Shock Synthesis of Cubic Silicon Nitride

The phase transitions of α-Si₃N₄ and β-Si₃N₄ have been investigated by shock compression through the recovery technique and Hugoniot measurements. α- and β-Si₃N₄ are transformed into a cubic spinel structure ( c -Si₃N₄). The yield of c -Si₃N₄ increases with increasing shock pressure and reaches 100% at 63 GPa. The shock-synthesized c -Si₃N₄ powders are nanocrystals and display a high-temperature metastability up to about 1620 K. c -Si₃N₄ is one of the hard materials based on the measured equation of state. c -Si₃N₄ powders have been characterized by electron microscopy and ²⁹Si magic angle spinning NMR spectroscopy. The purification and separation method has been developed to obtain pure c -Si₃N₄ powders.     

Calculation of XANES/ELNES Spectra of All Edges in Si3N4 and Si2N2O

Using a recently developed first-principles supercell method that includes the electron and core-hole interaction, the XANES/ELNES spectra of Si- L _2,3, Si- K , and N- K edges in α-Si₃N₄, β-Si₃N₄, spinel c -Si₃N₄, and Si₂N₂O were calculated and compared. The difference in total energies between the initial ground state and the final core-hole state provides the transition energy. The calculated spectra are found to be in good agreement with the experimental measurements on β-Si₃N₄ and c -Si₃N₄. The differences in the XANES/ELNES spectra for the same element in different crystals are explained in terms of differences in local bonding. The use of orbital-decomposed local density of states to explain the measured spectra is shown to be inadequate. These results reaffirm the importance of including the core-hole effect in any XANES/ELNES spectral calculation.     

Reaction and Formation of Crystalline Silicon Oxynitride in Si–O–N Systems under Solid High Pressure

Oxidized amorphous Si₃N₄ and SiO₂ powders were pressed alone or as a mixture under high pressure (1.0–5.0 GPa) at high temperatures (800–1700°C). Formation of crystalline silicon oxynitride (Si₂ON₂) was observed from amorphous silicon nitride (Si₃N₄) powders containing 5.8 wt% oxygen at 1.0 GPa and 1400°C. The Si₂ON₂ coexisted with β-Si₃N₄ with a weight fraction of 40 wt%, suggesting that all oxygen in the powders participated in the reaction to form Si₂ON₂. Pressing a mixture of amorphous Si₃N₄ of lower oxygen (1.5 wt%) and SiO₂ under 1.0–5.0 GPa between 1000° and 1350°C did not give Si₂ON₂ phase, but yielded a mixture of α,β-Si₃N₄, quartz, and coesite (a high-pressure form of SiO₂). The formation of Si₂ON₂ from oxidized amorphous Si₃N₄ seemed to be assisted by formation of a Si–O–N melt in the system that was enhanced under the high pressure.     

Shock-Compacted Si3N4 Nanocrystalline Ceramics: Mechanisms of Consolidation and of Transition from α- to β-form

Ultrafine powder of α-Si₃N₄ several tens of nanometers in size was successfully consolidated using a shock-compaction technique under 40 GPa. The bulk density of the most dense portion attained 99% of the theoretical value, and the Vick-ers microhardness was 2300 kg/mm. Consolidation was achieved through both densificarion by plastic deformation of constituent grains and interparticle bonding by surface melting. A transition process to β-Si₃N₄ was observed by transmission electron microscopy: Surface melting of the individual grains propagated into the center as temperature increased, and a large mass formed. A precursor of β–Si3N4 then emerged from the mass and finally grew into a β-Si₃N₄ crystal.     

Hot-Pressing of Si3N4 with Y2O3 and Li2O as Additives

The rates of densification and phase transformation undergone by α-Si₃N₄ during hot-pressing in the presence of Y₂O₃, Y₂O₃−2SiO₂, and Li₂0−2Si0₂ as additives were studied. Although these systems behave less simply than MgO-doped Si₃N₄, the data can be interpreted during the early stages of hot-pressing as resulting from a solution-diffusion-reprecipitation mechanism, where the diffusion step is rate controlling and where the reprecipitation step invariably results in the formation of the β-Si₃N₄ phase.     

