Thermal-field forward current in GaN-based surface-barrier structures

The voltage and temperature dependences of the capacitance and forward current in surface-barrier Ni-n-GaN structures are experimentally studied. The results are compared with the Padovani-Stratton thermofield emission theory. It is established that, in a temperature range of 250–410 K, the forward current of the Ni-n-GaN surface-barrier structures (the electron density in GaN is ～10¹⁷ cm^?3) is caused by a thermofield emission of electrons, whose energy is ～0.1 eV below the potential-barrier top.     

Tunnel-recombination currents and electroluminescence efficiency in InGaN/GaN LEDs

The mechanism of injection loss in p-GaN/InGaN/n-GaN quantum-well LEDs is analyzed by studying the temperature and current dependences of external quantum efficiency in the temperature range 77–300 K and by measuring transient currents. The data obtained are interpreted in terms of a tunnel-recombination model of excess current, which involves electron tunneling through the potential barrier in n-GaN and the over-barrier thermal activation of holes in p-GaN. At a low forward bias, the dominant process is electron capture on the InGaN/p-GaN interface states. At a higher bias, the excess current sharply increases due to an increase in the density of holes on the InGaN/p-GaN interface and their recombination with the trapped electrons. The injection of carriers into the quantum well is limited by the tunnel-recombination current, which results in a decrease in efficiency at high current densities and low temperatures. The pinning of the Fermi level is attributed to the decoration of heterointerfaces, grain boundaries, and dislocations by impurity complexes.     

Modified Interface Properties of Au/<Emphasis Type="Italic">n</Emphasis>-type GaN Schottky Junction with a High-<Emphasis Type="Italic">k</Emphasis> Ba<Subscript>0.6</Subscript>Sr<Subscript>0.4</Subscript>TiO<Subscript>3</Subscript> Insulating Layer

The interface properties of a Au/n-GaN Schottky junction (SJ) were modified by placing a high-k barium strontium titanate (Ba_0.6Sr_0.4TiO₃) insulating layer between the Au and n-GaN semiconductor. The surface morphology, chemical composition, and electrical properties of Au/Ba_0.6Sr_0.4TiO₃ (BST)/n-GaN metal/insulator/semiconductor (MIS) junctions were explored by atomic force microscopy, energy-dispersive x-ray spectroscopy, current–voltage (I–V) and capacitance–voltage (C–V) techniques. The electrical results of the MIS junction are correlated with the SJ and discussed further. The MIS junction exhibited an exquisite rectifying nature compared to the SJ. An average barrier height (BH) and ideality factors were extracted to be 0.77 eV, 1.62 eV and 0.92 eV, 1.95 for the SJ and MIS junction, respectively. The barrier was raised by 150 meV for the MIS junction compared to the MS junction, implying that the BH was effectively altered by the BST insulating layer. The BH values extracted by I–V, Cheung’s and Norde functions were nearly equal to one another, indicating that the techniques applied here were dependable and suitable. The frequency-dependent properties of the SJ and MIS junction were explored and discussed. It was found that the interface state density of the MIS junction was smaller than the SJ. This implies that the BST layer plays an imperative role in the decreased N_SS. Poole–Frenkel emission was the prevailed current conduction mechanism in the reverse-bias of both the SJ and MIS junction.     

Mechanism of dislocation-governed charge transport in schottky diodes based on gallium nitride

A mechanism of charge transport in Au-TiB _x -n-GaN Schottky diodes with a space charge region considerably exceeding the de Broglie wavelength in GaN is studied. Analysis of temperature dependences of current-voltage (I–V) characteristics of forward-biased Schottky barriers showed that, in the temperature range 80–380 K, the charge transport is performed by tunneling along dislocations intersecting the space charge region. Estimation of dislocation density ρ by the I–V characteristics, in accordance with a model of tunneling along the dislocation line, gives the value ρ ≈ 1.7 × 10⁷ cm^?2, which is close in magnitude to the dislocation density measured by X-ray diffractometry.     

Anomalous dependences of the diode barrier capacitance on bias voltage and temperature

Capacitances of a Schottky barrier and p ⁺-n junction whose n-type regions contain shallow donors and deep acceptors with levels in the upper part of the energy gap have been calculated. The capacitance was represented as two series capacitances of the near-contact region containing only donor impurity ions and of the intermediate layer at the interface between the space-charge region and the diode base, with account of the free-carrier concentration and its dependence on the potential. It was found that the capacitance of the intermediate layer heavily depends on temperature and may increase with the bias voltage. The calculated capacitancevoltage characteristics of the barrier capacitance are in agreement with experimental data and even describe the nonmonotonic dependences of the capacitance on the bias voltage.     

