电泳沉积碳纳米管的微波等离子体改性

采用电泳法在Si基底上沉积了碳纳米管(CNTs)薄膜, 并利用Ar微波等离子体对CNTs薄膜进行了改性处理, 研究了改性前后CNTs的微观结构和场发射性能. 高分辨透射电子显微镜(HRTEM)和拉曼光谱的表征结果表明, 等离子体改性明显改变了CNTs的微观结构, 形成了大量的管壁结构缺陷、纳米级突起和“针形”尖端; 场发射测试结果表明, CNTs经Ar等离子体改性处理后开启电场较改性前?略有增大, 等离子体改性10min的CNTs薄膜表现出最佳的场发射J-E特性, 阈值电场由改性前的3.12V/μm降低到2.54V/μm, 当电场强度为3.3V/μm时, 场发射电流密度由改性前的18.4mA/cm²增大到60.7mA/cm². 对Ar微波等离子体改性增强CNTs薄膜场发射性能的机理进行了分析.     

碳纳米管薄膜的低温制备及其场发射性能的研究

利用电镀方法在覆盖有金属Ti的玻璃衬底上制备了Ni催化剂,采用微波等离子体化学气相沉积技术,以CH4和H2为反应气体,在450℃的低温下制备了CNTs薄膜.利用扫描电子显微镜和Raman光谱对其表面形貌和结构进行了分析,在真空度小于2×10-4 Pa的环境中测试了CNTs薄膜的场致电子发射特性,开启电场2.7 V/μm.研究表明微波等离子体化学气相沉积技术低温制备CNTs薄膜是可行的,且该薄膜具有良好的场发射性能.     

表面镀钛对金刚石薄膜场发射特性的影响

利用等离子体化学气相（MWPCVD）沉积法在Si（100）面上沉积了金刚石薄膜,采用SEM、AFM、XRD、Raman、XPS等方法对薄膜的结构及表面形貌进行了分析。为提高薄膜的场发射性能,在金刚石表面溅射了金属Ti,对比金刚石薄膜、金刚石／金属Ti复合薄膜的场发射性能,结果表明,金刚石／金属Ti薄膜的发射电流密度更大,且随着电场的增加电流密度急剧增加,开启电场低,约为3V／μm,当电场为25V／μm时发射电流密度可达到1400mA／cm2,并在机理上进行了一些探索,对金刚石／金属复合结构薄膜的场发射性能研究有重要意义。     

紫外-可见光谱分析碳纳米管电泳液浓度对阴极场发射性能的影响

将酸化的碳纳米管(CNT)粉末、硝酸镁置于异丙醇溶剂中超声处理,制备成分散均匀的CNT电泳液.采用不同CNT浓度的电泳液在CrCuCr电极上电泳沉积CNT薄膜,并对阴极样品进行场发射性能测试;同时采用紫外-可见光谱仪对CNT电泳液进行光谱分析.结果表明,CNT浓度为0~0.13 g/L的电泳液在258 nm处存在光谱吸收,且其吸光度与相应CNT浓度呈良好的线性关系;当CNT浓度为0.12 g/L时电泳沉积制备的CNT阴极场发射性能较好,其开启电场为0.903 V/μm,当电场强度为1.395 V/μm时场发射电流密度为2.903 mA/cm2.利用紫外-可见光谱可以有效地分析电泳液中CNT浓度,为电泳沉积良好质量的CNT薄膜提供了保证.     

电介质TiO2粉体增强印刷碳纳米管薄膜的场发射性能

提出了一种可显著改善丝网印刷碳纳米管（CNTs）薄膜场发射特性的浆料制备方法。该方法以乙基纤维素为制浆剂,松油醇为溶剂,通过超声波把CNTs和TiO2粉体均匀地分散成CNTs/TiO2复合浆料,扫描电镜表明,丝网印刷的CNTs/TiO2薄膜在高温下烧结后形成连续的膜体,CNTs被球状的TiO2颗粒均匀隔离;场发射特性测试表明,与单纯的CNTs薄膜相比,CNTs/TiO2薄膜的开启电场降低了0.2V/μm,在电场强度为4.0V/μm时电流密度增加了26.5μA/cm2,结果说明,该方法对于提高CNTs的场发射特性有明显的作用,在CNTs发射显示器的制作中有很好的实际应用价值。     

碳纳米管/二氧化硅复合材料制备及场发射特性研究

采用溶胶-凝胶法制备了碳纳米管/二氧化硅复合材料,并对复合材料的场发射特性进行了研究,结果表明:复合材料有很好的场发射特性,含有10%(质量分数)CNTs的复合材料开启场较低(0.98V/μm).研究了用稀HF溶液处理复合材料表面后场发射性能,发现场发射性能明显改善,开启场由0.98V/μm下降到0.73V/μm,发射电流为1mA/cm2时的电场由2.1V/μm下降到1.0V/μm.研究表明碳纳米管/二氧化硅复合材料非常适用于场发射平面显示器中的阴极.     

