Using neural networks to construct models of the molecular beamepitaxy process

This paper presents the systematic characterization of the molecular beam epitaxy (MBE) process to quantitatively model the effects of process conditions on film qualities. A five-layer, undoped AlGaAs and InGaAs single quantum well structure grown on a GaAs substrate is designed and fabricated. Six input factors (time and temperature for oxide removal, substrate temperatures for AlGaAs and InGaAs layer growth, beam equivalent pressure of the As source and quantum well interrupt time) are examined by means of a fractional factorial experiment. Defect density, X-ray diffraction, and photoluminescence are characterized by a static response model developed by training back-propagation neural networks. In addition, two novel approaches for characterized reflection high-energy electron diffraction (RHEED) signals used in the real-time monitoring of MBE are developed. In the first technique, principal component analysis is used to reduce the dimensionality of the RHEED data set, and the reduced RHEED data set is used to train neural nets to model the process responses. A second technique uses neural nets to model RHEED intensity signals as time series, and matches specific RHEED patterns to ambient process conditions. In each case, the neural process models exhibit good agreement with experimental results     

外延GaN基薄膜表面应变演变RHEED分析

介绍了反射式高能电子衍射仪(RHEED)衍射原理以及半导体薄膜表面原子间距与其衍射图像间距成反比例关系。分析了采用ECR-PEMOCVD生长技术,在α-Al2O3衬底上低温外延GaN基薄膜(氮化层、缓冲层、外延层)工艺过程。通过对RHEED图像分析软件获取不同工艺过程中的外延薄膜衍射条纹间距的数据分析、计算、比较,得到薄膜表面衍射图像间距的大小,依据RHEED衍射图像与原子面间距之间的对应关系,分析薄膜表面的应变状态演变情况。分析计算结果表明生长20min氮化层、20min缓冲层的表面原子层处于压应变状态,而生长180min的AlN外延层,表面则处于完全弛豫状态。     

GaSb基的InAs/GaSbⅡ类超晶格背景载流子浓度的测量

高质量的InAs/GaSbⅡ类超晶格(SLs)材料生长在晶格匹配的GaSb衬底上,由于GaSb衬底具有良好的导电性,传统的霍尔测量难以直接得到外延超晶格材料的载流子浓度等电学参数,所以,如何准确地获得InAs/GaSb超晶格外延材料中的载流子浓度成为了研究人员关注的焦点之一。主要介绍了InAs/GaSbⅡ类超晶格背景载流子浓度测量的四种典型的方法:低温霍尔技术;变磁场霍尔技术以及迁移率谱拟合;衬底去除技术;电容-电压技术。并给出了各种方法的基本原理,评价了每种方法的优缺点。     

[(BaTiO3)m/(SrTiO3)m]n超晶格生长的RHEED实时研究

利用反射高能电子衍射(RHEED)，研究了在SrTiO3(100)基片上采用激光分子束外延法生长的[(BaTiO3)m／(SrTiO3)m]n超晶格薄膜的生长特性。观察到清晰明亮的反射高能电子衍射花样及富有周期性的RHEED振荡曲线，制备的超晶格呈现良好的结晶层状外延生长，薄膜表面及界面的平整度很好。     

Characterization of MOVPE-grown (Al, In, Ga) N heterostructures by quantitative analytical electron microscopy

The low pressure metalorganic vapor phase epitaxy growth of wurzite (Al, In, Ga)N heterostructures on sapphire substrates is investigated by quantitative analytical scanning transmission electron microscopy techniques like atomic number (Z-) contrast imaging and convergent beam electron diffraction (CBED). Especially (In, Ga)N quantum wells of different thicknesses as well as superlattices were analyzed with respect to defects, chemical composition variations, interface abruptness and strain (relaxation) effects. The interfaces in In_0.12Ga_0.88N/GaN quantum wells appear to be asymmetric. Additionally, we found composition variations of Δx_In≥0.03 within the InGaN quantum wells. The application of electron diffraction techniques (CBED) yields quantitative information on strain and relaxation effects. For the case of 17 nm thick InGaN quantum wells, we observed relaxation effects which are not present in the investigated thin quantum wells of 2 nm thickness. The experimentally obtained diffraction patterns were compared to simulations in order to get values for strain within the quantum wells. Additionally, the influence of dislocations on the digression of superlattices is investigated.     

