不同气氛保护下退火制备的CuO/SiO2复合薄膜微观结构分析

采用射频磁控共溅射法在Si(111)衬底上沉积Cu/SiO2复合薄膜.然后在N2和NH3保护下高温退火,再于空气中自然冷却氧化,制备出CuO结构,并对其微观结构进行分析.N2保护下退火温度为1100℃时样品中主晶相为立方晶系的CuO(200)晶面,薄膜样品表面出现纳米线状结构,表面组分主要包括Cu,O元素,冷却氧化形成CuO/SiO2复合薄膜.NH3气氛保护下退火,随着退火温度的升高,CuO由单斜晶相逐渐转变为立方晶相,CuO薄膜结晶质量提高.样品于900℃和1100℃退火后,形成有序散落的微米级颗粒,前者由粒状团簇组成,颗粒表面比较粗糙;后者由片融状小颗粒融合而成,颗粒表面比较光滑.     

不同气氛保护下退火制备的CuO/SiO2复合薄膜微观结构分析

采用射频磁控共溅射法在Si (111)衬底上沉积Cu/SiO2 复合薄膜,然后在N2和NH3保护下高温退火,再于空气中自然冷却氧化,制备出CuO结构,并对其微观结构进行分析. N2保护下退火温度为1100℃时样品中主晶相为立方晶系的CuO (200）晶面,薄膜样品表面出现纳米线状结构,表面组分主要包括Cu,O元素,冷却氧化形成CuO/SiO2复合薄膜. NH3气氛保护下退火,随着退火温度的升高,CuO由单斜晶相逐渐转变为立方晶相,CuO薄膜结晶质量提高. 样品于900℃和1100℃退火后,形成有序散落的微米级颗粒,前者由粒状团簇组成,颗粒表面比较粗糙;后者由片融状小颗粒融合而成,颗粒表面比较光滑.     

磁控溅射法制备BST铁电薄膜的实验研究

采用射频磁控溅射法在Si和Pt/TiOx/SiO2/Si衬底上沉积了(Ba0.65Sr0.35)TiO3铁电薄膜,研究了BST铁电薄膜微观结构和介电性能。实验结果表明:衬底温度在550℃,工作气压为2.0 Pa的溅射条件下沉积的BST薄膜,经750℃退火处理30 min后,形成了完整的钙钛矿相;与Si衬底相比,在Pt衬底上制备的BST薄膜晶粒更均匀、表面平整无裂纹。在室温、频率为100 kHz条件下薄膜的介电常数ε=353.8,介电损耗tanδ=0.012 8。介电温谱结果表明制备的(Ba0.65Sr0.35)TiO3铁电薄膜居里温度在5.0℃左右。     

近空间升华沉积CdTe薄膜的微结构和PL谱

用近空间升华法在CdS薄膜上沉积了CdTe薄膜.研究了在两种保护气氛下所沉积的多晶CdTe薄膜在后处理后的微结构、表面形貌及光致发光(PL)谱,并研究了CdTe表面和CdS/CdTe界面的PL谱的区别,根据薄膜的微结构对碲化镉在太阳电池中的应用进行了讨论.     

近空间升华沉积CdTe薄膜的微结构和PL谱

用近空间升华法在CdS薄膜上沉积了CdTe薄膜.研究了在两种保护气氛下所沉积的多晶CdTe薄膜在后处理后的微结构、表面形貌及光致发光(PL)谱,并研究了CdTe表面和CdS/CdTe界面的PL谱的区别,根据薄膜的微结构对碲化镉在太阳电池中的应用进行了讨论.     

用AAO为模板组装磁性金属Ni纳米线阵列

以多孔阳极氧化铝(AAO)为模板,采用直流电沉积的方法,制备了磁性金属Ni纳米线阵列。选用SEM、TEM、XRD等测试手段,对其微观形貌和结构进行了表征。结果表明:制得的Ni纳米线阵列排列规整、长度一致、直径与模板孔径基本一致,约为250nm,而且是结构紧密的多晶体。研究了电沉积时间对Ni纳米线长度的影响,发现电沉积时间应不超过15h。     

射频磁控共溅射高温NH_3退火制备CuO/SiO_2复合薄膜的微观结构

采用射频磁控共溅射法在硅衬底上沉积Cu/SiO2复合薄膜,然后在NH3保护下高温退火,再于空气中自然冷却氧化,形成XuO结构,对其微观结构进行分析.随着退火温度的升高,CuO由单斜晶相逐渐转变为立方晶相,CuO薄膜结晶质量提高.样品于900℃和1100℃退火后,形成有序散落的微米级颗粒,前者由粒状团簇组成,颗粒表面比较粗糙,后者由片融状小颗粒融合而成,颗粒表面比较光滑.     

