区(HAZ)和基体组成.基体组织为回火马氏体和网状M7C3型碳化物,激光熔凝处理使基体中脆性碳化物完全溶解,表面熔凝区组织得到高度细化,呈现组织梯度,生成奥氏体和M23C6型碳化物,热影响区由隐晶马氏体、残余奥氏体和弥散的碳化物组成.激光熔凝区由于细晶强化、固溶强化和位错强化的共同作用,回火稳定性明显提高,560 ℃回火后出现二次硬化,峰值硬度达到672 HV.高温滑动磨损条件下激光熔凝层具有优良的耐磨性能.     

45#钢镀铬激光诱导放电复合毛化条件下的金相初步研究

研究了镀铬后试样与普通试样在经过激光诱导复合毛化处理后显微硬度与金相的情况.通过对放电坑组织的分析,可以看出放电坑的熔凝组织分为两层:熔凝层和相变硬化层,热影响层在光学显微镜下不明显.熔凝层的最高硬度在900HV左右,大大高于45#钢基体200HV和镀Cr后300HV的硬度.在相变硬化层中,硬度随着相对表面距离的增大而逐渐下降.     

激光强化灰铸铁导轨的微观组织及磨损性能

采用正交实验优化了激光加工导轨试样的工艺参数,用光学显微镜、扫描电镜和显微硬度计对试样进行了显微组织分析和硬度测试,并在油润滑下与常规处理试样进行了磨损性能对比试验。结果显示,电流对硬化深度影响最显著,然后依次为扫描速度、脉宽和频率,优化后的激光加工参数:扫描速度为0.25mm/s,电流为150A,脉宽为10ms,频率为7Hz。激光加工试样熔凝区分布有球状石墨,相变区晶粒尺寸较熔凝区更细小,分布更均匀;硬度较常规处理有显著提高,其分布无变化梯度。当循环次数达38000时,激光加工试样较常规处理试样耐磨性提高约1倍。     

薄板模具钢脉冲Nd:YAG激光熔凝区的几何形状特征

在厚度为 0 .3— 2 .0mm的 5Cr4Mo3SiMnVAl( 0 1 2Al)模具钢和Cr1 2MoV模具钢薄板上 ,采用脉冲Nd :YAG激光进行了激光熔凝实验 ,研究了工艺参数 (脉冲宽度和脉冲频率 )、材质和材料厚度对激光熔凝后熔凝层几何形状特征的影响 ,并用一维解析模型进行了熔化深度的计算。结果表明 :随着脉冲宽度的增加或脉冲频率的减少 ,激光熔凝区的宽度和深度增加 ;Cr1 2MoV模具钢的激光熔化区宽度和深度比 0 1 2Al模具钢的大 ;随着材料厚度的增加 ,激光熔凝区的宽度增加 ,深度减小 ;用一维温度场解析模型进行熔化深度的计算是有效的。激光熔凝工艺参数、材料的热扩散情况和材料的热物性参数的不同是造成上述现象的主要原因     

薄板模具钢脉冲Nd:YAG激光熔凝试样 变形量的测量

在厚度为0.3～0.8 mm的5Cr4Mo3SiMnVAl(012Al)模具钢和Cr12MoV模具钢薄板上，采用脉冲Nd:YAG激光进行了激光熔凝实验，研究了工艺参数(脉冲宽度和脉冲频率)、材质和材料厚度对激光熔凝后试样厚度方向上最大变形量的影响。结果表明，激光熔凝薄板模具钢所引起的变形相当严重，其最大弯曲变形量与材料厚度为同一个数量级；随着脉冲频率的减少或脉冲宽度的增加或材料厚度的减少，试样厚度方向上的最大弯曲变形量增大；Cr12MoV钢试样厚度方向上的最大弯曲变形量比012Al钢的大。激光熔凝工艺参数、材料的热扩散情况和材料的热物性参数的不同是造成上述现象的主要原因。     

薄板模具钢脉冲Nd∶YAG激光熔凝试样变形量的测量

在厚度为 0 3～ 0 8mm的 5Cr4Mo3SiMnVAl(0 12Al)模具钢和Cr12MoV模具钢薄板上 ,采用脉冲Nd∶YAG激光进行了激光熔凝实验 ,研究了工艺参数 (脉冲宽度和脉冲频率 )、材质和材料厚度对激光熔凝后试样厚度方向上最大变形量的影响。结果表明 ,激光熔凝薄板模具钢所引起的变形相当严重 ,其最大弯曲变形量与材料厚度为同一个数量级 ;随着脉冲频率的减少或脉冲宽度的增加或材料厚度的减少 ,试样厚度方向上的最大弯曲变形量增大 ;Cr12MoV钢试样厚度方向上的最大弯曲变形量比 0 12Al钢的大。激光熔凝工艺参数、材料的热扩散情况和材料的热物性参数的不同是造成上述现象的主要原因     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.