Surface Modification of Fluororubber Using Atmospheric Pressure Dielectric Barrier Discharge （DBD）

Fluoride rubber F2311 film, an alternating copolymer of CF2-CFC1 （CTFE） and CH2-CF2 （VF2） components, was treated by atmospheric pressure dielectric barrier discharge （DBD） in air. The surface structure, topography and surface chemistry of the treated F2311 films were characterized by contact angle measurement, atomic force microscopy （AFM）, and X-ray photoelectron spectroscopy （XPS）, respectively. The experimental results showed that a short time air plasma treatment led to morphological, wettability and chemical changes in the F2311 films. The surface hydrophilicity increased greatly after the plasma treatment, the static water contact angle decreased from 98.6° to 32°, and oxygen containing groups （C=O, O-C=O, etc. ） were introduced. Atomic force microscopy revealed that plasma produced by DBD etched F2311 films obviously. The roughness of the samples increased remarkably with the formation of peaks and valleys on the treated surfaces. The increased surface wettability may be correlated with both the introduction of hydrophilic groups due to air plasma oxidation of the surface and the change in surface morphology etched by DBD.     

Diagnosis of Electronic Excitation Temperature in Surface Dielectric Barrier Discharge Plasmas at Atmospheric Pressure

The electronic excitation temperature of a surface dielectric barrier discharge （DBD） at atmospheric pressure has been experimentally investigated by optical emission spectroscopic measurements combined with numerical simulation. Experiments have been carried out to deter- mine the spatial distribution of electric field by using FEM software and the electronic excitation temperature in discharge by calculating ratio of two relative intensities of atomic spectral lines. In this work, we choose seven Ar atomic emission lines at 415.86 nm [（3s^23p^5）5p →（3s^23p^5）4s] and 706.7 nm, 714.7 nm, 738.4 nm, 751.5 nm, 794.8 nm and 800.6 nm [（3s^23p^5）4p → （3s^23p^5）4s] to estimate the excitation temperature under a Boltzmann approximation. The average electron energy is evaluated in each discharge by using line ratio of 337.1 nm （N2（C^3Пu →B3Пg）） to 391.4 nm （N2^＋（B2 ∑u^＋→ ∑g^＋））. Furthermore, variations of the electronic excitation tempera- ture are presented versus dielectric thickness and dielectric materials. The discharge is stable and uniform along the axial direction, and the electronic excitation temperature at the edge of the copper electrode is the largest. The corresponding average electron energy is in the range of 1.6- 5.1 eV and the electric field is in 1.7-3.2 MV/m, when the distance from copper electrode varies from 0 cm to 6 cm. Moreover, the electronic excitation temperature with a higher permittivity leads to a higher dissipated electrical power.     

Catalytic Decomposition of Toluene Using Various Dielectric Barrier Discharge Reactors

Decomposition of toluene was experimentally investigated with various dielectric barrier discharge （DBD） reactors, such as wire-cylinder, wire-plate and plate-to-plate, combined with multi-metal oxides catalyst （Mn-Ni-Co-Cu-Ox/Al2O3） loaded on the cordierite honeycomb and nickel foam, respectively. The effects of some factors including the residence time, reactor configuration and catalyst, upon the toluene destruction were studied. Results revealed that the use of in-plasma catalysis was more helpful to enhancing the DRE （destruction and removal efficiency） and reducing the O3 formation than that of either post-plasma catalysis or plasma alone. It was demonstrated that the wire-plate reactor was favorable for the oxidation reaction of toluene and the nickel foam-supported catalysts exhibited good activity.     

Surface Modification of Polyethylene （PE） Films Using Dielectric Barrier Discharge Plasma at Atmospheric Pressure

Modification of the surface properties of polyethylene （PE） films is studied using air dielectric barrier discharge at atmospheric pressure. The treated samples are examined by Water contact angle measurements, Fourier transform infrared attenuated total reflection spectroscopy （FTIR-ATR）, X-ray photoelectron spectroscopy （XPS） and scanning electron microscopy （SEM）. With the increase in treating time, the water contact angle changes from 93.2° before treatment to a minimum of 53.3° after a treatment for 50 s. Both ATR and XPS results show some oxidized species are introduced into the sample surface by the plasma treatment and the tendency of the water contact angle with the treating time is the same as that of oxygen concentration on the treated sample surface. SEM result shows the surface roughness of PE samples increases with the treatment time increasing.     