Emission sensitization and mechanisms of electron-excitation migration in structures based on III-nitrides doped with rare-earth elements (Eu,Er, Sm)

The effect of doping with Eu, Er, and Sm rare-earth ions on the shape of the luminescence spectrum for heterostructures with GaN/In _x Ga_{1 ? x} N (0.1 < x < 0.4) quantum wells and from p-GaN〈Mg〉/n-GaN and p-AlGaN/n-GaN junctions is investigated. The results of measurements of the electroluminescence of these structures correlate with the previous data on photoluminescence and Mössbauer spectroscopy. It is shown that it is the GaN “yellow” (5000–6000 Å) band that plays the important role in the excitation of intracenter states in the structures with several GaN/InGaN quantum wells doped with Eu and Sm. In this case, Eu is most likely the sensitizer for Sm. Additional introduction of 3d metal (Fe⁵⁷) in p-GaN〈Mg〉/n-GaN:Eu results in the realization of intracenter transitions in Eu³⁺: ⁵ D ₀ → ⁷ F ₁ (6006 Å), ⁵ D ₀ → ⁷ F ₂ (6195 Å), ⁵ D ₀ → ⁷ F ₃ (6627 Å), and ⁵ D ₁ → ⁷ F ₄ (6327 Å) due to the occurrence of new, efficient channels of excitation transfer to intracenter states and in the effect of Fe on the local environment of rare-earth ions including due to the f–d hybridization enhancement.     

The electronic and emissive properties of Au-doped porous silicon

The temperature dependences of photovoltage induced by intense pulses of red and white light, along with the time-resolved spectral dependences of photoluminescence, are studied for porous silicon structures por-Si/p-Si). These structures have been obtained by anode etching of p-Si with subsequent Au doping from an aqueous solution with Au ion concentrations of 10^?4 and 10^?3 M. The current-voltage characteristics and electroluminescence of the resulting por-Si/p-Si and por-Si:Au/p-Si structures are also studied after a deposition of semitransparent Au electrodes on por-Si. It is shown that the Au doping changes the sign of the boundary potential of p-Si from positive to negative, alters the magnitude and sign of the photovoltage in the por-Si films, and eliminates photomemory phenomena, which are associated with the capture of nonequilibrium electrons at grain-boundary traps and por-Si traps. The formation of Au nanocrystals in por-Si substantially affects the current-voltage and photoluminescence characteristics. Electroluminescence is observed for the Au/por-Si:(Au, 10^?3 M)/p-Si/Al structures and is attributed to emission from the nanocrystals.     

On the laser detachment of <Emphasis Type="Italic">n</Emphasis>-GaN films from substrates,based on the strong absorption of IR light by free charge carriers in <Emphasis Type="Italic">n</Emphasis> <Superscript>+</Superscript>-GaN substrates

The physical and technological basics of the method used to lift off lightly and moderately doped n-GaN films from heavily doped n⁺-GaN substrates are considered. The detachment method is based on the free-charge-carrier absorption of IR laser light, which is substantially higher in n⁺-GaN films.     

Molecular state of <Emphasis Type="Italic">A</Emphasis><Superscript>+</Superscript> centers in GaAs/AlGaAs quantum well

Along with the separate A ⁺ centers in the GaAs/AlGaAs quantum wells, there exist paired molecular states of the centers. The molecular states manifest themselves as the second peak of photoluminescence associated with the A ⁺ centers. This statement is based on data on the specific features of circular-polarized photoluminescence and on the characteristic dependences of the amplitudes of photoluminescence peaks on the degree of doping and temperature. The binding energy of holes in the molecular states is determined. It is suggested that the paired state of two positively charged A ⁺ centers is possible due to the polaron effect.     

Electrical Properties of <Emphasis Type="Italic">p</Emphasis>-NiO/<Emphasis Type="Italic">n</Emphasis>-Si Heterostructures Based on Nanostructured Silicon

Silicon nanowires are formed on n-Si substrates by chemical etching. p-NiO/n-Si heterostructures are fabricated by reactive magnetron sputtering. The energy diagram of anisotype p-NiO/n-Si heterostructures is constructed according to the Anderson model. The current–voltage and capacitance–voltage characteristics are measured and analyzed. The main current-transport mechanisms through the p-NiO/n-Si heterojunction under forward and reverse biases are established.     