CdS/CdTe异质结复合薄膜的制备及其性能表征

在玻璃衬底上依次采用化学水浴法(CBD)和真空蒸发工艺沉积CdS和CdTe薄膜,并在不同条件下进行热处理,制备了CdTe/CdS异质结复合薄膜。利用XRD、SEM、AFM和UV-VIS透射光谱对薄膜的结构、表面形貌、剖面及光学性能进行了研究。结果表明:以玻璃衬底和CdS薄膜作为衬底沉积的CdTe多晶薄膜结构相似,均具有(1l1)面择优取向;不同条件下制备的薄膜致密且粒径均匀,随着热处理温度的升高,薄膜晶粒增大明显,并出现CdS层减薄的现象,但薄膜的粗糙度也随之增大;CdCl2氛围下热处理后,薄膜粒径增大,粗糙度明显降低,其(111)晶面的择优取向进一步增强,且透过率下降,这对于提高太阳电池的光谱响应是非常有利的。     

近距离升华法制备Bi催化纳米晶CdTe薄膜的表征

采用近距离升华法(Close-Spaced-Sublimation,CSS)引入Bi催化剂成功制备出了具有纳米线、近阵列排布的纳米棒等形貌的纳米晶CdTe薄膜.并利用X射线衍射(XRD)、扫描电子显微镜(SEM)、紫外可见分光光度计等研究了薄膜的结构、表面形貌和光学性能.讨论了CdTe纳米结构可能的生长机制.

Abstract：

Bi-catalyzed nanocrystalline CdTe films were prepared by close spaced sublimation (CSS) technique successfully.These nanocrystalline CdTe films had surface appearance of nanowires or a similar array arrangement nanorod.The structure,the surface topograph and the optical properties of these films were studied using X-ray diffraction(XRD),scanning electron microscopy(SEM) and ultroviolet-visible (UV-VIS) spectrophotometer.And the possible growth mechanisms of these nanostructures were discussed.     

射频溅射CdTe薄膜结构特性分析

采用射频磁控溅射技术在玻璃衬底上沉积了CdTe单层薄膜,实验表明:在室温条件下,通过调节溅射功率和溅射氩气压强,沉积的CdTe薄膜显示了一系列结构形态.研究了无CdTe薄膜沉积、非晶CdTe薄膜沉积、晶化CdTe薄膜沉积的生长条件,并采用卢瑟福散射理论解释了溅射CdTe薄膜生长机制的分子动力学过程.     

Deposition and doping of CdS/CdTe thin film solar cells

1% oxygen is incorporated into both CdS and CdTe layers through RF sputtering of CdS/CdTe thin film solar cells. The optical and electrical parameters of the oxygenated and O₂-free devices are compared after CdCl₂ treatment and annealing in ambient Ar and/or air. The effects of ambient annealing on the electrical and optical properties of the films are investigated using current-voltage characterization, field emission scanning electron microscopy, X-ray diffraction, and optical transmission spectroscopy. The 1% oxygen content can slightly increase the grain size while the crystallinity does not change. Annealing in ambient Ar can increase the transmission rate of the oxygenated devices.     

长直SiO_2纳米线的制备和结构表征

采用磁控溅射法,以Si粉和溅金Si(111)为原料,加入C粉,在Si(111)衬底上制备无定形SiO2纳米线。首先,在Si(111)衬底上分别溅射厚度为18和36 nm的Au。然后,在1 100℃条件下处理80 min。用扫描电子显微镜(SEM)、X射线光电子能谱(XPS)、傅里叶红外光谱(FTIR)和X射线衍射方法 (XRD)等测试手段对退火后的SiO2纳米线的表面相貌、微观结构进行分析。结果表明,反应后有大量长而直的SiO2纳米线生成。而且随着溅射Au厚度的增加,SiO2纳米线的数量增多,且长度更长。这表明,SiO2纳米线的生长与溅射Au的厚度密切相关。     

CdTe/GaAs(111)B薄膜的MBE生长研究

采用分子束外延方法,在GaAs(111)B衬底上,生长CdTe薄膜,以求研制出用于液相外延生长碲镉汞(HgCdTe)薄膜的CdTe/GaAs(111)B复合衬底.通过理论分析和实验探索,优化了生长温度和Te/Cd束流比等重要生长参数,获得了质量较好的CdTe薄膜,再通过循环热处理,使CdTe/GaAs(111)B复合衬底的质量得到进一步的提高,X-射线回摆曲线半峰宽(FWHM)有明显的降低.为LPE-HgCdTe薄膜的生长打下了较好基础.     

Understanding the Evolution of CdTe Buffer Layer Surfaces on ZnTe/Si(211) and GaAs(211)B During Cyclic Annealing

We present the results of a detailed study of the changes that occur on CdTe buffer layer surfaces grown on ZnTe/Si(211) and GaAs(211)B during the routine thermal cyclic annealing (TCA) process. Observations indicate that CdTe buffer layer surfaces are Te saturated when the TCA is performed under Te overpressure. In the absence of Te flux during the TCA step, the CdTe surface loses CdTe congruently and the typical CdTe nanowires show the presence of nodules on their surfaces. The observed changes in reflection high-energy electron diffraction patterns during TCA are explained in terms of surface chemistry and topography observations. Overall, the Te overpressure is necessary to maintain a smoother and pristine surface to continue the molecular beam epitaxy (MBE) growth.     

