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| 射频交替溅射法制备的NiZn铁氧体薄膜的结构与磁性 | |
| 引用本文： | 王海波,孙建荣,王兰喜,魏福林,王丽,王建波,李发伸,沈宝龙.射频交替溅射法制备的NiZn铁氧体薄膜的结构与磁性[J].宁波大学学报(理工版),2010,23(1):115-117. |
| 作者姓名： | 王海波 孙建荣 王兰喜 魏福林 王丽 王建波 李发伸 沈宝龙 |
| 作者单位： | 1. 兰州大学,磁学与磁性材料教育部重点实验室,甘肃,兰州,730000;中国科学院,宁波材料技术与工程研究所,浙江,宁波,315211 2. 兰州大学,磁学与磁性材料教育部重点实验室,甘肃,兰州,730000 3. 中国科学院,宁波材料技术与工程研究所,浙江,宁波,315211 |
| 摘 要： | 使用交替靶射频溅射的方法在不同基底上制备得到了成分为NixZn1-xFe2O4的铁氧体薄膜，研究了NiZn铁氧体薄膜的生长条件，探讨了不同工艺条件对薄膜性能的影响，目的是提高薄膜饱和磁化强度Ms，降低薄膜矫顽力Hc，改善薄膜的软磁性能，以满足其在高频薄膜器件应用方面的需要．实验表明：沉积态薄膜即为尖晶石结构．并且通过不同实验条件对NiZn铁氧体薄膜性能影响的研究，得到了最佳的NiZn铁氧体薄膜的制备条件． |
| 关 键 词： | NiZn铁氧体 薄膜 溅射 穆斯堡尔谱 |
Structure and Magnetic Properties of NiZn Films Fabricated by Alternative Sputtering Technique |
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| WANG Hai-bo,SUN Jian-rong,WANG Lan-xi,WEI Fu-lin,WANG Li,WANG Jian-bo,LI Fa-shen,SHEN Bao-long.Structure and Magnetic Properties of NiZn Films Fabricated by Alternative Sputtering Technique[J].Journal of Ningbo University(Natural Science and Engineering Edition),2010,23(1):115-117. | |
| Authors: | WANG Hai-bo SUN Jian-rong WANG Lan-xi WEI Fu-lin WANG Li WANG Jian-bo LI Fa-shen SHEN Bao-long |
| Affiliation: | 1.Key Lab for Magnetism and Magnetic Materials of Minister of Education/a>;Lanzhou University/a>;Lanzhou 730000/a>;China/a>;2.Ningbo Institute of Material Technology & Engineering/a>;Chinese Academy of Sciences/a>;Ningbo 315211/a>;China |
| Abstract: | NiZn ferrite thin films are prepared by alternative sputtering technique from two targets with the composition of NiFe2O4 and ZnFe2O4.The fabricating conditions on the performance of the films are studied to improve the saturation magnetization and reduce the coercivity of the films,making the films suitable to the applications of high-frequency film devices.The as-deposited films are characterized with spinel structure.In this paper,the optimal fabricating conditions are achieved through a variety of trial... |
| Keywords: | NiZn ferrite film sputtering Moessbauer spectra |
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