Tunneling Current in Oppositely Connected Schottky Diodes Formed by Contacts between Degenerate <Emphasis Type="Italic">n</Emphasis>-GaN and a Metal

The nonlinear behavior of the I–V characteristics of symmetric contacts between a metal and degenerate n-GaN, which form oppositely connected Schottky diodes, is investigated at free-carrier densities from 1.5 × 10¹⁹ to 2.0 × 10²⁰ cm^–3 in GaN. It is demonstrated that, at an electron density of 2.0 × 10²⁰ cm^–3, the conductivity between metal (chromium) and GaN is implemented via electron tunneling and the resistivity of the Cr–GaN contact is 0.05 Ω mm. A method for determining the parameters of potential barriers from the I–V characteristics of symmetric opposite contacts is developed. The effect of pronounced nonuniformity of the current density and voltage distributions over the contact area at low contact resistivity is taken into account. The potential-barrier height for Cr–n⁺-GaN contacts is found to be 0.47 ± 0.04 eV.     

Electron mobility in the inversion layers of fully depleted SOI films

The dependences of the electron mobility μ_eff in the inversion layers of fully depleted double–gate silicon-on-insulator (SOI) metal–oxide–semiconductor (MOS) transistors on the density N _e of induced charge carriers and temperature T are investigated at different states of the SOI film (inversion–accumulation) from the side of one of the gates. It is shown that at a high density of induced charge carriers of N _e > 6 × 10¹² cm^–2 the μeff(T) dependences allow the components of mobility μ_eff that are related to scattering at surface phonons and from the film/insulator surface roughness to be distinguished. The μ_eff(N _e ) dependences can be approximated by the power functions μ_eff(N _e) ∝ N _e ^?n . The exponents n in the dependences and the dominant mechanisms of scattering of electrons induced near the interface between the SOI film and buried oxide are determined for different N _e ranges and film states from the surface side.     

Graphite/<Emphasis Type="Italic">p</Emphasis>-SiC Schottky Diodes Prepared by Transferring Drawn Graphite Films onto SiC

Graphite/p-SiC Schottky diodes are fabricated using the recently suggested technique of transferring drawn graphite films onto p-SiC single-crystal substrates. The current–voltage and capacitance–voltage characteristics are measured at different temperatures and at different frequencies of a small-signal AC signal, respectively. The temperature dependences of the potential-barrier height and of the series resistance of the graphite/p-SiC junctions are measured and analyzed. The dominant mechanisms of the charge–carrier transport through the diodes are determined. It is shown that the dominant mechanisms of the transport of charge carriers through the graphite/p-Si Schottky diodes at a forward bias are multi-step tunneling recombination and tunneling described by the Newman formula (at high bias voltages). At reverse biases, the dominant mechanisms of charge transport are the Frenkel–Poole emission and tunneling. It is shown that the graphite/p-SiC Schottky diodes can be used as detectors of ultraviolet radiation since they have the open-circuit voltage V_oc = 1.84 V and the short-circuit current density I_sc = 2.9 mA/cm² under illumination from a DRL 250-3 mercury–quartz lamp located 3 cm from the sample.     

Effect of the bias electric field on the spectral distribution of the photodielectric effect in the Schottky-barrier structures based on the cadmium-zinc telluride crystals

Spectral dependences of effective values of the real and imaginary parts of the low-frequency permittivity of the Cd_1?x Zn _x Te crystals (x=0.12–0.16) with the Schottky barrier fabricated on the surface are measured. It is found that the boundary wavelengths of the characteristic portions of the measured dependences represented in the complex plane correspond to energies of photons, which cause the radical variations in the state of negatively charged and electrically neutral localized acceptor states. The variations in the energy spectrum of the localized states, which are determined by the magnitude and polarity of the electric bias applied to the Shottky barrier, are found.     

Electrical properties of <Emphasis Type="Italic">n-</Emphasis>GaN/<Emphasis Type="Italic">p</Emphasis>-SiC heterojunctions

Epitaxial GaN layers were grown by hydride vapor phase epitaxy (HVPE) on commercial (CREE Inc., USA) p⁺-6H-SiC substrates (Na ? Nd ≈ 7.8 × 10¹⁷ cm^s?3) and n⁺-6H-SiC Lely substrates with a predeposited p⁺-6H-SiC layer. A study of the electrical properties of the n-GaN/p-SiC heterostructures obtained confirmed their fairly good quality and demonstrated that the given combination of growth techniques is promising for fabrication of bipolar and FET transistors based on the n-GaN/p-SiC heterojunctions.     