Study on the Generation Characteristics of Dielectric Barrier Discharge Plasmas on Water Surface简

A new contact glow discharge electrode employed in this study. Because of the strong field the electrode and the water surface, glow discharge on the surface of water was designed and strength in the small air gap formed by plasmas were generated and used to treat waste water. The electric field distribution of the designed electrode model was simulated by MAXWELL 3D~ simulation software, and the discharge parameters were measured. Through a series of experiments, we investigated the impact of optimal designs, such as the dielectric of the electrode, immersion depths, and curvature radii of the electrode on the generation characteristics of plasmas. In addition, we designed an equipotential multi-electrode configuration to treat a Methyl Violet solution and observe the discoloration effect. The experimental and simulation results indicate that the designed electrodes can realize glow discharge with a relative low voltage, and the generated plasmas covered a large area and were in stable state. The efficiency of water treatment is improved and optimized with the designed electrodes.     

Improving Hydrophobicity of Glass Surface Using Dielectric Barrier Discharge Treatment in Atmospheric Air

Non-thermal plasmas under atmospheric pressure are of great interest in industrial applications, especially in material surface treatment. In this paper, the treatment of a glass surface for improving hydrophobicity using the non-thermal plasma generated by dielectric barrier discharge （DBD） at atmospheric pressure in ambient air is conducted, and the surface properties of the glass before and after the DBD treatment are studied by using contact angle measurement, surface resistance measurement and wet flashover voltage tests. The effects of the applied voltage and time duration of DBD on the surface modification are studied, and the optimal conditions for the treatment are obtained. It is found that a layer of hydrophobic coating is formed on the glass surface after spraying a thin layer of silicone oil and undergoing the DBD treatment, and the improvement of hydrophobicity depends on DBD voltage and treating time. It seems that there exists an optimum treating time for a certain applied voltage of DBD during the surface treatment, The test results of thermal aging and chemical aging show that the hydrophobic layer has quite stable characteristics. The interaction mechanism between the DBD plasma and the glass surface is discussed. It is concluded that CHa and large molecule radicals can react with the radicals in the glass surface to replace OH, and the hydrophobicity of the glass surface is improved accordingly.     

Grafting Silane onto Silicate Glass Surface Treated by DBD in Air

Dielectric barrier discharge plasma in air was used to modify glass surface to induce the graft of silane onto the treated surface to increase the possibility of biomolecule immobilization. The plasma treated glass had been characterized by scanning electron microscopy （SEM）, Fourier transform infrared attenuated total reflection spectroscopy, X-ray photoelectron spectroscopy （XPS） and surface water contact angle measurement. The validity of grafting silane onto glass surface was approved by the analysis of water contact angle measurement, SEM and XPS. The grafted silane content was measured by visible absorption spectroscopy using acid Orange-7. It is shown that the grafting density of silane for glass samples increases significantly after plasma treatment.     

Dielectric Barrier Discharge Plasma-Induced Photocatalysis and Ozonation for the Treatment of Wastewater

The physicochemical processes of dielectric barrier discharge （DBD） such as insitu formation of chemically active species and emission of ultraviolet （UV）/visible light were utilized for the treatment of a simulated wastewater formed with Acid Red 4 as the model organic contaminant. The chemically active species （mostly ozone） produced in the DBD reactor were well distributed in the wastewater using a porous gas diffuser, thereby increasing the gas-liquid contact area. For the purpose of making the best use of the light emission, a titanium oxide-based photocatalyst was incorporated in the wastewater treating system. The experimental parameters chosen were the voltage applied to the DBD reactor, the initial pH of the wastewater, and the concentration of hydrogen peroxide added to the wastewater. The results have clearly shown that the present system capable of degrading organic contaminants in two ways （photocatalysis and ozonation） may be a promising wastewater treatment technology.     

