Effect of Indium Ambient on Electrical Properties of Mg-Foped AlxGa1-xN

Mg-doped AlxGa1-xN epilayers were grown on AlN/sapphire templates by metal organic chemical vapor depo- sition （MOCVD） using an indium-assisted growth method. At room temperature, the resistivity of Mg-doped Alo.43Gao.57N epilayer grown under indium （In） ambient is of the order of 10^4Ω.cm, while the resistivity of Mg-doped Al0.43Ga0.57N grown without In assistance is of the order of 10^6Ω.cm. The ultraviolet light-emitting diodes （UV-LEDs） using the In-assisted Mg-doped Al0.43Ga0.57N as the p-type layers were fabricated to verify the function of indium ambient. It is found that there are a lower turn-on voltage and a lower diode series resistance in the UV-LEDs fabricated with p-type Al0.43Ga0.57 N layers grown under In-ambient.     

金属有机化学气相淀积技术制备GaMnN薄膜材料光学性质研究

研究由MOCVD 技术制备的 GaMnN 外延薄膜光吸收谱.实验发现Mn掺杂后较未掺杂GaN吸收系数在近紫外区增加,在吸收谱低能区144 eV附近观察到吸收峰,吸收系数随Mn浓度的增加而增大.实验结果与基于密度泛函理论的第一性原理计算结果一致,结合理论计算分析认为144 eV附近的吸收峰源于Mn³⁺离子e态与t₂态间的带内跃迁⁵T₂→⁵E. 关键词： GaMnN MOCVD 密度泛函理论 光学性质     

低压MOCVD生长GaN p—n结蓝光LED

简要报道了采用一种改进的低压金属有机化物化学气相沉积（ＬＰ－ＭＯＣＶＤ）方法制备ＧａＮｐ－ｎ结蓝光光发射二极管（ＬＥＤ），介绍了ＬＥＤ的基本特性，这种ＬＥＤ具有良好的Ｉ－Ｖ特性和光谱特性，室温下，在正向电压５Ｖ，正向电流３－２０ｍＡ的条件下，峰值波长为依Ｍｇ的掺杂浓度和退火条件的不同而不同，分别在４２５ｎｍ，４３５ｎｍ和４８０ｎｍ附近，发射谱的半峰宽约为５０ｎｍ。     

Influence of Growth Temperature and Trimethylindium Flow of InGaN Wells on Optical Properties of InGaN Multiple Quantum-Well Violet Light-Emitting Diodes

An InGaN multiple-quantum-well (MQW) violet-light-emitting diode (LED) is grown by low-pressure metalorganic chemical vapour deposition. It is found that photoluminescence wavelength of the InGaN MQW violet LED is lengthened with increasing growth temperature and with the increasing trimethylindium flow of the InGaN wells. The electroluminescence peak wavelength of the violet LED are about 401 nm with full width at half maximum of 14nm, and the output power in injection current of 2OmA at room temperature is 4.1mW.     

基于粒子群优化的网络动态可靠性分析

时变性是节点和网络的典型特征。针对时变可靠性问题主要是基于上穿率法进行分析,传统的上穿率法分析方法通过时间离散,然后采用FORM法计算其瞬时可靠度,进而计算上穿率。对于功能函数非线性程度较高时,FORM求解精度降低。本文采用pso算法改进上穿率法,首先在离散时间之后,通过pso算法求解瞬时可靠度指标,然后计算上穿率进行时变可靠性分析,并通过实例与上穿率法及Monte-Carlo方法进行对比,本文提出的方法可以提高计算精度。     

用X射线衍射法测定氮化镓马赛克结构中的面内扭转角

Ⅲ-Ⅴ族氮化物半导体材料在发光二极管、激光器和探测器方面有着广泛的应用,采用高分辨X射线衍射来测定用金属有机化学气相沉淀法在蓝宝石衬底上生长的氮化镓外延层马赛克结构的扭转角,分别研究了(0002)、(1013)、(1012)、(1011)、(2021)五个面的X射线摇摆曲线,并且用Pseudo-Voigt方程拟合每一个面的摇摆曲线,我们利用外推法很方便地测得氮化镓外延薄膜的面内扭转角。另外我们采用同步辐射X射线掠入射衍射对样品进行(1100)面反射φ扫描直接测得面内扭转角,对第一种方法进行验证,两种方法测量结果相同。从而提供一种简单、方便的GaN外延层的面内扭转角的测试方法,为深入研究GaN材料奠定良好基础。     

