Electrochromic properties of nanocrystalline MoO3 thin films

Electrochromic MoO₃ thin films were prepared by a sol–gel spin-coating technique. The spin-coated films were initially amorphous; they were calcined, producing nanocrystalline MoO₃ thin films. The effects of annealing temperatures ranging from 100 °C to 500 °C were investigated. The electrochemical and electrochromic properties of the films were measured by cyclic voltammetry and by in-situ optical transmittance techniques in 1 M LiClO₄/propylene carbonate electrolyte. Experimental results showed that the transmittance of MoO₃ thin films heat-treated at 350 °C varied from 80% to 35% at λ = 550 nm (ΔT =  45%) and from 86% to 21% at λ ≥ 700 nm (ΔT =  65%) after coloration. Films heat-treated at 350 °C exhibited the best electrochromic properties in the present study.     

Synthesis, structure and luminescent properties of Lu(PO3)3

A new structural type of rare earth metaphosphate, Lu(PO₃)₃, was prepared from high-temperature solution, of which the crystal structure was solved in S.G. of Cc (No.9) and Z = 4 with unit cell dimensions of a = 13.972(3) Å, b = 6.6710(13) Å, c = 9.958(2) Å and β = 127.36(3)°. In Lu(PO₃)₃, [LuO₆] octahedra connect with the non-bridging oxygens on (PO₃)_n infinite zigzag chains that extended along c-axis. The VUV and X-ray excited luminescent properties of undoped and Ln³⁺ (Ln = Ce, Eu, Tb) doped samples were examined, from which the optical band gap was estimated to be 8.3 eV. Besides, in the undoped sample a STE emission within 320–480 nm was observed, which probably be related to oxygen defects. However, in the Lu(PO₃)₃:Ce sample the Ce³⁺ emission was weak and STE emission was totally quenched under hard X-ray excitation.     

Growth, thermal and optical properties of Yb:GdYAl3(BO3)4 crystal

Single crystal of Yb:GdYAl₃(BO₃)₄(Yb:GdYAB) has been grown by the flux method. The structure of Yb:GdYAB crystal has been determined by X-ray diffraction analysis. The experiment show that the crystal has the same structure as that of YAl₃(BO₃)₄ crystal and its unit cell constants have been measured to be a = 9.30146 Å, c = 7.24164 Å, Vol = 542.59 Å³. The absorption and fluorescence spectrum of Yb:GdYAl₃(BO₃)₄ crystal have also been measured at room temperature. In the absorption spectra, there are two absorption bands at 938 nm and 974 nm, respectively, which is suitable for InGaAs diode laser pumping. In the fluorescence spectra, there are two fluorescence peaks at 992 and 1040 nm. The thermal properties of Yb:GdYAl₃(BO₃)₄ crystal have been studied for the first time. The thermal expansion coefficient along c-axis is almost 5.4 times larger than that along a-axis. The specific heat of the crystal has been measured to be 0.77 J/g °C at room temperature. The calculated thermal conductivity is 5.26 Wm⁻¹ K⁻¹ along a-direction.     

Crystal structure and spectroscopic studies of NaGd(PO3)4

Single crystals of gadolinium–sodium polyphosphate NaGd(PO₃)₄ were grown for the first time using a flux method and characterized by X-ray diffraction. This phosphate crystallizes in a monoclinic system with P2₁/n space group and with the following unit-cell dimensions: a = 9.767(3) Å, b = 13.017(1) Å, c = 7.160(2) Å, β = 90.564(5)°, V = 910.3(4) Å³ and Z = 4. The crystal structure was solved from 3451 X-ray independent reflections with final R(F²) = 0.0219 and R_w(F²) = 0.056 refined with 164 parameters (). The atomic arrangement can be described as a long chain polyphosphate organization. Two infinite (PO₃)∝ chains with a period of eight tetrahedra run along the [0 1 1] direction. The structure of NaGd(PO₃)₄ consists of GdO₈ polyhedra sharing oxygen atoms with phosphoric group PO₄. Each Na⁺ ion is bonded to eight oxygen atoms.     

Transparent conducting F-doped SnO2 thin films grown by pulsed laser deposition

Transparent conducting fluorine-doped tin oxide (SnO₂:F) films have been deposited on glass substrates by pulsed laser deposition. The structural, electrical and optical properties of the SnO₂:F films have been investigated as a function of F-doping level and substrate deposition temperature. The optimum target composition for high conductivity was found to be 10 wt.% SnF₂ + 90 wt.% SnO₂. Under optimized deposition conditions (T_s = 300 °C, and 7.33 Pa of O₂), electrical resistivity of 5 × 10^− 4 Ω-cm, sheet resistance of 12.5 Ω/□, average optical transmittance of 87% in the visible range, and optical band-gap of 4.25 eV were obtained for 400 nm thick SnO₂:F films. Atomic force microscopy measurements for these SnO₂:F films indicated that their root-mean-square surface roughness ( 6 Å) was superior to that of commercially available chemical vapor deposited SnO₂:F films ( 85 Å).     

