Solid-Liquid Reaction in the Si3N4-AlN-Y2O3 System under 1 MPa of Nitrogen

The melting behaviors of selected compositions in the Si₃N₄-AlN-Y₂O₃ system were determined under 1 MPa of nitrogen. The phase diagrams of the ternary and their binary systems are presented. The lowest melting composition of the ternary system contains 15 mol % Si₃N₄, 25 mol % AIN, and 60 mol % Y₂O₃ and has a melting temperature of 1650°C. The binary eutectic compositions and temperatures are 15 mol % Si₃N₄ and 85 mol % Y₂O₃ at 1720°C, and 20 mol % AIN and 80 mol% Y₂O₃ at 1730°C.     

Microstructure, Strength, and Oxidation of a 10 wt% Zyttrite-Si3N4 Ceramic

Hot-pressed Si₃N₄ doped with 10 wt% zvttrite as a sinterine aid was studied. An equiaxed, fine-grainid microstructure was predominant, with no apparent porosity. Bend strengths were determined at room temperature and high temperatures (up to 1370°C/2500°F). Oxidation was measured by weight gain at 1370°C in air. The resulting material exhibited very good room-temperature strength (755 MPa/110 ksi). The work showed that room-temperature strength can be improved significantly by using controlled Si₃N₄ powder with 10 wt% zyttrite. High-temperature strength (514 MPd75 ksi) at 1370°C was nearly double that of hot-pressed Si₃N₄ (NC-132). The oxidation resistance at 1370°C was also higher than that of NC-132.     

The System Si3N4-SiO2-Y2O3

Subsolidus phase relations were established in the system Si₃N₄-SiO₂-Y₂O₃. Four ternary compounds were confirmed, with compositions of Y₄Si₂O₇N₂, Y₂Si₃O₃N₄, YSiO₂N, and Y₁₀(SiO₄)₆N₂. The eutectic in the triangle Si₃N₄-Y₂Si₂O₇-Y₁₀(SiO₄)₆N₂ melts at 1500°C and that in the triangle Si₂N₂O-SiO₂-Y₂Si₂O₇ at 1550°C. The eutectic temperature of the Si₃N₄-Y₂Si₂O₇ join was ∼ 1520°C.     

Compressive Creep and Oxidation Resistance of an Si3N4 Material Fabricated in the System Si3N4-Si2N2O-Y2Si2O7

The compressive creep behavior and oxidation resistance of an Si₃N₄/Y₂Si₂O₇ material (0.85Si₃N₄+0.10SiO₂+0.05Y₂O₃) were determined at 1400°C. Creep re sistance was superior to that of other Si₃N₄ materials and was significantly in creased by a preoxidation treatment (1600°C /120 h). An apparent parabolic rate constant of 4.2 × 10⁻¹¹ kg²·m-⁴·s⁻¹ indicates excellent oxidation resistance.     

Strength Retention in Hot-Pressed Si3N4 Ceramics with Lu2O3 Additives after Oxidation Exposure in Air at 1500°C

The effect of oxidation exposure on room-temperature flexural strength was examined in 3.33- and 12.51-wt%-Lu₂O₃-containing hot-pressed Si₃N₄ ceramics exposed to air at 1500°C for up to 1000 h. After oxidation exposure, the room-temperature strength of the ceramics was degraded, and strength retention decreased with time at temperature, dependent on the amount of additive. The retention in room-temperature strength displayed by the two compositions after 1000 h of oxidation exposure was 75%–80%. The degradation in strength was attributed to the formation of new defects at and/or near the interface between the oxide layer and the Si₃N₄ bulk during oxidation exposure.     

High/Low Modulus Si3N4-BN Composite for Improved Electrical and Thermal Shock Behavior

High-density Si₃N₄+6% CeO₂ composites with 5 to 50% BN were fabricated by hot-pressing. BN remained as a discrete phase. Dielectric constants were 4 to 8 and loss tangents were 0.0008 to 0.06 for the room temperature to 1100°C range for compositions with 10 to 50% BN. Thermal-expansion values perpendicular to the hot-pressing direction were somewhat less than those of hot-pressed Si₃N₄+6% CeO₂. Flexure strengths at room temperature were considerably lower than those of hot-pressed Si₃N₄+6% CeO₂ but values at 1000°, 1250°, and 1400°C in air were only slightly lower. Young's modulus values were found to decrease with increasing BN content at all temperatures. Better thermal shock resistance was found than for commercial hot-pressed Si₃N₄.     