Crystal Phase and Phonon Densities of States of β'-SiAION Ceramics, Si6-zAlzOzN8-z (0 ≤z≤ 4)

The crystal structure and phonon densities of states (DOS) of β-SiAlON ceramics, Si₆_ _z Al _z O _z N_8-z (0 < z < 4), prepared by a novel slipcast method, are studied by neutron-scattering techniques. The samples with z < 4 form a single-phase solid solution of Si-Al-O-N isostructural to β-Si₃N₄ (space group P 6 ₃/m). A consistent preferential occupation of the 2c sites by oxygen atoms and the 6 h sites by nitrogen atoms exists within this structure. The phonon DOS of β'-SiAlON displays phonon bands at ∼50 and 115 meV. These features are considerably broader than the corresponding ones in β-Si₃N₄ powder.     

Yield Strength of α-Silicon Nitride at High Pressure and High Temperature

Through the analysis of peak broadening of energy-dispersive diffraction lines from a powdered sample, the yield strength of α-Si₃N₄ was investigated at a pressure of 9 GPa and temperatures up to 1234°C. During compression at room temperature, the lattice strain deduced from peak broadening increased linearly with pressure up to 9.2 GPa, with no clear indication of strain saturation. While heating at 9 GPa, diffraction peaks narrowed and significant stress relaxation was observed at temperatures above 400°C, indicating the onset of yielding. The yield strength of α-Si₃N₄ decreases rapidly with increasing temperature: from 8.7 GPa at 400°C to 4.0 GPa at 1234°C. The low temperature for the onset of yielding and decrease of yield strength upon further heating bring up concern regarding the performance of α-Si₃N₄ as an engineering material. Finally, the grain size variation is also outlined together with the dependence of differential strain on pressure and on temperature. This provides crucial information for clarifying the "fine structure" of the evolution of the differential strain.     

Fabrication and Microstructure of Silicon Nitride/Boron Nitride Nanocomposites

A chemical process for fabrication of Si₃N₄/BN nanocomposite was devised to improve the mechanical properties. Si₃N₄/BN nanocomposites containing 0 to 30 vol% hexagonal BN ( h -BN) were successfully fabricated by hot-pressing α-Si₃N₄ powders, on which turbostratic BN ( t -BN) with a disordered layer structure was partly coated. The t -BN coating on α-Si₃N₄ particles was prepared by reducing and heating α-Si₃N₄ particles covered with a mixture of boric acid and urea. TEM observations of this nanocomposite revealed that the nanosized hexagonal BN ( h -BN) particles were homogeneously dispersed within Si₃N₄ grains as well as at grain boundaries. As expected from the rules of composites, Young's modulus of both micro- and nanocomposites decreased with an increase in h -BN content, while the fracture strength of the nanocomposites prepared in this work was significantly improved, compared with the conventional microcomposites.     

Standard Gibbs Energy of Formation of β-Silicon Nitride

Experimental thermochemical data (temperature, pressure) corresponding to the equilibrium conditions between finegrained β-SiC and β-Si₃N₄ for carbon activity a (C) = 1 are presented. Based on these data, the temperature dependence of ΔG°_f(β-Si₃N₄) has been expressed for standard states Si( s ), C( s ), and p(N₂) = 0.1 MPa by the equation ΔA°_f(β-Si₃N₄) = (-995.9 + 0.4547 T/K) kJ mol for T/K ε〈1650; 1968〉.     

Further Improvement in Mechanical Properties of Highly Anisotropic Silicon Nitride Ceramics

Si₃N₄ceramics were fabricated by tape casting of a raw-powder slurry seeded with three types of rodlike β-Si₃N₄particles. The effects of seed size on the microstructure and mechanical properties of the sintered specimens were investigated. All the seeded and tape-cast silicon nitrides presented an anisotropic microstructure, where the elongated grains grown from seeds were preferentially oriented parallel to the casting direction. The orientation degree of these grains, f ₀, was affected by seed size, and small-seed addition led to the highest f ₀value. This material exhibited high bending strength (∼1.4 GPa) and high fracture toughness (∼12 MPa^.m^1/2) in the direction normal to the grain alignment, which were attributed to the highly anisotropic and fine microstructure.     