Atmospheric pressure chemical vapour deposition of SnSe and SnSe2 thin films on glass

Atmospheric pressure chemical vapour deposition of tin monoselenide and tin diselenide films on glass substrate was achieved by reaction of diethyl selenide with tin tetrachloride at 350–650 °C. X-ray diffraction showed that all the films were crystalline and matched the reported pattern for SnSe and/or SnSe₂. Wavelength dispersive analysis by X-rays show a variable Sn:Se ratio from 1:1 to 1:2 depending on conditions. The deposition temperature, flow rates and position on the substrate determined whether mixed SnSe–SnSe₂, pure SnSe or pure SnSe₂ thin films could be obtained. SnSe films were obtained at 650 °C with a SnCl₄ to Et₂Se ratio greater than 10. The SnSe films were silver–black in appearance and adhesive. SnSe₂ films were obtained at 600–650 °C they had a black appearance and were composed of 10 to 80 μm sized adherent crystals. Films of SnSe only 100 nm thick showed complete absorbtion at 300–1100 nm.     

Crystal structure, thermal analysis and IR spectroscopic investigation of (C6H9N2)H2XO4 (X = As, P)

Crystals of 2-amino-4-methylpyridinium dihydrogenmonoarsenate (C₆H₉N₂)H₂AsO₄ and 2-amino-4-methylpyridinium dihydrogenmonophosphate (C₆H₉N₂)H₂PO₄ have been prepared and grown at room temperature. These materials are isotypic with the following unit cell dimensions (C₆H₉N₂)H₂AsO₄: a = 12.4415(5) Å, b = 6.8224(3) Å, c = 11.3524(5) Å, Z = 4, V = 963.60(6) Å³; (C₆H₉N₂)H₂PO₄: a = 12.4410(9) Å, b = 6.7165(3) Å, c = 11.3417(5) Å, Z = 4, V = 925.09(10) Å³. The common space group is Pnma. The structure of these compounds has been determined by X-ray data collection on single crystals of (C₆H₉N₂)H₂AsO₄ and (C₆H₉N₂)H₂PO₄. Due to the strong hydrogen-bond network connecting the H₂XO₄ groups, the anionic arrangement must be described as a linear organization. The chains composed by the macroanion spread along the b-direction, approximately centered by x = 0 and 1/2. All atoms of the structure, except one oxygen atom, are located in the mirror planes situated at y = 1/4 and 3/4, imparting an internal mirror symmetry to the anionic and the cationic entities. The linear macroanions are crossed by organic cations lying in mirrors perpendicular to the b-direction; this atomic arrangement is then described by a three-dimensional network of hydrogen bonds, built up by two types, O–HO bonds inside the chains and N–HO bonds linking adjacent chains. The thermal properties of both compounds are investigated as well as the IR properties supported by group theoretical analyses.     

Structure and conducting properties of La0.5Sr0.5CoO3−δ films on YSZ

La_0.5Sr_0.5CoO_3−δ (LSCO) thin films were deposited on yttria stabilized zirconia (YSZ) substrates by pulsed laser deposition (PLD) for application to thin film solid oxide fuel cell electrodes. During the deposition, the substrate temperature was varied from 450 to 750°C, and the oxygen pressure in the chamber was varied from 80 to 310 mTorr. Films deposited at 650°C and an oxygen background pressure of 150 mTorr were mostly (100) oriented. Deposition at higher temperatures or under lower oxygen pressures lead to mostly (110) oriented films. Films with low electrical resistivity of 10⁻³ Ω·cm were obtained.     

