共查询到17条相似文献,搜索用时 765 毫秒
1.
氧化铝具有优良的绝缘和阻氚性能,是ITER候选功能材料之一。本工作采用射频磁控溅射法在中国低活化马氏体(CLAM)钢基底上制备了氧化铝涂层。分别采用掠入射X射线衍射、Raman激光光谱和原子力显微镜对氧化铝涂层的结构和表面形貌进行了表征;测量了氧化铝涂层体电阻率;研究了氧化铝涂层样品的吸氢特性。结果表明:氧氩比为0.1和0.5下制备的氧化铝涂层为非晶结构,氧氩比为0.4下制备的涂层中出现了结晶程度较差的氧化铝δ相结构;氧氩比为0.1和0.4下制备的涂层粗糙度和粒径均小于氧氩比为0.5下制备的涂层;不同氧氩比下制备的氧化铝涂层体电阻率均超过2.7×1014Ω•cm,氧氩比为0.4下制备的涂层电阻率最高,达到2.1×1015Ω•cm;氧氩比为0.5下制备的涂层样品具有最低的吸氢量。氧氩比对涂层的电绝缘特性和吸氢特性有显著影响。 相似文献
2.
在不锈钢基体表面用离子束混合技术沉积SiC薄膜,然后用能量为5 keV的H+对其辐照直至剂量达到1×1018/cm2,再用二次离子质谱分析(SIMS)分析H+在SiC薄膜中深度分布和正离子谱,研究薄膜的阻氢性能和阻氢机理;最后采用渗透实验对涂覆在不锈钢基体表面的SiC材料的氚渗透系数进行测试,对其阻氚性能进行验证.结果表明,在不锈钢基材表面涂覆的SiC薄膜具有良好的阻氢性能,可将氚的渗透率降低4个数量级以上,SiC薄膜的阻氢是由于氢与薄膜中的硅、碳悬挂键反应形成诸如C-H、C-H2、C-H3、Si-H、Si-H2和Si-H3引起的. 相似文献
3.
4.
采用化学气相沉积(CVD)技术,在1Cr13不锈钢基体上制备TiC/Ti(C,N)/TiN复合涂层,研究了该涂层从室温(25℃)到400℃的微动磨损特性,并与无涂层的1Cr13不锈钢基材比较。结果表明:在滑移区.温度对1Cr13不锈钢微动磨损影响较显著;随着温度上升1Cr13不锈钢摩擦系数减少,磨损体积下降;而温度对TiC/Ti(C,N)/TiN复合涂层磨损体积影响不大.且磨损量均很小.TiC/Ti(C,N)/TiN涂层表现出比1Cr13不锈钢优异的抗微动磨损性能。但当该涂层被磨去后,产生的硬质磨屑形成磨粒磨损,反而对基体造成更大的损伤。 相似文献
5.
6.
为研究中子辐照对Cr涂层锆合金力学性能的影响,获得Cr涂层锆合金的辐照性能数据,本文针对多弧离子镀技术制备的Cr涂层锆合金开展了中子辐照考验,通过拉伸试验过程实时观测试样力学行为变化并对试验后断口微观形貌进行分析,研究了辐照后Cr涂层锆合金的力学性能以及涂层与基体的结合能力。结果表明:中子辐照导致Cr涂层锆合金的抗拉强度和屈服强度升高,断后伸长率下降,表现出与商用锆合金相似的辐照强化效应。同时Cr涂层与无涂层锆合金相比,其屈服强度和抗拉强度升高但塑性变形能力降低。另一方面,Cr涂层在拉伸变形量较大时产生环向裂纹,但未从基体表面剥落,中子辐照未对涂层结合强度产生明显的影响,受力过程中涂层仍保持了完整性。 相似文献
7.
阻氚涂层是聚变堆实现氚自持及氚安全的关键科学与技术问题之一。我国通过国家磁约束聚变能发展研究专项依托国内优势单位部署了阻氚涂层基础问题及工程化技术研发工作。本文介绍了国内外聚变堆结构材料表面阻氚涂层研究进展,重点评述了近几年我国在阻氚涂层的材料选择、制备技术及阻滞氢渗透机制三个科学技术问题的研究进展,提出今后的研究方向。目前我国阻氚涂层材料类型以氧化物涂层为主,涂层制备工艺技术在不断优化和更新。Al2O3/FeAl阻氚涂层的电化学沉积铝(ECA)、粉末包埋渗铝(PC)及热浸铝(HDA)等方法的工艺处理规模及涂层阻氚性能在国际上均相对领先。发展了研究阻氚涂层阻滞氢渗透作用机理的方法,将通常基于Fick定律的表象研究方法向原子级方法前推了一步。未来需在考虑涂层制备工艺与基体材料成分、性能的关系及其在复杂形状结构件的适用性基础上,开发长寿命、高阻氚性能的阻氚涂层材料及制备工艺。 相似文献
8.
9.
316L不锈钢表面双层辉光离子渗金属技术制备Al2O3涂层 总被引:1,自引:0,他引:1
Al2O3涂层由于具有较好的阻氚渗透效果可用作聚变堆第1壁涂层.利用双层辉光离子渗金属技术在316L不锈钢表面进行渗Al后热氧化处理,得到了致密的Al2O3涂层.对渗Al层的成分和形貌分别利用X射线衍射分析仪和扫描电子显微镜进行了分析和观察.结果表明:双层辉光离子渗金属技术能够制备出均匀致密、与基体结合良好的渗Al层.在316L不锈钢表面渗Al的最佳工艺参数条件下,获得的渗Al层经随后的热氧化处理,可形成质量良好的致密Al2O3涂层. 相似文献
10.
