微型柔性热敏传感器阵列应用研究

边界层分离点检测是实现分离流主动控制的前提和基础，也是气动控制灵巧蒙皮系统研究的重点和难点。以流体边界层分离点检测技术为研究对象，以流体边界层分离点判定的风洞实验为验证目标，设计制作微型热敏传感器与聚酰亚胺柔性衬底，并首次利用微装配技术集成分立敏感元件与柔性衬底形成热敏传感器阵列。首先，采用分立元件通过表面贴装工艺来实现柔性微型热膜传感器阵列的集成，并研究该传感器阵列中敏感元件、柔性衬底的设计及传感器的排布。然后，在低速风洞实验中对传感器阵列的性能和传感器阵列输出信号采用统计量算法的方式进行处理判断，判定圆柱翼型的流体分离点位置。最后，对实验的结果所作的分析表明，该微型柔性热敏传感器阵列满足流体分离检测系统实时性、动态性的要求。     

基于聚酰亚胺柔性衬底微温度传感器阵列的关键技术研究

基于柔性MEMS技术,在聚酰亚胺柔性衬底上成功制作出8×8阵列的铂薄膜电阻微温度传感器.该器件特别适用于复杂几何体高曲率表面温度的实时监控.采用了两种方法制作柔性器件第一种方法是将液态聚酰亚胺旋涂在有氧化物牺牲层的载体硅片上;第二种方法是用胶粘剂将P16051膜暂时粘在载体硅片上,然后分别在两种柔性PI衬底上制作铂薄膜热敏电阻温度传感器,最后将器件从硅片载体上分离下来.采用低温(小于300℃)工艺技术减小了PI柔性衬底的热循环.实验测试结果表明,PI衬底上的铂薄膜热敏电阻具备良好的线性度,其电阻温度系数接近于0.0023/℃.     

基于柔性MEMS皮肤技术温度传感器阵列的研究

采用MEMS皮肤技术,在聚酰亚胺柔性衬底上成功研制出8×8阵列铂薄膜热敏电阻温度传感器。实验采用热氧化硅片为机械载体,以便于旋涂液态聚酰亚胺柔性衬底上器件的加工。最后用湿法腐蚀方法将柔性器件从载体上释放下来。试验表明聚酰亚胺衬底上的铂薄膜热敏电阻与温度的变化具有良好的线性,其电阻温度系数达0.0023/℃。与固态聚酰亚胺膜衬底相比,采用旋涂液态聚酰亚胺解决了制备中遇到的两大主要困难:其一,消除了涂聚酰亚胺衬底与载体界面之间的气泡,聚酰亚胺衬底表面能保持良好平整度;其二,制备过程中由于热循环而使柔性衬底产生的热膨胀明显减小。这种柔性温度传感器阵列易贴于高曲率物体表面以探测小面积温度场分布。     

聚酰亚胺柔性温度传感器的制作与性能测试

基于微机电系统技术,在柔性聚酰亚胺(PI)基底上分别制作弓形与蛇形两种结构的铜薄膜与铂薄膜温度传感器。采用红外成像设备对传感器在通电状态下的热分布进行测试,结果表明PI基底具有良好的热绝缘性。对不同结构、不同金属薄膜的传感器性能进行对比分析,在25～90℃的温度测试范围内,4种温度传感器均具有较好的灵敏度和线性度,其中蛇形结构的铂薄膜温度传感器的线性度最好,线性相关系数达到了0.99933,其电阻温度系数为0.002 35/℃。     

流量传感器中敏感薄膜电阻制备及其特性分析

通过对热膜式流量传感器中敏感薄膜电阻制备技术的研究,分别介绍了流量传感器中敏感薄膜电阻设计的基本原理、敏感薄膜生长方法及一些具体应用实例。分析了影响薄膜黏附性和内应力的工艺因素,提高了敏感薄膜电阻的温度系数,制作出了具有良好稳定性和一致性的敏感薄膜电阻,满足流量传感器的使用要求。使流量传感器重复性可达±1%,该制备方法适用于热膜式流量传感器的小批量生产。     

微型热敏传感器的薄膜电阻设计研究

应用微型热敏传感器薄膜电阻的电阻温度系数设计方法,得到基于热敏电阻的电阻温度系数的计算和设计参数.结合针对流体壁面剪应力测量的应用要求,分析多晶硅和铂金属热敏电阻的优缺点,并且对试验电阻进行电阻温度系数和时间常数的分析计算,依据计算结果确定微型热敏传感器薄膜电阻的基体材料、薄膜材料和特征尺寸等参数,为微型热敏传感器的实际应用提供参考依据和分析方法.     

低速流体边界层分离检测试验

结合边界层分离点附近的切应力变化规律,对边界层分离特性进行研究,确定边界层分离点的判定依据.采用分立元件通过表面贴装工艺来实现柔性微型热膜传感器阵列的集成,并研究该传感器阵列中敏感元件、柔性衬底的设计及传感器的排布,解决柔性传感器阵列对微细加工工艺要求较高的难题.根据边界层分离点判定依据,在低速风洞试验中对传感器阵列的性能和传感器阵列输出信号采用统计量算法和傅里叶变换功率谱算法进行处理判断,并与计算流体力学仿真结果对比,结果表明制造的微型热敏传感器阵列能够实现对流体边界层分离位置的在线测量.     