分子束外延InAs量子点的RHEED实时原位分析

介绍了利用反射式高能电子衍射(RHEED)方法在自组装InAs量子点制备过程中进行结构分析的理论研究与实验工作的最新进展。从反射式高能电子衍射在InAs量子点临界转变状态测定、量子点表面取向、量子点应力分布测定、量子点形核长大动力学过程研究等方面的应用,可以看出RHEED在InAs量子点形成过程中对多种结构特征的原位分析具有突出优势。反射式高能电子衍射仪作为分子束外延系统中的标准配置,已成为一种对InAs量子点微观结构进行分析的简易而理想的分析测试工具。随着反射式高能电子衍射以及衍射理论的进一步发展,必将促进InAs量子点结构的精确表征水平的提高,进而实现更加理想结构的InAs量子点的制备及其应用。     

MEGAGAUSS SPECTRA OF SEMICONDUCTORS： MERCURYSELENIDE LOW-DIMENSIONAL STRUCTURES IN MAGNETIC FIELDS UP TO 1000 T

Introduction Mercuryselenideisan typezero gapsemiconduc torinzincblendestructure.ThemodificationHgSe:Fe withanirondopingnFe>5×1018cm-3leadstoa mixed valenceregimeofFe++/Fe+++systemanda pinningoftheFermi energytotheenergyofirondonor about210meVabovethebandedge[1].Pronounced short rangecorrelationeffectsinFe++/Fe+++system giverisetoadrasticmobilityincrease,sothatHgSe:Feasahostmaterialfornano structuredsystemsen surestheobservabilityofanyquantumeffect[2].1RecentexperimentsonHgSe:Feinmag n…     

Si衬底上无坑洞3C-SiC的外延生长研究

在冷壁式不锈钢超高真空系统上 ,利用低压化学气相淀积 (LPCVD)方法在直径为 5 0 mm的单晶 Si(1 0 0 )和 Si(1 1 1 )晶向衬底上生长出了高取向无坑洞的晶态立方相碳化硅 (3 C-Si C)外延材料 ,利用反射高能电子衍射 (RHEED)和扫描电镜 (SEM)技术详细研究了 Si衬底的碳化过程、碳化层的表面形貌及缺陷结构 ,获得了界面平整光滑、没有空洞形成的 3 C-Si C外延材料 ,并采用 X-射线衍射 (XRD)、双晶 X-射线衍射 (DXRD)和霍尔(Hall)测试等技术研究了外延材料的结构和电学特性     

利用GaAs基上InGaAs应变层制备有序排列的InAs量子点

在GaAs基InxGa1-xAs(x=0.15)应变层上生长了InAs量子点(QD)层,通过分析各层之间的应力状况和位错的演变过程,配合生长过程中对反射式高能电子衍射仪(RHEED)实时监测,并观察生长后的表面形貌,发现可以通过控制应变层厚度来控制应变层表面布纹结构的宽度,而且在应变层厚度低于位错增殖的临界厚度时布纹宽度较窄.如果同时控制QD层在刚刚出点,则QD主要沿着较窄的布纹结构排列,从而得到有序排列的QD     

GexSi1—x／Si量子阱和超晶格红外光电压谱

采用电容耦合法,在18～300K 温度范围内测量了一系列 Ge_xSi_(1-x)/Si应变层多量子阱和 Ge/Si 超薄超晶格在不同温度下的红外光电压谱。实验结果表明,在长波段有强的光电压信号。文中还对 Ge_xSi_(1-x)/Si 量子阱和超晶格的能带排列和光伏效应作了讨论。     

Cubic group-III nitride-based nanostructures—basics and applications in optoelectronics

Molecular beam epitaxy (MBE) of cubic group-III nitrides is a direct way to eliminate the polarization effects which inherently limits the performance of optoelectronic devices containing quantum well or quantum dot active regions. In this contribution the latest achievement in the MBE of phase-pure cubic GaN, AlN, InN and their alloys will be reviewed. A new reflected high-energy electron beam (RHEED) control technique enables to carefully adjust stoichiometry and to severely reduce the surface roughness, which is important for any hetero-interface. The structural, optical and electrical properties of cubic nitrides and AlGaN/GaN will be presented. We show that no polarization field exists in cubic nitrides and demonstrate 1.55 μm intersubband absorption in cubic AlN/GaN superlattices. Further the progress towards the development and fabrication of cubic hetero-junction field effect transistors (HFETs) is discussed.     

