选择区域生长高质量InGaAsP多量子阱材料

采用LP-MOVPE在SiO2掩膜的InP衬底上实现了高质量的InGaAsP多量子阱(MQW)的选择区域生长(SAG).通过改变生长温度和生长压力,MQW的适用范围由C波段扩展至L波段,即MQW的光致发光波长从1546nm延展至1621nm.光致发光（PL）测试表明：在宽达75nm的波长范围内,MQW的质量与非选择生长的MQW质量相当,并成功制作出电吸收调制DFB激光器（EML）.     

GSMBE生长 1.8- 2.0μm波段In Ga As/ In Ga As P应变量子阱激光器

报道了气态分子束外延 ( GSMBE)生长 1.8— 2 .0μm波段 In Ga As/ In Ga As P应变量子阱激光器的研究结果 .1.8μm波段采用平面电极条形结构 ,已制备成功 10μm和 80μm条宽器件 ,器件腔长 5 0 0μm,室温下光致发光中心波长约为 1.82μm,在 77K温度下以脉冲方式激射 ,阈值电流分别约为 2 5 0 m A和 6 0 0 m A ,中心波长分别在 1.6 9μm和 1.73μm附近 .2 .0μm波段 ,制备成功 8μm宽脊波导结构器件 ,器件腔长 5 0 0μm,室温光致发光中心波长约为1.98μm ,77K温度下以脉冲方式激射 ,阈值电流约为 2 0 m A ,中心波长约为 1.89μm,其电流限制和纵模限制效     

黄绿光发光二极管光衰性能研究

AlGaInP是GaAs基LED有源区主要材料,广泛应用于黄绿光至红光波段的LED。但在短波段尤其是黄绿光波段(565～575 nm),因其材料组成较接近间接带隙,其发光效率和稳定性存在问题。目前黄绿光功率衰减以俄歇复合损耗、非复合辐射中心损耗、载流子损耗为主。所以研究相同生长温度不同阱垒厚度、量子阱相同厚度不同生长温度、P型掺杂层掺杂浓度对发光光衰的影响。发现较薄的MQW阱垒厚度、较高的MQW生长温度及P-space后端P型层前端插入一层20 nm厚度,1.7×10~(18) cm~(-3)浓度的高掺杂层三种方案可以改善黄绿光发光二极管光衰性能。     

全固源分子束外延InAsP/InGaAsP多量子阱1.55μm激光器

利用新型全固源分子束外延技术 ,对 1 .5 5 μm波段的 In As P/ In Ga As P应变多量子阱结构的生长进行了研究。实验表明 ,较低的生长温度或较大的 / 束流比有利于提高应变多量子阱材料的结构质量 ,而生长温度对材料的光学特性有较大的影响。在此基础上生长了分别限制多量子阱激光器结构 ,制作的氧化物条形宽接触激光器实现了室温脉冲工作 ,激射波长为 1 5 63 nm,阈值电流密度为 1 .4k A/ cm2 。这是国际上首次基于全固源分子束外延的 1 .5 5 μm波段 In As P/ In Ga As P多量子阱激光器的报道     

分子束外延生长高应变单量子阱激光器

采用分子束外延方法研究了高应变 In Ga As/Ga As量子阱的生长技术 .将 In Ga As/Ga As量子阱的室温光致发光波长拓展至 116 0 nm,其光致发光峰半峰宽只有 2 2 me V.研制出 112 0 nm室温连续工作的 In Ga As/Ga As单量子阱激光器 .对于 10 0 μm条宽和 80 0 μm腔长的激光器 ,最大线性输出功率达到 2 0 0 m W,斜率效率达到 0 .84m W/m A,最低阈值电流密度为 45 0 A/cm2 ,特征温度达到 90 K.     

红橙光InGaN/GaN量子阱的结构与光学性质研究

采用金属有机物化学气相沉积(MOCVD)技术生长了具有高In组分InGaN阱层的InGaN/GaN多量子阱(MQW)结构,高分辨X射线衍射(HRXRD)ω-2θ扫描拟合得到阱层In含量28%。比较大的表面粗糙度表明有很大的位错密度。室温下光致荧光(PL)研究发现该量子阱发射可见的红橙光,峰位波长在610 nm附近。变温PL(15～300 K)进一步揭示量子阱在低温下有两个发光机制,对应的发射峰波长分别为538 nm和610 nm。由于In分凝和载流子的局域化导致的载流子动力改变,使得量子阱PL发光峰值随温度增加呈明显的"S"变化趋势。     

