一种主从混沌同步系统的研究及硬件实现

对一种基于主从同步的混沌同步系统进行了深入的研究.首先建立了该系统的数学模型并做出了仿真;然后在此基础上建立电路模型,并做了电路仿真;继而搭建了实际电路,通过示波器的观察,获得了满意的结果;最后对该系统应用于混沌保密通信中的可行性作出预测.     

混沌同步方法的研究

对驱动响应、耦合同步、反馈微扰、自适应同步和脉冲同步等5种同步方法在仿真的基础上进行了比较,介绍了主被动同步方法和高阶级联混沌系统的同步,并阐述了混沌同步与混沌通信的关系.     

超混沌系统的电路仿真及其自适应同步

对已提出的超混沌 Lü系统进行改进,构造研究一个新四维动力系统.对其进行复杂动力学分析,表明该系统含有超混沌吸引子.给出该系统的电路原理图,利用电路仿真得到与数值仿真完全相符的动力学行为.通过设计自适应控制器,将新超混沌系统的混沌轨道镇定到平衡点,并构造了自适应同步的驱动和响应系统,利用MATLAB仿真实现两个初值不同的新超混沌系统同步.结果表明,自适应同步与控制方法控制超混沌动力系统的有效性和可行性.     

一种新颖的统一混沌保密通信系统

文章详细地介绍了统一混沌系统和Pecora-Carroll同步法,用P-C法实现统一混沌系统同步,提出了一种新颖的保密通信系统,并用Matlab6.5/Simulink仿真软件进行建模仿真。结果表明,该系统能够正确地解调出原始加密信号,达到保密通信的目的。     

基于状态观测器的超混沌系统高精度同步方法

本文利用全维状态观测器理论实现了超混沌系统的同步,这种同步方法具有精度高、高效率、简单、灵活和能控的特点。提出同步混沌系统中的同步建立时间、同步稳态误差和同步精度的概念,设计了耦合蔡氏超混沌系统和Roessler超混沌系统的高精度同步方法,并对该方法的抗干扰性能进行了研究,计算机仿真结果证实了这种同步设计方法的有效性。     

分数阶超混沌系统的动力学分析及同步

对一个新的超混沌系统通过分数阶线性系统稳定性理论分析得出其分数阶形式,并利用matlab仿真得出该系统的混沌吸引子图像.接着对该分数阶系统的同阶数和不同阶数两种形式进行异结构的同步分析,设计自适应同步控制器,实现该系统的异结构同步,数值仿真的结果表明设计控制器很好的实现了驱动系统和响应系统的同步.     

一种基于观测器的混沌同步设计方法

本文基于工程上广为应用的非线性观测器思想,设计了一种混沌通信系统的同步设计方法:针对最新提出的统一混沌系统模型,采用状态观测器同步理论,通过设计合适的状态观测器,研究了随机扰动存在的情况下的混沌系统同步问题.对本文所考虑的观测器,还可以通过改变的值来调整观测器的参数,以满足一定的性能指标要求,从而在实际上更具有应用价值.该方法无需计算同步的条件李亚普诺夫指数,而且对噪声有一定的鲁棒性.通过MTLAB 6.5仿真,表明了该方法的有效性.     

基于四维混沌系统的OFDM同步算法

针对传统同步算法计算复杂度高,符号同步和载波同步精度低,保密性差等缺点,提出一种基于四维混沌系统的OFDM同步算法.首先通过分析该四维系统的动力学特性、对初始值的敏感性和计算Lyapunov指数等方式,证明该系统是一个新混沌系统,并分析生成的混沌序列相关性质.然后将混沌序列用于构造一个L等分的同步训练序列,基于该同步训练序列提出一种新的OFDM系统符号同步和载波同步方法.理论分析和仿真结果表明新算法计算复杂度低,符号同步和载波同步精度高,增强了系统保密性.     