Low-temperature epitaxial growth of conductive LaNiO3 thin films by RF magnetron sputtering

Epitaxial growth of LaNiO₃ (LNO) thin films was successful on CeO₂/YSZ/Si(100), MgO(100) and SrTiO₃ (STO)(100) substrates by RF magnetron sputtering at 300 °C, although pulsed laser deposition requires 600 °C to prepare epitaxial LNO films according to the literature. Epitaxial LNO films deposited on CeO₂/YSZ/Si(100) and STO(100) had single orientation of LNO[100]//CeO₂[110]//YSZ[110]//Si[110]) and LNO[100]//STO[100], respectively. On the other hand, epitaxial LNO films deposited on MgO(100) had mixed orientations of LNO[100]//MgO[100] and LNO[100]//MgO[110]. The lattice parameter, composition and resistivity of the LNO thin films were strongly dependent on the substrate temperature. The minimum resistivity of LNO films was approximately 5×10⁻⁶ Ω m, which value almost agrees with the resistivity in the literature. It was found that the temperature to achieve minimum resistivity was 200 °C, irrespective of the type of substrate. The surface of the LNO films was smooth and flat.     

Structure and electrical properties of (100)-oriented Pb(Zn1/3Nb2/3)O3–Pb(Mg1/3Nb2/3)O3–PbTiO3 thin films on La0.7Sr0.3MnO3 electrode by chemical solution deposition

(100)-oriented 0.462Pb(Zn_1/3Nb_2/3)O₃–0.308Pb(Mg_1/3Nb_2/3)O₃–0.23PbTiO₃ (PZN-PMN-PT) perovskite ferroelectric thin films were prepared on La_0.7Sr_0.3MnO₃/LaAlO₃ (LSMO/LAO) substrate via a chemical solution deposition route. The perovskite LSMO electrode was found to effectively suppress the pyrochlore phase while promote the growth of the perovskite phase in the PZN-PMN-PT film. The film annealed at 700 °C exhibited a high dielectric constant of 2130 at 1 kHz, a remnant polarization, 2P_r, of 29.8 μC/cm², and a low leakage current density of 7.2 × 10^− 7 A/cm² at an applied field of 200 kV/cm. The ferroelectric polarization was fatigue-free at least up to 10¹⁰ cycles. Piezoelectric coefficient, d₃₃, of 48 pm/V was also demonstrated. The results showed that much superior properties could be achieved with the PZN-PMN-PT thin films on the solution derived LSMO electrode than on Pt electrode by sputtering.     

Influence of substrate on the pulsed laser deposition growth and microwave behaviour of KTa0.6Nb0.4O3 potassium tantalate niobate ferroelectric thin films

Thin films of potassium tantalate niobate KTa_0.6Nb_0.4O₃ (KTN) were grown by pulsed laser deposition on five different substrates suitable for microwave devices: (100)MgO, (100)LaAlO₃, (1–102)sapphire (R-plane), (0001)sapphire (C-plane) and alumina. The high volatility of potassium at the film growth temperature required the addition of an excess of potassium to the ablation target. For optimized deposition conditions, Rutherford backscattering showed that the KTN films had a 1: 1 atomic ratio for K:(Nb + Ta). As grown KTN thin films were single-phase, without any particular orientation on sintered alumina, whereas an epitaxial growth with the (100) orientation was achieved on (100)MgO and (100)LaAlO₃ with a mosaicity Δω_(100)KTN close to 0.7°–1.5° and  0.4°–0.9°, respectively, attesting a high crystalline quality. In contrast, growth of KTN on R-plane sapphire results in a texture with the (100) orientation and the presence of the (110) orientation as a secondary one. The room temperature measurements carried out on Au interdigited capacitors patterned on KTN coated (100) LaAlO₃ and sapphire led at 1 GHz to an agility ΔC / C  4.6% and  7.2%, respectively, for a moderate applied field of 15 kV cm^− 1. Stubs patterned on the same systems led to an agility ΔF_r / F_r of  2.2% and 4.2%, respectively, for F_r = 7 GHz and the same applied field.     

Crystal structure and characterization of [2,5-(CH3O)2C6H3NH3]4P4O12·2H2O

The preparation, crystal structure, TG–DTA analysis and spectroscopy investigation are reported for the 2,5-dimethoxy phenyl ammonium cyclotetraphosphate dihydrate [2,5-(CH₃O)₂C₆H₃NH₃]₄P₄O₁₂·2H₂O. This new compound is triclinic P with unit cell dimensions: a = 7.438(5) Å, b = 11.841(7) Å, c = 12.354(4) Å,  = 96.61(4)°, β = 98.35(4)°, γ = 102.60(6)°, Z = 1 and V = 1038.0(1) Å³. Its crystal structure has been determined and refined to R = 0.049, with 5128 independant reflections. The structure can be described by rows of P₄O₁₂ ring anions along the a axis; between these rows are located the organic groups, connected to them by hydrogen bonds.     