微梁结构热偶微波功率传感器的灵敏度分析

在微波技术研究中，微波功率是表征微波信号特性的一个重要参数。微波功率测量已成为电磁测量的重要部分，可应用于很多场合，如发射机输出功率（包括天线系统辐射的功率）和振荡器输出功率的测量，毫瓦计的校准，标准信号发生器的校准等。微波功率传感器是微波功率计探头中的核心元件。微梁结构热偶微波功率传感器选择具有低电阻温度系数的Ta2N和高热电功率塞贝克系数的Si作为热偶材料，利用半导体工艺和NEMS工艺制作。器件获得了比薄膜结构更高的灵敏度，并且具有动态范围大、零点漂移小等特点，此结构已有多种形式。着重从理论上分析了MIS结构对该传感器灵敏度的影响，并提出了一种新的结构设计，以进一步提高器件性能。     

多孔硅微机械加工温敏传感器的研究

本文在对阳极氧化反应形成多孔硅及艰多孔硅选择性生长机理、刻蚀研究的基础上做出到衬底距离大于５０μｍ的微桥结构。然后在微桥上溅射－铬电阻薄膜，形成温敏传感器微结构，并对其温度电阻特性，热响应时间进行了测量。利用该本文还设计出一种新型的温敏、气敏多功能传感结构。     

低热导率衬底的热风速风向传感器研究

为了提高热风速风向传感器灵敏度,提出了采用低热导率衬底的方法,并利用有限元模拟和实验结果进行了验证.本文设计的传感器采用圆形结构的加热与测温电阻,利用热温差的方法测量风速和风向.为了验证传感器衬底对风速灵敏度的影响,本文分别在玻璃和陶瓷衬底上利用MEMS剥离工艺加工出了热风速传感器,并进行了风洞测试.实验结果表明,两个传感器均可以完成360°风向检测,风速量程超过10 m/s.此外,通过对两组测量结果的比较可以发现玻璃衬底传感器的灵敏度比陶瓷衬底高,这与有限元模拟结果完全吻合.     

磁控溅射TiN薄膜低温沉积技术及其摩擦学性能研究

利用磁控溅射装置在高速钢基体上制备了TiN薄膜,研究了基体温度升高的原因及其磁控溅射的低温原理,讨论了低温与离子刻蚀、负偏压、磁场强度3个主要溅射工艺参数的关系,并对TiN薄膜的摩擦学性能进行了研究。实验结果表明,离子刻蚀、负偏压、磁场强度对低温磁控溅射TiN成膜过程具有较大的影响,所制备的TiN薄膜的耐磨性、配副适应性也较好。     

溅射气压和衬底温度对Si1-xGex薄膜结构和光吸收性能的影响

采用射频磁控溅射法沉积了Si1-xGex薄膜,研究了溅射气压、衬底温度对薄膜结构、厚度、表面形貌、表面成分及光吸收性能的影响。结果表明:薄膜均为微晶结构且相组成不随溅射气压和衬底温度的改变而改变;随着溅射气压升高,薄膜结晶性能降低,升高衬底温度使其结晶性能提高;随气压或温度的升高,薄膜厚度均先增大后减小,在1.0Pa或400℃达到最大值;随温度的升高,薄膜表面团簇现象消失并变得平整致密,气压为8.0Pa时,表面有孔洞和沟道;随气压升高,薄膜中锗含量降低,光吸收强度减小,光学带隙增大;衬底温度的变化对光学带隙影响不大。     

Evaluation of surface roughness and nanostructure of indium tin oxide (ITO) films by atomic force microscopy

Indium tin oxide was deposited on a glass (soda lime glass) by radiofrequency sputtering system at different sputtering gas (argon/oxygen 90/10%) pressures (20-34 mTorr) at room temperature. The sputtering rate was affected by the sputtering gas pressure. The optimum sputtering gas pressure was found to be 27 mTorr. The samples at different thicknesses (168, 300, 400, 425, 475, 500 and 630 nm) were deposited on the substrate. Transparency, electrical conductivity and surface roughness of the films were characterized. The samples were annealed at 350, 400 and 450 degrees C to evaluate annealing process effects on the concerned parameters and, therefore, the above-mentioned measurements were repeated again. The films exhibited reasonable optical transmittance and electrical conductivity and greatly improved after annealing. The characterization was focused on the scanning of the film surfaces before and after annealing, which has a prominent effect on the optical properties of the films. Film surfaces were scanned by scanning probe microscopy in contact atomic force mode. The most consideration was devoted to image analysis.     