退火温度对纳米ZnO薄膜结构与发光特性的影响

利用溶胶鄄凝胶法在硅衬底上制备了纳米ZnO薄膜。研究了热处理对ZnO薄膜的质量与发光性能的影响。结果表明,纳米ZnO薄膜具有六方纤锌矿结构,并且,随着退火温度的升高,ZnO的晶粒变大,c轴取向性变好,紫外发光强度增强。     

Novel Cu Nanowires/Graphene as the Back Contact for CdTe Solar Cells

Cu‐nanowire‐doped graphene (Cu NWs/graphene) is successfully incorporated as the back contact in thin‐film CdTe solar cells. 1D, single‐crystal Cu nanowires (NWs) are prepared by a hydrothermal method at 160 °C and 3D, highly crystalline graphene is obtained by ambient‐pressure CVD at 1000 °C. The Cu NWs/graphene back contact is obtained from fully mixing the Cu nanowires and graphene with poly(vinylidene fluoride) (PVDF) and N‐methyl pyrrolidinone (NMP), and then annealing at 185 °C for solidification. The back contact possesses a high electrical conductivity of 16.7 S cm^?1 and a carrier mobility of 16.2 cm² V^?1 s^?1. The efficiency of solar cells with Cu NWs/graphene achieved is up to 12.1%, higher than that of cells with traditional back contacts using Cu‐particle‐doped graphite (10.5%) or Cu thin films (9.1%). This indicates that the Cu NWs/graphene back contact improves the hole collection ability of CdTe cells due to the percolating network, with the super‐high aspect ratio of the Cu nanowires offering enormous electrical transport routes to connect the individual graphene sheets. The cells with Cu NWs/graphene also exhibit an excellent thermal stability, because they can supply an active Cu diffusion source to form an stable intermediate layer of CuTe between the CdTe layer and the back contact.     

Fabrication and characterization of CdTe nano pattern on flexible substrates by nano imprinting and electrodeposition

Nano imprinting technology and the electrodeposition method were applied to make CdTe nano patterns on flexible substrates. An ammonia based aqueous solution was prepared at pH 10.7 and indium tin oxide (ITO)/polyethylene naphthalate (PEN) film with template was used as the working electrode. ITO thin film which was coated on PEN film had good electrical conductivity and optical transmittance. The template was manufactured by nano imprinting technology on ITO/PEN film. It was made from benzyl methacrylate and had nano rod arrays. It was used as the working electrode and for making CdTe nano pattern. CdTe nano pattern were analyzed by X-ray diffractometer, dual beam (DB)-focused ion beam (FIB)-scanning electron microscopy (SEM), Raman spectroscopy, and ultraviolet (UV)-visible (VIS) spectroscopy. The structure and optical properties of CdTe nano pattern on flexible substrates was analyzed. The crystalline size of nano pattern had 8.26 nm. The Te particles that were precipitated on CdTe surface seems to be exist. The absence of annealing process influenced to have low absorption coefficient and narrow band gap compared to bulk CdTe. However, nano pattern increased reflectance.     

Formation of Nickel Oxide Nanotubes with Uniform Wall Thickness by Low‐Temperature Thermal Oxidation Through Understanding the Limiting Effect of Vacancy Diffusion and the Kirkendall Phenomenon

In this work, the step‐wise oxidation mechanism of nickel (Ni) nanowires is elucidated. Rapid vacancy diffusion plays a significant role at low temperatures in forming heterostructures of nickel oxide (NiO) nanotubes with Ni nanowires. Subsequent investigations of Ni nanowire oxidation at higher temperatures and faster temperature ramp rates show that it is difficult to bypass this rapid vacancy diffusion stage, which affects the formation of the final structure. Therefore, it is unlikely to form solid NiO nanowires or NiO nanotubes with uniform wall thickness through the conventional annealing/oxidation process of Ni nanowires. Instead, a step‐wise oxidation process by combining low temperature oxidation with a chemical etching step is utilized to produce for the first time NiO nanotubes with uniform wall thickness from Ni nanowires.     

多层HgCdTe异质外延材料的热退火应力分析

前期研究采用高温热处理方法,获得了抑制位错的最佳退火条件.通过比对实验,发现不同衬底上HgCdTe表面的CdTe钝化层在热处理过程中对位错的抑制作用各有不同.结合晶格失配应力和热应力对不同异质结构进行理论计算,借助X射线摇摆曲线的倒易空间分析,解释了CdTe钝化层对HgCdTe位错抑制的影响作用.     

CuxS背接触层制备及在碲化镉薄膜太阳电池中应用研究

本文采用化学水浴法沉积CuxS薄膜,通过改变Cu元素比例研究其对碲化镉电池效率的影响。研究表明化学水浴法沉积的CuxS是非晶的,采用适当退火条件可以使其晶化,随着退火温度的提高,薄膜变得致密且结晶明显。CuxS薄膜厚度对电池性能有很大的影响,结果表明,随着CuxS薄膜厚度增加,电池性能先增加后减少。薄膜厚度为75nm时,CdS/CdTe电池性能最佳,达到了最高转化效率(η)为12.19%,填充因子(FF)为68.82%,开路电压(Voc)为820mV。