高透腔面大功率650 nm红光半导体激光器

利用石英闭管法对金属有机化学气相沉积(MOCVD)外延生长的应变量子阱(MQW)650 nm AlGaInP/GaInP材料进行选择区域扩Zn,使扩Zn区域的光致发光(PL)谱的峰值蓝移达175 meV,形成对650 nm波长激光器的高透腔面,有益于减少激光器腔面光吸收,增加了激光器退化的光学灾变损伤(COD)阈值.后工艺制作出条宽100μm,腔长1 mm的增益导引激光器,实现了红光半导体激光器的大功率输出.激光器阈值电流为382 mA,在2.28 A工作电流时达到光学灾变损伤阈值,最大连续输出光功率1.55 W,外微分量子效率达到0.82 W/A.     

Mg掺杂AlInP 650 nm LD外延片的Zn扩散研究

利用石英闭管法,对Mg掺杂AlInP 650 nm LD外延片进行Zn扩散,分析了扩散温度和时间2个参数对Zn扩散的影响.采用光致发光(PL)谱和电化学蒸涂(ECV)方法研究了Zn扩散产生的影响.PL谱结果表明,Zn扩散引起了AlGaInP/GaInP多量子阱(MQW)有源层的组分无序,使PL谱的峰值蓝移,最大蓝移为54 nm,约175 meV.ECV测量结果显示,Zn已经扩散到MQW有源区,MQW区域的p型载流子浓度为4.4×1017 cm-3.     

超薄多孔阳极氧化铝薄膜的制备和光学特性

采用二步阳极氧化法在草酸溶液中制备了超薄的多孔阳极氧化铝(PAA)薄膜,借助于扫描电子显微镜(SEM)分析了多孔阳极氧化铝薄膜的微观形貌,发现在其表面孔径为70～90nm的六边形内孔洞分布均匀,且垂直于表面平行生长,厚度约为500 nm.对其光致发光性能研究发现,该薄膜具有一个位于395 nm的紫外波段的发光峰.分析表明,该发光现象起源于氧化铝薄膜中与氧空位相关的F 中心.透射率随着波长的增加先急剧增加,在波长大于300 nm时,透射率随着波长的增加缓慢减小;而吸收率随着波长的增加先急剧减小,在波长大于300 nm时,吸收率随着波长的增加缓慢增加.     

Growth of Space Ordered 1.3μm InAs Quantum Dots on GaAs(100) Vicinal Substrates by MOCVD

用MOCVD技术在偏(1100)GaAs衬底上生长了发光波长在1.3μm的线状空间规则排列InAs量子点.光致发光实验表明,相对于正(100)衬底,偏(100)GaAs衬底上生长的InAs量子点具有更好的材料质量,光谱有更大的强度和更窄的线宽.为了得到发光波长为1.3μm的量子点,对比研究了不同In含量的InGaAs应力缓冲层(SBL)和应力盖层(SCL)的应力缓冲作用.结果表明,增加SCL中In含量能有效延伸量子点发光波长到1. 3μm,但是随着SBL中In的增加,发光波长变化不明显,并且材料质量明显下降.     

Detuning adjustable multiwavelength MQW-DFB laser array grown byeffective index/quantum energy control selective area MOVPE

A multiwavelength MQW DFB laser array with novel structure Is described. Oscillation wavelength and gain peak wavelength were simultaneously controlled on the same epitaxial wafer by using modulated grown thicknesses of selectively grown InGaAs/InGaAsP/InP MQW active waveguides. The laser array with constant-pitch built-in corrugation fabricated by a simple DFB laser process demonstrated 10.1 nm controllable range for lasing wavelength and 45 nm for gain peak wavelengths, with uniform lasing properties and narrow spectral linewidths. The technique is attractive for light sources used in WDM/FDM applications     

MOCVD生长GaAs/AlGaAs量子阱研究

利用常压MOCVD技术在较低生长速率下生长出多种GaAs/AlGaAs多量子阱结构材料,利用低温PL谱和TEM对材料结构进行了表征。所得势阱和势垒结构厚度均匀平整,最窄阱宽为1.8nm。本研究表明,低速率(γ≤0.5nm/s)连续生长工艺能够避免杂质在界面富集,优于间断生长工艺,且在掺si n~+-GaAs衬底上所得量子阱发光强度高于掺Cr SI-GaAs衬底上的结果。     

High-speed and low-drive-voltage monolithic multiple quantum-wellmodulator/DFB laser light source