Formation of α-Si3N4 Solid Solutions in the System Si3N4-A1N-Y2O3

The subsolidus phase diagram of the quasiternary system Si₃N₄-AlN-Y₂O₃ was established. In this system α-Si₃N₄ forms a solid solution with 0.1Y₂O₃: 0.9 AIN. The solubility limits are represented by Y_0.33Si_10.5Al_1.5O_0.5N_15.5 and Y_0.67Si₉A1₃ON₁₅. At 1700°C an equilibrium exists between β-Si₃N₄ and this solid solution.     

Fabrication of Hard and Strong α/β-Si3N4 Composites With MgSiN2 as Addivitives

α/β-Si₃N₄ composites with various α/β phase ratios were prepared by hot pressing at 1600°–1650°C with MgSiN₂ as sintering additives. An excellent combination of mechanical properties (Vickers indentation hardness of 23.1 GPa, fracture strength of about 1000MPa, and toughness of 6.3 MPa·m^1/2) could be obtained. Compared with conventional Si₃N₄-based ceramics, this new material has obvious advantages. It is as hard as typical in-situ-reinforced α-Sialon, but much stronger than the latter (700 MPa). It has comparable fracture strength and toughness, but is much harder than β-Si₃N₄ ceramics (16 GPa). The microstructures and mechanical properties can be tailored by choosing the additive and controlling the heating schedule.     

Dissolution Kinetics of β-Si3N4 in an Mg-Si-O-N Glass

The rate of dissolution of β-Si₃N₄ into an Mg-Si-O-N glass was measured by working with a composition in the ternary system Si₃N₄-SiO₂-MgO such that Si₂N₂O rather than β-Si₃N₄ was the equilibrium phase. Dissolution was driven by the chemical reaction Si₃N₄(c)+SiO₂( l )→Si₂N₂O(c). Analysis of the kinetic data, in view of the morphology of the dissolving phase (Si₃N₄) and the precipitating phase (Si₂N₂O), led to the conclusion that the dissolution rate was controlled by reaction at the crystal/glass interface of the Si₃N₄, crystals. The process appears to have a fairly constant activation energy, equal to 621 ±40 kJ-mol⁻¹, at T=1573 to 1723 K. This large activation energy is believed to reflect the sum of two quantities: the heat of solution of β-Si₃N₄ hi the glass and the activation enthalpy for jumps of the slower-moving species across the crystal/glass interface. The data reported should be useful for interpreting creep and densification experiments with MgO-fluxed Si₃N₄.     

Low-Temperature Synthesis of Nanocrystalline α-Si3N4 Powders by the Reaction of Mg2Si with NH4Cl

Nanocrystalline α-Si₃N₄ powders have been prepared with a yield of 93% by the reaction of Mg₂Si with NH₄Cl in the temperature range of 450° to 600°C in an autoclave. X-ray diffraction patterns of the products can be indexed as the α-Si₃N₄ with the lattice constants a = 7.770 and c = 5.627 Å. X-ray photoelectron spectroscopy analysis indicates that the composition of the α-Si₃N₄ samples has a Si:N ratio of 0.756. Transmission electron microscopy images show that the α-Si₃N₄ crystallites prepared at 450°, 500°, and 550°C are particles of about 20, 40, and 70 nm in average, respectively.     

Additive-Assisted Nitridation to Synthesize Si3N4 Nanomaterials at a Low Temperature

Starting from Si powder, NaN₃ and different additives such as N -aminothiourea, iodine, or both, Si₃N₄ nanomaterials were synthesized through the nitridation of silicon powder in autoclaves at 60°–190°C. As the additive was only N -aminothiourea, β-Si₃N₄ nanorods and α-Si₃N₄ nanoparticles were prepared at 170°C. If the additive was only iodine, α-Si₃N₄ dendrites with β-Si₃N₄ nanorods were obtained at 190°C. However, when both N -aminothiourea and iodine were added to the system of Si and NaN₃, the products composed of β-Si₃N₄ nanorods and α, β-Si₃N₄ nanoparticles could be prepared at 60°C.     