ZnO纳米棒/CNTs复合阴极的制备及其场发射性能的研究

采用水热法和喷涂法制备ZnO纳米棒/CNTs复合材料,并测试其场发射性能。首先采用水热法在ITO电极基面生长ZnO纳米棒阵列,随后通过喷涂技术在ZnO纳米棒阵列表面沉积碳纳米管(CNTs)。使用扫描电子显微镜和X-射线衍射分别表征样品的结构和形貌特征。结果表明,经喷涂沉积的CNT薄膜均匀地包裹在ZnO纳米棒尖端。对该复合材料采用二极结构测试其场发射性能,通过测试结果发现,ZnO纳米棒/CNTs复合材料可明显改善ZnO纳米棒阵列及CNT薄膜的场发射性能,该复合材料具有低开启电场强度(约0.96V/μm),高场增强因子(9881)。因此,ZnO纳米棒/CNTs复合材料是最有前景的场发射阴极材料之一。     

链状碳纳米管薄膜的制备及场发射特性研究

以镀有Ti层的Al2O3为衬底,在微波等离子体化学气相沉积系统中,以CH4和H2为反应气体,快速制备了链状碳纳米管薄膜(沉积时间仅1 min).通过SEM、TEM和Raman光谱观察了薄膜的表面形貌,分析了薄膜的微观结构.在高真空室中测试了薄膜场发射特性,其开启电场为0.81 V/μm,在3.15 V/μm 电场下,其场发射电流密度达到9 mA/cm2,发射稳定,是一种良好的电子发射体.     

表面热处理对氮化硼薄膜场发射特性的影响

用RF磁控溅射的方法在最佳沉积条件下在Si(100)基底上沉积了纳米氮化硼薄膜,然后对薄膜在真空度低于5×10-4Pa、温度分别为800℃和1000℃条件下进行了表面热处理,分别用红外光谱、原子力显微镜以及不同退火温度的场发射试验对薄膜进行了研究,结果表明表面热处理对BN薄膜的表面形貌没有明显影响,样品场发射特性的变化可能与表面负电子亲和势有关,未进行热处理的样品阈值电场较低,可能归因于表面负电子亲和势效应,阈值电场为8V/μm,发射电流为80μA,热处理温度为800℃时,负电子亲和势仍然存在,直到热处理温度达到1000℃时,表面负电子亲和势才消失.     

原子层沉积低温制备高取向锐钛矿TiO_2薄膜

利用原子层沉积(ALD)法分别在Si和石英衬底上制备了Ti O_2薄膜,并在N2氛围下对Ti O_2薄膜样品进行退火处理。采用X射线衍射、原子力显微镜和场发扫描电子显微镜对不同退火温度下样品晶体结构、表面形貌进行了分析。利用紫外-可见分光光度计对不同退火温度下的Ti O_2薄膜进行了光学性能测试,并分析了退火温度对其光学带隙的影响。发现利用ALD方法制备的沉积态Ti O_2薄膜为高度择优取向的锐钛矿结构;当退火温度升高到600℃时,Ti O_2薄膜晶体结构类型仍为锐钛矿型,晶粒略有变大;退火态Ti O_2薄膜粗糙度比沉积态Ti O_2薄膜的粗糙度大,而且粗糙度随退火温度升高而增大。根据薄膜的透射光谱拟合了光学带隙,退火后薄膜禁带宽度略有变宽,吸收边缘发生蓝移。     

纳米金刚石掺混对碳纳米管薄膜场发射性能的影响

为了提高碳纳米管（CNT）阴极膜的场发射均匀性和稳定性,同时改善CNT膜的制作过程,本文提出一种掺混纳米金刚石（D）制作高性能丝网印刷CNT膜的方法．通过掺混碳相纳米金刚石,形成结构匹配的CNT／D复合膜,CNT膜内的间隙势垒减少,发射体分散更均匀,膜层与基底接触面积增加;同时,结合纳米金刚石的负电亲和势和场发射特性,可有效提高CNT阴极膜的导电性,增大有效发射体的密度．场发射特性测试表明CNT／D复合膜能得到1．89V／μm的低开启电场,在2．8V／μm场强下,场发射电流密度远高于普通CNT膜,达到463μA／cm2,与普通CNT阴极膜相比,CNT／D复合膜的场发射稳定性显著提高,在400℃热处理后CNT／D膜激发阳极发光更均匀．     

缓冲层对碳纳米管强流脉冲发射特性的影响

为了研究缓冲层对碳纳米管薄膜(CNTs)强流脉冲发射特性的影响,采用酞菁铁高温热解方法分别在镀镍和不镀镍硅基底上生长了碳纳米管薄膜(Ni-CNTs和Si-CNTs),镍层采用化学镀方法制备,强流脉冲发射特性采用二极结构在单脉冲下进行测试。实验发现,通过引入镍缓冲层,CNTs的强流脉冲发射能力显著增强。在峰值为～10.4 V/μm的脉冲场强下,平均开启电场强度从Si-CNTs的5.0V/μm下降到Ni-CNTs的4.3V/μm,而峰值发射电流和电流密度从Si-CNTs的70A和3.5 A/cm2升高到Ni-CNTs的162 A和8.1 A/cm2,Ni-CNTs的峰值电流比Si-CNTs提高了1.3倍。     