Sintering of Si3N4-Y2O3-Al2O3

Sintering kinetics of the system Si₃N4-Y2O₃-Al₂O3 were determined from measurements of the linear shrinkage of pressed disks sintered isothermally at 1500° to 1700°C. Amorphous and crystalline Si₃N₄ were studied with additions of 4 to 17 wt% Y₂O₃ and 4 wt% A1₂O₃. Sintering occurs by a liquid-phase mechanism in which the kinetics exhibit the three stages predicted by Kingery's model. However, the rates during the second stage of the process are higher for all compositions than predicted by the model. X-ray data show the presence of several transient phases which, with sufficient heating, disappear leaving mixtures of β ' -Si₃N₄ and glass or β '-Si₃N₄, α '-Si₃N₄, and glass. The compositions and amounts of the residual glassy phases are estimated.     

Hot-Pressed Silicon Nitride with Lu2O3 Additives: Oxidation and Its Effect on Strength

The oxidation behavior and effect of oxidation on room-temperature flexural strength were investigated for hot-pressed Si₃N₄ ceramics, with 3.33 and 12.51 wt% Lu₂O₃ additives, exposed to air at 1400° and 1500°C for up to 200 h. Parabolic oxidation behavior was observed for both compositions. The oxidation products consisted of Lu₂Si₂O₇ and SiO₂. The Lu₂Si₂O₇ grew out of the surface silicate in preferred orientations. The morphology of oxidized surfaces was dependent on the amount of additive; Lu₂Si₂O₇ grains in the 3.33 wt% composition appeared partially in a needlelike type, compared with a more equiaxed type exhibited in the 12.51 wt% case. The high resistance to oxidation shown for both compositions was attributed to the extensive amounts of crystalline, refractory secondary phases formed during the sintering process. Moreover, after 200 h of oxidation at 1400° and 1500°C, the strength retention displayed by the two compositions was 93%–95% and 85%–87%, respectively. The strength decrease was associated with the formation of new defects at the interface between the oxide layer and the Si₃N₄ bulk.     

Phase Relationships in the Si3N4–SiO2–Lu2O3 System

Phase relationships in the Si₃N₄–SiO₂–Lu₂O₃ system were investigated at 1850°C in 1 MPa N₂. Only J-phase, Lu₄Si₂O₇N₂ (monoclinic, space group P 2₁/ c , a = 0.74235(8) nm, b = 1.02649(10) nm, c = 1.06595(12) nm, and β= 109.793(6)°) exists as a lutetium silicon oxynitride phase in the Si₃N₄–SiO₂–Lu₂O₃ system. The Si₃N₄/Lu₂O₃ ratio is 1, corresponding to the M-phase composition, resulted in a mixture of Lu–J-phase, β-Si₃N₄, and a new phase of Lu₃Si₅ON₉, having orthorhombic symmetry, space group Pbcm (No. 57), with a = 0.49361(5) nm, b = 1.60622(16) nm, and c = 1.05143(11) nm. The new phase is best represented in the new Si₃N₄–LuN–Lu₂O₃ system. The phase diagram suggests that Lu₄Si₂O₇N₂ is an excellent grain-boundary phase of silicon nitride ceramics for high-temperature applications.     

Properties of Isostatically Hot-Pressed Silicon Nitride

Hot isostatic pressing was studied for densification of reaction-bonded Si₃N₄ containing various levels of Y₂O₃. Near-theoretical density was achieved for com positions containing 3 to 7 wt% Y₂O₃. An Si₃N₄-5 wt% Y₂O₃ composition had a 4-point flexural strength at 1375°C of 628 MPa and survived 117 h of stress rupture testing at 1400°C and 345 MPa .     

Densification Behavior and Properties of Y2O3-Containing α-SiAlON-Based Composites

Different SiAION composites based on α'-SiAION are investigated, with respect to the phase relationships, densification behavior, and mechanical properties. The compositions are located on a phase-diagram line parallel to the Si₃N₄-Y₂O₃ 9AIN compound in the Si₃N₄-SiO₂-AlN-Al₂O₃-Y₂O₃-YN system. Analysis of the reaction sequences shows that the formation of the composites is associated with the transient appearance of Y₄A1₂O₉ (YAM), yttrium-aluminum-garnet (YAG), melilite, and a nitrogen-rich liquid phase. The small shift of compositions on the Si₃N₄-Y₂O₃-9AIN compound phase-diagram line toward the Al₂O₃-rich side offers the advantage of a higher sinterability and the removal of the melilite phase from a wide range of compositions containing α'-SiAlON and polytypes. The α'/β'-SiAlON composites show better mechanical properties in comparison to pure α'-SiAlON and composites of α'-SiAION and polytypes. A post-heat-treatment causes the crystallization of YAG as a grain-boundary phase and leads to excellent strength retention up to temperatures of 1350°C.     

