4H-SiC(004)面双晶衍射摇摆曲线的分析

用X射线双晶衍射法(XRD)对4H-SiC衬底和在该衬底上外延生长的4H-SiC单晶样品(004)面进行测试,在所有样品的测试结果中发现,摇摆曲线主峰左侧160″附近均出现傍肩,并且主峰衍射强度也较低.依据X射线衍射理论对系统射线在测试样品(004)面的衍射峰位展宽进行计算,并对4H-SiC原子结构进行了分析.研究结果证实,摇摆曲线中傍肩的存在与射线源中的Ka2射线参与衍射有关,而相对较低的衍射强度受其(004)面的特殊双层原子结构的影响.     

半导体异质结构材料的X射线晶体衍射测试分析

本文介绍Ｘ射线晶体衍射的测试原理，讨论了半导体薄片异质结构材料Ｘ射线晶体衍射测量中正、负失配，晶片微弯曲，摇摆曲线的对称性，复杂曲线的分解、干涉带等问题。指出了晶体衍射测试结果对ＭＯＣＶＤ、ＬＰＥ工艺调整的重要性。     

AlGaAs／AlAs体系DBR的MOCVD生长及表征

设计并利用MOCVD在（311）GaAs衬底上生长了12．5个周期的Al0．6Ga0．4As／AlAs黄绿光分布式Bragg反射（DBR）体系，测量了白光反光谱及其外延片峰值波长分布，反射率90％以上，波长不均匀性在1．0％以下；利用了X射线双晶衍射对其进行结构表征，580nm波长DBR结构周期为84．5nm。     

GaAs／GaAlAs阴极粘结工艺的X射线双晶衍射测量

分析了ＧａＡｓ／ＧａＡｌＡｓ阴极粘结工艺中应力产生的根源和晶体中应力对Ｘ射线双晶衍射峰的宽度和强度的影响。用Ｘ射线双晶衍射仪测量了阴极和玻璃热粘结工艺过程中阴极材料外延层和衬底的双晶回摆曲线。     

A study of etch pit density and x-ray rocking curves for GaAs substrate evaluation

The relationship of structural defects to the electrical properties of semiconductor materials is discussed. Etch pit density (EPD) measurements are normally used to evaluate dislocation density. A nondestructive, quantitative method for evaluation of substrate defect populations is needed for quality assurance. In this study, double crystal x-ray diffraction rocking curves are investigated for this purpose. Rocking curve widths are determined experimentally for a set of GaAs substrated with a range of EPD. The experimentally determined values are also compared with those calculated from simulated rocking curves based on x-ray diffraction theory. Limited correlation between rocking curve widths and EPD is observed. Formerly of Spectrum Technology Inc., Holliston, MA     

X-Ray diffraction analysis of bandgap-engineered distributed bragg reflectors

Compositionally graded interfaces between constitutive layers of the distributed Bragg reflectors (DBRs) in vertical cavity surface emitting lasers (VCSELs) greatly reduce operating voltages. In this paper, we demonstrate the use of high-resolution x-ray diffraction (HRXRD) in the characterization of a bandgap-engineered DBR. The final structure of the DBR is determined by comparing the Bragg peak intensities and locations in the x-ray rocking curve measurements with those of dynamical x-ray diffraction simulations. The aluminum concentration of the graded interface region is determined as a function of distance to within 2%. The width of the interface is accurate to within 1.5 nm. Such sensitivity demonstrates the utility of the non-invasive x-ray technique in characterizing not only the DBR, but also the entire VCSEL structure.     

GaAs／GaAsAl阴极粘结X射线双晶衍射测量

分析了ＧａＡｓ／ＧａＡｓＡｌ阴极粘结工艺中应力产生的根源和晶体中应力对Ｘ射线双晶衍射峰的宽度和强度的影响，用Ｘ射线双晶衍射仪测量阴极和玻璃热粘结工艺过程中的阴极材料外延层和衬底的双晶回摆曲线，实验结果表明，ＧａＡｓ／ＧａＡｓＡｌ阴极粘结工艺没有带来明显的附加应力，外延层衍射角的展宽是由于ＧａＡｓ阴极组件窗玻璃的非晶态性所致。     