动态离子束混合技术制备氧化铬薄膜的X射线光电子能谱与俄歇电子能谱研究 总被引:1,自引:0,他引:1
本文介绍的动态离子束混合技术制备氧化铬薄膜系在不锈钢基体上进行1keV氩离子束溅射沉积铬(同时通入一定量的O),并用100 keV的氩离子束或氧离子束轰击该样品.对两种离子束轰击形成的氧化铬薄膜进行了X射线光电子能谱(X-ray photoelectron spectroscopy,XPS)和俄歇电子能谱(Auger electron spectroscopy,AES)的分析研究.发现Ar 离子束制备的氧化铬薄膜主要是Cr2O3化合物,而O 离子束制备的氧化铬薄膜含有其它价态的铬氧化物.Ar 离子束制备氧化铬薄膜的污染碳少于O 离子束制备.与O 离子束制备相比较,相同能量的Ar 离子束轰击更有利于提高沉积的Cr原子与周围O2的反应性;Ar 离子束制备的氧化铬薄膜过渡层的厚1/3左右,较厚的过渡层显示了制备的薄膜具有较好的附着力. 相似文献
11.
S. K. Ngoi S. L. Yap B. T. Goh R. Ritikos S. A. Rahman C. S. Wong 《Journal of Fusion Energy》2012,31(1):96-103
A 3.3 kJ Mather type dense plasma focus device is used to generate a pulsed argon ion beam of 100 KeV in this work. Hydrogenated
amorphous silicon (a-Si:H) film prepared by plasma enhanced chemical vapor deposition (PECVD) on c-Si substrate was irradiated
with the argon ion beam produced by this dense plasma focus device. The effects of exposure to a single, 5 and 10 shots of
dense plasma focus argon ion beam irradiation on the surface morphology, crystallinity and chemical bonding properties of
the a-Si:H films were studied using Field Emission Scanning Electron Microscope (FESEM), X-ray Diffraction (XRD), Raman scattering
and Fourier Transform Infrared (FTIR) spectroscopy, respectively. Formation of nano-crystalline silicon phase along with increase
in structural order and hydrogen content in the film structure has been observed when the a-Si:H film was irradiated with
a single shot of dense plasma focus argon ion beam. Exposure to 5 and 10 shots of the dense plasma focus argon ion beam irradiation
reduced the hydrogen content resulting in a decrease in crystallinity and structural order in the film structure. 相似文献
12.
13.
With the development of industry, much attention has been paid to lengthening the life span of bearings. As reported in this paper, we investigated the Cr/CrN compound films formed on the specimens of W9Cr4V2Mo bearing steel by ion beam assisted deposition for improving the performance of bearing steels. The Vicker's microhardness, pin-on-disc, electrochemical measurement, XRD and SEM tests were used to characterize and analyze the treated samples. All results indicated that the mechanical properties of the treated samples were good, with the microhardness greater than that of the uncoated specimen, and the wear resistance, the passivity and pitting corrosion resistance increased considerably, the films possessed alternate Cr and CrN compound phases and produced different effects on the improvement of the performance of W9Cr4V2Mo bearing steels with different composing phases. 相似文献
14.
《Fusion Engineering and Design》2014,89(11):2516-2522
The effect of argon ion pre-irradiation on helium and hydrogen ion irradiation was investigated in tungsten. At the same time, comparative experiments were carried out on the irradiation of helium and hydrogen ions in tungsten. Without the argon ion irradiation, the energy of 35 keV hydrogen ions mainly accelerated the coalescence of defects created by the 60 keV helium ions, the irradiation damage degree increased with hydrogen ion fluence increasing. With the argon ion irradiation, lots of voids were created by argon ion irradiation, which increased the helium and hydrogen retention and the synergistic effect of helium–hydrogen in tungsten. In the same hydrogen fluence, the surface damage degree with argon ion pre-irradiation was higher than that without argon ion pre-irradiation. 相似文献
15.
SiC-C films with different content of SiC were deposited with r. f. magnetron sputtering followed by argon ion bombardment. These films were then permeated by hydrogen gas under the pressure of 3.23 × 107 Pa for 3h at 500K. AES and XPS were used to analyze chemical bonding states of C and Si in the SiC-C films as well as contaminating oxygen before and after hydrogen gas permeation in order to study the effect of hydrogen on them. Related mechanism was discussed in this paper. 相似文献
16.
《Journal of Nuclear Science and Technology》2013,50(9):996-998
To study about microstructure and chemical composition of oxide films formed on surface of stainless steel is most important for understanding of stress corrosion cracking (SCC) and irradiation assisted stress corrosion cracking (IASCC). In this work, a new sample preparation method for microstructure observation of oxide films was developed. To prevent to break oxide films during fabrication, surface of specimens were protected with plating. Focused ion beam (FIB) processing was conducted to prepare thin foil samples of cross section of oxide films. After sample preparation, microstructure of cross section of oxide films was observed by transmission electron microscope (FE-TEM), and microscopic chemical composition was analyzed by energy dispersed X-ray spectrometer (EDS). From the results, effects of silicon (Si) doping for oxide film formation in two oxidation conditions are discussed. 相似文献
17.