Phase Relations in the System Si3N4-SiO2-MgO and Their Interrelation with Strength and Oxidation

Phase relation studies of Si₃N₁, SiO₂, and MgO have established three important subsolidus tie lines, viz. Si₃N₄-MgO, Si₃N₄-Mg₂SiO₄, and Si₂N₂O-Mg₂SiO₄ for nonoxidizing fabrication conditions. Strength measurements at 1400°C show that optimum strengths are obtained for compositions approaching the Si₃N₄-MgO and Si₃N₄-Si₂N₂O tie lines and that inferior strengths are obtained for compositions approaching the Si₃N₄-Mg₂SiO₄ tie line. Oxidation measurements at 1375°C show that the oxidation kinetics depend on the content of MgO and Mg₂SiO₄ phases. Optimum oxidation resistance is observed for compositions approaching the Si₃N₄-Si₂N₂O tie line. Strength and oxidation results are discussed with regard to phase equilibrium considerations.     

Strength of Hot Isostatically Pressed Si3N4 After Heat Treatment in Ar-O2 and H2-H2O

The effects of heat treatment in Ar-O₂ and H₂-H₂O atmospheres on the flexural strength of hot isostatically pressed Si₃N₄ were investigated. Increases in room-temperature strength, to values significantly above that of the aspolished material, were observed when the Si₃N₄ was exposed at 1400°C to (1) H₂ with water vapor pressure ( P _H2O) greater than 1 × 10⁻⁴ MPa or (2) Ar with oxygen partial pressure ( P _O2) of between 7 × 10⁻⁶ and 1.5 × 10⁻⁵ MPa. However, the strength of the material was degraded when the P _H2O in H₂ was lower than 1 × 10⁻⁴ MPa, and essentially unaffected when the P _O2 in Ar was higher than 1.5 × 10⁻⁵ MPa. We suggest that the observed strength increases are the result of strength-limiting surface flaws being healed by a Y₂Si₂O₇ layer formed during exposure.     

Effect of Oxidation on Mechanical Properties of Fibrous Monolith Si3N4/BN at Elevated Temperatures in Air

The oxidation behavior and its effect on the mechanical properties of fibrous monolith Si₃N₄/BN after exposure to air at temperatures ranging from 1000° to 1400°C for up to 20 h were investigated. After exposure at 1000°C, only the BN cell boundary was oxidized, forming a B₂O₃ liquid phase. With increasing exposure temperature, the Si₃N₄ cells began to oxidize, forming crystalline Y₂Si₂O₇, SiO₂, and silicate glass. However, in this case, a weight loss was observed due to extensive vaporization of the B₂O₃ liquid. After exposure at 1400°C, large Y₂Si₂O₇ crystals with a glassy phase formed near the BN cell boundaries. The oxidation behavior significantly affected the mechanical properties of the fibrous monolith. The flexural strength and work-of-fracture decreased with increasing exposure temperature, while the noncatastrophic failure was maintained.     

Hot Isostatic Processing of Shocked Si3N4 Powder

To enhance the sinter ability of Si₃N₄, powders mixed with 0, 2, and 5 wt% Y₂O₃ were explosively shock-treated. Compacts of these powders were encapsulated in 96% silica glass containers and isostatically hot-pressed. The shocked Si₃N₄ with 5 wt% Y₂O₃ was pressed to a density of 3.09 g/cm³ (95.4% of theoretical) at 1400°C under 430 MPa for 3 h, whereas the unshocked material attained only 82.4% of theoretical density under the same hot isostatic pressing conditions.     