测定离子注入单晶损伤与应变的双晶(n~v,-n~v)排列方法

依据双晶摇摆曲线的形成原理,提出了一种高分辨率,高灵敏度的测定离子注入单晶损伤与应变的双晶(n~v,—n~v)排列方法。考虑到掠入射情形的色散效应,对掠射角的选择进行了讨论。对Ga注入Si单晶样品的测定证实了(n~v—n~v)排列的优越性,摇摆曲线上得到了未曾见过的细微振荡。     

用X双晶衍射法研究InGaAs/GaAs量子阱结构

用X射线双晶衍射方法对MBE方法生长的InGaAs/GaAs量子阱结构材料进行了测试分析.结果表明,在材料生长过程中,深能级的引入严重影响了材料的光学特性及界面完整性.通过改变衬底温度、V/Ⅲ速流比等实验条件,得到了质量较好的材料.同时对实验样品的双晶衍射回摆曲线中干涉条纹及峰的劈裂现象进行了理论分析.     

RTD纳米薄层的精细控制及X射线双晶衍射测量

在共振隧穿二极管(RTD)的MBE生长中,用双生长速率和束流调制技术实现了RTDnm级薄层的精细控制;用X射线双晶衍射仪扫描并分析了典型双势垒RTD样品的衍射摇摆曲线;用计算机对样品结构进行了动力学模拟分析。结果显示样品异质结界面和晶体质量良好,纳米薄膜的组分和厚度偏差分别控制在2%和3.5%之内,说明薄层的生长得到了精细控制。     

用高分辨X射线衍射面扫描评估4H-SiC晶片结晶质量

介绍了高分辨X射线衍射(HRXRD)面扫描技术在评估4H-SiC抛光片整体结晶质量方面的应用。对4H-SiC抛光片整片及局部特定位置进行HRXRD摇摆曲线面扫描,并拟合摇摆曲线半高宽(FWHM)峰值得到的极图,观察4H-SiC抛光片表面的FWHM分布范围、分布特点和多峰聚集区。结合表面缺陷测试仪和偏振光显微镜测试方法,对因螺旋生长产生的晶界分布聚集区以及边缘高应力晶界聚集区进行了表征。二者测试结果与HRXRD摇摆曲线面扫描的结果一致。对多片样品在不同区域使用不同测试方法得到的结果均验证了HRXRD摇摆曲线面扫描可以宏观识别晶畴界面聚集区,清楚辨别出位于晶片中心附近由于螺旋生长面交界形成的晶畴界面,以及位于晶片边缘、受生长热场影响晶粒畸变产生的高应力晶畴界面。     

双晶x射线衍射法测量超薄层外延材料厚度

介绍了通过双晶ｘ射线衍射测量超薄外延层厚度的一种方法。利用回摆曲线中的干涉条纹测量了通过ＭＢＥ生长的Ｇａ０．７Ａｌ０．３Ａｓ／Ｇａ０．９Ａｌ０．１Ａｓ／Ｇａ０．７Ａｌ０．３Ａｓ结构的各层层厚。     

Si1-xGex/Si应变材料的生长及热稳定性研究

利用分子束外延（MBE）技术生长了Ge组份为0.1-0.46的Si1-xGex外延层。X射线衍射线测试表明，SiGe/Si异质结材料具有良好的结晶质量和陡峭界面，其它参数与可准确控制。通过X射线双晶衍射摆曲线方法，研究了经700℃、800℃和900℃退火后应变SiGe/Si异质结材料的热稳定性。结果表明，随着退火温度的提高，应变层垂直应变逐渐减小，并发生了应变弛豫，导致晶体质量退化；且Ge组分越小，Si1-xGex应变结构的热稳定性越好；室温下长时间存放的应变材料性能稳定。     

CAS晶体生长与习性研究

采用中频感应上称重提拉技术对Ca_2Al_2SiO_7(CAS)压电晶体进行了生长,研究了不同转速及生长方向下晶体的生长习性,从理论上分析了转速和生长方向对晶体形貌的影响。结果表明,晶体外形随转速的增加,其形貌由圆柱状变为正方形,再变为长方形,当转速到一定临界值时,晶体呈多晶状;随晶体生长方向的不同,晶体有不同的显露方向,并都有强的显露面(001)。对晶体不同显露方向进行了X线衍射分析,且对(001)面进行回摆测试。结果表明,晶体结构完整,结晶性能好。     