Phase Relationships in the Si3N4–SiO2–Lu2O3 System

Phase relationships in the Si₃N₄–SiO₂–Lu₂O₃ system were investigated at 1850°C in 1 MPa N₂. Only J-phase, Lu₄Si₂O₇N₂ (monoclinic, space group P 2₁/ c , a = 0.74235(8) nm, b = 1.02649(10) nm, c = 1.06595(12) nm, and β= 109.793(6)°) exists as a lutetium silicon oxynitride phase in the Si₃N₄–SiO₂–Lu₂O₃ system. The Si₃N₄/Lu₂O₃ ratio is 1, corresponding to the M-phase composition, resulted in a mixture of Lu–J-phase, β-Si₃N₄, and a new phase of Lu₃Si₅ON₉, having orthorhombic symmetry, space group Pbcm (No. 57), with a = 0.49361(5) nm, b = 1.60622(16) nm, and c = 1.05143(11) nm. The new phase is best represented in the new Si₃N₄–LuN–Lu₂O₃ system. The phase diagram suggests that Lu₄Si₂O₇N₂ is an excellent grain-boundary phase of silicon nitride ceramics for high-temperature applications.     

Plasma Etching of α-Sialon Ceramics

Plasma etching of β-Si₃N₄, α-sialon/β-Si₃N₄ and α-sialon ceramics were performed with hydrogen glow plasma at 600°C for 10 h. The preferential etching of β-Si₃N₄ grains was observed. The etching rate of α-sialon grains and of the grain-boundary glassy phase was distinctly lower than that of β-Si₃N₄ grains. The size, shape, and distribution of β-Si₃N₄ grains in the α-sialon/β-Si₃N₄ composite ceramics were revealed by the present method.     

Tensile Strength of Silicon Nitride Whiskers Synthesized by Reacting Amorphous Silicon Nitride and Titanium Dioxide

The tensile strength of α-Si₃N₄ whiskers synthesized by reacting amorphous Si₃N₄ and TiO₂ at 1490°C under a N₂ pressure of 700 torr was measured using a microbalance, and the diameter dependence of the strength was investigated. The Si₃N₄ whiskers had diameters of 0.04 and 0.8 μm and dominant [1011] and [1010] growth directions. Chemical analysis showed that they contained Ti and O impurities. The tensile strength of six Si₃N₄ whiskers increased from 17 to 59 GPa with decreasing whisker diameter.     

Influence of Phase Formation on Dielectric Properties of Si3N4 Ceramics

The influence of phase formation on the dielectric properties of silicon nitride (Si₃N₄) ceramics, which were produced by pressureless sintering with additives in MgO–Al₂O₃–SiO₂ system, was investigated. It seems that the difference in the dielectric properties of Si₃N₄ ceramics sintered at different temperatures was mainly due to the difference of the relative content of α-Si₃N₄, β-Si₃N₄, and the intermediate product (Si₂N₂O) in the samples. Compared with α-Si₃N₄ and Si₂N₂O, β-Si₃N₄ is believed to be a major factor influencing the dielectric constant. The high-dielectric constant of β-Si₃N₄ could be attributed to the ionic relaxation polarization.     

High-Resolution Electron Microscopy of Chemically Vapor-Deposited β-Si3N4-TiN Composites

Microstructures of Si₃N₄-TiN composites prepared by chemical vapor deposition (CVD) were investigated by the multibeam imaging technique using a 1 MV electron microscope. High-resolution images showed a number of fibrous TIN crystallites dispersed in the matrix of CVD β-Si₃N₄. Crystallographic orientation relations between β-Si₃N₄ and TiN were determined directly from the observed images in the subcell scale. The fibrous axis of TiN is parallel to the (110) direction of the NaCl structure and lies along the c axis of the hexagonal β-Si₃N₄ crystal. Domain boundaries, planar faults, nonplanar faults, and dislocations were found in the CVD β-Si₃N₄ matrix near the TiN crystallites. The origin of the structure defects is briefly discussed in connection with the formation of TiN crystallites in the matrix.