WO3/Bi2WO6复合薄膜的制备及其光电化学性能

以导电玻璃为基底采用水热法制备了WO3纳米片薄膜,再通过溶剂热法改变不同溶剂热反应时间(6、8和10 h)在WO3纳米片薄膜上生长Bi2WO6制备了WO3/Bi2WO6复合薄膜.利用XRD、SEM、UV-Vis、光电流、光电催化和交流阻抗对WO3/Bi2WO6复合薄膜的结构和光电性能进行表征与测定.结果表明,WO3纳米片薄膜的光电流密度为0.74 mA/cm2,对质量浓度为6.0 mg/L亚甲基蓝的光电催化效率为47.9％.不同WO3/Bi2WO6复合薄膜的光电化学性能均优于单一WO3纳米薄膜,且溶剂热反应时间为8 h的WO3/Bi2WO6复合薄膜具有最高的光电流密度(1.22 mA/cm2)和最优的光电催化效率(58.6％).WO3/Bi2WO6复合薄膜有效降低了复合薄膜内部电子阻抗,增加了有效光电化学反应位点,显著提升了光电化学性能.     

WO3/ZnWO4复合薄膜的制备及其光电化学性能

采用水热法在导电玻璃(FTO)上制备WO3纳米薄膜,然后通过改变水热反应时长(1、3、5 h)在WO3纳米薄膜上成功制备了WO3/ZnWO4复合薄膜.利用XRD和SEM对WO3/ZnWO4复合薄膜样品的组成结构及形貌进行分析.并对WO3/ZnWO4复合薄膜样品进行吸收光谱测试、光电流测试、光电催化测试和交流阻抗测试.结...     

QLED用空穴传输层WO3的形貌调控和光电性能研究

采用溶剂热法在FTO导电玻璃上制备WO3薄膜,通过改变溶剂和添加剂的种类,调控WO3的微观形貌、光学性质和电学性质,以期作为空穴传输材料应用在QLED器件中.利用XRD、FE-SEM、紫外可见分光透射光谱、霍尔测试等方法分析表征样品.实验结果表明,通过溶剂热法成功制备了不同形貌的WO3薄膜,其光学透过率高,载流子传输速率得到明显提高,有望应用在QLED器件中进而提高QLED的器件效率.其中,采用水作为溶剂,并添加2 mL乙腈和0.07 g尿素的溶剂热条件制备的WO3薄膜其载流子传输速率最高为2.678×102 cm2·Vs-1,导电性能最高,电阻率为5.334×10-2 Ω·cm.     

纳米WO3薄膜的制备方法及性质研究

介绍和分析了制备纳米WO3薄膜的主要方法及各自优缺点;对纳米WO3的性质研究现状作了简要概述,并提出了纳米WO3薄膜的发展前景.     

WO3薄膜材料的气敏性能

研究了WO3薄膜材料的制备工艺、气敏性能和贵金属表面改性。以钨酸为原料、加入有机络合剂的无机盐溶胶-凝胶(inorganic solgel method,ISG)法合成了WO3薄膜。确定了最佳ISG工艺制度,即以柠檬酸为络合剂,10次成膜,预处理温度为600℃,烧成温度为650℃。实验结果表明：WO3是一种n型半导体,其最佳工作温度为550℃。通过掺杂贵金属制备了Pt/WO3薄膜材料,有效地改善了薄膜的气敏性能,可以在600℃下获得高达4100的灵敏度。WO3的气敏机理为表面控制型。     

WO3/ZnWO4复合薄膜的制备及其光电化学性能研究

摘要：采用水热法在导电玻璃(FTO)上制备WO3纳米薄膜,然后同样使用水热法并改变水热反应时长(1h,3h,5h)在WO3纳米薄膜上成功制备WO3/ZnWO4复合薄膜。利用X射线衍射和扫描电子显微镜对WO3/ZnWO4复合薄膜样品的组成结构及形貌进行分析。并对WO3/ZnWO4复合薄膜样品进行吸收光谱测试、光电流测试、光电催化测试和交流阻抗测试,结果表明WO3/ZnWO4复合薄膜样品相较于单一WO3纳米薄膜,具有更好的光吸收特性、更优秀的光电流特性和显著提升的光电催化活性。且水热反应3h的WO3/ZnWO4复合薄膜样品相较于水热反应1h和5h的WO3/ZnWO4复合薄膜样品具有最高的光电流密度和最优的光电催化效率。     

