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UV电泳光成像抗蚀剂的制备及性能
引用本文:刘仁,顾辉旗,安丰磊,王春林,张胜文,刘晓亚.UV电泳光成像抗蚀剂的制备及性能[J].高分子材料科学与工程,2011(5):156-159.
作者姓名:刘仁  顾辉旗  安丰磊  王春林  张胜文  刘晓亚
作者单位:江南大学化学与材料工程学院;中海油常州涂料化工研究院;无锡广信感光科技有限公司
基金项目:国家自然科学基金资助项目(NSFC20374025)
摘    要:合成了水可分散阳离子型丙烯酸酯光敏聚合物(UPDHES),以其为主体树脂制得了阴极光敏电泳涂料乳液,并以铜箔为阴极进行电泳成膜、闪蒸、曝光、显影成像.研究了电泳过程中电流密度的变化对涂膜的影响,并对电泳涂膜进行了扫描电镜表征;考察了光敏树脂双键含量对其光固化动力学及性能的影响;最后对光成像抗蚀荆的分辨率进行了测试.结果...

关 键 词:电泳  涂料  紫外光  成像  抗蚀剂

UV Curable Electrodeposition System for Photoresist
Ren Liu,Huiqi Gu,Fenglei An,Chunlin Wang,Shengwen Zhang,Xiaoya Liu.UV Curable Electrodeposition System for Photoresist[J].Polymer Materials Science & Engineering,2011(5):156-159.
Authors:Ren Liu  Huiqi Gu  Fenglei An  Chunlin Wang  Shengwen Zhang  Xiaoya Liu
Affiliation:1.School of Chemical and Material Engineering,Jiangnan University,Wuxi 214122,China;2.ChinaNational Offshore Oil Corporation(CNOOC) Changzhou Paint & Coatings Industry Research Institute,Changzhou 213016,China;3.Wuxi Kuangshun Photosensitivity Technology Co.,Ltd.,Wuxi 214401,China)
Abstract:A water dispersible cationic photosensitive acrylate copolymer(UPDHES) for preparing electrodeposition coating was synthesized by free radical copolymerization,and then electrodeposition coating solution was prepared using UPDHES resin. With sheet copper as the cathode,the coating solution was electrodeposited on the copper plate,finally the resist pattern was obtained after UV irradiation and develops.The change in the current density of electrodeposition process was studied,and the surface morphology of deposition film was characterized by scanning electron microscopy,The effect of the double bond content on the curing kinetics and properties of photoresist was also investigated.Finally,the resolution of electrodeposition photoresist was evaluated.The results show that: the film obtained by electrodeposition is uniform and compact,which has strong adhesion on the substrate after curing.As the increase of the C=C content,the tensile strength and wear resistance of cured film increase accordingly,the resolution of the electrodeposition photoresist can reach the level of 15μm.
Keywords:electrodeposition  coating  UV irradiation  photoimaging  photoresist
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