X射线双晶衍射在微波半导体器件中的应用

通过Ｘ射线动力学理论计算的晶体摆动曲线与测试实验曲线的比较给出外延薄膜材料的结构，为器件研制了工作提供了有用的数据，证明运用Ｘ射线动力学理论计算计算机拟合能为薄膜材料成分和厚度提供无损检测手段。     

大直径半绝缘4H-SiC单晶生长及表征

采用升华法稳定地生长出7.62 cm半绝缘4H-SiC单晶。通过优化钒掺杂工艺获得了均匀分布的电阻率1011Ω·cm。用激光拉曼光谱仪对晶片进行扫描,结果表明SiC单晶晶型为4H晶型。半绝缘4H-SiC单晶微管密度最好结果小于2 cm-2。用高分辨X射线衍射术表征了7.62 cm 4H-SiC单晶衬底片的结晶质量,（0004）衍射摇摆曲线半峰宽为40＂,说明晶体结晶性较好。     

应变量子阱结构材料X射线双晶衍射摇摆曲线的测试与分析

报告了多薄层质结构材料Ｘ射线衍射模拟摇摆曲线和压应变，张应变量子阱材料的实测摇摆曲线，指出了计算机模拟分析实测摇摆曲线是精确求得失配率，量子阱周期的科学方法，分析和讨论了与失配率，量子阱周期有关的简单计算公式的适用性。     

Growth of GaxIn1−xAs1−ySby alloys by metalorganic chemical vapor deposition

The quaternary GaInAsSb alloy system with direct band gaps adjustable in wavelength from 1.7 to 4.3 μm, which may provide the basis for emitters and detectors over this entire region, was studied. Alloys of GaInAsSb were grown lattice-matched on GaSb substrates by metalorganic chemical vapor deposition using a conventional atmospheric pressure horizontal reactor. The properties of the GalnAsSb alloys were characterized by single crystal x-ray rocking curves, the double crystal x-ray rocking curves, the photoluminescence and infrared absorption. A preliminary study of the capabilities of scanning electron acoustic microscopy in the characterization of GaInAsSb alloy has been made, some observations are briefly compared with scanning electron microscopy.     

Yb,Ho,Pr:GYTO晶体生长、结构及光谱性能（特邀）

首次采用提拉法成功生长出了新型中红外激光晶体Yb,Ho,Pr:GYTO,采用X射线Rietveld精修方法得到了晶体的结构参数。测量了Yb,Ho,Pr:GYTO晶体（100)、(010)和(001)衍射面的X射线摇摆曲线,衍射峰的半峰宽分别为0.036°、0.013°和0.077°,表明生长出的晶体是单晶并且具有较高的结晶质量。采用激光剥蚀电感耦合等离子体质谱法测定了Yb,Ho,Pr:GYTO晶体中Yb3+、Ho3+、Pr3+和Y3+的浓度,Yb,Ho,Pr:GYTO晶体中Yb3+、Ho3+、Pr3+和Y3+的有效分凝系数分别为0.624、1.220、1.350和0.977。测量了Yb,Ho,Pr:GYTO晶体室温下的极化吸收谱,并指认了相应的能级吸收跃迁。940 nm半导体激光器激发的2.9 μm荧光光谱表明,最大发射波长为2908 nm。此外,还论证了GYTO中Yb-Ho-Pr的能量传递机制。与Ho:GYTO晶体相比,Yb,Ho,Pr:GYTO晶体的5I₇能级寿命降低了87.13%,与上能级5I₆的寿命相近,说明Yb,Ho,Pr:GYTO晶体更容易实现粒子数反转和激光输出。     

Effects of isostatic oxygen pressure on the crystal growth and optical properties of undoped and Er3+‐doped Ca3(VO4)2 single‐crystal Fibres

The influence of the isostatic oxygen pressure as a crystal growth atmosphere on the optical and structural properties of undoped and erbium‐doped calcium orthovanadate single‐crystal fibres was studied by optical absorption, photoluminescence, energy‐dispersive X‐ray analysis and X‐ray powder diffraction techniques. Relationships between the oxygen pressure used during the crystal growth and some optical and structural parameters are established. Through an oxygen vacancy model the effects of the crystal growth conditions on the physical properties of the material are inferred. Copyright © 2000 John Wiley & Sons, Ltd.