活性炭掺杂WO_3/ZnO复合薄膜制备及其光催化性能研究

采用溶胶-凝胶法在铝箔上制备WO3/ZnO复合薄膜,并用活性炭对其改性,以甲基橙水溶液模拟有机污染物,研究了WO3/ZnO薄膜的光催化降解性能。实验结果表明:白炽灯照射2h、WO3质量分数为2.5%时,WO3/ZnO/铝箔对甲基橙的降解率达到78.54%;紫外光照射下降解率达到99.89%。当活性炭掺杂量为10g/L时,制得的WO3/ZnO复合薄膜均匀一致且光催化性能良好,可见光照射下甲基橙降解率达到85.71%。     

纳米WO3薄膜的制备方法及其性质研究

纳米WO3薄膜是一种典型的功能性纳米材料,在电致变色、气敏性、共催化及光致变色等方面都有着广阔的应用前景。综述了纳米WO3薄膜的几种常用制备方法并进行了比较,对纳米WO3薄膜的发展前景作出展望。     

纳米WO3薄膜的制备方法及其性质研究

纳米WO3薄膜是一种典型的功能性纳米材料,在电致变色、气敏性、共催化及光致变色等方面有着广阔的应用前景。本文综述了纳米WO3薄膜的几种常用制备方法并进行了比较,最后对纳米WO3薄膜的发展前景作出展望。     

纳米WO_3薄膜的制备方法及性质研究

介绍和分析了制备纳米WO3薄膜的主要方法及各自优缺点;对纳米WO3的性质研 究现状作了简要概述,并提出了纳米WO3薄膜的发展前景。     

Synthesis and Optical Properties of Poly(BPDA-ODA)/Silica Hybrid Thin Films

Poly(BPDA-ODA)/silica hybrid optical thin films were synthesized using a sol-gel reaction combined with spin coating and multi-step baking. The hybrid thin films were prepared by the precursors of aminoalkoxysilane capped poly(BPDA-ODA) amic acid and tetramethoxysilane (TMOS). Highly transparent hybrid thin films were obtained at a silica content of 0–51.9 wt%. The prepared hybrid thin films showed homogeneous structures and excellent surface planarity. The refractive index of the prepared hybrid thin films decreased linearly with increasing the silica content while the Abbe number showed the opposite trend. The prepared hybrid films also exhibited a much smaller optical birefringence than the parent poly(BPDA-ODA) because of the reduction of the rigid backbone by incorporating the silica moiety. Optical planar waveguides were prepared from the prepared hybrid thin films. The optical losses of the planar waveguides at 1310 nm were in the range of 0.5–1.3 dB/cm, which were reduced significantly by increasing the silica moiety. The reduction of the C–H bonding density and excellent surface planarity by incorporating the silica moiety explain the trend of optical loss. These results suggest that the prepared polyimide-silica hybrid thin films have potential applications for optical devices.     

Sol—Gel法制备WO3薄膜的研究

采用络合物ｓｏｌ－ｇｅｌ浸渍提拉法以过钨酸酯的乙醇溶液为先驱制备了ＷＯ３薄膜，研究了有机添加剂草酸对膜结构的影响，并对所得薄膜进行了红外光谱、可见光谱和ＳＥＭ等测试和观察。结果表明该法能制得质量好的ＷＯ３薄膜，在溶液中加入草酸可以有效地控制裂纹扩展。因此在优化工艺条件后将能得到无裂纹的ＷＯ３薄膜。     

利用相分离制备透明超疏水纳米二氧化硅薄膜

以氨水为催化剂配制碱溶胶(Sol A),以盐酸为催化剂配制酸溶胶(Sol B),在酸、碱混合溶胶中添加聚丙烯酸(PAA)引发相分离,制备出高粗糙度的"沟-小山"形貌的透明薄膜,随后经过三甲基氯硅烷(TMCS)修饰,表面接触角达到151°,具有超疏水性能。     

TiO2光催化薄膜的制备及其性能

在稀硫酸溶液中的阳极氧化钛箔,采用混合增长模型技术控制氧化膜的生长,制备了TiO2光催化薄膜,TiO2薄膜通过苯酚的光催化降解实验检验,具有较高的催化活性及很好的催化稳定性,实验结果表明：阳极氧化法固定TiO2薄膜切实地,不仅解决了TiO2微粒光催化过程催化剂微料与水难分离的问题,而且阳极氧化制膜所需时间短（几秒到几分）、工艺简单,十分有利于工业化制备。     