Pressureless Sintering of α-Si3N4 Porous Ceramics Using a H3PO4 Pore-Forming Agent

A new method for preparing high bending strength porous silicon nitride (Si₃N₄) ceramics with controlled porosity has been developed by using pressureless sintering techniques and phosphoric acid (H₃PO₄) as the pore-forming agent. The fabrication process is described in detail and the sintering mechanism of porous ceramics is analyzed by the X-ray diffraction method and thermal analysis. The microstructure and mechanical properties of the porous Si₃N₄ ceramics are investigated, as a function of the content of H₃PO₄. The resultant high porous Si₃N₄ ceramics sintered at 1000°–1200°C show a fine porous structure and a relative high bending strength. The porous structure is caused mainly by the volatilization of the H₃PO₄ and by the continous reaction of SiP₂O₇ binder, which could bond on to the Si₃N₄ grains. Porous Si₃N₄ ceramics with a porosity of 42%–63%, the bending strength of 50–120 MPa are obtained.     

Phase Equilibria in the System Si3N4-SiO2-BeO-Be3N2

The 1780°C isothermal section of the reciprocal quasiternary system Si₃N₄-SiO₂-BeO-Be₃N₂ was investigated by the X-ray analysis of hot-pressed samples. The equilibrium relations shown involve previously known compounds and 8 newly found compounds: Be₆Si³N₈, Be₁₁Si₅N₁₄, Be₅Si²N₆, Be₉Si₃N₁₀, Be₈SiO₄N₄, Be₆O₃N₂, Be₈O₅N₂, and Be₉O₆N₂. Large solid solubility occurs in β-Si₃N₄, BeSiN₂, Be₉Si₃N₁₀, Be₄SiN₄, and β-Be₃N₂. Solid solubility in β-Si₃N₄ extends toward Be₂SiO₄ and decreases with increasing temperature from 19 mol% at 1770°C to 11.5 mol% Be₂SiO₄ at 1880°C. A 4-phase isotherm, liquid +β-Si₃N₄ ( ss )Si₂ON₂+ BeO, exists at 1770°C.     

Oxidation Behavior of Hot-Pressed Si3N4

The high-temperature chemical stability of hot-pressed Si₃N₄ was studied between 600° and 1450°C. Reactions were followed by X-ray diffraction and scanning electron microscopy. In air, this material begins to oxidize at 700° to 750°C; a distinct amorphous siO₂ surface layer results after 24 h at 750°C-Concomitant formation of cristobalite occurs, depending on exposure time, and is enhanced as temperature is Increased. Magnesium and calcium magnesium silicates form above 1000°C. The data suggest that impurities, e.g. Mg, Ca, and Fe, greatly lower the oxidation resistance of Si₃N₄ in air.     

Characteristics of ZrO2-Dispersed Si3N4 without Additives Fabricated by Hot Isostatic Pressing

Dense, ZrO₂-dispersed Si₃N₄ composites without additives were fabricated at 180 MPa and ∼1850° to 1900°C for l h by hot isostatic pressing using a glass-encapsulation method; the densities reached >96% of theoretical. The dispersion of 20 wt% of 2.5YZrO₂ (2.5 mol% Y₂O₃) in Si₃N₄ was advantageous to increase the room-temperature fracture toughness (∼7.5 MPa˙m^1/2) without degradation of hardness (∼15 GPa) because of the high retention of tetragonal ZrO₂. The dependence of fracture toughness of Si₃N₄–2.5YZrO₂ on ZrO₂ content can be related to the formation of zirconium oxynitride because of the reaction between ZrO₂ and Si₃N₄ matrix in hot isostatic pressing.     

Mechanical Behavior of MoSi2 Reinforced–Si3N4Matrix Composites

The mechanical behavior of MoSi₂ reinforced–Si₃N₄ matrix composites was investigated as a function of MoSi₂ phase content, MoSi₂ phase size, and amount of MgO densification aid for the Si₃N₄ phase. Coarse-phase MoSi₂-Si₃N₄ composites exhibited higher room-temperature fracture toughness than fine-phase composites, reaching values >8 MP·am^1/2. Composite fracture toughness levels increased at elevated temperature. Fine-phase composites were stronger and more creep resistant than coarse phase composites. Room-temperature strengths >1000 MPa and impression creep rates of ∼10⁻⁸ s⁻¹ at 1200°C were observed. Increased MgO levels generally were deleterious to MoSi₂-Si₃N₄ mechanical properties. Internal stresses due to MoSi₂ and Si₃N₄ thermal expansion coefficient mismatch appeared to contribute to fracture toughening in MoSi₂-Si₃N₄ composites.