Optical properties of a-(Se70Te30)100−x(Se98 Bi2)x thin films

Measurements of optical constants (absorption coefficient, refractive index, extinction coefficient, real and imaginary part of the dielectric constant) have been made on a-(Se₇₀Te₃₀)_100−x (Se₉₈Bi₂)_x thin films (where x=0, 5, 10, 15 and 20) of thickness 2000 Å in the wavelength range 450–1000 nm. It is found that the optical bandgap decreases with the increase of Se₉₈Bi₂ concentration in the a-(Se₇₀Te₃₀)_100−x(Se₉₈Bi₂)_x system. The value of refractive index (n) decreases, while the extinction coefficient (k) increases with increasing photon energy. The results are interpreted in terms of concentration of localized states varying effective Fermi level.     

偏轴磁控溅射法外延BiFeO3薄膜的介电性能与阻变效应

利用偏轴射频磁控溅射法, 在(001) SrTiO₃(STO)单晶基片上制备了Pt/BiFeO₃/La_0.5Sr_0.5CoO₃/STO (Pt/BFO/ LSCO/STO)异质结电容器。研究了BiFeO₃薄膜的结构和物理性能。原子力显微镜(AFM)和X射线衍射(XRD)分析表明: BFO薄膜结晶质量良好, 且为单相(00l)外延钙钛矿结构。介电性能测试结果发现: 在5 V驱动电压下, Pt/BFO/LSCO电容器呈现饱和的蝶形回线, 调谐率和介电损耗分别为14.1%和0.19。此外, 阻变机制研究表明: 在0→5→0 V正向电压和0→-5→0 V负向电压下, 阻变均为高阻向低阻转变规律, 呈现为铁电二极管的阻变开关行为。通过I-V曲线拟合, 得到0→5→0→-5 V时阻变机制为空间电荷限制电流陷阱能级的填充和脱陷, 而-5→0 V时符合界面限制的F-N隧穿机制。     

Properties of SnO2 films fabricated using a rectangular filtered vacuum arc plasma source

Transparent and conducting SnO₂ films of 57–200nm thickness were deposited on microscope glass slide substrates, using a rectangular filtered vacuum arc deposition system. The 40 glass slides were equally distributed on a 400 × 420mm substrate carriage, and were exposed to a Sn plasma beam, produced by a rectangular vacuum arc plasma gun with a Sn cathode, and passed through a rectangular magnetic macroparticle filter towards the substrates. The carriage with the substrates was transported past the 94 × 494mm filter outlet. The SnO₂ films were fabricated on the glass substrates at room temperature by maintaining the chamber oxygen background pressure at 0.52Pa. The film composition, and electrical and optical properties were studied as a function of the film thickness. The films were stored under ambient air conditions, and their electrical resistance was measured as a function of storage time over a period of several months.

The average resistivity of films was 10–17mΩ cm for films with thickness (t) less than 100nm, but that of t > 100nm it was 5–9mΩ cm. The resistivity of the films with t > 100nm did not change significantly after 8months of storage in ambient air. The optical transmittance of the films in the visible spectrum was in the range of 75–90%. The optical constants, i.e., the refractive index and the extinction coefficient of the films at wavelength λ = 550nm were in the range of 2.02–2.09 and 0.013–0.023, respectively, and the optical band gap energy was 4.15–4.21eV. Unlike the electrical resistivity, the optical parameters weakly depended on t.     

Deposition of HfO2 thin films on ZnS substrates

HfO₂ thin films with columnar microstructure were deposited directly on ZnS substrates by electron beam evaporation process. SiO₂ thin films, deposited by reactive magnetron sputtering, were used as buffer layers, HfO₂ thin films of granular microstructure were obtained on SiO₂ interlayer by this process. X-ray diffraction patterns demonstrate that the as-deposited HfO₂ films are in an amorphous-like state with small amount of crystalline phase while the HfO₂ films annealed at 450 °C in O₂ for 30 min and in Ar for 150 min underwent a phase transformation from amorphous-like to monoclinic phase. Antireflection effect in certain infrared wave band, such as 3–6 μm, 4–12 μm, 4–8 μm and 3–10 μm, can be observed, which was dependent on the thickness of thin films. The cross-sectional images of HfO₂ films, obtained by field emission scanning electron microscopy, revealed that there was no distinct morphological change upon annealing.     

