激光钝化对熔石英修复后损伤性能影响的实验研究

采用10.6 μupm 的 CO₂激光, 对单次激光脉冲辐照修复熔石英存在的烧蚀采用大光斑钝化去除. 经过辐照修复的区域置于前表面测试初始损伤阈值, 结果表明调制造成的损伤得到了一定程度的抑制; 辐照区域置于后表面修复后 熔石英的初始损伤阈值超过了基底的初始损伤阈值. 实验观察到了应力分布外扩, 同时明显减弱. 对损伤增长的测试说明, 经过激光熔融辐照后的损伤点, 当应力释放以后, 损伤扩展初期表现出指数增长趋势, 后期随着辐照次数的增加, 损伤增长不再明显, 并且趋于恒定值.     

Rear-surface light intensification caused by a Hertzian-conical crack in 355-nm silica optics

Theoretical studies show that a Hertzian-conical crack can be considered to be composed of double cone faces for simplicity. In the present study, the three-dimensional finite-difference time-domain method is employed to quantify the electric-field distribution within the subsurface in the presence of such a defect under normal incidence irradiation. Both impurities (inside the crack) and the chemical etching have been investigated. The results show that the maximum electric field amplitude |E| max is 9.57374 V/m when the relative dielectric constant of transparent impurity equals 8.5. And the near-field modulation will be improved if the crack is filled with the remainder polishing powders or water vapor/drops. Meanwhile, the laser-induced initial damage moves to the glass-air surface. In the etched section, the magnitude of intensification is strongly dependent on the inclination angle θ. There will be a highest modulation when θ is around π/6, and the maximum value of |E| max is 18.57314 V/m. When θ ranges from π/8 to π/4, the light intensity enhancement factor can easily be larger than 100, and the modulation follows a decreasing trend. On the other hand, the modulation curves become smooth when θ > π/4 or θ < π/8.     

Bright blue photoluminescence from a mixed tin and manganese oxide xerogel prepared via solben hydrothermalben gel process

A new blue photoluminescent material, a mixed tin and manganese oxide xerogel, is prepared via sol-hydrothermal-gel process assisted by citric acid. The composition xerogel exhibits strong blue emission at room temperature, with an emission maximum at 434 nm under short (234 nm) or long-wavelength (343 nm) ultraviolet excitation. The photoluminescent excitation spectrum of the mixed tin and manganese oxide xerogel, monitored at an intensity maximum wavelength of 434 nm of the emission, consists of two excitation peaks at 234 nm and 343 nm. With heat treatment temperature increasing from 110 ℃ to 200 ℃, the blue emission intensity increases remarkably, whereas it is almost completely quenched after being treated at 300 ℃. The carbon impurities in the mixed tin and manganese oxide xerogel, confirmed by Fourier transform infrared spectroscopy and X-ray photoelectron spectroscopy, should be responsible for the bright blue photoluminescence.     

Surface defects,stress evolution,and laser damage enhancement mechanism of fused silica under oxygen-enriched condition

Oxygen ions (O⁺) were implanted into fused silica at a fixed fluence of 1×10¹⁷ ions/cm² with different ion energies ranging from 10 keV to 60 keV. The surface roughness, optical properties, mechanical properties and laser damage performance of fused silica were investigated to understand the effect of oxygen ion implantation on laser damage resistance of fused silica. The ion implantation accompanied with sputtering effect can passivate the sub-/surface defects to reduce the surface roughness and improve the surface quality slightly. The implanted oxygen ions can combine with the structural defects (ODCs and E' centers) to reduce the defect densities and compensate the loss of oxygen in fused silica surface under laser irradiation. Furthermore, oxygen ion implantation can reduce the Si-O-Si bond angle and densify the surface structure, thus introducing compressive stress in the surface to strengthen the surface of fused silica. Therefore, the laser induced damage threshold of fused silica increases and the damage growth coefficient decreases when ion energy up to 30 keV. However, at higher ion energy, the sputtering effect is weakened and implantation becomes dominant, which leads to the surface roughness increase slightly. In addition, excessive energy aggravates the breaking of Si-O bonds. At the same time, the density of structural defects increases and the compressive stress decreases. These will degrade the laser laser-damage resistance of fused silica. The results indicate that oxygen ion implantation with appropriate ion energy is helpful to improve the damage resistance capability of fused silica components.     