柔性衬底直流磁控溅射ZnO基高性能透明导电薄膜的制备及性能研究

采用直流磁控溅射法,以柔性PET(聚对苯二甲酸乙二醇酯)为基底,通过参数优化以求在室温下制备高性能ZnO/Ag/ZnO多层薄膜。实验中,使用X射线衍射仪(XRD)、原子力显微镜(AFM)、紫外-可见分光光度计、四探针电阻测试仪等仪器分别对ZnO/Ag/ZnO多层薄膜的微观结构、表面形貌、透过率及方块电阻进行测试及表征。结果表明,随着Ag层厚度增加,薄膜方块电阻急剧下降,通过改变ZnO层厚度,可有效调节薄膜光学性能,随着ZnO层厚度增加,可见光区平均透过率先增大后减小。引入品质因子FTC作为评价指标可知,当依次沉积ZnO、Ag、ZnO厚度为50nm、8nm、50nm时,薄膜光电性能最佳,其在可见光平均透过率为82.3%、方块电阻为2.8Ω/、禁带宽度为3.332eV。     

Development of RF magnetron sputtering method to fabricate PZT thin film actuator

PZT piezoelectric very thin films suitable for a microactuator have been deposited onto Invar alloy substrate using a high-temperature RF magnetron sputtering technique. PZT thin films must be deposited onto conductive substrate for a monomorph or a bimorph actuator. The chemical composition and the crystalline structure of these films were measured by ESCA and XRD, respectively. The chemical composition of PZT deposited stoichiometrically was almost the same as commercially-produced bulk PZT. Crystal planes (1 1 0) and (1 1 1) of PZT perovskite structure were observed in XRD analysis. When the substrate was heated to above 600 °C, SEM revealed only a very small number of pinholes on the surface. A thin (500 nm) film actuator has been characterized by measuring the piezoelectric property using a Laser Doppler Vibrograph. It was confirmed that the piezoelectric property has a linear relationship with the grain size, which also increased with the substrate temperature. The piezoelectric property of deposited PZT thin films showed a good agreement with a quoted value of bulk PZT, when the substrates were heated to 600 °C.     

Multilayer thin film CrN coating on aerospace AL7075-T6 alloy for surface integrity enhancement

Chromium nitride (CrN) coating has emerged as a new alternative in machining applications. CrN has good thermal stability, low deposition temperature, and excellent wear and corrosion resistance. However, no precise information exists yet regarding the ideal coating parameter conditions that lead to higher surface integrity. For this reason, an optimization study is desired—a study on the parameters of CrN coating on aerospace Al7075-T6 alloy using physical vapor deposition magnetron sputtering. The present research work investigates the effects of temperature as well as nitrogen flow rate and DC power on coated samples’ surface hardness, adhesion, surface roughness, and microstructure. To carry out the investigation, the Taguchi optimization method with L₁₆ (3⁴) orthogonal array was applied. However, to obtain optimum parameters for superior surface integrity, signal/noise (S/N) response analysis method was employed. Finally, confirmation tests with the best parameter combinations attained in the optimization process were carried out to demonstrate the progress made. Ultimately, surface hardness of coated Al7075-T6 was enhanced by 15.33 %, adhesion by 24.3 %, and surface roughness by 7.22 %.     

Predicting electroless Ni–Co–P coating using response surface method

Electroless Ni–Co–P coating has been studied considering pure copper (99.99 %) as a substrate material. The deposited mass per unit area of the substrate has been considered as the response variable. The individual as well as combined effects of the process parameters on the response variable has been studied. The bath temperature and the interaction of cobalt source concentration and reducing agent concentration have been found to be significant through regression analysis and Student's t test. Mathematical modelling has been carried out using a second-order response surface model with central composite design to take into account the effect of curvature in the predicted response. The equation for response surface has been determined using MATLAB software package. The response surface plots show that the rate of deposition increases significantly with the rise in temperature while the cobalt source concentration and reducing agent concentration have an interactive effect which influences the rate of deposition. The test of reliability for the predicting response surface equation shows that the equation gives an excellent fitting to the observed values.     

Conventional and ionized magnetron sputter‐deposition of nanocrystalline titanium diboride thin films

Titanium diboride has many interesting physical and chemical properties that make it attractive as a tribological coating material. We focus our study on the relationship between hardness, crystal structure and processing parameters for TiB₂ thin films produced by conventional and ionized magnetron sputtering. When synthesized by conventional magnetron sputtering, TiB₂ films with the highest degree of crystallinity have the highest hardness and are obtainable at an optimum combination of argon pressure and substrate bias. The films also show strong (0001) texture. Such high degree of crystallinity can be obtained without substrate bias by ionized magnetron sputtering, in which enhanced ionization of the plasma is obtained by inductively coupling RF power in the region between the magnetron target and the substrate. This revised version was published online in July 2006 with corrections to the Cover Date.     

射频磁控溅射法制备氮化硼薄膜

采用射频磁控溅射方法在T10钢表面获得了氮化硼薄膜。借助光学显微镜、摩擦磨损试验仪和划痕试验仪等研究了溅射时间、溅射功率以及中间层对薄膜性能的影响。结果表明：氮化硼薄膜的摩擦因数约为钢基材料的一半,中间层镍磷合金的加入使薄膜结合力显著提高。