Characterization of the thorium phosphate-hydrogenphosphate hydrate (TPHPH) and study of its transformation into the thorium phosphate-diphosphate (β-TPD)

The preparation of thorium phosphate-diphosphate (Th₄(PO₄)₄P₂O₇, TPD) was developed through the precipitation of thorium phosphate-hydrogenphosphate hydrate (Th₂(PO₄)₂(HPO₄)·H₂O, TPHPH) at 150–160 °C in closed PTFE container or in autoclaves. From EPMA analyses and SEM observations, the initial precipitate was single phase and multilayered. The behaviour of TPHPH (orthorhombic system with a = 21.368(2) Å, b = 6.695(1) Å and c = 7.023(1) Å) was followed when heating up to 1250 °C. It was first dehydrated leading to the anhydrous thorium phosphate-hydrogenphosphate (TPHP, orthorhombic system with a = 21.229(2) Å, b = 6.661(1) Å and c = 7.031(1) Å at 220 °C) after heating between 180 and 200 °C. This one turned progressively into the new low-temperature variety of TPD (called -TPD, orthorhombic system with a = 21.206(2) Å, b = 6.657(1) Å and c = 7.057(1) Å at 300 °C) correlatively to the condensation of hydrogenphosphate groups into diphosphate entities. These three phases (TPHPH, TPHP and -TPD) exhibit closely related 2D layered structures, therefore different from the 3D structure of the thorium phosphate-diphosphate (high-temperature variety). This latter compound, now called β-TPD, was obtained by heating -TPD above 950 °C. All the techniques involved in this study (XRD, Raman and IR spectroscopy, ¹H and ³¹P NMR) confirmed the successive chemical reactions proposed.     

Molecular beam epitaxial growth of SmBa2Cu3O7−δ thin films and effect of substrate temperature on the surface roughness

Stoichiometrically optimized, epitaxial SmBa₂Cu₃O_7-δ thin films with high T_{c, R = 0} and high critical current densities j_c have been prepared for the first time in a tightly controlled molecular beam epitaxy process in non-reactive molecular oxygen, followed by an in situ loading process with molecular oxygen. The surface roughness (on a submicrometre scale) of single-crystal films with their c axes perpendicular to the surface depends markedly on the surface temperature of the substrate during the deposition of the epitaxial films, within a range of only a few degrees centigrade. The calibrated optimal temperature for the preparation of epitaxial films 200 nm thick of this single orientation is found to be 680 ± 5 °C. In scanning tunnelling microscopy investigations, they show a surface roughness of less than 6 nm (five SmBa₂Cu₃O_7−δ unit cells) on a 2 μm × 2 μm scale. At deposition temperatures below this optimal deposition temperature, the well-known a-axis growth increases rapidly, whereas higher temperatures give a significantly higher surface roughness, which can be observed by scanning electron microscopy.     

Preparation and optical properties of sol–gel derived Er-doped Al2O3–Ta2O5 films

Thin films of the system xAl₂O₃–(100 − x)Ta₂O₅–1Er₂O₃ were prepared by a sol–gel method and a dip-coating technique. The influences of the composition and the crystallization of the films on Er³⁺ optical properties were investigated. Results of X-ray diffraction indicated that the crystallization temperature of Ta₂O₅ increased from 800 to 1000 °C with increased values of x. In crystallized films, the intensities of the visible fluorescence and upconversion fluorescence tend to decrease with an increase in x values, due to the high phonon energy of Al₂O₃; the strongest fluorescence is observed in a crystallized film for x = 4 heat treated at 1000 °C. In amorphous films obtained by heat treatment at relatively low temperatures the Er³⁺ fluorescence could not be observed because strong fluorescence from organic residues remaining in the films thoroughly covered the Er³⁺ fluorescence. On the other hand, the Er³⁺ upconversion fluorescence in the amorphous films was observed to be stronger than that in the crystallized films. The strongest upconversion fluorescence is observed in an amorphous film for x = 75 heat treated at 800 °C.     

Physical properties of (La,Sr)Ti(O,N)3 thin films grown by pulsed laser deposition

Thin films of La_xSr_1−xTiO_3+x/2 (x = 0, 0.25, 0.5, 0.75, 1) were grown by laser ablation on two different kinds of substrates (SrTiO₃ (STO) and MgO) and were subsequently ammonolysed to yield the corresponding oxynitrides La_xSr_1−xTi(O,N)₃. For both substrates all films were found to grow epitaxially to the (1 0 0) direction of the cubic perovskite structure, except for x = 0.5 that grew parallel to the (1 1 0) direction. For some of the films TiN was detected as impurity phase. Scanning electron microscopy revealed that the films are dense and homogeneous with thicknesses around 350 nm. Atomic force microscopy showed that the surface roughness of the films varied between 4.2 and 14.1 nm. The employed substrate had a strong influence on the electrical properties. Films grown on STO exhibited a metallic behaviour, in contrast to the films grown on MgO, which were insulating.