Optimization of field emission properties of carbon nanotubes cathodes by electrophoretic deposition

Cold cathodes of carbon nanotubes (CNTs) were deposited on the glass substrate by the electrophoretic deposition (EPD) method. The cathodes were tested in the diode construction with the cathode–anode gap of 170 μm in vacuum. The emission characteristics of the CNTs film cathodes have as good properties as those by screen printing and better emission uniformity. The influence of the voltage between electrodes in the electrophoretic process of flat cold cathode fabrication on the uniformity of the CNTs film distribution was studied. The results indicate that the uniformity of CNTs film cathode by EPD depends on the voltage between electrodes during the electrophoretic deposition. The uniformity of CNTs film and optimized emission properties of the cathode have been achieved when the voltage is 25 V.     

碳纳米管薄膜的制备及其场发射研究

为了克服用Fe（NO3）3、Mg（NO3）2体系催化剂自由生长出的碳纳米管缠绕程度较严重,分布不均匀的缺点,采用丝网印刷催化剂的方法将其印刷在石英、硅和钛三种不同的基底上,结果表明,在石英基底上,用CVD法制备的碳纳米管分布较均匀,有效地克服了团聚现象,并用其作为场发射的阴极进行场发射实验,实验表明,该阴极开启场为2．2V／μm,在电场强度为3．0V／μm下,阳极电流为46．6uA,场发射电流稳定,波动小于5％。该阴极可望应用于场致发射显示器、液晶显示的背光源、照明光源等器件。     

新型碳纳米管微焦点电子源研究

介绍了一种基于碳纳米管场发射的新型微焦点电子源技术.利用激光烧蚀镍金属表面使内部未氧化的镍金属熔化喷出暴露于基底表面,再通过化学气相沉积制备出直径约为350μm的半球壳型碳纳米管薄膜阴极.场发射测试表明,电子源具有低开启电场(<1V/μm)、高发射电流(可达1A/cm2)和高压强发射稳定等特点.通过复合石墨烯和750℃...     

Fabrication of carbon nanotubes field emission cathode by composite plating

Carbon nanotubes (CNTs) have high aspect ratio and have great potential to be applied as the field emission cathode because of its large field enhancement factor. In this work, a high performance carbon nanotube field emission cathode (CNTFC) was fabricated by using a composite plating method. The CNTs were purified by acid solutions and then dispersed in electrobath with nickel ions at temperatures of 60, 70, or 80 degrees C for the electroless plating process on glass substrate. The resulting CNT-Ni composite film has strong adhesion on the glass substrate. The degree of graphitization and the microstructure of the CNTFCs were studied by Raman spectroscopy and scanning electron microscopy. The field emission properties of the CNTFCs show a low turn-on electric field E(on) of about 1.2 V/microm, and a low threshold electric field E(th) of about 1.9 V/microm. Such a composite plating method could be applied to the fabrication of large area CNT field-emission displays.     

Fabrication of carbon nanotube-emitters on Ag-Cu alloy film by thermal welding

A field emission electron source was fabricated on a Si substrate using Ag-Cu alloy (ACa) and carbon nanotubes (CNTs). The ACa was adopted as a binder material due to its excellent electrical conductivity, oxidation stability, and suitable melting point (783 degrees C). The surface morphology of the ACa-film was improved by introducing an Nb layer as an adhesion layer between the ACa-film and the Si substrate. The ACa-film thickness was varied from 100 to 500 nm. The spray method was employed to deposit a CNT film on the ACa/Nb/Si substrate for large area fabrication. After annealing the substrate at 700 degrees C for 10 min, the CNT film was tightly welded on the ACa-films, and the CNT-emitters fabricated on the 400-nm-thick ACa-film exhibited high current density and stability with a low turn-on voltage. It is worth noting that ACa could be applied to the glass substrate because the CNT-emitters fabricated at 500 degrees C exhibited good field emission characteristics.     

Optimization of field emission properties of carbon nanotubes by Taguchi method

It is the purpose of this study to evaluate the field emission property of carbon nanotubes (CNTs) prepared by microwave plasma-enhanced chemical vapor deposition (MPCVD) method. Nickel layer of 5 nm in thickness on 20-nm thickness titanium nitride film was transformed into discrete islands after hydrogen plasma pretreatment. CNTs were then grown up on Ni-coated areas by MPCVD. Through the practice of Taguchi method, superior CNT films with very low emission onset electric field, about 0.7 V/μm (at J = 10 μA/cm²), are attained without post-deposition treatment. It is found that microwave power has the most important influence on the field emission characteristics of CNT films. The increase of methane flow ratio will downgrade the degree of graphitization of CNT and thus its field emission characteristics. Scanning electron microscope and transmission electron microscopy (TEM) observation and energy dispersive X-ray spectrometer analysis reveal that CNT growth by MPCVD is based on tip-growth mechanism. TEM micrographs validate the hollow, bamboo-like structure of the multi-walled CNTs.