共查询到19条相似文献,搜索用时 332 毫秒
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传感器技术是信息社会的四大支柱之一,传感器和计算机结合形成的智能系统大大的拓展了人类生活的空间.在传感器家族中,根据电容的物理特性制作的传感器占有重要地位.电容传感器是很好的状态传感器,可提高电容检测,尤其是微小电容检测的精度,是目前测控技术的热点.本文重点介绍一套微小电容差分高精度检测电路,该套电路可测物体的运动加速度,加速度计的分辨率可达2-18. 相似文献
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单电容式及差分电容式MEMS传感器检测系统 总被引:1,自引:0,他引:1
传感器技术是信息社会的四大支柱之一,传感器和计算机结合形成的智能系统大大的拓展了人类生活的空间。在传感器家族中,根据电容的物理特性制作的传感器占有重要地位。电容传感器是很好的状态传感器,可提高电容检测,尤其是微小电容检测的精度,是目前测控技术的热点。本文重点介绍一套微小电容差分高精度检测电路,该套电路可测物体的运动加速度,加速度计的分辨率可达2-18。 相似文献
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介绍了一种用于X射线工业检测的多通道电荷读出IC。该电荷读出IC可提供64个通道,将探测器电荷转换成模拟电压。电路由电荷放大器增益控制、增益电容阵列、时序发生器、移位寄存器链、电荷放大器阵列和采样保持放大器等组成,具有低噪声、14位动态范围等特性。电路芯片采用0.8μm标准CMOS工艺制造,芯片尺寸为3.1mm×10.9mm。电路在3.3MHz频率、5V电源电压和3.5V参考电压下工作,电路功耗为45mW。测试结果表明,在电荷放大器增益电容为0.5pF和光电二极管结电容为33pF下,电路的输出噪声达到600μV(Vrms)。 相似文献
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对于流水线模数转换器来说,电容失配是一种主要的非线性误差源.为了减小电容失配误差,本文提出了一种电容失配校准的方法.该方法通过一种电荷相加、电容交换和电荷反转移的电路技术,可将电容失配误差减小至其2次项.动态模型仿真演示了一个由4-bit电容匹配精度实现12-bit 积分非线性(INL)的例子,验证了电容失配校准的有效性.与传统电路相比,该方法只需在模拟电路中增加几个开关,因此电路实现仍然简单.另一方面,由于一个转换周期需要2个以上的时钟相,会影响模数转换的速度.因此,该方法适用于中等高速、高精度的应用场合. 相似文献
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文中提出一个V/Q变换的广义跨导概念,并应用在开关电容阻抗模拟中。使用V/Q变换器,可以用电压传递函数实现所希望的阻抗函数。由此概念出发,分别导出了前差FD,后差BD和双线性S/Z变换的三种接地开关电容频变负阻SC-FDNR电路。如果所选用的电压传递函数电路对杂散电容不灵敏,那么实现的模拟阻抗电路对杂散电容也是不灵敏的。作为文中的一个例子,用FD-FDNR电路组成一个谐振回路,实验表明其频响特性与理论分析相一致。 相似文献
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设计和分析了一种用于10位分辨率,5 MHz采样频率流水线式模数转换器中的差分采样/保持电路.该电路是采用电容下极板采样、开关栅电压自举、折叠式共源共栅技术进行设计,有效地消除了开关管的电荷注入效应、时钟馈通效应引起的采样信号的误差,提高了采样电路的线性度,节省了芯片面积、功耗.电路是在0.6 μm CMOS工艺下进行模拟仿真,当输入正弦波频率为500 kHz,采样频率为5 MHz时,电路地无杂散动态范围(SFDR)为75.4 dB,能够很好的提高电路的信噪比,因此该电路适用于流水线式模数转换器. 相似文献
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The analyses of MEMS gyroscope interface circuit on thermal noise, 1/f noise and phase noise are made in this paper. A closed-loop differential driving circuit and a low-noise differential detecting circuit based on the high frequency modulation are designed to limit the noise. The interface chip is implemented in a standard 0.5 μ m CMOS process. The test results show that the resolution of sensitive capacity can reach to 6.47 × 10-20 F at the bandwidth of 60 Hz. The measuring range is ± 200°/s and the nonlinearity is 310 ppm. The output noise density is 5.8°/(h·√Hz). The angular random walk (allen-variance) is 0.092°/√h and the bias instability is 2.63°/h. 相似文献
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Paul A. Muls Gilbert J. Declerck Roger J. van Overstraeten 《Solid-state electronics》1977,20(11):910-922
The relationship between interface charge and surface potential of a MOS capacitor is examined when interface charge inhomogeneities are present. For practical values of the interface charge variance, the relation between interface charge and surface potential is found to be quite linear. High surface state densities and high impurity concentrations tend to damp the potential fluctuations and to increase the linearity. The magnitude of the potential deviation for a given charge deviation increases from flat band to weak inversion and decreases again in strong inversion, due to screening, but the linearity is found to be best in weak inversion.The original Nicollian-Goetzberger analysis of the MOS a.c. conductance technique uses a Gaussian potential distribution and an equivalent circuit consisting of an array of parallel surface state branches connected to a single oxide capacitance. We compare this model with a patchwork model, using a Gaussian interface charge density distribution and an equivalent circuit with distributed oxide capacitance. It is found that in depletion, for practical charge densities, the patchwork model interpretation of conductance peaks does not lead to a very different result than the random charge distribution model interpretation. Both models agree very well on surface state density and variance of the interface charge distribution, but a large discrepancy on the capture cross section of the surface states is possible. 相似文献