Growth and Optical Properties of Double Heterostructure GaN／InGaN／GaN Films with Large Composition

The double heterostructure GaN/InGaN/GaN films with different thicknesses of the InGaN layer were grown at 780℃ or 800℃ by metal-organic chemical vapour deposition.The samples were investigated using x-ray diffraction (XRD),room-temperature photoluminescence (PL) and Raman scattering.The dependences of the samples on both the growth temperature and the thickness of the InGaN layer were studied.The composition of InGaN was determined by the results of XRD,and the bowing parameter of InGaN was calculated in terms of the PL spectra.When the thickness of the InGaN layer was reduced,the phase separation of InGaN was found in some samples.The raman frequency of the A1(LO) and E2(low) modes in all the samples shifted and did not agree with Vegard‘s law.     

HVPE反应器的环形分隔进口数对生长均匀性的影响

利用FLUENT软件对3种环形分隔进口(4环、8环、12环)的氢化物气相外延(HVPE)反应器的生长均匀性进行了二维数值模拟研究。分别考虑输运模型和输运-生长模型,模拟过程保持相同的GaCl、NH3及N2气体进口流量。结果显示:在只考虑输运的模型中,反应室流动均匀性随着进口环数的增多而改善。8环进口时,衬底上方温度分布最均匀;4环进口时,衬底上方的GaCl浓度较高,但均匀性最差,Ⅴ/Ⅲ比也较低;8环及12环进口可得到均匀的GaCl浓度分布及较高的Ⅴ/Ⅲ比。在包括输运和GaN生长的模型中,尽管8环进口反应器衬底上方的GaCl浓度低于12环进口反应器,却因其较薄的边界层厚度而导致较高的生长速率,并且生长均匀性较高。因此,8环进口反应室更有利于GaN的HVPE生长。     

Role of vacancy-type defects in magnetism of GaMnN

Role of vacancy-type(N vacancy(VN) and Ga vacancy(VGa)) defects in magnetism of GaMnN is investigated by first-principle calculation.Theoretical results show that both the VNand VGainfluence the ferromagnetic state of a system.The VNcan induce antiferromagnetic state and the VGaindirectly modify the stability of the ferromagnetic state by depopulating the Mn levels in GaMnN.The transfer of electrons between the vacancy defects and Mn ions results in converting Mn~(3+)(d~4) into Mn~(2+)(d5).The introduced VNand the ferromagnetism become stronger and then gradually weaker with Mn concentration increasing,as well as the coexistence of Mn~(3+)(d~4) and Mn~(2+)(d~5) are found in GaMnN films grown by metal–organic chemical vapor deposition.The analysis suggests that a big proportion of Mn~(3+)changing into Mn~(2+)will reduce the exchange interaction and magnetic correlation of Mn atoms and lead to the reduction of ferromagnetism of material.     

MOVPE生长m面GaN薄膜的表面吸附研究

采用基于密度泛函理论的Materials Studio中的CASTEP模块,对金属有机物气相外延MOVPE生长m面GaN薄膜的表面反应前体的吸附过程进行研究.针对吸附粒子GaCH3和NH3在m面GaN表面不同的初始吸附位,优化计算了GaCH3和NH3在表面的吸附能、与近邻原子的距离、态密度、电荷密度分布、电子布居.计算结果表明,GaCH3在表面Ga brg2位优化之后的位置最稳定,吸附能最低,GaCH3中的Ga原子与表面邻近的N原子、Ga原子分别形成Ga-N、Ga-Ga共价键.NH3在表面N brg2位最稳定,吸附能最低,NH3中的N原子与表面邻近的Ga原子形成N-Ga共价键.通过对比在最佳吸附位的MMG中的Ga原子和NH3中的N原子与表面原子的电荷分布情况和布居数,证明上述吸附粒子与表面确实存在共价作用,形成共价键.