Preparation of Copper Nanoparticles Using Dielectric Barrier Discharge at Atmospheric Pressure and its Mechanism简

Dielectric barrier discharge （DBD） cold plasma at atmospheric pressure was used for preparation of copper nanoparticles by reduction of copper oxide （CuO）. Power X-ray diffraction （XRD） was used to characterize the structure of the copper oxide samples treated by DBD plasma. Influences of H2 content and the treating time on the reduction of copper oxide by DBD plasma were investigated. The results show that the reduction ratio of copper oxide was increased initially and then decreased with increasing H2 content, and the highest reduction ratio was achieved at 20% H2 content. Moreover, the copper oxide samples were gradually reduced by DBD plasma into copper nanoparticles with the increase in treating time. However, the average reduction rate was decreased as a result of the diffusion of the active hydrogen species. Optical emission spectra （OES） were observed during the reduction of the copper oxide samples by DBD plasma, and the reduction mechanism was explored accordingly. Instead of high-energy electrons, atomic hydrogen （H） radicals, and the heating effect, excited-state hydrogen molecules are suspected to be one kind of important reducing agents. Atmospheric-pressure DBD cold plasma is proved to be an efficient method for preparing copper nanoparticles.     

Experimental Investigation of Flow Separation Control Using Dielectric Barrier Discharge Plasma Actuators

Influence of plasma actuators as a flow separation control device was investigated experimentally. Hump model was used to demonstrate the effect of plasma actuators on external flow separation, while for internal flow separation a set of compressor cascade was adopted. In order to investigate the modification of the flow structure by the plasma actuator, the flow field was examined non-intrusively by particle image velocimetry measurements in the hump model experiment and by a hot film probe in the compressor cascade experiment. The results showed that the plasma actuator could be effective in controlling the flow separation both over the hump and in the compressor cascade when the incoming velocity was low. As the incoming velocity increased, the plasma actuator was less effective. It is urgent to enhance the intensity of the plasma actuator for its better application. Methods to increase the intensity of plasma actuator were also studied.     

Fabrication of Titanium Dioxide Thin Films by DBD-CVD Under Atmosphere

Titanium dioxide films were firstly deposited on glass substrate by DBD-CVD （dielectric barrier discharge enhanced chemical vapor deposition） technique. The structure of the films was investigated by X-ray diffraction （XRD）, scanning electron microscopy （SEM）. TiO2 films deposited under atmosphere pressure show preferred orientation, and exhibit columnar-like structure, while TiO2 films deposited under low gas pressure show no preferred orientation. The columnar-like structure with preferred orientation exhibits higher photocatalytic efficiency, since the columnar structure has larger surface area. However, it contributes little to the improvement of hydrophilicity. DBD-CVD is an alternative method to prepare photocatalytic TiO2 for its well-controllable property.     

Deep Desulfurization of Diesel Fuels with Plasma/Air as Oxidizing Medium,Diperiodatocuprate （III） as Catalyzer and Ionic Liquid as Extraction Solvent

In this paper, the oxidative desulfurization （ODS） system is directly applied to deal with the catalytic oxidation of sulfur compounds of sulfur-containing model oil by dielectric barrier discharge （DBD） plasma in the presence of air plus an extraction step with the oxidation-treated fuel put over ionic liquid [BMIM]FeC14 （1-butyl-3-methylimidazolium tetrachloroferrate）. This new system exhibited an excellent desulfurization effect. The sulfur content of DBT in diesel oil decreased from 200 ppm to 4.92 ppm （S removal rate up to 97.5%） under the following optimal reaction conditions： air flow rate （v） of 60 mL/min, amplitude of applied voltage （U） on DBD of 16 kV, input frequency （f） of 79 kHz, catalyst amount （w） of 1.25 wt%, reaction time （t） of 10 min. Moreover, a high desulfurization rate was obtained during oxidation of benzothiophene （BT） or 4,6-DMDBT （4,6-dimethyl-dibenzothiophene） under the aforementioned conditions. The oxidation reactivity of different S compounds was decreased in the order of DBT, 4,6-DMDBT and BT. The remarkable advantage of the novel ODS system is that the desulfurization condition applies in the presence of air at ambient conditions without peroxides, aqueous solvent or biphasic oil-aqueous solution system.     