Monolithic integration of an InGaAsP/InGaAs multiple quantum well (MQW) distributed-feedback (DFB) laser with a high-speed InGaAs/InAlAs MQW intensity modulator is demonstrated. A 3-dB bandwidth. in excess of 16 GHz and low-drive-voltage operation (4.0 V) for a 20-dB on-off ratio are obtained. Good coupling efficiency between an MQW DFB laser and an MQW modulator is accomplished using hybrid crystal growth of MO-VPE and MBE     

InGaAs/GaAs多量子阱SEED面阵结构特性与设计

讨论了谐振腔中的 DBR对 In Ga As/ Ga As多量子阱 SEED面阵光反射特性的影响 .采用 In Ga As/ Ga As作为多量子阱 SEED器件的有源区 ,从而获得了 980 nm工作波长 .设计和分析了 In Ga As/ Ga As多量子阱 SEED中的一种用于倒装焊的新型谐振腔结构 .多量子阱材料是用 MOCVD系统生长 ,利用微区光反射谱、PL 谱以及 X射线双晶衍射对多量子阱材料进行了测量和分析 ,测量结果表明多量子阱材料具有良好的质量 ,证明了器件结构的设计和分析是准确的     

Design and Characteristics of InGaAs/GaAs MQW SEED Arrays Structure

讨论了谐振腔中的DBR对InGaAs／GaAs多量子阱SEED面阵光反射特性的影响．采用InGaAs／GaAs作为多量子阱SEED器件的有源区,从而获得了980nm工作波长．设计和分析了InGaAs／GaAs多量子阱SEED中的一种用于倒装焊的新型谐振腔结构．多量子阱材料是用MOCVD系统生长,利用微区光反射谱、PL谱以及X射线双晶衍射对多量子阱材料进行了测量和分析,测量结果表明多量子阱材料具有良好的质量,证明了器件结构的设计和分析是准确的．     

High-speed 1.5-μm compressively strained multi-quantum wellself-aligned constricted mesa DFB lasers

A great improvement in the high-speed characteristics for compressively strained multi-quantum-well (MQW) distributed-feedback (DFB) lasers with self-aligned constricted mesa structures is described. Negative wavelength detuning is an important factor in making possible the extraction of potential advantages for the compressively strained MQW DFB lasers. A 17-GHz bandwidth, which is the highest among the 1.5-μm MQW DFB lasers, is demonstrated. A wavelength chirp width of 0.42 nm at 10 Gb/s is obtained due to a reduced linewidth enhancement factor that has a magnitude of less than 2. Nonlinear damping K factor in a DFB laser with 45-nm negative detuning has drastically decreased to 0.13 ns, about half of that for unstrained MQW lasers. This is mainly due to an enhanced differential gain as large as 6.9×10 ^-12 m³/s. The estimated intrinsic maximum bandwidth is 68 GHz     

Metalorganic vapor phase epitaxy growth and properties of GaAs/AlGaAs and InGaAs/GaAs quantum well structures on (111)A GaAs substrates

We review the recent advances in the fabrication and properties of GaAs/AlGaAs and InGaAs/GaAs quantum well (QW) structures grown on (111)A GaAs substrates by atmospheric pressure metalorganic vapor phase epitaxy (MOVPE). We show that a 25-period GaAs/AlGaAs multi-QW (MQW) structure was fabricated with good crystal quality, high photoluminescence (PL) emission intensity and monolayer (ML) interfacial roughness. A PL full width at half maximum (FWHM) of 10.5 meV was achieved for a 25-period MQW with a well width of 44 Å. This is the narrowest linewidth reported to date for any similar structures grown on (111)A or B substrates by any growth technique. We also report the properties of an InGaAs/GaAs single quantum well structure grown on (111)A GaAs. For this structure, the PL FWHM value was 9.1 meV, corresponding to a 1 ML interfacial roughness for a well width of 41 Å. This is the first demonstration of an InGaAs/GaAs quantum well structure grown on (111)A or (111)B GaAs by MOVPE.     

The effects of laser irradiation on InGaAs/GaAs multiple quantum wells grown by metalorganic molecular beam epitaxy

We studied the effects of Ar ion laser irradiation during the growth of InGaAs/ GaAs multiple quantum wells (MQW) structures by metalorganic molecular beam epitaxy. Structural and optical properties were characterized by Nomarski microscopy, Dektak stylus profiler, and low-temperature photoluminescence (PL) measurements. For MQW structures grown at a relatively low substrate temperature (500°C), the laser irradiation influences greatly the growth process of the In^Ga^^As well and results in a large blue shift of about 2000à in the PL peak. Such a large blue shift suggests that laser modification during growth could have some novel applications in optoelectronics. On the other hand, the laser irradiation has relatively small effects on samples grown at a higher substrate temperature (550°C).