White electroluminescence from ZnO/GaN structures

White electroluminescence (EL) from ZnO/GaN structures fabricated by pulsed laser deposition of ZnO:In onto GaN:Mg/GaN structures MOCVD-grown on Al₂O₃ substrates has been observed. The white light is produced by superposition of the two strongest emission lines, narrow blue and broad yellow, peaked at 440 and 550 nm, respectively. The intensity ratio of different EL lines from ZnO/GaN/Al₂O₃ structures depends on the ZnO film quality and drive current. The white EL is due to the high density of structural defects at the n-ZnO/p-GaN interface. A band diagram of the n-ZnO/p-GaN/n-GaN structure is constructed and a qualitative explanation of the EL is suggested.     

Electrical characteristics of Au/<Emphasis Type="Italic">n</Emphasis>-GaAs structures with thin and thick SiO<Subscript>2</Subscript> dielectric layer

The aim of this study, to explain effects of the SiO₂ insulator layer thickness on the electrical properties of Au/n-GaAs Shottky barrier diodes (SBDs). Thin (60 Å) and thick (250 Å) SiO₂ insulator layers were deposited on n-type GaAs substrates using the plasma enganced chemical vapour deposition technique. The current-voltage (I–V) and capacitance-voltage (C-V) characteristics have been carried out at room temperature. The main electrical parameters, such as ideality factor (n), zero-bias barrier height (? _Bo ), series resistance (R _s ), leakage current, and interface states (N _ss ) for Au/SiO₂/n-GaAs SBDs have been investigated. Surface morphologies of the SiO₂ dielectric layer was analyzed using atomic force microscopy. The results show that SiO₂ insulator layer thickness very affects the main electrical parameters. Au/n-GaAs SBDs with thick SiO₂ insulator layer have low leakage current level, small ideality factor, and low interface states. Thus, Au/n-GaAs SBDs with thick SiO₂ insulator layer shows better diode characteristics than other.     

Schottky barriers based on <Emphasis Type="Italic">n</Emphasis>-In<Subscript>2</Subscript>S<Subscript>3</Subscript> films obtained by laser-induced evaporation

The method of evaporation of starting targets with subsequent deposition onto glass substrates at temperatures of 480–720 K is used to grow homogeneous thin (0.6–1.5 μm) n-In₂S₃ films on which the In/n-In₂S₃ Schottky barriers were formed for the first time; evaporation was induced by a pulsed laser. The temperature dependence of resistivity of the films with the n-type conductivity was studied and the activation energy of donor centers in these films was determined. Spectral dependences of the photoconversion quantum efficiency η(?ω) for the barriers obtained were studied. An analysis of the spectral dependences η(?ω) made it possible to identify the type of band-to-band transitions and estimate the band gap in the In₂S₃ films. It is concluded that the thin In₂S₃ films can be used in broadband photoconverters of optical radiation.     

Electrical Characteristics of GaN-Based Light-Emitting Diodes on Patterned Sapphire Substrates

Patterned sapphire substrate light-emitting diodes display obvious negative capacitance (NC) at large forward biases. This is measured using a method based on a small signal alternating current together with direct I–V plots. The NC in patterned sapphire substrate LEDs grows exponentially with the forward applied voltage. This observation is unexpected and in contrast with Shockley’s p–n junction theory, which only includes an increasing diffusion capacitance and not a NC. However, this result is in good agreement with conventional sapphire substrate LEDs. Furthermore, the negative terminal capacitance confirmed the prediction of Laux and Hess’ theory. The ideal factor of a patterned sapphire substrate LED is about 5, greatly exceeding the traditional theoretical value. The capacitance increased to a maximum and then gradually decreased, which was similar to the results for a p–n junction. Patterned sapphire substrate LEDs can withstand higher voltages than conventional sapphire substrate LEDs. This work could further confirm the existence of NC.     

Field effect and capacitance of silicon crystals with hopping conductivity over point radiation defects pinning the Fermi level

The static field effect and capacitance of Si crystals with hopping conductivity over defects in the charge states (+1), (0), and (?1), which pin the Fermi level, are calculated. In the Si band gap, the defects in the (0) and (+1) charge states form a v′ band, and in the charge states (?1) and (0), they form a c′ band. The width of the c′ and v′ energy bands is calculated under the assumption of Coulomb interaction of each charged defect with only the nearest ion. The energy gap between the c′ and v′ bands is assumed to be constant. Nonmonotonicity of the dependence of capacitance and surface hopping conductivity on the electric potential on the surface of the highly damaged Si crystals is predicted.