混沌系统的混合同步及其在安全通信中的应用

提出了一类混沌系统的混合同步方法。利用非线性系统的状态观测器，给出了一类混沌系统的同步和安全通信的简单有效的方法，并分析了系统的稳定性，对Rossler混沌系统的分析和仿真研究表明，该方法在混沌同步及安全通信中具有同步速度快、系统精度高等优良性能。     

一种基于误差系统稳定性的混沌广义同步方法

该文在将混沌系统分为线性与非线性两部分的基础上,利用反馈控制及参数变换,提出了一种新的混沌广义同步方法。该方法基于线性变换,把系统广义同步问题转化为同步误差系统的稳定性问题,并给出了广义同步存在的条件。该方法可以通过配置同步速度,改善混沌广义同步的性能。且不受混沌系统线性部分稳定性的限制,扩大了混沌广义同步的通用性。通过对Lorenz系统进行仿真,结果表明该方法具有很好的适用性。     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Nanoimprint Lithography -A Next Generation High Volume Lithography Technique

IntroductionNanoimprint Lithography is a well-acknowl-edged low cost, high resolution, large area pattern-ing process. It includes the most promising methods,high-pressure hot embossing lithography (HEL) [2],UV-cured imprinting (UV-NIL) [3] and micro contactprinting (m-CP, MCP) [4]. Curing of the imprintedstructures is either done by subsequent UV-lightexposure in the case of UV-NIL or by cooling downbelow the glass transition temperature of the ther-moplastic material in case of HEL…     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

Influence of PVK ： NPB hole transporting layer on the characteristics of organic light-emitting devices

A doping system consisting of NPB and PVK is employed as a composite hole transporting layer （CHTL）. By adjusting the component ratio of the doping system, a series of devices with different concentration proportion of PVK ： NPB are constracted. The result shows that doping concentration of NPB enhances the competence of hole transporting ability, and modifies the recombination region of charge as well as affects the surface morphology of doped film. Optimum device with a maximum brightness of 7852 cd/m^2 and a power efficiency of 1.75 lm/W has been obtained by choosing a concentration proportion of PVK ： NPB at 1：3.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.     

Analysis of error performance on Turbo coded FDPIM

Due to variable symbol length of digital pulse interval modulation（DPIM）, it is difficult to analyze the error performances of Turbo coded DPIM. To solve this problem, a fixed-length digital pulse interval modulation（FDPIM） method is provided. The FDPIM modulation structure is introduced. The packet error rates of uncoded FDPIM are analyzed and compared with that of DPIM. Bit error rates of Turbo coded FDPIM are simulated based on three kinds of analytical models under weak turbulence channel. The results show that packet error rate of uncoded FDPIM is inferior to that of uncoded DPIM. However, FDPIM is easy to be implemented and easy to be combined, with Turbo code for soft-decision because of its fixed length. Besides, the introduction of Turbo code in this modulation can decrease the average power about 10 dBm, which means that it can improve the error performance of the system effectively.     

A method for calculating the center position of collimated light

It is a key problem to accurately calculate beam spots＇ center of measuring the warp by using a collimated laser. A new method, named double geometrical center method （DGCM）, is put forward for the first time. In this method, a plane wave perpendicularly irradiates an aperture stop, and a charge couple device （CCD） is employed to receive the diffraction-beam spots, then the geometrical centers of the fast and the second diffraction-beam spots are calculated respectively, and their mean value is regarded as the center of datum beam. In face of such adverse instances as laser intension distributing defectively, part of the image being saturated, this method can still work well. What＇s more, this method can detect whether an unacceptable error exits in the courses of image receiving, processing and calculating. The experimental results indicate the precision of this method is high.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Preparation and Characterization of TaN ALD Precursors

High purity organic-tantalum precursors for thin film ALD TaN were synthesized and characterized.Vapor pressure and thermal stability of these precursors were studied.From the vapor pressure analysis,it was found that TBTEMT has a higher vapor pressure than any other published liquid TaN precursor,including TBTDET,TAITMATA,and IPTDET.Thermal stability of the alkyl groups on the precursors was investigated using a 1H NMR technique.The results indicated that the tertbutylimino group is the most stable group on TBTDET and TBTEMT as compared to the dialkylamido groups.Thermal stability of TaN precursors decreased in the following order:TBTDET ＞ PDMAT ＞ TBTEMT.In conclusion,precursor vapor pressure and thermal stability were tuned by making slight variations in the ligand sphere around the metal center.