Growth optimization and optical properties of GaAs-(Ga,Al)As quantum well structures on UV-ozone prepared nominal (111)B GaAs surfaces

GaAs and (Ga,Al)As---GaAs quantum well (QW) structures have been grown by molecular beam epitaxy on nominal (111)B oriented GaAs substrates. The substrate preparation technique involving UV-ozone oxidation was observed to lead to a rough surface after oxide desorption. Mirror-like layer surfaces have nevertheless been achieved by applying a careful procedure during the first stages of growth in order to recover surface flatness. New evidence of planarization is presented, based on the frequency analysis of reflection high-energy electron diffraction (RHEED) intensity oscillations during growth. QWs grown at a moderate substrate temperature (about 610°C) have been obtained with sharp excitonic transitions whose photoluminescence (PL) emission linewidths are comparable to those obtained on misoriented (111)B substrates. In contrast, the use of higher substrate temperatures was found to provide rougher interfaces due to GaAs sublimation during growth interruption at each interface, as revealed by continuous wave and time-resolved PL measurements.     

Infrared spectroscopy of lattice vibrations in ZnTe/CdTe superlattices with quantum dots on the GaAs substrate with the ZnTe buffer layer

The results of the analysis of the infrared lattice reflectance spectra of multiperiod ZnTe/CdTe superlattices with CdTe quantum dots are reported. The samples are grown by molecular beam epitaxy on the GaAs substrate with the ZnTe buffer layer. Due to the large number of periods of the superlattices, it is possible to observe CdTe-like vibration modes in the quantum dots, i.e., the dislocation-free stressed islands formed during the growth due to relaxation of elastic stresses between the ZnTe and CdTe layers are markedly different in their lattice parameters. From the frequency shifts of the CdTe- and ZnTe-like vibration modes with respect to the corresponding modes in the unstressed materials, it is possible to estimate the level of elastic stresses.     

Lateral electronic transport in short-period InAs/GaAs superlattices at the threshold of quantum dot formation

Temperature dependences of resistance at 0.7 K<T<300 K, the Hall and Shubnikov-de Haas effects in magnetic fields of up to 40 T, photoluminescence (PL), and morphology of a heterointerface (using an atomicforce microscope) of short-period InAs/GaAs superlattices were investigated. The investigations were carried out for a region of subcritical and critical thickness Q=2.7 monolayers (ML) of InAs. Upon exceeding the critical thickness, the self-organized growth of InAs quantum dots (QDs) set in. The formation of QD layers upon exceeding the critical thickness of InAs Q=2.7 ML is accompanied by a transition of conductivity from metallic to hopping. It is found that at InAs layer thicknesses of Q=0.33 ML and Q=2.0 ML, the PL intensities and electron mobilities in the structures have clearly pronounced maxima. Anisotropy of conductivity, which depends on the thickness of the deposited InAs layers, was observed.     

InP基功率HEMT结构材料分子束外延生长研究

从 3个层面研究了分子束外延 Al0 .48In0 .52 As/ Ga0 .47In0 .53As/ In P功率 HEMT结构材料生长技术。首先 ,通过观察生长过程的高能电子衍射 (RHEED)图谱 ,确立了 Ga0 .47In0 .53As/ In P结构表面层的 MBE RHEED衍射工艺相图 ,据此生长的单层 Si-doped Ga0 .47In0 .53As(40 0 nm) / In P室温迁移率可达 6960 cm2 / V· s及电子浓度 1 .3 3 E1 7cm- 3。其次 ,经过优化结构参数 ,低噪声 Al0 .48In0 .52 As/ Ga0 .47In0 .53As/ In P HEMT结构材料的 Hall参数达到μ30 0 K≥ 1 0 0 0 0 cm2 / V· s、2 DEG≥ 2 .5 E1 2 cm- 2 。最后 ,在此基础之上 ,降低 spacer的厚度、在 Ga0 .47In0 .53As沟道内插入 Si平面掺杂层并增加势垒层的掺杂浓度获得了功率 Al0 .48In0 .52 As/ Ga0 .47In0 .53As/ In PHEMT结构材料 ,其 Hall参数达到μ30 0 K≥ 80 0 0 cm2 / V· s、2 DEG≥ 4 .0 E1 2 cm- 2 。     