等温退火对辐照诱发的非晶TiNiCu合金微观组织结构的影响

 TiNiCu记忆合金在美国Argonne国家实验室IVEM Tandem National Facility加速器产生的400keV Xe+离子辐照到0.4dpa时发生非晶化转变。通过电子显微镜研究了非晶化的TiNiCu合金的回复和再结晶过程。退火加热的速度是10℃/min。在280℃时非晶环附近出现电子衍射斑点以及明场像中出现少量析出相，表明回复和再结晶开始。退火到550℃出现多晶环，650℃时有片状马氏体变体生成，750℃时有很锐利的多晶环出现，表明再结晶过程基本完成。经标定再结晶晶粒仍然是TiNiCu记忆合金。再结晶组织与辐照前TiNiCu 合金的显微组织相比有较大差异。     

宽带低相干光单次时间相干性测量研究

传统测量光束时间相干性的方法是通过机械扫描的方式实现的,这种方法不能够实现单次测量,而且对于相干时间较短的宽带光测量误差较大。本文提出了一种单次时间相干性测量的新方法,通过给迈克尔逊干涉仪的反射镜引入楔角,使光束波前产生随位置变化的延迟差,可从单次测量的一幅干涉图中计算提取出光场完整的时间相干性信息。实验中测量了不同宽带入射光的时间相干性,均与理论结果吻合较好。单次时间相干性测量的方法将为高功率宽带激光装置提供更为方便的时间相干性测量手段,提高实验测量效率。     

1.064 μm脉冲激光作用下SiO2薄膜纹波损伤的模拟

 用1.064 μm波长的单脉冲(6 ns)激光对K9玻璃基底上电子束沉积的单层SiO₂薄膜进行了辐照损伤实验。以扫描电镜对K9基底的断面进行分析,并采用表面热透镜装置对膜层中的缺陷进行了检测,最后采用Matlab偏微分工具箱对缺陷的散射光光场进行了有限元模拟。实验研究表明：膜层中存在缺陷,基底中也存在大量缺陷。模拟研究表明：缺陷的位置越深,形成的条纹间距也越宽;当缺陷的形状不规则时,在局部出现近似平行的纹波结构;当缺陷的数目增加时,这些缺陷的散射光的叠加就形成相互叠加的条纹。     

离子注入掺杂锐钛矿TiO2薄膜的光学性能

 在玻璃基体上,采用射频磁控溅射方法在不同的基体温度下制备了TiO₂薄膜,然后在薄膜中注入注量分别为5×1016, 1×1017和5×1017/cm2的N离子以制备N掺杂的TiO₂薄膜。X射线衍射结果表明：制备出的TiO₂薄膜为锐钛矿型。X射线光电子能谱研究结果表明：注入的N离子与TiO₂晶粒相互作用,形成了含氮的TiO_xN_2-x化合物,从而改变了TiO₂薄膜的吸收边;随N离子注量增加,吸收边移动更明显;同时,由于氮离子注入产生的辐照缺陷使TiO₂薄膜在紫外和可见光区的吸收也明显增强。     

Preparation of p-type ZnO:(Al, N) by a combination of sol--gel and ion-implantation techniques

We report the preparation of p-type ZnO thin films on (0001) sapphire substrates by a combination of sol--gel and ion-implantation techniques. The results of the Hall-effect measurements carried out at room temperature indicate that the N-implanted ZnO:Al films annealed at 600\du\ have converted to p-type conduction with a hole concentration of $1.6\times10¹⁸cm^-3, a hole mobility of 3.67cm²/V.s and a minimum resistivity of 4.80cm.\Omega$. Ion-beam induced damage recovery has been investigated by x-ray diffraction (XRD), photoluminescence (PL) and optical transmittance measurements. Results show that diffraction peaks and PL intensities are decreased by N ion implantation, but they nearly recover after annealing at 600\du. Our results demonstrate a promising approach to fabricate p-type ZnO at a low cost.     

退火对熔石英表面损伤修复点损伤增长的影响

研究不同参数退火处理的熔石英表面损伤修复点再次损伤及损伤增长时的形貌和损伤增长率的差异, 同时与未退火的基底及修复点的损伤增长行为对比. 结果表明: 未退火的修复点再次损伤后, 损伤点周围的裂纹会在应力的作用下继续扩展, 导致更加严重、尺寸更大的损伤点; 当退火处理将修复点周围应力导致的光程差控制在25 nm左右时, 虽损伤增长速率较快, 但可有效抑制裂纹扩展. 同时研究结果也表明只要退火过程能将修复点周围应力导致的光程差控制在10 nm以下, 其损伤增长率与基底的损伤增长率没有明显差异, 从而可以有效控制修复点的损伤增长速率. 研究结果可为分析应力对修复点损伤增长的影响、指导退火参数的优化提供参考.