Experimental Study on Electrical Breakdown for Devices with Micrometer Gaps

The understanding of electrical breakdown in atmospheric air across micrometer gaps is critically important for the insulation design of micro ＆ nano electronic devices. In this paper, planar aluminum electrodes with gaps ranging from 2μm to 40 #m were fabricated by microelectromechanical system technology. The influence factors including gap width and surface dielectric states were experimentally investigated using the home-built test and measurement system. Results showed that for SiO2 layers the current sustained at 2-3 nA during most of the pre-breakdown period, and then rose rapidly to 10-30 nA just before breakdown due to field electron emission, followed by the breakdown. The breakdown voltage curves demonstrated three stages： （1） a constantly decreasing region （the gap width d 〈5 μm）, where the field emission effect played an important role just near breakdown, supplying enough initial electrons for the breakdown process; （2） a plateau region with a near constant breakdown potential （5 μm〈 d 〈10 μm）; （3） a region for large gaps that adhered to Paschen＇s curve （d 〉10μm）. And the surface dielectric states including the surface resistivity and secondary electron yield were verified to be related to the propagation of discharge due to the interaction between initial electrons and dielectrics.     

Effects of Hydroxyl Radicals on Introduced Organisms of Ship＇s Ballast Water Based Micro-Gap Discharge

With the physical method of micro-gap gas discharge, OH. radicals were produced by the ionization of O2 in air and H2O in the gaseous state, in order to explore more effective method totreat the ship＇s ballast water. The surface morphology of Al2O3 dielectric layer was analysed using Atomic Force Microscopy （AFM）, where the size of Al2O3 particles was in the range of 2 μm to 5 μm. At the same time, the biochemical effect of hydroxyl radicals on the introduced organisms and the quality of ship＇s ballast water were studied. The results indicate that the main reasons of cell death are lipid peroxide and damage of the antioxidant enzyme system in Catalase （CAT）, Peroxidase （POD） and Superoxide dismutase （SOD）. In addition, the quality of the ballast water was greatly improved.     

Achieving Better NOx Removal in Discharge Plasma Reactor by Field Enhancement

Application of plasma chemistry for gas cleaning is gaining prominence in recent years, mainly from an energy efficiency point of view. In this paper we conducted a comparative study of NO/NOx removal using two different types of dielectric barrier discharge electrodes, wire- cylinder reactor, pipe-cylinder reactor. Investigations were first carried out with synthetic gases to obtain the baseline information on the NO/NOx removal with respect to the two geometries studied. Further, experiments were carried out with raw diesel exhaust under loaded condition. A high NOx removal efficiency of 90% was observed for the pipe-cylinder reactor as compared to that of 53.4% for the wire-cylinder reactor. Furthermore, for the same energy consumed per NO molecule （about 73 eV/NO molecule）, the removal efficiency increased from 67% for the wire- cylinder to about 98% for the pipe-cylinder which was quite appreciable.     

Role of Ion Beam Irradiation and Annealing Effect on the Deposition of AlON Nanolayers by Using Plasma Focus Device

AlON nanolayers are synthesized on Al substrate by the irradiation of energetic nitrogen ions using plasma focusing. Samples are exposed to multiple （5, 10, 15, 20 and 25） focus shots. Ion energy and ion number density range from 80 keV to 1.4 MeV and 5.6×10^19 m^- 3 to 1.3×10^19 m ^-3, respectively. Moreover, the effect of continuous annealing （473 K and 523 K） on an AlN surface layer synthesized with 25 focus shots is also examined. The main features of the X-ray diffraction （XRD） patterns with increasing focus shots are： （i） variation in the crystallinity of AlN along （111）, （200） and （311） planes, （ii） increasing average crystallite size of AlN （111） plane, and （iii） stress relaxation observed in AlN （111） and （200） planes. The crystallinity of AlN surface layer is comparatively better at 473 K annealing temperature. A broadened diffraction peak related to an aluminium oxide phase showing weak crystallinity is observed for 15 focus shots while non-bounded oxides are present in all other deposited layers. Raman and Fourier transform infrared spectroscopy （FTIR） analysis confirm the presence of AlN and Al203 for the surface layer annealed at 473 K temperature. Raman analysis shows that the overlapping of AlN and Al2Oa results in the development of residual stresses. Scanning electron microscope （SEM） results demonstrate that the formation of rounded grains （range from 20 nm to 200 nm） and variations in their microstructures features depend on the increasing number of focus shots. Decomposition of larger clusters into smaller ones is observed.     