A real-time quantitative assessment of self-assembled quantum dots by reflection high-energy electron diffraction

A method for in-situ quantitative characterization of quantum dots during growth is provided using the readily available reflection high-energy electron diffraction (RHEED). RHEED patterns of uncapped self-assembled InAs/GaAs quantum dots are investigated theoretically and experimentally. Previously predicted intensity fringes along chevron tails of quantum dot's RHEED diffraction spots are observed experimentally. Post-growth atomic force microscopic images and theoretical RHEED images of the same are obtained parallel to experimental data. The bounding facets of the quantum dots are determined using the angle between the chevrons. The size (height) of the quantum dots is determined using the periodicity of intensity fringes along the chevrons during growth.     

静压下（CdSe）_m／（ZnSe）_n－ZnSe超短周期超晶格量子阱的共振喇曼散射研究

在静压和液氮温度下观察到（ＣｄＳｅ）ｍ／（ＺｎＳｅ）ｎ短周期超晶格中重空穴激子的复合发光和多达４阶的类ＺｎＳｅＬＯ多声子喇曼散射，并观察到厚ＺｎＳｅ势垒层的带边发光和限制在厚势垒层中的类ＺｎＳｅＬＯ声子散射．结果表明，加压后（ＣｄＳｅ）ｍ／（ＺｎＳｅ）ｎ短周期超晶格中的类ＺｎＳｅ的１ＬＯ和２ＬＯ声子模频率分别以３．７６和７．１１ｃｍ－１／ＧＰａ的速率向高频方向移动，超晶格阱层光致发光峰的压力系数为５９．８ｍｅＶ／ＧＰａ．与（ＣｄＳｅ）ｍ／（ＺｎＳｅ）ｎ短周期超晶格共振时的类ＺｎＳｅ１ＬＯ声子模频率比与ＺｎＳｅ势垒层共振时的类ＺｎＳｅ１ＬＯ声子模频率低２．０ｃｍ－１，反映了（ＣｄＳｅ）ｍ／（ＺｎＳｅ）ｎ短周期超晶格中ＬＯ声子的限制效应     

Electron properties of surface InGaAs/InAlAs quantum wells with inverted doping on InP substrates

The electron-transport and optical properties of heterostructures with a surface InGaAs/InAlAs quantum well in the cases of inverted δ doping with Si atoms (below the quantum well) and of standard δ doping (above the quantum well) are compared. It is shown that, in the case of inverted doping, the two-dimensional electron density in the quantum well is increased in comparison with the case of the standard arrangement of the doping layer at identical compositions and thicknesses of other heterostructure layers. The experimentally observed features of low-temperature electron transport (Shubnikov–de Haas oscillations, Hall effect) and the photoluminescence spectra of heterostructures are interpreted by simulating the band structure.     

Size and shape modification of self assembled InAs quantum dots and stacked layers by in-situ etching

We present investigations of the structural and optical properties of in-situ etched, self assembled InAs islands using AsBr₃ within a molecular beam epitaxy system. This procedure allows reshaping and downsizing of quantum dots with atomic layer precision. The critical thickness of a second InAs layer on top of a thin GaAs layer covering a first InAs dot layer was investigated by RHEED using the 2D–3D transition due to the Stranski–Krastanov growth mode. In-situ etching of the GaAs spacer layer results in an array of small dips on the surface due to enhanced etching at locally strained areas. The dips influence the nucleation of the second dot layer.     

Analysis of mechanisms for electron scattering in GaAs/AlxGa1−x As superlattices with doped quantum wells for longitudinal resonant current flow in high electric fields and at low temperatures

Formulas are derived for, and a numerical analysis made of, the dependence of the transverse phase relaxation time on electron energy for resonant current flow through GaAs/Al_xGa_1−x As superlattices with doped quantum wells. The parameters are chosen to be close to those of superlattices used for creating photodiodes for operation at λ⋍10 μm. The analysis is limited to the interactions of electrons with neutral atoms and impurity ions at low temperatures. Resonant current flow is ensured by an electric field that brings the ground state and the first excited state of the “Stark ladder” into resonance with neighboring, weakly interacting quantum wells. Fiz. Tekh. Poluprovodn. 33, 438–444 (April 1999)