Electrochromic properties of polycrystalline thin films of tungsten trioxide prepared by chemical vapour deposition

The electrochromic properties of polycrystalline thin films of tungsten trioxide prepared by chemical vapour deposition were studied using cyclic voltametry and chronoamperometry measurements. Two kinds of films were investigated depending on the conditions of preparation. Although the composition of the layers obtained after pyrolysis of W(CO)₆ is influenced by the presence of oxygen flow, the final annealing of these products leads to the same polycrystalline structure. Electrochromic properties have been investigated in acid and hydro-organic electrolytes. Cyclic voltametry shows that both colouration and bleaching of the films are associated with electrochemical reactions. The optical efficiencies and the response times were studied in both media and compared with amorphous WO₃ thin films prepared by vacuum evaporation. Best results have been obtained in acid electrolyte for films prepared by pyrolysis of W(CO)₆ in the presence of oxygen flow. We also observed that cycling greatly enhanced the response time. Current injection during colouration was found to depend strongly on time and to be mainly controlled by the resistance of the electrolyte at short times (f<200 ms).     

The Structural,Optical and Electrical Properties of Spin Coated WO<Subscript><Emphasis Type="Bold">3</Emphasis></Subscript> Thin Films Using Organic Acids

Tungsten trioxide (WO₃) thin films were prepared incorporating various organic acid additives by the sol-gel spin coating technique. They were characterized by X-ray diffraction (XRD), UV-Visible analysis, scanning electron microscopy (SEM) and dc electrical conductivity. From XRD, the crystal phase, average grain size and structural parameters of WO₃ thin films were found to vary owing to different water dissolved organic acid additives. The variation of optical conductivity and band gap energy was calculated from the UV-Visible analysis. The SEM studies revealed that the organic acids influenced the surface morphology of the microsized plates of tungsten oxides. The electrical conductivity at various temperatures correlated with the average grain size of the nanocrystallites of WO₃ thin films.     

液相沉积法制备光催化TiO2／SiO2复合薄膜及其表征

通过液相沉积法在较低的温度下制备了TiO2／SiO2复合薄膜，利用UV-Vis、XRD和SEM等表征手段对薄膜的透明性、物相和表面形貌进行了表征；并在紫外光照下，通过薄膜对罗丹明B水溶液的光催化降解实验，评价了沉积薄膜的光催化活性。实验结果表明，在室温下制备的液相沉积膜具有较好的光催化活性。     

热处理温度对MoO_3薄膜的结构及光致变色性能的影响

采用溶胶-凝胶浸渍提拉法制备MoO3光致变色薄膜。用色差计表征了材料的光致变色性能,并结合X射线衍射、扫描电镜、紫外-可见吸收光谱研究了热处理温度对其微观结构及性能的影响。结果表明:制备的产物为斜方相MoO3;随热处理温度的升高,MoO3薄膜光致变色性能先增后减。当温度为500℃时,薄膜的结晶度最大,颗粒粒径最小,比表面积较大;色差值最大为1.2330。在该温度下激发波长向长波长移动,薄膜的吸收光波区域变宽,从而使MoO3薄膜的光致变色性能提高。     

p-Type and n-type Cu2O semiconductor thin films: Controllable preparation by simple solvothermal method and photoelectrochemical properties

p-Type and n-type Cu₂O thin films were controllably prepared using a simple solvothermal method by adjusting pH value of the copper (II) acetate aqueous solution. Photoelectrochemical experiments show that the Cu₂O thin films synthesized in acid and alkaline (or neutral) media present n-type and p-type semiconductor character, respectively. Moreover, the films prepared at pH 5 have the best photoelectrochemical properties. The mechanism for the formation of these p-type and n-type Cu₂O films is discussed. The Cu₂O p–n homojunction fabricated in this study shows typical p–n junction character. This facile preparation method may be a promising way to prepare p–n homojunctions for semiconductor devices.     

TiO2 纳米薄膜的制备及降解印染废水的研究

采用sol-gel浸渍法制备了不同厚度的TiO2纳米薄膜，并在不同温度下进行热处理，得到不同团簇颗粒尺寸的TiO2纳米薄膜，同时采用银镜反应使部分薄膜镀银。研究了镀银和未镀银TiO2纳米薄膜对印染废水的降解能力。