Degradation of Alizarin Red by Hybrid Gas-Liquid Dielectric Barrier Discharge

A system based on dielectric barrier discharge （DBD） with improved discharge sta- bility and homogeneity was used for the degradation of Alizarin Red （AR）. This special structure of the DBD system is characterized by the high voltage electrode, which is covered with a quartz tube and partially immersed in water, and by directly using the water as the ground electrode. A transition was realized from the filamentary mode for the conventional structure of the DBD to the semi-homogeneous mode for such a configuration of the plasma discharge. The spectra of plasma are dominated by N2 molecular lines in the ultraviolet-A radiation region. Plasma degra- dation of AR in this system exhibited pseudo-first-order reaction kinetics. The degradation rate of AR reached 95% or so after 14 min treatment under favorable conditions. Alkaline conditions are favorable for the degradation of AR. The increase of conductivity of the solution, input power and usage of oxygen bubbling could enhance AR degradation.     

The Design and Test of a Be Window for the ITER Radial X-Ray Camera

Beryllium(Be) window is a key component of the ITER radial X-ray camera(RXC).The Be window presented in this paper has a mechanical clamping structure, the thickness of the Be foil is 80 μm, and the X-ray threshold of the 80 μm Be foil is 1.24 keV. A honeycomb support is designed and applied to strengthen the Be foil to prevent it from breakage when it is exposed to1 atm perssure. Based on analysis results, the hole diameter of the support is chosen as 4 mm. A metal seal is used to isolate the vacuum on two sides of the Be window, the hollow metal sealing ring ensures the He leakage rate of the Be window being lower than 6×10-10Pa·m3·s-1. Baking(240°C, 2 h) and vibration(3.3 Hz, 2 h) tests are carried out and the feasibility of the Be window's sealant in these situations is tested. The Be window has good stability that can save maintenance cost as well as enhancing the safety of the RXC.     

Synthesis of Crystalline Carbon Nitride Thin Films by Pulsed Arc Discharge at Atmospheric Pressure

The preparation of crystalline C3N4 films was investigated using pulsed arc discharge from mixed methanol and ammonia water at atmospheric pressure. The X-ray diffraction （XRD） patterns of the films prepared at a substrate temperature of 450℃ suggested that the film was composed of α-C3N4 and fl-C3N4 crystallites. Raman spectra exhibited distinct peaks which are in good agreement with those predicted theoretically for C3N4 crystallites.     

Effect of Low-Frequency Power on Etching Characteristics of 6H-SiC in C4Fs/Ar Dual-Frequency Capacitively Coupled Plasma

Dry etching of 6H silicon carbide （6H-SiC） wafers in a C4Fs/Ar dual-frequency capacitively coupled plasma （DF-CCP） was investigated. Atomic force microscopy （AFM） and X-ray photoelectron spectroscopy （XPS） were used to measure the SiC surface structure and compositions, respectively. Optical emission spectroscopy （OES） was used to measure the relative concentration of F radicals in the plasma. It was found that the roughness of the etched SiC surface and the etching rate are directly related to the power of low-frequency （LF） source. At lower LF power, a smaller surface roughness and a lower etching rate are obtained due to weak bombardment of low energy ions on the SiC wafers. At higher LF power the etching rate can be efficiently increased, but the surface roughness increases too. Compared with other plasma dry etching methods, the DF-CCP can effectively inhibit CχFγ films＇ deposition, and reduce surface residues.